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Displaying 129-143 of 265 results

1020 Exhibit: Ex 1020 Request for Reconsideration Mar 4 2003

Document IPR2016-01311, No. 1020 Exhibit - Ex 1020 Request for Reconsideration Mar 4 2003 (P.T.A.B. Jul. 1, 2016)

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1008 Exhibit: Ex 1008 2015 07 30 Exhibit B US 6784552 Claim Chart Intel

Document IPR2016-01311, No. 1008 Exhibit - Ex 1008 2015 07 30 Exhibit B US 6784552 Claim Chart Intel (P.T.A.B. Jul. 1, 2016)

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1014 Exhibit: Ex 1014 Prelim Amendment Mar 31 2000

Document IPR2016-01311, No. 1014 Exhibit - Ex 1014 Prelim Amendment Mar 31 2000 (P.T.A.B. Jul. 1, 2016)

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1005 Exhibit: Ex 1005 US 5541427 Chappell

Document IPR2016-01311, No. 1005 Exhibit - Ex 1005 US 5541427 Chappell (P.T.A.B. Jul. 1, 2016)

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1009 Exhibit: Ex 1009 US 5374836 Vinal

Document IPR2016-01311, No. 1009 Exhibit - Ex 1009 US 5374836 Vinal (P.T.A.B. Jul. 1, 2016)

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1012 Exhibit: Ex 1012 US 5053351 Fazan

Document IPR2016-01311, No. 1012 Exhibit - Ex 1012 US 5053351 Fazan (P.T.A.B. Jul. 1, 2016)

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1006 Exhibit: Ex 1006 US 5338700 Dennison

Document IPR2016-01311, No. 1006 Exhibit - Ex 1006 US 5338700 Dennison (P.T.A.B. Jul. 1, 2016)

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1024 Exhibit: Ex 1024 Allowance Apr 20 2004

Document IPR2016-01311, No. 1024 Exhibit - Ex 1024 Allowance Apr 20 2004 (P.T.A.B. Jul. 1, 2016)

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1001 Exhibit: Ex 1001 US 6784552

Document IPR2016-01311, No. 1001 Exhibit - Ex 1001 US 6784552 (P.T.A.B. Jul. 1, 2016)

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1023 Exhibit: Ex 1023 Corrected Amendment Mar 31 2004

Document IPR2016-01311, No. 1023 Exhibit - Ex 1023 Corrected Amendment Mar 31 2004 (P.T.A.B. Jul. 1, 2016)

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1004 Exhibit: Ex 1004 EP 592078A1 Hawley

Document IPR2016-01311, No. 1004 Exhibit - Ex 1004 EP 592078A1 Hawley (P.T.A.B. Jul. 1, 2016)

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1007 Exhibit: Ex 1007 US 6066555 Nulty

Document IPR2016-01311, No. 1007 Exhibit - Ex 1007 US 6066555 Nulty (P.T.A.B. Jul. 1, 2016)

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1019 Exhibit: Ex 1019 Office Action Sept 11 2002

Document IPR2016-01311, No. 1019 Exhibit - Ex 1019 Office Action Sept 11 2002 (P.T.A.B. Jul. 1, 2016)

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1010 Exhibit: Ex 1010 Etch mechanism in the reactive ion etching of silicon nitride D...

Document IPR2016-01311, No. 1010 Exhibit - Ex 1010 Etch mechanism in the reactive ion etching of silicon nitride Dulak (P.T.A.B. Jul. 1, 2016)

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1011 Exhibit: Ex 1011 FH 6066555 Rule 131 Declaration Feb 25 1999

Document IPR2016-01311, No. 1011 Exhibit - Ex 1011 FH 6066555 Rule 131 Declaration Feb 25 1999 (P.T.A.B. Jul. 1, 2016)

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