`
`INNOLUX CORPORATION V. PATENT OF SEMICONDUCTOR ENERGY
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`LABORATORY CO., LTD.
`SEL EXHIBIT 2008
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`INNOLUX CORPORATION V. PATENT OF SEMICONDUCTOR ENERGY
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`|PR2013-00066
`LABORATORY CO., LTD.
`
`|PR2013-00066
`
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`Display Research Lab Homepage
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`Display Research Laboratory
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`Home
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`Research
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`Professor Miltiadis Hatalis
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`Laboratory Director
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`@9146
`Alumni
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`Publications
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`M L
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`ehigh Homepage
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`ECE Dept Page
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`Contact I11formation
`Sherman Fairchild Lab 308
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`Phone: (610)758-3944
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`Fax: (610)758-6279
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`email: 1nkh1@lehigh.edu
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`Education
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`Ph.D. Electrical Engineering, Carnegie Mellon University, USA 1987
`M.S. Electrical Engineering, State University of New York at Buffalo, USA 1984
`B.S. Physics, Aristotle University of Thessalonia, Greece 1982
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`
` Biography
`My CV
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`Professor Miltiadis Hafalis received the B.S. degree in Physics from Aristotle University of
`Thessaloniki, Thessaloniki, Greece,
`in 1982,
`the M.S. degree in Electrical and Cmputer
`Egineering from the State University of New York at Buffalo in 1984, and the Ph.D. degree in
`Electrical and Computer Engineering from Carnegie Mellon University, Pittsburgh, PA,
`in
`1987. He joined the Department of Electrical and Computer Engineering of Lehigh University,
`Bethlehem, PA, in 1987 as an Assistant Professor and was promoted to Associate Professor in
`1991 and to Professor in 1995. In 1992, he was a Visiting Scientist at XEROX Palo Alto
`Research Center. He is the author or coauthor of over 150 technical publications in the field of
`Polysilicon Thin—Film Transistor Technology. His research interests are in electronic thin film
`materials, devices and circuits for flat panel displays, and integrated Microsystems on variety of
`rigid and flexible platforms including silicon, glass, flexible metal foil, and plastic. Dr. Hatalis
`served as Chairman of the organization committee for five technical workshops and conferences
`in the field of flat panel displays and systems.
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`Xiaoxiao Ma
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`Ph.D. Candidate
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`Phone: (610)758-3948
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`Fax: (610)758-4561
`email: xim207@lehigh.edu
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`
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`Contact Information
`Sherman Fairchild Lab 303
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`
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` Education
`Ph.D. Candidate, Electrical Engineering, Lehigh University, USA
`M.S. Electrical Engineering, Lehigh University, USA 2009
`B.S. Material Science & Engineering, Shanghai Jiao Tong University, China 2007
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`Biography
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`‘:3
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` _PENGADaoo4sa1-s9e9 7!:7’ ‘l
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`http://webtest.ece.lehigh.edu/DRL/people/
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`Xiaoxiao Ma received her B.S. in Material Science and Engineering from Shanghai Jiao Tong
`University, China in July 2007. She earned her Master's Degree in Electrical Engineering under
`Dr. Hatalis's supervisor in May 2009 after joining Lehigh University for two years. Currently
`she is pursuing her Ph.D degree in the same field working in the Display Research Lab. Her
`research interest focuses on study of various metal foils for flexible electronics as well as
`synthesis and characterization of thin films.
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`1 mg
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`Thomas Charisoulis
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`M.S. Student
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`Contact Information
`Sherman Fairchild Lab 307
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`Phone: (610)758-4020
`Fax: (610)758-4561
`email: thc2l0@lehigh.edu
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`I
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`Biography
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`Devry Institute - Electrical Engineering
`Desales University and Lehigh University - Additional Studies
`Perkin Ehner/ ASML — Field Service and Support Engineer
`Lucent Technologies - Photolithography Engineer
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`http://webtest.ece.lehigh.edu/DRL/people/
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`Display Research Lab Homepage
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`Research
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`B99912
`Alumni
`Publications
`Facilities
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`Developing Tomorrow's Technology Today
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` With the goal
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`Lehigh Homepage
`ECE Dept Page
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`to realize high-perforrnance electronic systems on flexible platform this group pursuits design and
`development of devices, circuits and Very large scale integrated systems on stainless steel foil substrate mainly employing
`polysilicon Thin Film Transistor (TFT) technology. In contrast with plastic substrates, metal foils can withstand high-
`temperature steps such as thermal oxide growth, themial dopant activation, silicidation etc. Furthermore,
`the superior
`dimensional stability of metal foil substrates permits the implementation of rather small features (<lpm) over a large area.
`This makes the development of highly integrated, high performance CMOS electronics on flexible, large area platfomi
`possible. Our efforts cover the following aspects:
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`- Preparation of flexible metal foil substrates
`- Design, simulation, and fabrication of application specific solid state devices (including TFT, pi11 Diode, OLED, etc.)
`0 Design, simulation, and fabrication of standalone circuits, application specific integrated circuits and systems with
`novel technologies (including poly-Si TFT, Oxide—TFT, and etc.)
`a Development of characterization and testing setup for highly customized large area integrated systems.
`a Encapsulation of air or humidity sensitive electronic systems
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`Following are some of our projects
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`0 AMOLED display on flexible metal foil substrate
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`-
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`Integrated analog, digital and mixed signal circuits on stainless steel foil
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`- Large Area Flexible Digital Systems on Flexible Platfomi
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`o Low Temperature Metal-Oxide 'IFTs for display and sensor applications
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`a Evaluation of TFT electronics on flexible platfonn u11der mechanical strain
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`. Assessment of various metal foils for flexible electronic applications
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`a Reverse stamped printed electronics
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`http://www.ece.lehigh.edu/DRL/
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`Display Research Lab Homepage
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`Polysilicon TFT on Steel
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`Poly—Si TFT Structure
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`http://www.ece.lehigh.edu/DRL/research/p—Si%20TFT%20Tech/index.html
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`6/3/2013
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`n-type and p-type SLS p-Si 'I‘FTs with channel widthof 1 611m and different channel lengths
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