throbber

`
`
`
`SEL EXHIBIT NO. 2006
`
`
`CHI MEI INNOLUX CORP. v. PATENT OF SEMICONDUCTOR ENERGY
`LABORATORY CO., LTD.
`
`IPR2013-00064
`
`
`
`
`
`

`

`Receipt date: 02/11/2010
`Please type a plus sign (+) inside this box —) [+1
`
`31898833 ~ QAU: 2829
`PTO/SB/OSA (08-00)
`Approved for use through 10/31/2002. OMB 0651—0031
`U.S. Patent and Trademark Office: US. DEPARTMENT OF COMMERCE
`Under the Paerwork Reduction Act of 1995, no nersons are reuired to res-0nd to a collection of information unless It contains a valid OMB control number.
`
`
`
` Substitute for form 1449A/PTO
`Complete if Known
`Application Number
`11/898,833
`
`
`
`INFORMATION DISCLOSURE
`
`Filing Date
`September 17, 2007
`
`
`
`STATEMENT-BY APPLICANT
`First Named Inventor
`
`
`(use as many sheets as necessary)
`
`
`
`
`389%“-
`Group Art Unit
`
`.. m.
`Examiner Name
`
`
`Attorney Docket Number
`, 0756-8108
`
`
`U.S. PATENT DOCUMENTS
`
`
`
`Examiner
`initiais'
`
`U.S. Patent Document
`
`
`Pages, Columns. Lines, Where
`igures
`p
`I
`Raievanépassag/fspggfelevam
`‘
`Name of Paientee or Applicant of
`'
`Kind Code?
`Number
`Clled Document
`
`(if known)
`
`
`
`
`
`
`FOREIGN PATENT DOCUMENTS
`
`Examiner
`
`‘
`
`
`
`
`
`
`
`
`
`
`
`
`
`Foreign Palent Document
`Kind Code
`(itr known)
`
`Name Of Patentee or
`APPIIDET‘I 0f Cited
`Document
`
`Date of Publication of Cited
`Document
`MM—DD-YYYY
`
`Pages, Columns, Lines,
`Where Relevant Passages
`or Relevant Figures Appear
`
`Numberd
`Officez
`
`
`
`
`
`
`Examiner
`Initials
`
`,
`
`Include name of the author (in CAPITAL LETTERS), title of the article (when appropriate), title of the
`item (book, magazine, journal, serial, symposium, catalog, etc,)., date, page(s), volume-issue number(s),
`
`publisher, city and/or country where published.
`
`Order Granting Joint Motion Requesting Court to Vacate Order on Summary Judgment
`of (I) Invalidity of U.S. Patent No. 6,756,258 as to Obviousness and (II) Infringement of
`U.S. Patent No. 6,404,480 dated July 6, 2007 (*As titled, but in fact the Motion is
`Denied)
`
`
`
`
`Examiner
`
`Michael Lebentrittf
`
`Date
`
`\
`,
`..,
`9511 1/20“;
`
`Initial 'rf reference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation if not in _
`*EXAMINER:
`conformance and not considered.
`include copy of this form with next communication to applicant.
`
`SEL EXHIBIT 2006
`
`PAGE 1
`
`SEL EXHIBIT 2006
`PAGE 1
`
`

`

`Please type a plus sign (+) inside this box a [+1
`
`PTO/SB/OSA (08-00)
`Approved for use through 10/31/2002. OMB 0651—0031
`US. Patent and Trademark Office: US DEPARTMENT OF COMMERCE
`Under the Pa uerwork Reduction Act of 1995, no uersons are re-uired to resend to a collection of information on see it contains a valid OMB control number.
`
`Substitute for form 1449A/PTO
`
`INFORMATION DISCLOSURE
`STATEMENT BY APPLICANT
`h
`ts
`(use as manys ee
`
`as necessary)
`
`Complete if Known
`
`Application Number
`11/898,833
`Filing Date
`September 17, 2007
`First Named Inventor
`on ZHANG et al.
`Group Art Unit
`Examiner Name
`Michael Lebentritt
`
`Attorney Docltet Number
`
`0756-8108
`
`U.S. PATENT DOCUMENTS
`
`Kind Code?
`(ifknown)
`
`Name of Patentea or Applicant of
`Cited Document
`
`
`Dale of Publication of Cited
`Pages. Columns, Lines, Where
`Document
`Relevant Passages or Reievant
`Figures Appear
`
`
`
`
`
`
`
`
`
`
`Name of Patentee or
`Applicant of Cited
`Document
`
`
`Date of Publication of Cited
`Pages. Columns, Lines,
`Document
`Where Relevant Passages
`or Relevant Figures Appea
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Examiner
`Initials
`
`'
`
`.
`
`(
`Include name of the author (in CAPITAL LETTERS), title of the article when appropriate), title of the
`item (book, magazine. journal, serial, symposium, catalog, etc.)., date, page(s), volume-issue number(s).
`publisher. city and/or countw where published,
`C. Zarowin and R. Horwath, “Control of Plasma Etch Profiles with Plasma Sheath
`Electric Field and RF Power Density,” J. Electrochem. Soc: Solid-State Science and
`Tech., November 1982, pp. 2541-2547.
`
`T2
`
`
`iiflichaei Lebeniriit/
`Si- nature
`
`
`
`
`
`Considered
`
`05/1 11010
`
`
`
`Initial lf reference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation if not in
`*EXAMINER:
`conformance and not considered.
`Include copy of this form with next communication to applicant.
`
`SEL EXHIBIT 2006
`
`PAGE 2
`
`SEL EXHIBIT 2006
`PAGE 2
`
`

`

`Notice of References Cited
`
`Application/Control No.
`
`Applicant(s)/Patent Under
`Reexamination
`
`ZHANG ET AL.
`11/893,333
`Examiner
`Art Unit
`
`MICHAEL S. LEBENTRITT
`
`2829
`
`Page 1 of1
`
`U.S. PATENT DOCUMENTS
`
`.
`.
`.
`Date
`Document Number
`
`Country Code-Number-Kind Code
`MM.YYYY
`CIaSSIflcatlon
`*
`
`257/66
`257/49
`
`438/150
`
`349/43
`
`257/350
`
`438/153
`
`I I I I I I I
`
`FOREIGN PATENT DOCUMENTS
`Document Number
`Date
`.
`.
`.
`Country Code-Number-Kind Code
`MM-YYYY
`Classn‘lcatlon
`
`Country
`
`Name
`
`
`
`
`
`
`
`*A copy of this reference is not being furnished with this Office action. (See MPEP § 707.05(a).)
`Dates in MM-YYYY format are publication dates. Classifications may be US or foreign.
`U.S. Patent and Trademark Office
`PTO-892 (Rev. 01-2001)
`
`Notice of References Cited
`
`Part of Paper No. 20091104
`
`SEL EXHIBIT 2006
`
`PAGE 3
`
`Reddy, Damoder *
`
`05-1994
`01-1998
`
`06-2000
`
`05-2001
`
`02-2002
`
`01-2003
`
`Tominaga et al.
`
`Suzawa, Hideomi
`Yamazaki et al.
`
`Onisawa et al.
`
`Kitakado et al.
`
`SEL EXHIBIT 2006
`PAGE 3
`
`

`

`Receipt date: 04/04/2008
`Please type a plus sign (+) inside this box ._, [+]
`
`
`
`31898833 ~ QAU: 2829
`PTO/SB/OSA (08~00)
`Approved for use through 10/31/2002. 0MB 0651-0031
`
`1
`:
`and Trademark Ofiice: U. S. DEPARTMENT OF COMMERCE
`
`«6‘
`tion ofinformation unless it contains a valid OMB control number
`
`Substitute for form 1449A/PTO
`1
`
`
`
`
`
`Au”26- 0‘0
`‘
`' ‘
`INFORMATION DISCLOSURE
`
`
`STATEMENT BY APPLICANT
`Hon on ZHANG etal.
`
`
`
`
`(ute armanysheetsasneceisaqy)
`M“
`
`
`
`
`
`
`_xaminerName
`
`
`iing ate
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Include name of the author (in CAPITAL LETTERS), title ofthe article (when appropriate), title-ofthe
`item (book, tnagazine,joumal, serial, symposium, catalog, etc), date, page(s), volume-issue number(s),
`publisher, city and/or country where published.
`
`Semiconductor Energy Laboratory Co., Ltd’s Motion for Summary Judgment on its
`Claim of Infringement of the ‘480 Patent and on Defendants’ Inequitable Conduct,
`Laches, License, and Patent Misuse Affirmative Defenses dated March 19,2007
`
`Declaration of Stanley A. Schlitter in Support of Semiconductor Energy Laboratory Co.,
`Ltd.’s Motion for Summary Judgment (Exhibit 1, 5-21) dated March 19, 2007
`
`Defendants’ Motion for Summary Judgment of (A) Non-Infringement and Invalidity of
`the ‘258 Patent; (B) Non—Infringement and Invalidity ofthe ‘995 Patent; and (C) No
`Liability for Foreign Sales and/or Sales to Authorized Licensees dated March 19, 2007
`
`Declaration of Robert W. Unikel in Support of Defendants’ Motion for Summary
`Judgment of (A) Non-Infringement and Invalidity of the ‘258 Patent; (B) Non-
`Infringement and Invalidity of the ‘995 Patent; and (C) No Liability for Foreign Sales
`and/or Sales to Authorized Licensees (Exhibit 2-17) dated March 19, 2007
`
`Semiconductor Energy Laboratory Co. Ltd’s Memorandum of Points and Authorities in
`Opposition to Defendants’ Motion for Summary Judgment dated April 16, 2007
`
`Declaration of Stanley A. Schlitter in Support of Semiconductor Energy Laboratory Co.,
`Ltd.’s Opposition to Defendants’ Motion for Summary Judgment (Exhibit 2, 3, 6, 9, 10,
`13, 77) dated April 16, 2007
`
`Defendants’ Opposition to Semiconductor Energy Laboratory Co., Ltd’s Motion for
`Summary Judgment on its Claim ofInfringement of the ‘480 Patent and on Defendants’
`Inequitable Conduct, Laches, License, and Patent Misuse Affirmative Defenses dated
`April 16, 2007
`
`
`
`
`
`
`'
`
`
`
`Declaration of Robert W. Unikel in Support of Defendants’ Opposition to Semiconductor
`Energy Laboratory Co., Ltd.’s Motion for Summary Judgment on its Claim of
`Infringement of the ‘480 Patent and on Defendants’ Inequitable Conduct, Laches, License,
`and Patent Misuse Affirmative Defenses (Exhibit 2, 8-14) dated April 16, 2007
`
`Semiconductor Energy Laboratory Co., Ltd.’s Reply in Support ofits Motion for
`Summary Judgement on its Claim of Infringement of the ‘480 Patent and on Defendants’
`Inequitable Conduct, Laches, License, and Patent Misuse Affirmative Defenses dated
`April 30, 2007
`
` Examiner
`
`
`,I’Michael Labentritt/
`
`Si_nature
`
`Date
`Considered
`
`,
`,
`1 1104/2009
`
`
`
`Initial ifreference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`*EXAMINER:
`conformance and not considered.
`Include copy ofthis form with next communication to applicant.
`
`ALL REFERENCES CONSlflERED EXCEPT WHERE UNED THROUGH.
`
`/'l\!i.i../
`
`SEL EXHIBIT 2006
`
`PAGE 4
`
`SEL EXHIBIT 2006
`PAGE 4
`
`

`

`Receipt date: 04/04/2008
`Please type a plus sign (+) inside this box —> [+]
`
`“898833 ~ QAU: 2829
`.
`PTO/SB/08A (08-00)
`Approved for use through 10/31/2002. OMB 0651-0031
`US. Patent and Trademark Office: US. DEPARTMENT OF COMMERCE
`Under the Paerwork Reduction Act of1995, no nersons are re-uired to resend to a collection ofinformation unless it contains a valid OMB control number.
`
`Substitute for form l449A/PTO
`
`
`
`Application Number
`
`INFORMATION DISCLOSURE
`
`
`Filing Date
`STATEMENT BY APPLICANT
`FirstNamed Inventor
`HOIL' OIL':ZI‘IANG CI al.
`
`(use as many .rheelx as necessary)
`
`Group Art Unit
`2%
`Examiner Name
`
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Examiner
`Initials.
`_
`
`Cite
`No.l
`
`Include name ofthe author (in CAPITAL LETTERS), title ofthe article (when appropriate), title ofthe
`item (book, magazine, journal, serial, symposium, catalog, etc), date, page(s), volume-issue number(s),
`publisher, city andfor country where published.
`
`Declaration of Stanley A. Schlitter in Support of Semiconductor Energy Laboratory Co,
`Ltd.’ 5 Reply1n Support ofits Motion for Summary Judgment (Exhibit 1-3) dated April
`
`30, 2007
`.
`Defendants’ Reply Memorandum1n Support of its Motion for Summary Judgment of (A)
`Non-Infringement and Invalidity of the ‘258 Patent; (B) Non-Infringement and Invalidity
`of the ‘995 Patent; and (C) No Liability for Foreign Sales and/or Sales to Authorized
`Licensees dated A-ril 30, 2007
`Declaration of Ryan E. Lindsey in Support of Defendants’ Reply Memorandum in
`Support of its Motion for Summary Judgment of (A) Non-Infringement and Invalidity of
`the ‘258 Patent; (B) Non-Infringement and Invalidity ofthe ‘995 Patent; and (C) No
`Liability for Foreign Sales and/or Sales to Authorized Licensees (Exhibit A-G) dated
`
`April 30, 2007
`Joint Motion Requesting Court to Vacate Order on Summary Judgment of (I) Invalidity of
`US. Patent No. 6,756,258 as to Obviousness and (II) Infringement ofU.S. Patent No.
`
`6,404,480 dated Jul 5, 2007
`Rule 41 Stipulation ofDismissal dated July 6, 2007
`
`
`
`
`
`Order Granting Joint Motion Requesting Court to Vacate Order on Summary Judgment of
`(I) Invalidity ofU.S. Patent No. 6,756,258 as to Obviousness and (II) Infringement of
`US. Patent No. 6,404,480 dated Jul 6,2007
`Defendant Chi Mei Optoelectronics Corp.’s Notice of Motion and Motion for
`Clarification of the Court’s Claim Construction Order Regarding US. Patent Nos.
`6,404,480 and 6,756,258; Memorandum of Points and Authorities in Support Thereof
`dated June 9, 2006, Semiconductor Energy Laboratory Co., Ltd. v. Chi Mei
`Ootoelectronics Cor-., et al., No. C 04-04675 MHP, 9 a es.
`Plaintiff Semiconductor Energy Laboratory Co. Ltd’s Memorandum of Points and
`Authorities in Support of Its Opposition to CMO’s Motion for Clarification ofthe Court’s
`Claim Construction Order dated June 26, 2006, Semiconductor EnergyLaboratory Co.,
`Ltd. v. Chi Mei Outoelectronics Cor-., et al., No. C 04-04675 MHP, 10 1a es.
`Defendant Chi Mei Optoelectronics Corp.’s Reply Memorandum in Support of Its Motion
`for Clarification dated June 29, 2006, Semiconductor Energy Laboratory Co., Ltd. v, Chi
`'
`ntoelectronics Cor-., et al., No. C 04-04675 MHP, 8
`.
`Memorandum & Order Re: Motion for Clarification dated July 28, 2006, Semiconductor
`Energy Laboratory Co., Ltd. v. Chi Mei Optoelectronics Corp., et al., No. C 04-04675
`
`Memorandum & Order, Claim Construction, March 24, 2006, US. District Court,
`Northern District ofCalifornia, Semiconductor Energy Laboratory Co., Ltd. v. Chi Mei
`Otoelectronics Cor-., et al., No. C 04-04675 MHP.
`
`Date
`.
`.
`.
`,
`Examiner
`.
`.
`—
`a
`1‘.
`1
`Constdered
`,Mcnael Lebenintt’
`3mm”,
`Initial if reference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`‘EXAMINER:
`conformance and not considered,
`Include copy of this form with next communication to applicant.
`
`'ALL REFERENCES CONSIDERED EXCEPT WHERE LINED THROUGH.
`
`/'l\!i.L./
`
`SEL EXHIBIT 2006
`
`PAGE 5
`
`SEL EXHIBIT 2006
`PAGE 5
`
`

`

`Application Number
`
`
`
`Complete ifKnown
`
`.1
`A g
`1
`. .....m...
`
`1
`
`
`’ 1 V:
`
`833
`
`Réceipt date: 04/04/2008
`
`31898833 ~ QAU: 2829
`
`Please type a plus sign (+) inside this box a [+]
`
`PTO/SB/OSA (08-00)
`Approved for use through 10/31/2002. OMB 0651-0031
`US. Patent and Trademark Office: US, DEPARTMENT OF COMMERCE
`uired to res r ond to a collection of information unless it contains a valid OMB control number.
`Under the Paerwork Reduction Act of 1995, no ersons are re
`
`
`
`Substitute for form 1449A/PTO
`,1,
`
`
`
`i:
`‘ -
`5
`
`INFORMATION DISCLOSURE
`
`Au-us 26, 2004
`STATEMENT BY APPLICANT
`
`Hon- on ZHANG et al.
`
`
`2
`'
`(use as many sheets as necessary)
`
`
`Examiner Name
`
`
` U.S. PATENT DOCUMENTS
`
`
`
`Date of Publication of Cited
`Pages, Columns, Lines, Where Relevant
`US. Patent Document
`
`
`Examiner
` Name of Patmtee or Applicant ofCited
`Document
`Passage: or Rclewnt Figures Appear
`
`
`
`initials
`
`MM-DD-YYYY
`Document
`
`
` Number Kind Code2
`
`(if/mow")
`
`II
`I I
`5,003,356
`Wakai et al.
`03/26/1991
`
`
`II
`I I
`5,032,883
`Wakai et al.
`07/16/1991
`
`
`II=I Wakai et al. III 5,166,085 Wakai et al. I—
`
`
`
`
`I I
`II
`5,229,644
`Wakai et a1.
`07/20/1993
`
`I I
`II
`Wakai et al.
`07/05/1994
`5,327,001
`
`Zhang et al.
`I I
`II
`01/25/2005
`6,847,064
`
`
`FOREIGN PATENT DOCUMENTS
`
`Examiner
`Initials
`
`Foreign Patent Document
`Kind Code
`(1/known)
`
`Number'
`
`Name of Patcntee or
`Applicant ofCited Document
`
`Date ofPublimtion of Cited
`Document
`MM-DD-YYYY
`
`Pages, Columns, Lines, Where
`Relevant Passages or Relevant
`Figures Appear
`
`
`
`02-268468
`
`11/02/1990
`10/05/1990
`
`II
`III
`III
`III-—
`EP
`0 347178
`2/20/1989
`II 1
`09/06/1990
`02-22422]
`II
`I —
`II
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Examiner
`lnitials‘
`
`‘
`
`,
`
`’
`
`Include name ofthe author (in CAPITAL LETTERS), title ofthe article (when appropriate), title ofthe
`item (book, magazine, journal, serial, symposium, catalog, etc.)., date, pagc(s), volume-issue number(s),
`publisher, city and/or country where published.
`
`Stipulation of Dismissal of SEL’s Claims Against Proview and Proview’s Claims Against
`SEL dated February 2, 2007
`Order (Proview Dismissal) dated February 7, 2007
`
`Stipulation of Dismissal ofSEL’s Claims Against all Defendents, and Defendants’ Claims
`Against SEL dated April 27, 2007
`[Proposed] Order (All Defendants Dismissal) dated April 27, 2007
`
`Order (All Defendants Dismissal) dated April 30, 2007
`
`Plaintiff‘s Original Complaint, Filed 05/05/2006, US. District Court, Eastern District of
`Texas, Marshall Division, Semiconductor Energy Laboratory Co., Ltd, v. HannStar
`
`
`Disla Cora, et al., Case No. 2-06CV-190.
`Date
`,.
`,,.
` /lvlichael Lebentritv’
`
`Considered
`1 “04/2009
`
`Examiner
`Si nature
`
`Initial ifrefercncc considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`"EXAMINER:
`conformance and not considered.
`include copy ofthis form with next communication to applicant,
`
`ALL REFERENCES CONSlDERED EXCEPT WHERE LlNED THROUGH.
`
`/'l\!i.1_./
`
`SEL EXHIBIT 2006
`
`PAGE 6
`
`SEL EXHIBIT 2006
`PAGE 6
`
`

`

`Receipt date: 04/04/2008
`Please type a plus sign (+) inside this box ——> [+]
`
`
`
`Complete ifKnown ~~~~~~
`
`33
`
`
`
`Auust 26, 2004
`Hon on- ZHANG et a1.
`.
`9999
`9999 ..
`: 6 ran "I ltt
`
`
`
`
`
`Examiner Name
`
`
`
`U.S. PATENT DOCUMENTS
`
`
`
`
`
`
`Date of Publication of Cited
`Pages, Columns, Lines, Where Relevant
`Document
`
`
`
`Passages or Relevant Figures Appear
`
`Name of Patentee or Applicant of Cited
`MM-DD-YYYY
`
`Document
`
`
`
`
`03/30/1993
`
`1
`2/14/1993
`9/24/1991
`0 _
`08/29/1989 —
`02/25/1992 _
`7/21/1992
`0 —
`07/02/1996
`
`
`
`
`
`——
`
`__
`
`Examiner
`
`Initials'
`
`US, Patent Document
`
`Zn0:~-_o
`
`2=aS
`
`Number“
`
`T”
`
`t1898833 ~ EN): 2829
`PTO/SB/08A (08—00)
`Approved for use through 10/31/2002. OMB 0651-0031
`U.S. Patent and Trademark Office: U.S. DEPARTMENT OF COMMERCE
`Under the Pa-erwork Reduction Act of 1995, no Iersons are re uired to res-0nd to a collection of information unless it contains a valid OMB control number.
`
`Substitute for form 1449A/PTO
`
`
`INFORMATION DISCLOSURE
`STATEMENT BY APPLICANT
`
`
`(use as many sheets as necessary)
`
`
`
`
`
`Kind Code2
`(rylmnwn)
`5 I,l98,694—
`_ 2—
`mu.
`4:
`—C16
`\r
`00
`8—
`
`
`
`
`
`C19—
`FOREIGN PATENT DOCUMENTS
`
`
`
`Date of Publication ofCited
`
`
`E
`Pages, Columns, Lines.
`Examiner
`Foreign Patent Document
`Name of Patentee or
`Document
`
`Where Relevant Passages or
`Initials.
`
`IVIM-DD-YYYY
`
`
`
`Relevant Figures Appear
`Applicant of Cited Doeumenr
`Kind Code
`
`
`(ifknown)
`
`
`06/06/1989
`
`1 1
`
`1 0
`
`
`
`P
`”U
`
`P
`
`P ”
`
`
`
`1-144682
`0—245 124
`2-260460
`419 160
`3-086573
`2-281238
`1-180523
`1-091467
`341 003
`C15
`EP
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`n
`Examiner
`Cite
`Include name ofthe author (in CAPITAL LETTERS), title ofthe article (when appropriate), title ofthe
`
`lnitials'
`No
`item (book, magazine.joumal, serial, symposium, catalog, etc.).. date, page(s), volume-issue numberts),
`
`publisher, city and/or country where published.
`
`
` Defendant’s Final Invalidity Contentions and Accompanying Document Production dated
`August 28, 2006
`
`
`00000n@00wa59
`UHHhHmL—tgv—to"U'U"UE!
`999w—o
`i
`
`
`
`
`
`.-
`
`
`
`
`Yoshida et 31., “A 9-in. Multicolor LCD Addressed by a-Si TFTs with High—Field-Effect
`.I
`Mobilities,” SID International Symposium Digest of Technical Papers, pp. 242-246, May
`
`
`1988
`
`
`
`.-
`
`
`ull
`ull
`
`artial.
`
`
`
`
`
`
`
`Miyata et al., “Two-Mask Step-Inverted Staggered o-Si TFT-Addressed LCD’s,” SID
`International Symposium Digest of Technical Papers, pp.155-158, May, 1989
`
`7
`
`Castleberry et al., “A 1 Mega-Pixel Color a-Si TFT Liquid-Crystal Display,” SID
`International Symposium Digest ofTechnical Papers, pp. 232-234, May 1988
`
`
`Examiner
`
`I
`.-
`-
`,-
`;
`ihlichael Lebemntv
`
`Date
`
`.
`,,
`t “MM/2009
`
`Initial if reference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`*EXAMINER:
`conformance and not considered. Include copy of this form with next communication to applicant.
`
`ALL REFERENCES CONSlDERED EXCEPT WHERE LlNED THROUGH.
`
`/'l\!i.i../
`
`SEL EXHIBIT 2006
`
`PAGE 7
`
`SEL EXHIBIT 2006
`PAGE 7
`
`

`

`Receipt date: 04/04/2008
`Please type a plus sign (+) inside this box —> [+]
`
`“11898833 ~ QAU: 2829
`PTO/S B/08A (08-00)
`Approved for use through 10/31/2002. OMB 0651-0031
`US. Patent and Trademark Ofiice: US. DEPARTMENT OF COMMERCE
`Under the Pa 1 erwork Reduction Act of1995, no nersons are re uired to res and to a collection ofinformation unless it contains a valid OMB control number.
`
`Substitute for form 1449A/PTO
`
`
`Filing Date
`
`
`First Named Inventor
`
`Group Art Unit
`
`
`
`
`
`
`Examiner
`
`Initials'
`
`Number
`Kind Code1
`(Iflamwn)
`
`
`Name ofPatentee or Applicant afCited
`Document
`
`Date of Publication of Cited
`Document
`MM-DD-YYYY
`
`
`
`
`
`
`Puget, Columns, Lines, Where Relevant
`Passages or Relevant Figures Appear
`
`
`
`4,857,907
`5,359,206
`
`C34
`
`C40
`
`4,663,494
`4,693,960
`
`3,484,662
`4,376,672
`
`Koden
`Yamamoto et a1.
`Possin et at.
`
`Kwasnicketal.
`
`08/15/1989
`10/25/1994
`
`
`11/29/1988
`03/30/1993
`
`Kishi et a1.
`Babichetal.
`Yan- et at.
`Ha_on
`Wan ; et a1.
`
`05/05/1987
`09/15/1987
`03310987
`12/16/1969
`03/15/1983
`
`
`
`
`FOREIGN PATENT DOCUMENTS
`
`
`
`Date of Publication of Cited
`Examiner
`Pages. Columns, Lines.
`Foreign Patent Document
`
`Document
`Name of Patentee or
`Initials'
`Where Relevant Passages or
`
`Kind Code
`Applicant ofCited Document
`wnnxyvv
`Relevant Figures App-r
`
`
`
`(ifknown)
`
`Ollicc’
`
`Number’
`
`
`
`
`
`
`
`
`
`i
`
`Full
`Full
`Full
`04/10/1989
`
`
`06/13/1991
`
`Full
`
`
`00
`
`J J
`
`
`
`11/08/1985
`
`Full
`
`
`
`
`
`C21
`C22
`C23
`C24
`C25
`C26
`C29
`C30
`C31
`C33
`C37
`
`
`
`
`
`JP
`2-210420
`JP
`1-114080
`v_t
`P
`4-091120
`'U
`2-272774
`P
`3-138980
`P
`2-234125
`JP
`60-224270
`JP
`63-224258
`09/19/1988 _—
`JP
`61-093488
`05/12/1986
`Full
`JP
`06/26/1986
`Full
`61-139069
`JP
`06/06/1989
`Full
`01-144682
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Examiner
`Cite
`Include name ofthe author (in CAPITAL LETTERS), title ofthe article (when appropriate), title ofthe
`Initials.
`No.l
`item (book, magazine,joumal, serial, symposium, catalog, etc), date, page(s), volume-issue number(s),
`publisher, cily and/or country where published.
`
`
`
`Peter Van Zant, “Microchip Fabrication: A Practical Guide to Semiconductor Processing”
`
`
`(McGraw-Hill, 2nd ed. 1990)
`
`
`Brian Chapman, “Glow Discharge Processes,” (John Wiley & Sons 1980), p. 299
`
`Kern & Deckert, “Thin Film Processes” (Academic Press 1978)
`
`
`
`
`Examiner
`Sinature
`
`
`
`Initial ifreference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`*EXAMINER:
`conformance and not considered,
`lncludc copy of this form with next communication to applicant.
`
`ALL REFERENCES CONSlDERED EXCEPT WHERE UNED THROUGH.
`
`/'l\!l.i_./
`
`SEL EXHIBIT 2006
`
`PAGE 8
`
`SEL EXHIBIT 2006
`PAGE 8
`
`

`

`31898833 ~ QAU: 2829
`PTO/SB/OSA (08—00)
`Approved for use through 10/31/2002. OMB 0651-0031
`U.S. Patent and Trademark Office: U.S. DEPARTMENT OF COMMERCE
`Under the Paerwork Reduction Act of1995, no ersons are reuired to resond to a collection ofinformation unless it contains a valid OMB control number.
`
`Substitute for form l449A/PTO
`
`
`
`Application Number
`INFORMATION DISCLOSURE
`STATEMENT BY APPLICANT
`(use as many xheeLr as necesxaly)
`
`
`
`
`
`Filing Date
`First Named Inventor
`
`'
`
`Group Art Unit
`
`
`
`
`..;.HI,;..,H.¢..,_
`
`‘5.“ h ‘- H: H H'
`
`Réceipi dale: 04/04/20Q8
`Please type a plus sign (+) inside this box —> [+]
`
`
`
`
`
`Examiner
`lnitials'
`
`
`
`Number
`
`Kind Code2
`(if/01mm)
`
`
`U.S. PATENT DOCUMENTS
`
`Date of Publication of Cited
`Pages, Columns, Lines, Where Relevant
`
`Document
`
`
`Passages or Relevant Figures Appear
`MM-DD-YYYY
`Name ofPatentee or Applicant ofCited
`
`Document
`
`
`
`
`
`
`
`
`09/18/1984 —
`07/22/1986 —
`
`
`1 0
`
`6/12/1990
`
`s '
`
`__
`
`Koba ashi
`
`.—
`
`0
`
`45—
`an\10\
`
`\0
`
`LIIIJI41>A'—‘OOO
`
`—
`
`
`
`
`
`omce’
`
`Number‘
`
`
`4/23/1991 _
`li
`0/06/1992 —
`1/22/1994
`
`
` Cite No.I
`
`
`FOREIGN PATENT DOCUMENTS
`
`Date of Publication ofCited
`Pages. Columns, Lines,
`Examiner
`Foreign Patent Document
`Document
`Where Relevant Passages or
`Name ofPatentee or
`lnitials'
`Applicant ofCiicd Document
`MM-DD-YYYY
`Relevant Figures Appear
`Kind Code
`(.y‘lamm.)
`
`
`
`
`
`
`
`
`
`
`
`Examiner
`.
`.
`.
`Initials
`
`ull
`
`ulI
`ull
`ull
`ull
`
`=a5aI._.——1
`
`n
`
`
`
`
`
`
`
`C52
`C53
`C54
`C55
`C56
`C57
`Ou: so
`OLII NO
`ONO
`'0
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`Include name ofthe author (in CAPITAL LETTERS), title of the article (when appropriate), title of the
`
`
`item (book, magazine. journal. serial, symposium, catalog, etc.)., date, page(s), volume-issue numbeds),
`publisher, city and/or country where published.
`
`
`
`C. Adams and A. Capio, “Edge Profiles in the Plasma Etching of Polycrystalline Silicon,”
`
`J. Electrochem. Soc: Solid—State Science and Tech, February 1981, pp. 366-370
`
`
`5/09/1989
`1/08/1990
`1/08/l990
`1/02/1990
`5/17/1991
`2/24/1983
`2/26/1987
`3/15/1989
`7/22/1987
`
`1-1 17067
`2-001824
`2-001947
`02-268468
`03-1 16778
`58-222533
`62-299081
`64—068967
`
`2,185,622
`
`P P
`
`‘—4
`H
`
`
`
`‘-1L4e—i'—1
`
`P
`
`I—i
`0
`
`B
`
` Y. Asai et al., “A 6.7-in. Square High-Resolution Full-Color TFT-LCD,” Japan Display
`
`
` A. Bell and D. Hess, “Fundamentals and Applications of Plasma Chemistry for IC
`
`Fabrication,” The Electrochemical Society, May 12, 1985
`
`
`
`1989, pp. 514-517
`
`D. Castleberry et al., “a-Si Addressed Liquid Crystal Aircraft Display,” American Inst. Of
`Aeronautics and Astronautics, Inc., 1984, pp. 296-300.
`
`
`
`Examiner
`Date
`1. wet/2009
`
`
`
`,r’Michaoi Lobentriit/
`Si_nature
`
`
`
`
`*EXAMINER:
`Initial ifreference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`conformance and not considered.
`Include copy ofthis form with next communication to applicant.
`
`ALL REFERENCES CONSWERED EXCEPT WHERE UNED THROUGH.
`
`/'l\!i.1../
`
`SEL EXHIBIT 2006
`
`PAGE 9
`
`SEL EXHIBIT 2006
`PAGE 9
`
`

`

`Receipt date: 04/04/2008
`Please type a plus Sign (+) inside this box —> [+]
`
`.
`
`31898833 ~ QAU: 2829
`PTO/SB/OXA (08-00)
`Approved for use through 10/31/2002. OMB 0651-0031
`US. Patent and Trademark Office: U.S. DEPARTMENT OF COMMERCE
`Under the Paerwork Reduction Act of1995, no crsons are reuired to resend to a collection ofinformation unless it contains a valid OMB control number.
`
`Substitute for form I449A/PTO
`Complete ifKnown
`
`
`
`
`
`Auust 26, 2004
`
`
`
`Hon- unlit/mama].
`
`
`""""~.«
`~~
`‘
`.. ......
`
`
`
`
`
`: itt
`
`
`
`Examiner
`Initials'
`
`Cite
`No.l
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Include name of the author (in CAPITAL LETTERS), title ofthe article (when appropriate), title cfthe
`item (book, magazine. journal, serial, symposium, catalog, etc.)., date, page(s), volume-issue number(s),
`publisher, city and/or country where published.
`
`C65
`
`C66
`
`T. Chikamura et al., “The Characteristics of Amorphous Silicon TFT and' Its Application
`in Liquid Crystal Display,” Mat. Res. Coc. Symp. Proc., Vol. 95, 1987, pp. 421-430
`
`J. Coburn and H. Winters, “Plasma etching — A Discussion of Mechanisms,” J. Vac. Sci.
`Tech., 16(2), March/April 1979, pp. 391-403
`
`M. Dohjo et al., “Low Resistance Mo-Ta Gate-Line Material for Large-Area a-Si TFT—
`LCDs,” Proceedings ofthe SID, Vol. 29/4, 1988, pp. 330-332
`
`I. Haller et al., “Selective Wet and Dry Etching of Hydrogenated Amorphous Silicon and
`Related Materials,” J. Electrochem. Soc.: Solid-State Science and Tech, August 1988, pp.
`2042—2045
`
`
`
`H. Hayama and M. Matsumura, “Amorphous-Silicon Thin-Film Metal-Oxide-
`Semiconductor Transistors," Appl. Phys. Lett. 36(9), May 1, 1980, pp. 754-755
`
`W. Howard, “Active-Matrix Techniques for Displays,” Proceedings ofthe SID, Vol. 27/4,
`1986, pp. 313-326
`
`N. Ibaraki, “Active Matrix Crystal Manufacturing Process,” Nikkei Business Publications,
`Inc., pp. 146-155
`
`K. Ichiawa, “14.3-in-Diagonal 16-Color TFT-LCD Panel Using o-SicH TFTs,” SID
`Digest 1989, pp. 226-229
`.
`
`M. Ikeda et al., “Low Resistance Copper Address Line for TFT LCD,” Japan Display,
`1989, pp. 498-501
`
`Y. Kaneko et 211., “Analysis and Design ofu-Si TFT/LCD Panels with a Pixel Model,”
`IEEE Transactions on Electron Devices, Vol. 36, No. 12, December 1989, pp. 2953-2958
`
`
`
`Y. Lee, “Reactive Ion Etching,” March 10, 1983
`
`
`H. Lehmann & R. Widmer, “Dry Etching for Pattern Transfer,” J. Vac. Sci. Tech., 17(5),
`September/October 1980, pp. 1177-1183.
`
`R. Light, “Reactive Ion Etching of Aluminum/Silicon,” J. Electrochem. Soc.: Solid-State
`Science and Tech., November 1983, pp. 2225-2230.
`
`Examiner
`gimme
`
`,
`.
`,
`:
`IV
`EV ichaei Leaentritt/
`
`‘
`
`Date
`Considered
`
`Initial if reference considered, whether or not citation is in conformance with MPEP 609, Draw line through citation ifnot in
`"EXAMINER:
`conformance and not considered. Include copy ofthis form with next communication to applicant.
`
`ALL REFERENCES CONSIDERED EXCEPT WHERE LINED THROUGH.
`
`/'l\!i.i_./
`
`SEL EXHIBIT 2006
`
`PAGE 10
`
`SEL EXHIBIT 2006
`PAGE 10
`
`

`

`Receipt date: 04/04/2008
`Please type a plus sign (+) inside this box -—> [+]
`
`I1898833 ~ QAU: 2829
`PTO/SB/08A (08-00)
`Approved for use through 10/31/2002. OMB 0651-0031
`US. Patent and Trademark Ofiice: U.S. DEPARTMENT OF COMMERCE
`Under the PaUEI'WOl'k Reduction Act of 1995, no uersons are re- uired to resend to a collection of information unless it contains a valid OMB control number.
`
`
`Substitute for form 1449A/PTO
`
`
`
`
`INFORMATION DISCLOSURE
`STATEMENT BY APPLICANT
`
`
`
`(me as many sheet\' as necessary)
`
`
`
`
`Examiner_ame
`
`
`
`Examiner
`Initials
`
`
`
`
`C82
`
`C on 3
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`
`
`
`
`Cite
`Include name of the author (in CAPITAL LETTERS), title of the article (when appropriate), title of the
`No.'
`item (book. magazine, journal serial symposium, catalog, etc.) date page(s) volume-issue number(s),
`publisher, city and/or country where published
`
`
`
`
`C78 M. Matsumura, “Amorphous Silicon Transistors and Integrated Circuits,: Proceedings of
`the 14‘h Conference on Solid State Devices, Tokyo, 1982, pp. 487-491
`
`
`H. Mattausch et al., “Reactive Ion Etching ofTa—Silicide/Polysilicon Double Layers for
`C79
`
`the Fabrication of Integrated Circuits," J. Vac. Sci. Tech, Bl(l), January-March 1983, pp.
`
`15-22
`
` M. Mieth and A. Barker, “Anisotropic Plasma Etching of Polysilicon Using SF6 and
`CFC13,” J. Vac. Sci. Tech., A1(2), April-June 1983, pp. 629—635
`
`
`_.C8
`
`
`H. Moriyama et al., “A 12-in. Full-Color a-SizH TFT-LCD With Pixel Electrode Buried in
`Gate Insulator,” Proceedings ofthe SID, Vol. 31/1, 1990, pp. 13-17
`
`
`
` Y. Nara and M. Matsumura, “Experimental Study of Amorphous Silicon Integrated
`Circuit,” Proceedings of the 13”] Conference on Solid State Devices, Tokyo, 1982, pp.
`
`
`257-261
`
` T. Nomoto et al., “A 9-in. Diagonal Full Color LCD Using T2-Gate Electrode a—Si TFT,”
`
`
`Japan Display 1989, pp. 502-505
`
`
`
`
`Y. Oana et al. “A 9.5-inch Diagonal Multicolor Amorphous Silicon TFT-LCD Panel,”
`1985 Int’l Display Research Conference
`
` Y. Oana, “Technical Developments and Trends in tit-Si TFT-LCDs, “ Journal of Non-
`
`
`Crystalline Solids 115, 1989, pp. 27-32
`
`
`
`
`
`
`P. Parrens, “Anisotropic and Selective Reactive lon Etching ofPolysilicon Using SF6,” J.
`Vac. Sci. Tech., 19(4), November/December 1981, pp. 1403-1407
`
`
`
`
`M. Powell and J. Orton, “Characteristics of Amorphous Silicon Staggered-Electrode Thin-
`Film Transistors,” Appl. Phys. Lett. 45(2), July 15, 1984, pp. 171-173
`
`
`
`J. Pankove, “Semiconductors and Semimetals,” Academic Press 1984, Vol. 21, Part D,
`pp. 89-114
`
`
`
`
`
`A. Snell et al., “Application of Amorphous Silicon Field Effect Transistors in Addressable
`Liquid Crystal Display Panels,” App. Phys. 24, 1981, pp. 357-362
`
`Examiner
`Date
`,
`f,
`r‘
`
`
`.
`_
`Comm“,
`11.041.20.39
`./M chaei Lebentnt/
`
`*EXAMTNER:
`Initial if reference considered, whether or not citation is in conformance with MPEP 609. Draw line through citation ifnot in
`conformance and not considered, Include copy of this form with next communication to applicant.
`
`8.B
`
`00 LII
`
`in0000\lox
`
`0oo 00
`
`Oon \o
`
`
`
`
`
`ALL REFERENCES CONSIDERED EXCEPT WHERE LINED THROUGH.
`
`/'l\!1.L./
`
`SEL EXHIBIT 2006
`
`PAGE 11
`
`SEL EXHIBIT 2006
`PAGE 11
`
`

`

`Receipt date: 04/04/20Q8
`Please type a plus sign (+) inside this box -» [+]
`
`31898833 ~ QAU: 2829
`PTO/SB/08A (08-00)
`Approved for use through 10/31/2002. OMB 0651‘-003I
`U. S Patent and Trademark Office: U. S. DEPARTMENT OF COMMERCE
`Under the Paicrwork Reduction Act of 1995, no -ersons are re-uired to resend to a collection ofinformation unless it contains a valid OMB control number
`Substitute for form 1449A/PTO
`Complete IfKnown
`
`
`
`
`
`
`
`
`
`Auust 26 2004
`
`
`Hon- on: ZHANG etal
`
`
`
`
`_xaminerName
`EO‘Efl "”1121:
`
`Number
`
`US. PATENT DOCUMENTS
`Date of Publication ofCited
`Pages, Columns, Lines, Where Relevant
`Documenl
`
`
`
`Passages or Relevant Figures Appear
`
`Name of Patemee or Applicant of Cited
`MM'DD-YYYY
`Document
`
`
`
`
`Examiner
`
`
`lnitials'
`
`Kind Code
`
`(fknown)
`
`4954218 _ 09/04/1990 —
`_ €100
`
`_c101 5,166,757 - KItamura et a1
`11/24/1992 _
`
`
`
`OTHER PRIOR ART — NON PATENT LITERATURE DOCUMENTS
`
`Examiner
`Initials.
`
`Cite
`No'
`
`C90
`
`Include name of the author (in CAPITAL LETTERS), title ofthe article (when appropriate), title ofthe
`item (book, magazine,joumal, serial, symposium, catalog, etc.)., date, page(s), volume-issue number(s),
`publisher, city and/or country where published.
`
`'
`
`V. Dorfman, “The Use of Selective-Etching and Masking Principles in Integrated-Circuit
`Manufacture,” Soviet Microelectronics, Vol. 5, No. 2, March/April 1976, pp. 81-101
`
`
`
`
`
`C91
`
`E. Takeda, “An Amorphous Si TFT Array with ToOx/SiNx Double Layered Insulator for
`Liquid Crystal Displays,” 1988 Int’l Display Research Conf., pp. 155-158
`
`
`M. Takeda, “12.5-in. LCD Addressed by o-Si TFTs Employing Redundancy
`Technology,” Japan Display 1986, pp. 204-207
`
`M. Thompson, “A Comparison of Amorphous and Poly Crystalline TFTs for LC
`Displays,” Journal ofNon-Crystalline Solids 137 and 138, 1991, pp. 1209-1214
`
`J. Vossen et al., “Processes for Multilevel Metallization," J. Vac. Sci. Tech, Vol. 11, No.
`1, January/February 1974, pp. 60-70
`
`M. Yamano and H. Takesada, “Full Color Liquid Crystal Television Addressed by
`Amorphous Silicon TFTs,

This document is available on Docket Alarm but you must sign up to view it.


Or .

Accessing this document will incur an additional charge of $.

After purchase, you can access this document again without charge.

Accept $ Charge
throbber

Still Working On It

This document is taking longer than usual to download. This can happen if we need to contact the court directly to obtain the document and their servers are running slowly.

Give it another minute or two to complete, and then try the refresh button.

throbber

A few More Minutes ... Still Working

It can take up to 5 minutes for us to download a document if the court servers are running slowly.

Thank you for your continued patience.

This document could not be displayed.

We could not find this document within its docket. Please go back to the docket page and check the link. If that does not work, go back to the docket and refresh it to pull the newest information.

Your account does not support viewing this document.

You need a Paid Account to view this document. Click here to change your account type.

Your account does not support viewing this document.

Set your membership status to view this document.

With a Docket Alarm membership, you'll get a whole lot more, including:

  • Up-to-date information for this case.
  • Email alerts whenever there is an update.
  • Full text search for other cases.
  • Get email alerts whenever a new case matches your search.

Become a Member

One Moment Please

The filing “” is large (MB) and is being downloaded.

Please refresh this page in a few minutes to see if the filing has been downloaded. The filing will also be emailed to you when the download completes.

Your document is on its way!

If you do not receive the document in five minutes, contact support at support@docketalarm.com.

Sealed Document

We are unable to display this document, it may be under a court ordered seal.

If you have proper credentials to access the file, you may proceed directly to the court's system using your government issued username and password.


Access Government Site

We are redirecting you
to a mobile optimized page.





Document Unreadable or Corrupt

Refresh this Document
Go to the Docket

We are unable to display this document.

Refresh this Document
Go to the Docket