`__________
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`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`__________
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`
`
`LAM RESEARCH CORP.,
`
`Petitioner
`
`v.
`
`DANIEL L. FLAMM,
`
`Patent Owner
`___________
`
`U.S. Patent No. RE40,264 E
`
`Issued: April 29, 2008
`
`Named Inventor: Daniel L. Flamm
`
`Title: MULTI-TEMPERATURE PROCESSING
`___________
`
`PETITION FOR INTER PARTES REVIEW
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`
`
`OF U.S. PATENT NO. RE40,264 E
`
`SIXTH PETITION
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`Mail Stop: PATENT BOARD
`Patent Trial and Appeal Board
`U.S. Patent & Trademark Office
`P.O. Box 1450
`Alexandria, VA 22313-1450
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`TABLE OF CONTENTS
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`Page
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`I.
`
`II.
`
`INTRODUCTION ....................................................................................... 1
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`MANDATORY NOTICES PURSUANT TO 37 C.F.R. § 42.8 ................. 1
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`A. Notice of Real Party-In-Interest (37 C.F.R. § 42.8(b)(1)) ................. 1
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`B.
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`C.
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`D.
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`E.
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`F.
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`Notice of Related Matters (37 C.F.R. § 42.8(b)(2)) ........................... 2
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`Designation of Lead and Back-up Counsel (37 C.F.R. §
`42.8(b)(3)) .......................................................................................... 2
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`Service Information (37 C.F.R. § 42.8(b)(4)) .................................... 2
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`Payment of Fees (37 C.F.R. § 42.103) ............................................... 2
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`Certification of Grounds for Standing (37 C.F.R. §
`42.104(a)) ........................................................................................... 2
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`III.
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`PRIORITY DATE OF THE '264 PATENT ................................................ 3
`
`A.
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`B.
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`C.
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`Independent Claim 27 ........................................................................ 5
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`Independent Claim 37 ........................................................................ 5
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`The Continuation-In-Part Provisional Application No.
`60/058,650 Disclosure Filed September 11, 1997 ............................. 6
`
`1.
`
`2.
`
`Etching the Film (cl. 27) or Film Treatment (cl. 37) at
`the Selected First Temperature, Changing to a
`Selected Second Temperature, and Etching (cl. 27) or
`Film Treatment (cl. 37) at the Selected Second
`Temperature ............................................................................ 6
`
`Using a Measured Substrate Temperature (cl. 27) or a
`Control Circuit and Substrate Temperature Sensor (cl.
`37) ........................................................................................... 7
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`Page
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`D. Disclosure of Parent Application No. 09/151,163 Filed Dec.
`4, 1995 ................................................................................................ 8
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`E.
`
`Claims 27-50, 66, and 67Are Only Entitled to a Priority Date
`of September 11, 1997 ..................................................................... 12
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`IV.
`
`CHALLENGE AND RELIEF REQUESTED .......................................... 12
`
`A.
`
`Specific Art and Statutory Ground(s) on which the
`Challenges are Based ....................................................................... 13
`
`V.
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`VI.
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`PERSON HAVING ORDINARY SKILL IN THE ART ......................... 14
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`THERE IS A REASONABLE LIKELIHOOD THAT AT LEAST
`ONE CLAIM OF THE '264 PATENT IS UNPATENTABLE ................ 15
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`A. Ground 1: Claims 27-29, 31-46, 50, 66, and 67 are Rendered
`Obvious by Kadomura in View of '485 Wang and Kawamura
`under 35 U.S.C. § 103(a) .................................................................. 15
`
`1.
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`2.
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`3.
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`4.
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`5.
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`6.
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`7.
`
`Kadomura in View of '485 Wang and Kawamura
`Teaches All the Limitations of Independent Claim 27 ......... 15
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`Chart for Claim 27 ................................................................ 22
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`Kadomura in view of '485 Wang and Kawamura
`Teaches All the Limitations of Dependent Claims 28-
`29, 31-36, 66 ......................................................................... 26
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`Chart for Claims 28-29, 31-36, and 66 ................................. 31
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`Kadomura in View of '485 Wang and Kawamura
`Teaches All the Limitations of Independent Claim 37 ......... 33
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`Chart for Claim 37 ................................................................ 39
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`Kadomura in View of '485 Wang and Kawamura
`Teaches All the Limitations of Dependent Claims 38-
`46, 50, and 67 ........................................................................ 41
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`Page
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`8.
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`9.
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`Chart for Claims 38-46, 50, and 67 ...................................... 49
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`Reasons for Combinability for Claims 27-29, 31-46,
`50, 66, and 67 ........................................................................ 50
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`B.
`
`Ground 2: Kadomura in View of '485 Wang, Kawamura, and
`Tegal Teaches All the Limitations of Dependent Claims 30
`and 49 ............................................................................................... 53
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`1.
`
`2.
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`Chart for Claims 30 and 49 ................................................... 53
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`Reasons for Combinability for claims 30 and 49 ................. 53
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`C.
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`Ground 3: Kadomura in View of EP Wang and Kawamura
`Teaches All the Limitations of Claims 37, 47, and 48 ..................... 54
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`1.
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`2.
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`Chart for Claims 37, 47, and 48 ............................................ 57
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`Reasons for Combinability for claims 37, 47, and 48 .......... 58
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`TABLE OF AUTHORITIES
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`Page(s)
`
`
`Cases
`Ariosa Diagnostics v. Isis Innovation Ltd. Patent Owner,
`IPR2012-00022 (MPT), 2013 WL 2181162
`(P.T.A.B. Feb. 12, 2013) .......................................................................... 3
`
`Augustine Med., Inc. v. Gaymar Indus., Inc.,
`181 F.3d 1291 (Fed. Cir. 1999) ................................................................ 3
`
`Baldwin Graphic Systems, Inc. v. Siebert, Inc.,
`512 F. 3d 1338 (Fed. Cir. 2008) ............................................................. 17
`
`Hollmer v. Harari,
`681 F.3d 1351 (Fed. Cir. 2012) ................................................................ 3
`
`In re Alappat,
`33 F.3d 1526 (Fed. Circ. 1994) .............................................................. 43
`
`In re Freeman,
`573 F.2d 1237 (CCPA 1978) .................................................................. 43
`
`In re Noll,
`545 F.2d 141 (CCPA 1976) .................................................................... 43
`
`In re Prater,
`415 F.2d at 1403 (CCPA 1969) .............................................................. 43
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`KSR Int'l. Co. v. Teleflex Inc.,
`550 U.S. 398 (2007).................................................................................. 1
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`Statutes
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`35 U.S.C. § 102 ................................................................................................. 13
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`35 U.S.C. § 103 ................................................................................................. 15
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`35 U.S.C. § 112 ............................................................................................... 3, 4
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`Page(s)
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`35 U.S.C. § 120 ................................................................................................... 3
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`35 U.S.C. § 311-319............................................................................................ 1
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`35 U.S.C. § 314 ................................................................................................. 14
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`Other Authorities
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`M.P.E.P. § 201.11 I.B ......................................................................................... 4
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`Rules
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`37 C.F.R. § 42.100 .............................................................................................. 1
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`37 C.F.R. § 42.103 .............................................................................................. 2
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`37 C.F.R. § 42.104 ............................................................................ 2, 12, 13, 15
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`37 C.F.R. § 42.15 ................................................................................................ 2
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`37 C.F.R. § 42.22 .............................................................................................. 12
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`37 C.F.R. § 42.8 .............................................................................................. 1, 2
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`EXHIBIT LIST
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`Exhibit
`1001
`
`Description
`U.S. Patent No. RE40,264 (the '264 patent)
`
`1002
`
`1003
`
`1004
`
`1005
`
`1006
`
`1007
`
`1008
`
`1009
`
`1010
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`U.S. Patent No. 6,063,710 (Kadomura)
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`U.S. Patent No. 5,219,485 ('485 Wang)
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`European Patent Application Number 90304724.9 (Tegal)
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`U.S. Patent No. 5,892,207 (Kawamura)
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`European Patent Application Number 87311193.4 (EP Wang)
`
`Continuation-in-Part Provisional Application No. 0/058,650 filed
`Sept. 11, 1997
`
`Parent Application No. 08/567,224 filed Dec. 4, 1995
`
`Declaration of Joseph L. Cecchi, Ph.D.
`
`Curriculum Vitae of Joseph L. Cecchi, Ph.D.
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` Petition 6
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`In accordance with 35 U.S.C. §§ 311-319 and 37 C.F.R. § 42.100 et seq.,
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`Lam Research Corporation ("Lam" or "Petitioner") respectfully requests that the
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`Board institute inter partes review of claims 27-50, 66, and 67 ("challenged
`
`claims") of U.S. Patent No. RE40,264 E ("the '264 patent") (Ex. 1001), which is
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`owned by Daniel L. Flamm ("Flamm" or "Patent Owner"), and cancel those claims
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`because they are unpatentable in view of prior art patents and printed publications.
`
`I.
`
`INTRODUCTION
`
`The twenty-six challenged claims are all directed to a method for processing
`
`a substrate in the manufacture of a semiconductor device.1 Ex. 1009 ¶¶ 52-60. As
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`set forth below, the claims of the '264 patent are obvious because they are nothing
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`more than the result of Flamm combining "familiar elements according to known
`
`methods" to "yield predictable results." KSR Int'l. Co. v. Teleflex Inc., 550 U.S.
`
`398, 416 (2007). Ex. 1009 ¶¶ 61-63.
`
`II. MANDATORY NOTICES PURSUANT TO 37 C.F.R. § 42.8
`A. Notice of Real Party-In-Interest (37 C.F.R. § 42.8(b)(1))
`The real-party in interest for this Petition is Lam Research Corporation.
`
`1 Claims 13-26, 64, and 65 are challenged in a separate IPR, "Petition 5" or
`
`the "Fifth Petition," filed concurrently with this IPR. Claims 51-63, 68-71 are
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`challenged in a separate IPR, "Petition 7" or the "Seventh Petition," filed
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`concurrently with this IPR.
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`B. Notice of Related Matters (37 C.F.R. § 42.8(b)(2))
`The '264 patent is presently at issue in the declaratory judgment action Lam
`
`Research Corp. v. Daniel L. Flamm, Case 5:15-cv-01277-BLF (N.D. Cal.) and in
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`the infringement action Daniel L. Flamm v. Samsung Electronics Co., Ltd., et al.,
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`Case 1:15-cv-00613-LY (W.D. Tex.), and in the following IPRs: IPR2015-01759;
`
`IPR2015-01764; IPR2015-01766; and IPR2015-01768.
`
`C. Designation of Lead and Back-up Counsel (37 C.F.R. § 42.8(b)(3))
`Lead Counsel: Michael R. Fleming (Reg. No. 67,933)
`
`Backup Counsel: Samuel K. Lu (Reg. No. 40,707)
`
`Address: Irell & Manella LLP, 1800 Avenue of the Stars, Suite 900,
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`Los Angeles, CA 90067 | Tel: (310) 277-1010 | Fax: (310) 203-7199
`
`Service Information (37 C.F.R. § 42.8(b)(4))
`
`D.
`Please address all correspondence to the lead and backup counsel above.
`
`Petitioner also consents to email service at LamFlammIPR@irell.com.
`
`Payment of Fees (37 C.F.R. § 42.103)
`
`E.
`The Office is authorized to charge Deposit Account No. 09-0946 for any
`
`fees required for this Petition, including the fee set forth in 37 C.F.R. § 42.15(a),
`
`referencing Docket No. 153405-0053 (264IPR), and for any other required fees.
`
`F. Certification of Grounds for Standing (37 C.F.R. § 42.104(a))
`Petitioner certifies that the '264 patent is eligible for inter partes review and
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`that Petitioner is not barred or estopped from requesting an inter partes review of
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`the challenged claims of the '264 patent on the grounds identified herein.
`
`Petitioner has filed a declaratory judgment action for non-infringement of the
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`claims of the '264 patent, Lam Research Corp. v. Daniel L. Flamm, Case 5:15-cv-
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`01277-BLF (N.D. Cal.). Petitioner has not filed a declaratory judgment action for
`
`invalidity of the claims of the '264 patent. See, e.g., Ariosa Diagnostics v. Isis
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`Innovation Ltd. Patent Owner, IPR2012-00022 (MPT), 2013 WL 2181162, at *5
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`(P.T.A.B. Feb. 12, 2013). On Oct. 2, 2015, Daniel L. Flamm answered Lam's
`
`Complaint but did not file any counterclaims against Lam for infringement of the
`
`'264 patent. On Oct. 2, 2015, Flamm filed a Third-Party Complaint asserting
`
`claims of infringement of the '264 patent against unknown Lam customers.
`
`III. PRIORITY DATE OF THE '264 PATENT
`Under 35 U.S.C. § 120, a claim in a patent is entitled to the benefit of the
`
`filing date of an earlier filed application only if the subject matter of the claim as a
`
`whole is disclosed in the earlier-filed application as required by 35 U.S.C.
`
`§ 112(a). "If any application in the priority chain fails to make the requisite
`
`disclosure of subject matter [under § 112], the later-filed application is not entitled
`
`to the benefit of the filing date of applications preceding the break in the priority
`
`chain." Hollmer v. Harari, 681 F.3d 1351, 1355 (Fed. Cir. 2012); see also
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`Augustine Med., Inc. v. Gaymar Indus., Inc., 181 F.3d 1291, 1302-03 (Fed. Cir.
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`1999) ("Subject matter that arises for the first time in [a] CIP application does not
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`receive the benefit of the filing date of the parent application.").
`
`The '264 patent is a reissue of U.S. Patent No. 6,231,776 ("the '776 patent"),
`
`which issued from Application No. 09/151,163 filed on Sept. 10, 1998 and
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`Provisional Application No. 60/058,650 filed on Sept. 11, 1997 ("the continuation-
`
`in-part provisional application"), which is a continuation-in-part of Application No.
`
`08/567,224 ("the parent application") filed on Dec. 4, 1995. Ex. 1001. Flamm
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`may only rely on the priority date of Sept. 11, 1997, which is the date when certain
`
`claim features of claims 27-50, 66, and 67 were disclosed and adequately
`
`supported by a proper disclosure under 35 U.S.C. § 112 in the continuation-in-part
`
`provisional application filed on Sept. 11, 1997. Because certain features of claims
`
`27-50, 66, and 67 were not disclosed and were not adequately supported by the
`
`parent application, they are not entitled to priority of the parent application date.
`
`Priority is determined on a claim-by-claim, not on a limitation-by-limitation, basis.
`
`See M.P.E.P. § 201.11 I.B ("[I]f a claim in a continuation-in-part provisional
`
`application recites a feature which was not disclosed or adequately supported by a
`
`proper disclosure under 35 U.S.C. [§] 112 in the parent non-provisional
`
`application, but which was first introduced or adequately supported in the
`
`continuation-in-part provisional application, such a claim is entitled only to the
`
`filing date of the continuation-in-part provisional application.") (emphasis added).
`
`Ex. 1009 ¶ 31.
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`Independent Claim 27
`
`A.
`Claim 27 recites a method comprising (a) "heating a substrate holder to a
`
`first substrate holder temperature with a heat transfer device, the substrate holder
`
`having at least one temperature sensing unit; (b) "placing a substrate having a film
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`thereon on a substrate holder within a chamber;" (c) "etching a first portion of the
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`film at a selected first substrate temperature;" (d) "etching a second portion of the
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`film at a selected second substrate temperature, the selected second substrate
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`temperature being different from the selected first substrate temperature;" (e)
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`"wherein substrate temperature is changed from the selected first substrate
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`temperature to the selected second substrate temperature, using a measured
`
`substrate temperature, within a preselected time interval for processing" (f) "and at
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`least the first substrate temperature or the second substrate temperature, in single or
`
`in combination, is above room temperature." Ex. 1001, 22:10-28. Ex. 1009 ¶ 32.
`
`Independent Claim 37
`
`B.
`Claim 37 recites a method comprising (a) "placing a substrate having a film
`
`thereon on a substrate holder within a chamber of a plasma discharge apparatus;"
`
`(b) "performing a first film treatment of a first portion of the film at a selected first
`
`substrate temperature;" (c) "with the substrate temperature control circuit, changing
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`from the selected first substrate temperature to a selected second substrate
`
`temperature;" and (d) "performing a second film treatment of a second portion of
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`the film at the selected second substrate temperature." Ex. 1001, 22:59-23:14. Ex.
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`1009 ¶ 33.
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`For step (c), claim 37 recites "the substrate temperature control circuit" to be
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`"operable to change the substrate temperature from the selected first substrate
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`temperature to the selected second substrate temperature within a preselected time
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`period to process the film." Ex. 1001, 23:17-21. The claim also requires that the
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`plasma discharge apparatus comprises (1) "a substrate temperature control system
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`comprising a substrate temperature sensor and a substrate temperature control
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`circuit operable to adjust the substrate temperature to a predetermined substrate
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`temperature value with a first heat transfer process" and (2) "a substrate holder
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`temperature control system comprising a substrate holder temperature sensor and a
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`substrate holder temperature control circuit operable to adjust the substrate holder
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`temperature to a predetermined substrate holder temperature value with a second
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`heat transfer process." Id. at 22:62-23:5. Ex. 1009 ¶ 34.
`
`C. The Continuation-In-Part Provisional Application No. 60/058,650
`Disclosure Filed September 11, 1997
`1.
`
`Etching the Film (cl. 27) or Film Treatment (cl. 37) at the
`Selected First Temperature, Changing to a Selected Second
`Temperature, and Etching (cl. 27) or Film Treatment (cl.
`37) at the Selected Second Temperature
`
`In the Summary of the continuation-in-part provisional application, the
`
`following is disclosed: "In another aspect of the invention provides an apparatus
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`for etching a substrate in the manufacture of a device using different temperatures
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`during etching." Ex. 1007-11, lines 28-29. Claim 1 of the continuation-in-part
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`provisional application recites "performing a first etching of a first portion of said
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`film at a first temperature and performing a second etching of a second portion of
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`said film at a second temperature, said first temperature being different from said
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`second temperature." Ex. 1007-32, lines 5-7. The specification and Figure 3
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`further disclose the programmed temperature process. Ex. 1007-49 – 1007-50
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`("Programmed Temperature Process (Fig. 3)"). Ex. 1009 ¶ 35.
`
`2.
`
`Using a Measured Substrate Temperature (cl. 27) or a
`Control Circuit and Substrate Temperature Sensor (cl. 37)
`
`In the description of Figure 6 of the continuation-in-part provisional
`
`application, the following is disclosed: "Also possible to have fiber optic for
`
`interference or band edge IR sensor or [L]uxtron probe to sense bottom surface
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`temperature of wafer and control on this temperature." Ex. 1007-46, second para.,
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`fifth sentence. In the description of Figure 1 of the continuation-in-part provisional
`
`application, the following is disclosed: "The desired fluid temperature is
`
`determined by comparing the desired wafer or wafer chuck setpoint temperature to
`
`a measured wafer or wafer chuck temperature (this measurement can be performed
`
`with a thermocouple, thermistor, pyrometer, fluoroptic® sensor or other sensing
`
`means)." Ex. 1007-48, first para., fourth sentence. In the description of Figure 2
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`of the continuation-in-part provisional application, the following is disclosed: "In
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`addition to the sensors TCl and TC2, it is convenient to monitor the top surface
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`chuck temperature and the wafer temperature so that TCl can be selected to
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`maintain the wafer temperature within a specified amount of a wafer etching or
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`CVD temperature . . . ." Ex. 1007-49, first para., sixth sentence. The continuation-
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`in-part application Figure 3 and the description for Figure 3 disclose the etching of
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`the native oxide at room temperature, the etching of tungsten silicide at the higher
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`temperature, the etching of the polysilicon at a reduced temperature , all done in
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`the same chamber. Ex. 1007-49 – 1007-50. Ex. 1009 ¶ 36.
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`D. Disclosure of Parent Application No. 09/151,163 Filed Dec. 4, 1995
`The parent application, filed on Dec. 4, 1995, does not provide written
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`description support for any of claims 27-50, 66, and 67 of the '264 patent, and thus
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`the challenged claims are entitled to priority of no earlier than Sept. 11, 1997.
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`Missing from the parent application is all the above referenced disclosure as well
`
`as the above referenced Figures 1, 2, 3, and 6 in the continuation-in-part
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`provisional application. See Ex. 1008-53 – 1008-65 (parent application figs. 1-9).
`
`Ex. 1009 ¶ 37.
`
`As discussed above, claims 27 and 37 of the '264 patent recites a method of
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`performing film treatment or etching on a substrate on a substrate holder, where
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`the film treatment or etching takes place at both a first temperature and a second
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`temperature of the substrate and the temperature is changed within a specific time
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`interval. Claim 27 requires measuring the substrate temperature and claim 37
`
`requires using a substrate temperature control circuit and a substrate temperature
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`sensor. The concepts of etching the film at the selected first temperature and
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`etching at a second portion of the film at the selected second temperature while on
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`the same substrate holder and using a substrate temperature control circuit and a
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`substrate temperature sensor are entirely lacking from the disclosure of the parent
`
`application, and thus the '264 patent cannot claim priority to the parent application.
`
`Ex. 1009 ¶ 38.
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`There is no mention of using a substrate temperature control circuit and a
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`substrate temperature sensor in the parent application. Also, there is no mention of
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`changing the substrate holder temperature within a specific time interval. Ex. 1009
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`¶ 39.
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`Only approximately one page out of 36 pages of the text of the parent
`
`application's specification touches on processing a substrate at different
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`temperatures. Ex. 1008-45. Instead of disclosing changing the temperature of a
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`single substrate holder to two different temperatures for processing as recited in
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`claims 27-50, 66, and 67, the parent application discloses multiple different
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`substrate holders (or "pedestals") within different chambers, each of which is kept
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`at a different temperature. Id. Ex. 1009 ¶ 40.
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`The parent application teaches that the temperature of the substrate is
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`changed by moving the substrate to a different chamber having a different pedestal
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`between each processing step. The photoresist stripping is taught as comprising
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`two steps, followed by a cooling step. First, stripping occurs in a first chamber
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`having a pedestal set to "a temperature of about 40 °C to maintain a lower wafer
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`temperature." Ex. 1008-45, lines 16-23. In the second step, the "wafer was
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`transferred into a [second] chamber," where "overashing was performed to
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`substantially remove all photoresist material from the wafer." Id. at lines 24-31.
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`The "pedestal of this chamber was at 150 to 200 °C." Id. Then, after the stripping
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`process is completed, "the wafer is removed" from the previous chamber "and
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`placed on the cooling station," which "reduces the temperature of the wafer. Ex.
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`1008-46, lines 2-5. Ex. 1009 ¶ 41.
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`Thus, the stripping process described in the parent application requires at
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`least three separate substrate temperature-adjusting devices—at least two substrate
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`holders (one for each stripping chamber), and a separate "cooling station" to cool
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`the wafer after the photoresist has been removed. This is in contrast to claims 27-
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`50, 66, and 67, which recite changing the temperature of a single substrate holder
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`to influence the film treatment or etching process. Ex. 1009 ¶ 42.
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`Accordingly, the parent application does not disclose at least the following
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`limitations for claims 27-36 and 66:
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` "placing a substrate having a film thereon on the substrate holder in a
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`chamber; etching a first portion of the film at a selected first substrate
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`temperature; and etching a second portion of the film at a selected
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`second substrate temperature, the selected second substrate
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`temperature being different from the selected first substrate
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`temperature"; and
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` "wherein substrate temperature is changed from the selected first
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`substrate temperature to the selected second substrate temperature,
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`using a measured substrate temperature, within a preselected time
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`interval." Ex. 1009 ¶ 43.
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`
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`Accordingly, the parent application does not disclose at least the following
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`limitations for claims 37-50 and 67:
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` "placing a substrate having a film thereon on a substrate holder within
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`a chamber of a plasma discharge apparatus … performing a first film
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`treatment of a first portion of the film at a selected first substrate
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`temperature; with the substrate temperature control circuit, changing
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`from the selected first substrate temperature to a selected second
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`substrate temperature, the selected second substrate temperature being
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`different from the selected first substrate temperature; and performing
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`a second film treatment of a second portion of the film at the selected
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`second substrate temperature; wherein … the substrate temperature
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`control circuit is operable to change the substrate temperature from
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`the selected first substrate temperature to the selected second substrate
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`temperature within a preselected time period to process the film"; and
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` "a substrate temperature sensor and a substrate temperature control
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`circuit operable to adjust the substrate temperature to a predetermined
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`substrate temperature value with a first heat transfer process." Ex.
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`1009 ¶ 44.
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`E. Claims 27-50, 66, and 67Are Only Entitled to a Priority Date of
`September 11, 1997
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`As shown above, the Parent Application No. 08/567,224 does not provide
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`written description support for any of the claims 27 and 37 of the '264 patent, and
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`thus the challenged claims are entitled to priority of no earlier than Sept. 11, 1997.
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`Claims 28-36 and 66 depend from claim 27 and claims 38-50 and 67 depend from
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`claim 37. Because of their dependency, these claims are entitled to priority of no
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`earlier than Sept. 11, 1997 as well. Ex. 1009 ¶ 45.
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`IV. CHALLENGE AND RELIEF REQUESTED
`Pursuant to 37 C.F.R. § 42.22(a)(1) and §§ 42.104(b) and (b)(1), Petitioner
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`challenges claims 27-50, 66, and 67 of the '264 patent. Petitioner respectfully
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`requests inter partes review and cancellation of the challenged claims of the '264
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`patent based on the grounds detailed below in Section VI.
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`A.
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`Specific Art and Statutory Ground(s) on which the Challenges are
`Based
`Pursuant to 37 C.F.R. § 42.104(b)(2), inter partes review of the '264 patent
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`is requested in view of the following references, each of which is prior art to the
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`'264 patent: U.S. Patent No. 6,063,710 to Kadomura et al. ("Kadomura," Ex. 1002)
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`filed Feb. 21, 1997 and issued May 16, 2000; U.S. Patent No. 5,219,485 to Wang
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`("'485 Wang," Ex. 1003) filed Oct. 17, 1991 and issued Jun. 15, 1993; European
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`Patent Application Number 90304724.9 to Lachenbruch et al. ("Tegal," Ex. 1004)
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`filed May 1, 1990 by Tegal Corp. and published on Nov. 28, 1990 as Publication
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`No. 0399676A1; U.S. Patent No. 5,892,207 to Kawamura et al. ("Kawamura," Ex.
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`1005) filed Nov. 27, 1996 and issued Apr. 6, 1999; and European Patent
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`Application Number 87311193.4 to Wang et al. ("EP Wang," Ex. 1006) filed Dec.
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`18, 1987 by Applied Materials, Inc. and published on Jun. 6, 1988 as Publication
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`No. 0272140A2.
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`Kadomura and Kawamura qualify as prior art under pre-AIA 35 U.S.C. §
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`102(e) because their application were filed before the Sept. 11, 1997 priority date
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`of the '264 patent. '485 Wang, Tegal, Narita, and EP Wang, qualify as prior art
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`under pre-AIA 35 U.S.C. § 102(b) because each was published or issued more than
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`one year prior to the Sept. 11, 1997. The references in this Petition were not before
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`the Examiner during the prosecution of the '264 patent or its parent applications.
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`The Petition does not present the same or substantially the same prior art or
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`arguments previously presented during the prosecution of the '264 patent or its
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`parent applications. Petitioner requests cancellation of challenged claims 27-50,
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`66, and 67 of the '264 patent under the following statutory grounds:
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`References(s)
`Ground 35 U.S.C.
`1
`§ 103(a) Kadomura in view of '485
`Wang and Kawamura
`§ 103(a) Kadomura in view of '485
`Wang, Kawamura, and Tegal
`§ 103(a) Kadomura in view of
`Kawamura and EP Wang
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`2
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`3
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`Claims
`27-29, 31-36, 66
`37-46, 50, 67
`30, 49
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`37, 47, 48
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`Section VI demonstrates, for each of the statutory grounds, that there is a
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`reasonable likelihood that the Petitioner will prevail. See 35 U.S.C. § 314(a).
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`Additional explanation and support for each ground is set forth in the expert
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`declaration of Joseph L. Cecchi, Ph.D. Ex. 1009 ¶¶ 1-30, 46-51.
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`V.
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`PERSON HAVING ORDINARY SKILL IN THE ART
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`A Person Having Ordinary Skill In The Art ("PHOSITA") would generally
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`have had either (i) a Bachelor's degree in engineering, physics, chemistry,
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`materials science, or a similar field, and three or four years of work experience in
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`semiconductor manufacturing or related fields, or (ii) a Master's degree in
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`engineering, physics, chemistry, materials science, or a similar field and two or
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`three years of work experience in semiconductor manufacturing or related
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`fields. Ex. 1009 ¶¶ 27-30.
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`VI. THERE IS A REASONABLE LIKELIHOOD THAT AT LEAST ONE
`CLAIM OF THE '264 PATENT IS UNPATENTABLE
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`Claims 27-50, 66, and 67 of the '264 patent are unpatentable on the
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`following grounds. Pursuant to 37 C.F.R. § 42.104(b)(4), Petitioner provides in
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`the following claim charts a detailed comparison of the claimed subject matter and
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`the prior art specifying where each element of the challenged claims is found. Ex.
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`1009 ¶ 64.
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`A. Ground 1: Claims 27-29, 31-46, 50, 66, and 6