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Shu-Fang Chen Lin-Hung Shiu Hung-Chung Chien Hung-Chang Hsieh

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Taiwan Semiconductor Manufacturing Co., Ltd.

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Lithography Method with Surface Modification Layer

62/374,616 | U.S. Patent Application

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Location ELECTRONIC

Filed Aug. 12, 2016

Case Type Provisional

Status Provisional Application Expired

Child 15/355,359 Patented

Last Updated: 5 years, 6 months ago

Date	#	Transaction
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Lithography Method with Surface Modification Layer

62/374,616 | U.S. Patent Application

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