`
`ncap DOE - LIV Measurements pre and post
`barrier dep and after 1600 hours in ambience
`
`Plate6.9 -Devicel
`
`Plate6.9 - Device2
`
`1 00E+00
`
`• Cuff nt-post
`
`1 00E 01
`
`• Reserse I V-post
`
`1 00E02
`
`1 00E03
`
`1 00E04
`
`1 00E05
`
`1 00E 06
`
`1 00E07
`
`Voltage (V)
`
`soo
`
`ma 1,-
`
`05
`
`Cuff nt-pre
`
`Reserse I V-pre
`
`• Cuff ft
`
`• Reserse I V-post2
`(1654hrs)
`
`Luminance-post
`
`— Luminance-poste
`
`1 00E+00
`
`1 00E-01
`
`1 00E-02
`
`1 00E-03
`
`00E-04
`
`1 00E-05
`
`1 00E 06
`
`1 00E-07
`
`• __________
`
`Voltage (V)
`
`Plate6.9 - Device3
`
`Plate6.9 -Device4
`
`1 -1 -9 -0 -7 -8 -8 .4 -3.2 -1
`
`• Gwent-post
`
`• Reserse I V-post
`
`Gwent-pre
`
`Reserse I V-pre
`
`• Cuff ni-post2
`
`• Reserse I V-post2
`(1654hrs)
`
`r Luminance-post
`
`— Luminance-post2
`
`1 -1 -9 -6 -7 -6 .6 -4 -3
`
`E 3
`
`1.00E-04
`
`1.00E-05
`
`1.00E-06
`
`Voltage (V)
`
`voltage (V)
`
`Minimize I-V Shift due to Barrier Depositiv-
`
`1.00E+00
`
`1.0M-01
`
`1.0M-02
`
`1.0M 03
`
`e) 1.0M-04
`
`1.0M-05
`
`1.0M-06
`
`1.0M-07
`
`SLIDE 42
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`• Cuff nt-post
`
`• Reserse I V-post
`
`Cuff nt-pre
`
`Reserse I V-pre
`
`• Cumnt-post2
`
`• Reserse I V-post2
`(165410s)
`
`-4-- Luminance-post
`
`— Luminance-post2
`
`• Cuihent-post
`
`• Reserse I V-post
`
`Cuihent-pre
`
`Reserse I V-pre
`
`• Cuihent-post2
`
`• Reserse I V-post2
`(165410s)
`
`Luminanc0post
`
`— Luminance-post2
`
`SYMMORPHIX
`
`DEFTS-PA_0003249
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 2 of 40
`
`ncap DOE — Optimize Luminance Change on
`Pixelated OLED test Devices > 1600 Hours in
`Ambience
`
`Percent change in Luminance
`[Plate-ID_7.4]
`
`Percent change in Luminance
`[Plate-ID_7.1]
`
`so
`2 60
`
`Z 40
`
`20
`
`1 00
`
`pre-poSh %change
`pre-poS121 %change
`laashp0512: %change
`
`cu cct (n14)
`
`Percent change in Luminance
`[Plate-ID_6.3]
`
`6.- pre-posh %Change
`pre-pos121 %change
`pOst-poS12: %change
`
`P.-POSC%change
`pre-p042: %Change
`poshpos12: %change
`
`80
`
`Cure 1.4)
`
`Ready for Accelerated Testing at Dupont
`
`SLIDE 43
`
`Thin-film encapsulated OLEDs lighting up with
`minimal luminance change after 1654 hours in
`damp heat
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003250
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 3 of 40
`
`,604,
`
`le;
`
`Aval,
`
`Cleaning: Pinhole Reduction
`
`Cleaned substrate
`before barrier dep
`
`Ca Test Results After 569 hours in 50 °C / 95% RH
`
`Substrate cleaning reduces pinholes from external causes
`
`DEFTS-PA_0003251
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 4 of 40
`
`Ca OD Results
`
`Densitometer Readings
`
`130.00%
`
`120.00%
`
`1 10.00%
`
`8E, 100.00%
`
`90.00%
`
`80.00%
`
`70.00%
`
`60.00%
`
`50.00%
`
`• Glass
`M PEN Process1
`A PEN Process2
`— Linear (PEN Process1)
`— Linear (PEN Process2)
`— Linear (Glass)
`
`200
`
`400
`
`600
`
`800
`
`1000
`
`1200
`
`Elapsed Time (Hr)
`
`SYMMORPH IX
`
`DEFTS-PA_0003252
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 5 of 40
`
`As-received Substrates for test
`1. Two kinds of substrates will be transported to Symmorphix
`1-1. OLED's substrate (ca. 27x20 mm2, 5 ea)
`1-2. OLED's substrate with evaporated Al layer (ca. 27x20 mm2, 5 ea)
`
`2. Images of OLED's substrate
`
`<4,s4
`
`Separator
`
`Insulator
`
`4'
`,;;Xti
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003253
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 6 of 40
`
`Zfr
`
`Photographs of substrates w/ the Aluminum layer
`
`As-received
`
`After Deposition:
`
`SLIDE 47
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003254
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 7 of 40
`
`44,21'
`
`Cross-section SEM with 2,500A AIOSi film
`(on substrate with the Al layer)
`
`S4700 15.0kV 6.1mm x15.05 SE(M) 4/29/05 11:21
`
`3 00um
`
`Conformal
`barrier
`coverage
`underside of
`the separator
`
`,
`
`WiyjyroPIF" ATC:!A
`•
`,
`k,7140gpkii
`ilOWHANIVtilf/OgOite,
`
`77
`
`AOK
`
`-
`
`^4700 15.0kV 6.1mm x50 0k SE(M) 4129/051130
`-
`,...SLIDE 48
`
`•
`
`*5;
`
`S4700 15.0kV 5.8mm x100k SE(M) 4(29/051308
`
`500nm
`
`SYMMORPHIX'
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003255
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 8 of 40
`
`Barrier Film Slow Tapering Capability
`
`Great mushroom under coverage
`— Single layer solution possible
`Barrier Film Thickness Tapering Capability for Contact Exposure
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003256
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 9 of 40
`
`xample of Undercut Filling
`
`34700 15.0kV 5.7mm x100k SE(U) 5/2/05 1546
`
`.411%
`
`Note the conformal
`barrier coverage
`underside and
`corner
`
`Cross-section SEM with 2,500A AIOSi film
`
`•
`SLIDE 50
`
`SYMMORPH IX
`
`DEFTS-PA_0003257
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 10 of 40
`
`• Plastic roughness and defects
`
`•Spikes — plastic, handling
`
`•Particles from plastic/handling
`
`• Scratches - handling
`
`• Pits — arcing, possible metal
`contamination of plastic
`
`• Barrier Cracking — local adhesion
`issues (pre-contamination)
`
`Defect Pa reto Analysis
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003258
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 11 of 40
`
`, i/eVfiqii
`g4,4AMO
`c404,0J9`4„,,ebnii,k
`
`P,11/
`
`Flexible Electronics Industry Challenges
`
`(Future Application)
`
`Most of today's displays (TFT-LCDs) and semiconductor ICs (CMOS on
`Si) use substrates that are inflexible, heavy, brittle and expensive
`Cheap displays and electronics require cheap flexible substrates
`(plastics)
`Requires low-temperature barrier
`semiconductor and gate dielectric film
`
`LED DISPLAY STRUCTURE
`
`6D-nfr
`
`'- 1'Iu1ic
`
`tate
`
`OM PAN Y
`
`SYMMORPHIX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003259
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 12 of 40
`
`Ingle Layer Barrier on Plastic WVTR
`Performance Improvement History
`
`PEN -1!Pretreatme
`Barrier Process
`Optimization
`
`WVTR (g/m2/day) vs Date
`
`* Median WVTR
`
`Consistent Improvement in Barrier Performance with < 2000A Single
`Layer Barrier
`
`SLIDE 53
`
`SYMMORPHIX '
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003260
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 13 of 40
`
`• % transmission of barrier film on PEN equivalent to bare PEN
`• Transmission change minimal post boiling water test (4 hours)
`
`4(X)
`WA
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003261
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 14 of 40
`
`E Samples - % T (Nov '04)
`
`Transmission of November Samples vs. Air
`
`‘0,:r00
`
`,44
`
`apioad~r.
`_ loorrwiw
`
`I
`
`0-
`P
`
`Baseline
`Process C
`
`'" Process D
``'m Process E
`
`- Process B
`—"— Process A
`
`,i0NvelengthIcni°m)
`
`Tuning Some DOE Parameters affect %T
`
`Lower %I Barrier may be useful for encapsulation or barrier lid for bottom emitting devices
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003262
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 15 of 40
`
`Defect Pareto Analysis Summary
`
`Particles -
`
`,
`
`90
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003263
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 16 of 40
`
`ccelerated Lifetime Measurements of
`er Coated PEN (May 2004)
`
`Calcium Test OD Measurements
`
`= -0.0002x ± 0.92
`
`•
`
`. Sample1
`. Sample2
`Glass Control
`Linear (Sample1)
`Linear(Sample2)
`— Linear (Glass Control)
`
`y = -0.0004x -1.- 0.9475
`
`1
`0.9
`0.8
`0.7
`0.6
`0.5
`0.4
`0.3
`0.2
`0.1
`0
`
`Normalized Ca OD
`
`0
`
`200
`
`400
`
`600
`
`800
`
`1000
`
`1200
`
`# of Hours in 60c/90% R.H
`
`>1000 hours on accelerated testing (50°C, 95% RH)
`As-received substrate sample based on empirical calculations
`WVTR —1.2 E-3 g/m2/day
`Cleaned substrate reduces pinholes and has a WVTR — 4.4E-4 g/m2/day
`
`SLIDE 57
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003264
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 17 of 40
`
`Ca OD (Nov '04)
`
`Densitometer Readings (As % Of Original)
`
`110% ,
`
`100%
`
`90%
`
`80%
`
`70% I
`
`60% k
`
`50%
`
`40%
`
`30%
`
`20%
`
`10%
`
`0%
`
`0 100
`
`200
`
`300
`
`1.00
`
`Improved Barrier
`Process A
`
`Glass on
`Glass Control
`
`Improved Barrier
`Process D
`
`Improved Barrier
`Process B
`
`'Baseline
`
`,
`600
`500
`EraptFdltolir§
`
`700
`
`800
`
`900
`
`1000
`
`1100
`
`—0—Glass —0-1201 process A
`
`1 1204 Process B
`
`1206 Baseline
`
`—0-1207 Process C —0-1208 Process D
`
`1 1210 Process E
`
`Improvement in Ca OD performance with DOE Parameter Tuning
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003265
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 18 of 40
`
`n of Barrier on PEN
`
`Sake Test
`
`150 °C for 1 Hr on a hot plate
`
`No visible damage
`16% Curl which remained after cooling
`
`Ambient moisture uptake 4 10 mbar
`for 18 hours -*Inspect 50x
`
`Submerge for 1 hr - Air dry -*
`
`Film unaffected
`„..„„..„„„..„„•„..„„•„..„„
`'•
`
`'• '
`
`Submerge for 1 hr 4 Air dry 4
`Inspect 50x
`
`Submerge for 1 hr 5 Air dry 4
`Inspect 50x
`
`Submerge for 1 hr 4 Air dry 4
`Inspect 50x
`
`••.filinOneiteCtecl:•,,
`• •
`.
`
`Solvent Test: THF
`
`Minor damage; no concern
`
`Material is suitable for conformal or flexible displays and electronics
`
`DEFTS-PA_0003266
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 19 of 40
`
`Encapsulation Summary of Progress
`
`Pixelated OLEDs from Dupont encapsulated successfully
`lasting 1600 hours in ambience.
`— Accelerated testing is next, substrates shipped to Dupont SB
`, Equipment Setup for LIV measurements on backlights and
`pixelated OLEDs is complete and working inside glove
`box.
`- Preliminary Process DOE to find the process window of
`barrier deposition process complete.
`- Detailed DOE to close in on the optimized process
`underway.
`Samples ready for accelerated lifetime testing to be done
`at Dupont.
`
`SLIDE 60
`
`SYMMORPHIX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003267
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 20 of 40
`
`0,000 Footview of Symmorphix
`
`Barrier
`on
`Plastic
`
`Thin
`Dielectrics
`and Metals
`
`Substrates
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003268
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 21 of 40
`
`Barrier Process on PEN: 2500A TEM
`
`AS HD2000 200kV x250k TE
`
`klAS HD2000 200kV ,800k I E
`
`30. nm
`
`SLIDE 62
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003269
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 22 of 40
`
`s-section
`
`UAS1-02000 200V x250k TE
`
`250nm Aluminosilicate barrier on
`plastic;
`
`showing a metal "breath" treatment
`on TEOS coated PEN Plastic
`
`6.2 nm of Niobium Oxide at atomic
`resolution (r. 25 atomic lavers thick)
`
`•shows the dense defect free
`amorphous dielectric laver
`
`.deposited on a similar defect free
`layer of Niobium Nitride and
`
`•niobium metal- IV and CV on
`request.
`
`SLIDE 63
`
`SYMMORPH IX '
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003270
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 23 of 40
`
`Acknowledgements
`
`• USDC Funding
`• Rich Wessell, Terri Cardellino (DuPont)
`• Bill MacDonald, Bob Rustin & Keith Rollins (Dupont
`Teijin)
`, Jens Hauch (Konarka Technologies)
`• Jay Lewis & Sonia Grego (MCNC —RDI)
`• Giovanni Nisato (Philips)
`• Anna Chwang, Janice Mahon (UDC)
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003271
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 24 of 40
`
`,fi,koy"
`
`ymmorphix Summary
`
`, Develop equipment and process for production of high-quality glass-
`ceramic films using Symmorphix physical vapor deposition
`(PVD) technology
`
`, Develop products based on high-quality amorphous dielectric films for:
`— Barriers and protective films in OLEDs, touch sensors and flexible
`ICs
`— High-capacitance dielectrics for capacitors and energy storage
`— Polymer substrates and polymer electronics
`— Planar integrated optical devices with gain
`
`Business model
`— In large-volume applications, license technology
`— In high-value (low volume) applications, develop and market
`products
`
`OMPANY
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003272
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 25 of 40
`
`Appendix A: Metrology Data
`
`Y•-_,-
`
`Birefringence
`
`DigpeFsicii
`
`Stress
`
`PL Intensity Map
`
`Lifetime & Cup
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003273
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 26 of 40
`
`,..,nnn,00■PeoVAWIPM0
`1115461004010,' ,74r,,,,
`
`7
`
`4, •
`
`Thickness Uniformity 2.7% 6 sigma
`
`1
`
`Lertialitaki
`-01,1P42
`
`$1600,0 -11004
`311140711,-164111
`
`- 1 (+01 ,
`1.1161049 Raid
`INFrzs
`1 p-
`oploosr,ime
`
`s
`
`sinifot-!ms?
`
`
`
`. . errnigion .6111111.1,5 INre .210.111 illatr$.11
`-Q
`4'423 1D % fii.1576$9i
`
`.
`
`, .
`
`91:4141115.16.11%
`
`SYMMORPHIX'
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003274
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 27 of 40
`
`w
`
`•
`
`4
`
`0
`
`o oi
`
`o o •
`
`ro j m
`
`ro
`
`W o
`
`MAL, l4X173 Q
`
`MEM IliminumAIASIkki
`JThM LOs 1.459373
`
`LIME
`4111114 0. I AMU
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003275
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 28 of 40
`
`-MUM fficEir,
`Jima o Row. MOM 111(ps .1411016
`
`9I%.( ]
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003276
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 29 of 40
`
`01)416''57''''Y
`
`ndex) for three Aluminosilicate optical alloy
`ide films. k values less then E-5 over visible
`
`1.6
`
`1.58
`
`1.56
`
`1.48
`
`1.46
`
`1.44
`
`83-17
`
`92-8
`
`0
`
`500
`
`1000
`
`1500
`
`2000
`
`Wavelength
`
`O MPANY CONFIDENT
`
`SYMMORPHIX'
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003277
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 30 of 40
`
`010.00800,0"'"
`
`ress on silicon from as deposited with 3
`nneal cycles blue, pink and yellow
`
`161
`
`/211441 sivIsswi r oripsnisr.s
`
`mosmormamomem
`
`tf1011
`
`aaaaarata.
`
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`
`ow 1. ra
`
`01,4 y91.
`1.4evoltvo.0.14*.'
`
`416
`
`Tommie
`
`:44,64e $4
`
`O MPANY CONFIDENT
`
`SYMMORPHIX'
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003278
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 31 of 40
`
`0000PooM;00,.00:O,' oo,o•;',41o."1,0Hrro
`44.oliknoV000',ophoovllo°
`.
`**010.oril%
`
`• E
`
`r+3 active waveguide over passive waveguide — after
`mode size converter
`SEM of fracture cross section
`
`C OMPANY
`
`SYMMORPHIX''
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003279
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 32 of 40
`
`Vtfrgt*VA9V''''""
`
`Differential Scanning Calorimetry of an Aluminosilicate Film
`Note: exothermal stable annealing to —MOO C where spinodal composition (opaque)
`phases are formed.
`
`V$.
`
`Y
`
`OMPANY
`
`_...6SYMMORPHIX"
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003280
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 33 of 40
`
`ride" PL of the Er+3 doped Aluminosilicate
`waveguide core after 850 C anneal
`
`1
`
`1515-1565 nm
`
`1500
`
`1520
`
`1540
`
`1560
`
`1580
`
`Wavelength ( nm )
`
`O MPANY CONFIDENT IAA...
`
`SYMMORPHIX'
`
`1
`
`0.9
`
`0.8
`
`0.7
`
`^ 0 6
`
`— 0.5
`
`0- 0.4
`
`0.3
`
`0.2
`
`0.1
`
`Pr"
`
`480
`
`0 1
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003281
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 34 of 40
`
`rbium Up-conversion (green glow) as low as 4.8E-18 (for improved
`rsion) is shown with lifetimes greater than 3.4 msec.
`
`Data: L048614_C,L048630_C,L048640_C,L048650_C,L048670_C,L0486100_C,L0486200_C
`Model: Up-Conv
`
`±0.00004
`
`= 3.9953E-9
`ChN2/DoF
`FV2 = 0.99961
`
`naii-0>%0D12010>
`NO
`0.14894
`Cup
`4.82E-18
`tau
`0.00345
`x0
`0
`±0
`N_total 2.3E20 ±0
`N0_2 0.33768
`N0_3 0.41998
`N0_4 0.44033
`N0_5 0.56495
`N0_6 0.56633
`N0_7 0.58579
`
`0.03957
`±0.00016
`±0
`±2.1218E-6
`
`±0.00035
`±0.00044
`±0.00047
`±0.00061
`±0.00062
`±0.00064
`
`0.00
`
`0.01
`t (sec)
`
`0.02
`
`O MPANY
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003282
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 35 of 40
`
`w birefringence) amplified C band single
`mode output
`
`Peak intensity(count,)
`Peak position(um)
`Total beam energy(counts)
`Grav2ty position(um)
`Beam width(um)
`Beam Gauss width(um)
`Beam area(u52)
`Beam energy(counts)
`Average energy(counts)
`-Isperslon(%)
`Ilt(deg)
`PAliptisity(%)
`
`FWAM
`
`1
`
`97.00,40.00
`115.64,105.83
`117.11,111.57
`9685.00
`2712809
`280.10
`19.54
`29.19
`118.21
`
`1/e
`386
`-94.00, 40.00
`5595992
`-97.00,40.00
`136.23,125.25
`140.66,134.00
`13634.00
`3370331
`247.20
`28.10
`29.51
`117.76
`
`1
`
`1/e2
`
`-98.00,41.00
`186.50,178.44
`198.93,189.51
`26541.00
`4522978
`170.41
`55.80
`31.19
`114.12
`
`c'eb.
`
`Frof1le
`
`300
`
`200
`
`ntomoity
`(counl_s)
`
`cursucl curSor2 CR1-CR2
`197_28
`188,6
`2_42
`187.26
`18,22
`9.04
`
`length
`f um)
`
`-56.00
`-56,00
`
`60.00
`60.00
`
`116.00
`706.0fl
`
`IntensIty
`
`cummorl curson2 CR1 CR2
`18,.41
`1,3.44
`-4.03
`
`length
`
`(UM)
`
`-52.00
`-52.00
`
`5,00
`54.00
`
`106.00
`106.00
`
`Analyzing Condition
`
`m ame:17/04/02
`Accumulation No..32
`
`Line widmlul
`Smoothing points No. :1
`
`O M PAN Y
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003283
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 36 of 40
`
`Low Contamination
`
`Deposited intrinsic amorphous silicon film
`
`ppm
`
`5.0
`0.3
`3.3
`0.0
`0.0
`0.0
`0.0
`0.0
`0.0
`0.0
`
`H
`Ar
`0
`N
`C
`B
`P
`Na
`K
`Li
`In
`Al
`Ni
`Cu
`
`As-dep Si
`<0.1%
`<0.1%
`3.E+18
`2.E+17
`2.E+18
`2.E+16
`2.E+15
`1.E+15
`1.E+16
`1.E+14
`2.E+13
`1.E+16
`ND <3E+15
`ND <2E+15
`atoms/cm3
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003284
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 37 of 40
`
`*OW
`
`ispersion of several aluminosilicate
`allo
`
`n(2)= n, + 1(2 —1500.74), 1500nm < A <1649nm
`
`X = 1500.74
`no
`1.45983
`1.46098
`1.47411
`1.47507
`1.55294
`1.55278
`
`92-8 TE
`92-8 TM
`83-17 TE
`83-17 TM
`35-65 TE
`35-65 TM
`
`1649.08
`
`1.45824
`1.45938
`1.47250
`1.47346
`1.55125
`1.55108
`
`dn/cD,
`-1.07186E-05
`-1.07860E-05
`-1.08534E-05
`-1.08534E-05
`-1.13927E-05
`-1.14602E-05
`
`500
`
`1000
`Wavelength
`
`1500
`
`2000
`
`O MPANY
`
`SYMMORPH IX
`
`1.6
`
`1.44
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003285
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 38 of 40
`
`nd k for 92% silica- 8% alumina
`
`Layer #1
`
`1.485
`
`1.48
`
`1.475
`
`1.47
`
`1.465
`
`1.46
`
`1.455
`
`Index Of Refraction (N)
`
`300
`
`500
`
`700
`
`900
`
`1100
`
`1300
`
`1500
`
`1700
`
`Wavelength (nm)
`
`O MPANY
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003286
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 39 of 40
`
`ange of index control for several alumino-silicate
`alloy films as % from silica
`
`Refractive Index as a function of Al% in Aluminosilicates
`
`A-n choices:
`
`Al%
`1Oook-to-0% 9%
`35%-to-8% 6%
`17%-to-8% 1%
`0.5%
`13%-to-8%
`
`y = -7E08x 1E-05x' + 0 0006x - 1 4625
`O 969
`
`• RI (As Den)
`
`E R.I Post Anneal
`
`— Poly. (R.I (As Dep))
`
`10
`
`20
`
`30
`
`40
`
`50
`
`Al%
`
`60
`
`70
`
`80
`
`90
`
`100
`
`O M PAN Y
`
`SYMMORPH IX '
`
`1.7
`
`1.65
`
`1.6
`
`1.55
`
`1.5
`
`1.45
`
`1.4
`
`Refractive Index
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003287
`
`
`
`Case 6:20-cv-00636-ADA Document 77-3 Filed 03/10/21 Page 40 of 40
`
`Materials for the Symmorphix Processes
`
`Dielectrics (Glass / Ceramic)
`— A1203ABI {D}
`— SiO2 Si 3N4 4-B1_ _ 2 , _ 3
`
`— Aluminosilicate {B}
`— TiO2 / TiOxNi_{B} {D}
`— Ta205{D}
`— ZrO2
`— Various titanates {D}
`
`, Conductors
`— Al {E}
`— Ti / TiN / TiS2 {E}
`— Ta / TaN {E}
`— Mo / MoSi2{E}
`— Cr
`— w
`— ITO
`
`Underlined = Have fabricated
`{B} = Barrier layer candidate
`{D} = Dielectric layer candidate
`{E} = Electrode layer candidate
`
`• Semiconductors
`— Si
`— SiO
`— Ge
`
`• Substrates
`— Glass
`— Quartz
`— Silicon
`— Alumina / Sapphire
`— LiTa03
`— FR4
`— Polymers (various)
`— Stainless steel
`
`O MPANY
`
`SYMMORPH IX
`
`<Presentation Name>
`
`1/15/2021
`
`C OMPANY CONFIDENTIAL
`
`DEFTS-PA_0003288
`
`