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`Paper No. __
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`UNITED STATES PATENT AND TRADEMARK OFFICE
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`____________
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`BEFORE THE PATENT TRIAL AND APPEAL BOARD
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`____________
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`TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD,
`Petitioner,
`
`v.
`
`GODO KAISHA IP BRIDGE 1,
`Patent Owner.
`____________
`
`IPR2017-018431
`Patent 7,893,501
`____________
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`PATENT OWNER’S UPDATED EXHIBIT LIST
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`1 Case IPR2017-01842 has been consolidated with this proceeding．
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`2208
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`2209
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`2210
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`2211
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`Exhibit Description
`2201
`Request for Continued Examination dated March 29, 2010
`2202
`U.S. Patent No. 6,437,404 (“Xiang”)
`2203
`U.S. Patent No. 6,870,230 (“Matsuda”)
`2204
`Office Action dated May 10, 2010
`2205
`U.S. Patent No. 3,390,022
`2206
`McGraw-Hill Dictionary of Scientific and Technical Terms (2003)
`2207
`Declaration of Joshua J. Miller in Support of Motion for Admission Pro
`Hac Vice
`Declaration of Alexander D. Glew, Ph.D., P.E.
`Transcript of the Deposition of Stanley R. Shanfield, Ph.D. (March 27,
`2018)
`Transcript of the Deposition of Stanley R. Shanfield, Ph.D. (March 28,
`2018)
`Exhibit 2001 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., annotated version of ’501 Patent
`Exhibit 2001 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., annotated version of Igarashi
`Exhibit 2003 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., Hawley’s Condensed Chemical Dictionary, Twelfth Edition
`(1993)
`Exhibit 2004 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., annotated version of Xiang (Ex. 2202)
`Exhibit 2005 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., annotated versions of Fig. 12 of Igarashi
`Exhibit 2006 from March 27-28 Deposition of Dr. Stanley Shanfield,
`Ph.D., annotated versions of Fig. 12 of Igarashi
`U.S. Pat. No. 6,924,237
`U.S. Pub. No. 2004/0164359
`U.S. Pat. No. 4,908,324
`U.S. Pat. No. 5,792,695
`U.S. Pat. No. 6,020,233
`Park, et al., A Study on Modified Silicon Surface after CHF3/C2F6
`Reactive Ion Etching, 16 ETRI Journal 45 (1994)
`Miyatake, et al., Surface Contamination Control During Plasma
`Etching, 1593 SPIE 47 (1991)
`Kastenmeier, et al., Gas Utilization in Remote Plasma Cleaning and
`Stripping Applications, 18(5) J. VAC. SCI. TECH. 2102 (2000)
`Butterbaugh, et al., Plasma-Surface Interactions in Fluorocarbon
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`2214
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`2215
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`2225
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`2226
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`Exhibit Description
`Etching of Silicon Dioxide, 9(3) J. VAC. SCI. TECH. 1461 (1991)
`Schaepkens, et al., Study of the SiO2-toSi3N4 Etch Selectivity
`Mechanism in Inductively Coupled Fluorocarbon Plasmas and a
`Comparison with the SiO2-to-Si Mechanism, 17(1) J. VAC. SCI. TECH.
`26 (1999)
`U.S. Patent No. 5,505,816
`The American Heritage College Dictionary (Third Edition)
`Curriculum vitae of Alexander D. Glew, Ph.D., P.E.
`Transcript of July 19, 2018 Conference Call
`Exhibit to Deposition of Stanley R. Shanfield, Ph.D.
`Deposition Transcript of Stanley R. Shanfield, Ph.D. July 25, 2018
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`CERTIFICATE OF SERVICE UNDER 37 C.F.R. §42.6 (e)(4)
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`I certify that on August 9, 2018 I will cause a copy of the foregoing
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`document, including any exhibits referred to therein, to be served via electronic
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`mail, as previously consented to by Petitioner, upon the following:
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`
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`David L. Cavanaugh
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`David.Cavanaugh@wilmerhale.com
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`Dominic.Massa@wilmerhale.com
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`MichaelH.Smith@wilmerhale.com
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`Dominic E. Massa
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`Michael H. Smith
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`Date: August 9, 2018
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`/MacAulay Rush/
`MacAulay Rush
`Patent Paralegal
`WOLF GREENFIELD & SACKS, P.C.
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