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Displaying 54-68 of 72 results

1016 Exhibit: EX1016 Proceedings of ISTCCSTIC 2009

Document IPR2024-00533, No. 1016 Exhibit - EX1016 Proceedings of ISTCCSTIC 2009 (P.T.A.B. Feb. 29, 2024)
Silicon Nanocrystals Synthesized by Electron-beam Co-evaporation Method and Their Application for Nonvolatile Memory C. Chen, R. Jia, M. Liu, W. Li, C. X. Zhu, H. F. Li, P. W. Zhang, C. Q. Xie, Q. Wang and T. C. Ye (Institute of Microelectronics, Chinese Academy of Sciences)
Halo Implantation Optimization for 65nm Low Power PMOS Device Inverse Narrow Width Effect Improvement H. Ye, J. Ju, X. Shi, B. Liu, J. Ning and I. C. Chen (Semiconductor Manufacturing International Corporation)
Influence of Polymeric Gas on Sidewall Profile and Defect Performance of Aluminum Metal Etch X. Wang, H. Zhang, M. Shen, W. Sun and S. Chang (Semiconductor Manufacturing International Corporation) Ex. 1016, Page 19
The introduction of trench isolation reduced the latch-up concern so that the main application field of epitaxial material then became related to the improvement of the Gate-Oxide-Integrity (GOI) and the DRAM refresh properties (see e.g. [3] and references therein), although cost considerations remained important.
There are a large variety of technological parameters (Si etch depth, degree of recess, epitaxial thickness, layer composition, pre-epitaxial cleaning and bake, growth conditions, anneal technique, junction geometry, use of pre- or post-epi implants, etc) that will have an impact on the final stress level and the associated defect generation [12-17].
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1012 Exhibit: EX1012 Scheduling Order in Sung v Samsung et al, 4 23 cv 00752

Document IPR2024-00533, No. 1012 Exhibit - EX1012 Scheduling Order in Sung v Samsung et al, 4 23 cv 00752 (P.T.A.B. Feb. 29, 2024)
Deadline for Initial Mandatory Disclosure of all persons, documents, data compilations and tangible things, which are relevant to a claim or defense of any party and which has not previously been disclosed.
All other parties will have seven calendar days to serve a response with any objections and requesting cross examination line and page numbers to be included.
If a fellow member of the Bar makes a just request for cooperation or seeks scheduling accommodation, a lawyer will not arbitrarily or unreasonably withhold consent.
Alternatively, if exhibits have been scanned and will be presented via a computer projection system, be sure there is a way for the Court to view or read them separately so as to be able to understand motions and objections.
In lieu of early motions for summary judgment, the parties are directed to include any arguments related to the issue of indefiniteness in their Markman briefing, subject to the local rules’ normal page limits.
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1013 Exhibit: EX1013 Tsai et al, “Effect of CMP conditioner diamond shape

Document IPR2024-00533, No. 1013 Exhibit - EX1013 Tsai et al, “Effect of CMP conditioner diamond shape (P.T.A.B. Feb. 29, 2024)
Zimmer and Stubbmann [6] pointed out that the grit size, shape, crystalline orientation, distribution density, degree of protrusion of the diamonds, and substrate planarity will all affect the dressing rate of the conditioner.
They also mentioned that the tip height distribution of conventional CMP pad conditioners is intrinsically large due to the variation in the grit size and diamond orientation.
Garretson CC, Mear ST, Rudd JP, Prabhu G, Osterheld T, Flynn D (2000) New Pad Conditioning Disk Design Delivers Excellent Process Performance While Increasing CMP Productivity.
Lee H, Zhuang Y, Sugiyama M, Seike Y, Takaoka M, Miyachi K, Nishiguchi T (2010) Pad flattening ratio, coefficient of friction and removal rate and analysis during silicon dioxide chemical mechanical planarization.
Kawakubo M, Kadomura K, Sugaya T, Hirai O, Tsugane K, Tamada Y (2009) Effect of mechanical and chemical wear of diamond consistency of conditioning, Second International con- ference on planarization/CMP Technology, Japan, Fukuoka, November pp 313–318 Ex. 1013, Page 10
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1019 Exhibit: EX1019 Hsieh Yee Decl

Document IPR2024-00533, No. 1019 Exhibit - EX1019 Hsieh Yee Decl (P.T.A.B. Feb. 29, 2024)

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1014 Exhibit: EX1014 Fenna, A Dictionary of Weights, Measures, and Units

Document IPR2024-00533, No. 1014 Exhibit - EX1014 Fenna, A Dictionary of Weights, Measures, and Units (P.T.A.B. Feb. 29, 2024)

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1001 Exhibit: EX1001 US Patent No 8,974,270

Document IPR2024-00533, No. 1001 Exhibit - EX1001 US Patent No 8,974,270 (P.T.A.B. Feb. 29, 2024)

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1018 Exhibit: EX1018 MERLIN

Document IPR2024-00533, No. 1018 Exhibit - EX1018 MERLIN (P.T.A.B. Feb. 29, 2024)

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1003 Exhibit: EX1003 270 Patent FH

Document IPR2024-00533, No. 1003 Exhibit - EX1003 270 Patent FH (P.T.A.B. Feb. 29, 2024)

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1011 Exhibit: EX1011 US Patent No 7,741,764

Document IPR2024-00533, No. 1011 Exhibit - EX1011 US Patent No 7,741,764 (P.T.A.B. Feb. 29, 2024)

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1009 Exhibit: EX1009 Ishizuka et al

Document IPR2024-00533, No. 1009 Exhibit - EX1009 Ishizuka et al (P.T.A.B. Feb. 29, 2024)

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1010 Exhibit: EX1010 US Patent App Pub No 20030084894

Document IPR2024-00533, No. 1010 Exhibit - EX1010 US Patent App Pub No 20030084894 (P.T.A.B. Feb. 29, 2024)

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1006 Exhibit: EX1006 US Patent App Pub No 20080004743 “Goers”

Document IPR2024-00533, No. 1006 Exhibit - EX1006 US Patent App Pub No 20080004743 “Goers” (P.T.A.B. Feb. 29, 2024)

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1015 Exhibit: EX1015 Copy of SungECS CCC RightFind

Document IPR2024-00533, No. 1015 Exhibit - EX1015 Copy of SungECS CCC RightFind (P.T.A.B. Feb. 29, 2024)

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1020 Exhibit: EX1020 EDTX Caseload Profile December 31, 2023

Document IPR2024-00533, No. 1020 Exhibit - EX1020 EDTX Caseload Profile December 31, 2023 (P.T.A.B. Feb. 29, 2024)

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1007 Exhibit: EX1007 Sung et al Polycrystalline Diamond PCD Shaving Dresser

Document IPR2024-00533, No. 1007 Exhibit - EX1007 Sung et al Polycrystalline Diamond PCD Shaving Dresser (P.T.A.B. Feb. 29, 2024)

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