www.uspto.gov
`
`UNITED STATES DEPARTMENT OF COMMERCE
`United States Patent and Trademark Office
`Address: COMMISSIONER FOR PATENTS
`P.O. Box 1450
`Alexandria, Virginia 22313-1450
`
`18/251,261
`
`05/01/2023
`
`Antonius Johannus VAN DER NET
`
`3857.2970001
`
`9861
`
`STERNE, KESSLER, GOLDSTEIN & FOX P.L.L.C.
`1101 K Street, NW
`10th Floor
`WASHINGTON,DC 20005
`
`RIDDLE, CHRISTINA A
`
`2882
`
`PAPER NUMBER
`
`NOTIFICATION DATE
`
`DELIVERY MODE
`
`11/27/2024
`
`ELECTRONIC
`
`Please find below and/or attached an Office communication concerning this application or proceeding.
`
`The time period for reply, if any, is set in the attached communication.
`
`Notice of the Office communication was sent electronically on above-indicated "Notification Date" to the
`following e-mail address(es):
`eoffice @sternekessler.com
`
`PTOL-90A (Rev. 04/07)
`
`

`

`
`
`Disposition of Claims*
`20-38 is/are pending in the application.
`)
`Claim(s)
`5a) Of the above claim(s) _ is/are withdrawn from consideration.
`C) Claim(s)__is/are allowed.
`Claim(s) 20-22 and 24-38 is/are rejected.
`Claim(s) 23 is/are objectedto.
`4 Claim(s
`are subject to restriction and/or election requirement
`)
`* If any claims have been determined allowable, you maybeeligible to benefit from the Patent Prosecution Highway program at a
`participating intellectual property office for the corresponding application. For more information, please see
`http:/Awww.uspto.gov/patents/init_events/pph/index.jsp or send an inquiry to PPHfeedback@uspto.gov.
`
`) ) ) )
`
`Application Papers
`10)() The specification is objected to by the Examiner.
`11)) The drawing(s) filed on 5/1/2023 is/are: a)(¥) accepted or b)() objected to by the Examiner.
`Applicant may not request that any objection to the drawing(s) be held in abeyance. See 37 CFR 1.85(a).
`Replacement drawing sheet(s) including the correction is required if the drawing(s) is objected to. See 37 CFR 1.121(d).
`
`Priority under 35 U.S.C. § 119
`12)(¥) Acknowledgment is made of a claim for foreign priority under 35 U.S.C. § 119(a)-(d)or (f).
`Certified copies:
`—_c)LJ None ofthe:
`b)LJ Some**
`a)¥) All
`1.{¥) Certified copies of the priority documents have been received.
`2.1 Certified copies of the priority documents have been received in Application No.
`3.2.) Copies of the certified copies of the priority documents have been receivedin this National Stage
`application from the International Bureau (PCT Rule 17.2(a)).
`*“ See the attached detailed Office action for a list of the certified copies not received.
`
`Attachment(s)
`
`1)
`
`Notice of References Cited (PTO-892)
`
`Information Disclosure Statement(s) (PTO/SB/08a and/or PTO/SB/08b)
`2)
`Paper No(s)/Mail Date 5/19/2023.
`U.S. Patent and Trademark Office
`
`3)
`
`4)
`
`(LJ Interview Summary (PTO-413)
`Paper No(s)/Mail Date
`(Qj Other:
`
`PTOL-326 (Rev. 11-13)
`
`Office Action Summary
`
`Part of Paper No./Mail Date 20241120
`
`Application No.
`Applicant(s)
`18/251,261
`VAN DER NETetal.
`
`Office Action Summary Art Unit|AIA (FITF)StatusExaminer
`CHRISTINA A RIDDLE
`2882
`Yes
`
`
`
`-- The MAILING DATEof this communication appears on the cover sheet with the correspondence address --
`Period for Reply
`
`A SHORTENED STATUTORYPERIOD FOR REPLYIS SET TO EXPIRE 3 MONTHS FROM THE MAILING
`DATE OF THIS COMMUNICATION.
`Extensionsof time may be available underthe provisions of 37 CFR 1.136(a). In no event, however, may a reply betimely filed after SIX (6) MONTHSfrom the mailing
`date of this communication.
`If NO period for reply is specified above, the maximum statutory period will apply and will expire SIX (6) MONTHSfrom the mailing date of this communication.
`-
`- Failure to reply within the set or extended period for reply will, by statute, cause the application to become ABANDONED (35 U.S.C. § 133).
`Any reply received by the Office later than three months after the mailing date of this communication, evenif timely filed, may reduce any earned patent term
`adjustment. See 37 CFR 1.704(b).
`
`Status
`
`1)C) Responsive to communication(s) filed on
`CA declaration(s)/affidavit(s) under 37 CFR 1.130(b) was/werefiledon
`
`2a)C) This action is FINAL. 2b)¥)This action is non-final.
`3) An election was madeby the applicant in responseto a restriction requirement set forth during the interview
`on
`; the restriction requirement and election have been incorporated into this action.
`4)() Since this application is in condition for allowance except for formal matters, prosecution as to the merits is
`closed in accordance with the practice under Exparte Quayle, 1935 C.D. 11, 453 O.G. 213.
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 2
`
`DETAILED ACTION
`
`Notice of Pre-AlA or AIA Status
`
`1.
`
`The present application, filed on or after March 16, 2013,
`
`is being examined
`
`underthefirst inventor to file provisions of the AIA.
`
`Priority
`
`2.
`
`Acknowledgement is madethat the instant application is a national stage entry of
`
`application PCT/EP2021/078531,
`
`filed on 10/14/2021, which claims priority from
`
`EP20206671.8, filed on 11/10/2020.
`
`3.
`
`Claim 35 is objected to becauseof the following informalities:
`
`Claim Objections
`
`a.
`
`Claim 35, lines 1-2, “a use of a sub-atmospheric pressure conditioning
`
`system in a lithographic apparatus” should be changed to --a sub-atmospheric
`
`pressure conditioning method in a lithographic apparatus-- to remove “use” claim
`
`language.
`
`Appropriate correction is required to place claims in better form.
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 3
`
`Claim Rejections - 35 USC § 112
`
`4.
`
`The following is a quotation of 35 U.S.C. 112(b):
`(b) CONCLUSION.—The specification shall concludewith one or more claims particularly
`pointing out and distinctly claiming the subject matter which the inventor or a jointinventor
`regards as the invention.
`
`The following is a quotation of 35 U.S.C. 112 (pre-AlA), second paragraph:
`The specification shall conclude with one or more claims particulary pointing out and distinctly
`claiming the subject matter which the applicant regards ashis invention.
`
`5.
`
`Claims 29-33 and 37 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-
`
`AIA), second paragraph, as being indefinite for failing to particularly point out and
`
`distinctly claim the subject matter which the inventoror a joint inventor (or for
`
`applications subject to pre-AlA 35 U.S.C. 112, the applicant), regards as the invention.
`
`Regarding claim 29, the limitation “wherein the first and second conditioning
`
`fluid reservoirs are in fluid connection with one another via a valvethat is operable to
`
`control the level of conditioning fluid in the conditioning fluid reservoir that is in fluid
`
`communication with the optical element” in lines 8-10 are vague and indefinite.It is
`
`unclear which conditioning fluid reservoir is in fluid communication with the optical
`
`element. For the purposes of examination, the limitation is being interpreted as meaning
`
`wherein the first and second conditioning fluid reservoirs are in fluid connection with one
`
`another via a valve that is operable to control the level of conditioning fluid in thefirst
`
`and second conditioning fluid reservoirs that are in fluid communication with the optical
`
`element. Thus, claim 29 and all claimed depending therefrom are rejected as being
`
`indefinite. Appropriate correction is required.
`
`Regarding claim 32, a broad range or limitation together with a narrow range or
`
`limitation that falls within the broad range orlimitation (in the same claim) may be
`
`considered indefinite if the resulting claim does not clearly set forth the metes and
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 4
`
`bounds of the patent protection desired. See MPEP § 2173.05(c).
`
`In the present
`
`instance, claim 32 recites the broad recitation the conditioning system is configured to
`
`operate at between around 0.02 bara and 0.9 bara, and the claim also recites the
`
`conditioning system is configured to operate around 0.2 bara which is the narrower
`
`statement of the range/limitation. The claim is considered indefinite because there is a
`
`question or doubt as to whether the feature introduced by such narrower languageis (a)
`
`merely exemplary of the remainder of the claim, and therefore not required, or (b) a
`
`required feature of the claims. Thus, claim 32 is rejected as being indefinite. Appropriate
`
`correction is required.
`
`Regarding claim 37, the limitation “wherein the system or sub-system comprises
`
`an optical element, a reflector or a mirror” in lines 1-2, as drafted, is vague and
`
`indefinite.
`
`It is unclear if the limitation is intended to present a list of an optical element,
`
`a reflector, or a mirrororif the system or sub-system is intended to comprise an optical
`
`element, which is further limited to be either a reflector or a mirror. For the purposes of
`
`examination, the limitation is being interpreted as meaning the system or sub-system
`
`comprises an optical element, a reflector, or a mirror. Thus, claim 37 is rejected as
`
`being indefinite. Appropriate correction is required.
`
`Claim Rejections - 35 USC § 102
`
`6.
`
`The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that
`
`form the basis for the rejections under this section madein this Office action:
`
`A person shall be entitled to a patent unless —
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 5
`
`(a)(1) the claimed invention waspatented, described in a printed publication, orin public use,
`on sale, or otherwise available to the public beforethe effectivefiling date of the claimed
`invention.
`
`7.
`
`Claims 36-37 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Van
`
`Berkel et al. (US PGPub 2019/0033499, Van Berkel hereinafter).
`
`Regarding claim 36, Van Berkel discloses a method of conditioning a system or
`
`sub-system of a lithographic apparatus (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062]),
`
`the method comprising:
`
`providing a liquid conditioning fluid at sub-atmospheric pressure to the system or
`
`sub-system to be conditioned (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062], claim 24,
`
`a coolant supply unit 43 supplies fluid to the reflector 13 in a range including sub-
`
`atmospheric pressure, 0.001 bar to below 1 bar).
`
`Regarding claim 37, Van Berkel discloses wherein the system or sub-system
`
`comprises an optical element, a reflector or a mirror (Figs. 1-6, paras. [0041], [0048]-
`
`[0055], [0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13).
`
`Claim Rejections - 35 USC § 103
`
`8.
`
`The following is a quotation of 35 U.S.C. 103 which forms the basis forall
`
`obviousness rejections set forth in this Office action:
`
`A patent fora claimed invention may notbe obtained, notwithstanding thatthe claimed
`invention is not identically disclosed as set forth in section 102, if the differences between the
`claimed invention and the prior artare suchthat the claimed invention as a whole would have
`been obvious beforethe effective filing date of the claimed invention to a person having
`ordinary skill in the art to which the claimed invention pertains. Patentability shall notbe
`negated by the manner in which the invention was made.
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 6
`
`9.
`
`Claims 20, 21, 29-32, 34, 35, and 38 are rejected under 35 U.S.C. 103 as being
`
`unpatentable over Van Berkel et al. (US PGPub 2019/0033499, Van Berkel hereinafter)
`
`in view of Novak (US Patent No. 5,998,889).
`
`Regarding claim 20, Van Berkel discloses a conditioning system (Figs. 1-6,
`
`paras. [0041], [0048]-[0055],
`
`[0062]), comprising
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-6, paras.
`
`[0019]-[0029],
`
`[0031]-[0032], [0041], [0048]-[0055], [0062], the coolant supply system is
`
`used to cool a mirror in a lithographic apparatus LA),
`
`wherein the conditioning system is configured to condition one or more optical
`
`elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror),
`
`wherein the conditioning system is configured to have a sub-atmospheric
`
`pressure at the one or more optical elements (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 in a range
`
`including sub-atmospheric pressure, 0.001 bar to below 1 bar), and wherein the liquid
`
`conditioning fluid is water (Figs. 1-6, paras. [0040]-[0041],
`
`[0048]-[0055],
`
`[0062], the
`
`coolant supply system supplies water as a coolant). Van Berkel does not appearto
`
`explicitly describe a sub-atmospheric pressure conditioning fluid reservoir for storing at
`
`least part of a liquid conditioning fluid.
`
`Novakdiscloses a sub-atmospheric pressure conditioning fluid reservoir for
`
`storing at least part of a liquid conditioning fluid (Fig. 10, col. 4,lines 24-63, the coolant
`
`fluid recirculating system 50 and tanks 51 and 52 are held at below atmospheric
`
`pressure. The tanks 51 and 52 store coolantliquid).
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 7
`
`It would have been obviousto oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to have included a sub-atmospheric pressure
`
`conditioning fluid reservoir for storing at least part of a liquid conditioning fluid as taught
`
`by Novakin the conditioning system as taught by Van Berkel since including a sub-
`
`atmospheric pressure conditioning fluid reservoir for storing at least part of a liquid
`
`conditioning fluid is commonly used to preventliquid from leaking out of the system
`
`(Novak, col. 4, lines 24-41).
`
`Regarding claim 21, Van Berkel as modified by Novak discloses wherein the
`
`sub-atmospheric pressure conditioning fluid reservoir is connected to a vacuum pump
`
`and/or a gas inlet (Novak, Fig. 10, col. 4, lines 24-63, tank 52 is connected to a vacuum
`
`source via vacuum connection 54. Tank 51 is connected to valve 53 to introduce air into
`
`the chamber 51).
`
`Regarding claim 29, as best understood, Van Berkel discloses a conditioning
`
`system (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062]), comprising:
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-6, paras.
`
`[0019]-[0029],
`
`[0031]-[0032], [0041], [0048]-[0055], [0062], the coolant supply system is
`
`used to cool a mirror in a lithographic apparatus LA),
`
`wherein the conditioning system is configured to condition one or more optical
`
`elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror in the
`
`lithographic apparatus LA),
`
`wherein the conditioning system is configured to have a sub-atmospheric
`
`pressure at the one or more optical elements (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 8
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 in a range
`
`including sub-atmospheric pressure, 0.001 bar to below 1 bar). Van Berkel does not
`
`appearto explicitly describe first and second conditioning fluid reservoirs, wherein the
`
`first and second conditioning fluid reservoirs are in fluid connection with one another via
`
`a valvethat is operable to control the level of conditioning fluid in the conditioning fluid
`
`reservoir that is in fluid communication with the optical element.
`
`Novak discloses first and second conditioning fluid reservoirs (Fig. 10, col. 4,
`
`lines 24-63, the coolantfluid recirculating system 50 includes tanks 51 and 52),
`
`wherein the first and second conditioning fluid reservoirs are in fluid connection
`
`with one another via a valvethat is operable to control the level of conditioning fluid in
`
`the conditioning fluid reservoir that is in fluid communication with the conditioned
`
`element (Fig. 10, col. 4, lines 24-63, tanks 51 and 52 are connected via pump 56 which
`
`is controlled by the pressure conditioned detected by switches SW1 and SW2 to pump
`
`liquid from tank 52 to tank 51. The tanks are in fluid communication with cooling jacket
`
`25).
`
`It would have been obvious to oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to haveincluded first and second conditioning fluid
`
`reservoirs, wherein the first and second conditioning fluid reservoirs are in fluid
`
`connection with one another via a valve that is operable to control the level of
`
`conditioning fluid in the conditioning fluid reservoir that is in fluid communication with the
`
`conditioned element as taught by Novakfor the optical element in the conditioning
`
`system as taught by Van Berkel sincefirst and second conditioning fluid reservoirs,
`
`wherein the first and second conditioning fluid reservoirs are in fluid connection with one
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 9
`
`another via a valve that is operable to control the level of conditioning fluid in the
`
`conditioning fluid reservoir that is in fluid communication with the optical elementis
`
`commonly used to control the pressure in the fluid recirculation system to preventliquid
`
`from leaking out of the system (Novak,col. 4, lines 24-41).
`
`Regarding claim 30, Van Berkel as modified by Novak discloses wherein the
`
`conditioning system further comprises a liquid conditioning fluid comprising water (Van
`
`Berkel, Figs. 1-6, paras. [0040]-[0041],
`
`[0048]-[0055],
`
`[0062], the coolant supply system
`
`supplies water as a coolant).
`
`Regarding claim 31, Van Berkel as modified by Novak discloses wherein at
`
`least one of the one or more optical elements is a reflector or a mirror (Van Berkel, Figs.
`
`1-6, paras. [0019]-[0029], [0031]-[0032], [0041], [0048]-[0055],
`
`[0062], the coolant
`
`supply system is used to cool a mirror).
`
`Regarding claim 32, as best understood, Van Berkel as modified by Novak
`
`discloses wherein the conditioning system is configured to operate at between around
`
`0.02 and 0.9 bara or around 0.3 bara (Van Berkel, Figs. 1-6, paras. [0041], [0048]-
`
`[0055], [0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 ina
`
`range including sub-atmospheric pressure, 0.001 bar to below 1 bar).
`
`Regarding claim 34, Van Berkel discloses a lithographic apparatus a
`
`conditioning system (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062]) comprising
`
`a conditioning system configured to include a liquid conditioning fluid, wherein
`
`the liquid conditioning fluid is water (Figs. 1-6, paras. [0040]-[0041], [0048]-[0055],
`
`[0062], the coolant supply system supplies water as a coolant);
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 10
`
`wherein the conditioning system being configured to condition one or more
`
`optical elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029], [0031]-
`
`[0032], [0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror
`
`in the lithographic apparatus LA),
`
`wherein the conditioning system is configured to have a sub-atmospheric
`
`pressure at the one or more optical elements (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 in a range
`
`including sub-atmospheric pressure, 0.001 bar to below 1 bar). Van Berkel does not
`
`appearto explicitly describe a sub-atmospheric pressure conditioning fluid reservoir
`
`configured to store at least part of the liquid conditioning fluid.
`
`Novakdiscloses a sub-atmospheric pressure conditioning fluid reservoir
`
`configured to store at least part of the liquid conditioning fluid (Fig. 10, col. 4, lines 24-
`
`63, the coolant fluid recirculating system 50 and tanks 51 and 52 are held at below
`
`atmospheric pressure. The tanks 51 and 52 store coolantliquid).
`
`It would have been obvious to oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to have included a sub-atmospheric pressure
`
`conditioning fluid reservoir configured to store at least part of the liquid conditioning fluid
`
`as taught by Novakin the conditioning system as taught by Van Berkel since including a
`
`sub-atmospheric pressure conditioning fluid reservoir configured to store at least part of
`
`the liquid conditioning fluid s commonly used to preventliquid from leaking out of the
`
`system (Novak, col. 4, lines 24-41).
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 11
`
`Regarding claim 35, Van Berkel discloses a use of a sub-atmospheric pressure
`
`conditioning system in a lithographic apparatus (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062]) comprising
`
`conditioning one or moreoptical elements of the lithographic apparatus (Figs. 1-
`
`6, paras. [0019]-[0029], [0031]-[0032], [0041], [0048]-[0055],
`
`[0062], the coolant supply
`
`system is used to cool a mirror in the lithographic apparatus LA),
`
`using a sub-atmospheric pressure at the one or more optical elements (Figs. 1-6,
`
`paras. [0041], [0048]-[0055],
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to
`
`the reflector 13 in a range including sub-atmospheric pressure, 0.001 bar to below 1
`
`bar),
`
`using water as a liquid conditioning fluid (Figs. 1-6, paras. [0040]-[0041],
`
`[0048]-
`
`[0055], [0062], the coolant supply system supplies water as a coolant). Van Berkel does
`
`not appear to explicitly describe storing at least part of the liquid conditioning fluid in a
`
`sub-atmospheric pressure conditioning fluid reservoir.
`
`Novak discloses storing at least part of the liquid conditioning fluid in a sub-
`
`atmospheric pressure conditioning fluid reservoir (Fig. 10, col. 4, lines 24-63, the
`
`coolant fluid recirculating system 50 and tanks 51 and 52 are held at below atmospheric
`
`pressure. The tanks 51 and 52 store coolantliquid).
`
`It would have been obvious to oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to haveincluded storing at least part of the liquid
`
`conditioning fluid in a sub-atmospheric pressure conditioning fluid reservoir as taught by
`
`Novakin the method as taught by Van Berkel since including storing at least part of the
`
`liquid conditioning fluid in a sub-atmospheric pressure conditioning fluid reservoir is
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 12
`
`commonly used to preventliquid from leaking out of the system (Novak,col. 4,lines 24-
`
`41).
`
`Regarding claim 38, Van Berkel discloses a lithographic method (Figs. 1-6,
`
`paras. [0041], [0048]-[0055],
`
`[0062]) comprising:
`
`projecting a patterned beam of radiation onto a substrate (Figs. 1-6, paras.
`
`[0019]-[0026],
`
`the lithographic apparatus LA includes a projection system PS that
`
`projects the beam patterned by patterning device MA onto a substrate W), the patterned
`
`beam being directed or patterned using at least one optical element conditioned using a
`
`conditioning system (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-
`
`[0055], [0062], the projection system PSincludes a reflector 13 that is cooled using a
`
`coolant supply system), the conditioning system comprising:
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-6, paras.
`
`[0019]-[0029],
`
`[0031]-[0032], [0041], [0048]-[0055], [0062], the coolant supply system is
`
`used to cool a mirror in the lithographic apparatus LA),
`
`wherein the conditioning system is configured to condition one or more optical
`
`elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror in the
`
`lithographic apparatus LA),
`
`wherein the conditioning system is configured to have a sub-atmospheric
`
`pressure at the one or more optical elements (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 in a range
`
`including sub-atmospheric pressure, 0.001 bar to below 1 bar), and
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 13
`
`wherein the liquid condition fluid is water (Figs. 1-6, paras. [0040]-[0041],
`
`[0048]-
`
`[0055], [0062], the coolant supply system supplies water as a coolant). Van Berkel does
`
`not appear to explicitly describe a sub-atmospheric pressure conditioning fluid reservoir
`
`for storing at least part of a liquid conditioning fluid.
`
`Novakdiscloses a sub-atmospheric pressure conditioning fluid reservoir for
`
`storing at least part of a liquid conditioning fluid (Fig. 10, col. 4, lines 24-63, the coolant
`
`fluid recirculating system 50 and tanks 51 and 52 are held at below atmospheric
`
`pressure. The tanks 51 and 52 store coolantliquid).
`
`It would have been obviousto oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to have included a sub-atmospheric pressure
`
`conditioning fluid reservoir for storing at least part of a liquid conditioning fluid as taught
`
`by Novakin the lithographic method as taught by Van Berkel since including a sub-
`
`atmospheric pressure conditioning fluid reservoir for storing at least part of a liquid
`
`conditioning fluid is commonly used to preventliquid from leaking out of the system
`
`(Novak, col. 4, lines 24-41).
`
`10.
`
`Claim 22 is rejected under 35 U.S.C. 103 as being unpatentable over Van Berkel
`
`as modified by Novak as applied to claim 20 above,and further in view of Nomoto (US
`
`PGPub 2010/0073649).
`
`Regarding claim 22, Van Berkel as modified by Novak does not appear to
`
`explicitly describe wherein the conditioning system further comprises: a pump upstream
`
`of the optical element, and a flow restrictor between the pump and the optical element.
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 14
`
`Nomoto discloses a pump upstream of the conditioned element (Figs. 1-4, paras.
`
`[0040]-[0041],
`
`[0050], supply pump 17 is provided upstream of the heat exhausting
`
`members 11), and
`
`a flow restrictor between the pump and the conditioned element (Figs. 1-4, paras.
`
`[0040]-[0041],
`
`[0050]-[0052], [0064]-[0067], flow rate adjusting valve 4 and shut-off
`
`valve 9 are disposed between heat exhausting member 11 and supply pump 17).
`
`It would have been obvious to oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to have included a pump upstream of the conditioned
`
`element, and a flow restrictor between the pump and the conditioned element as taught
`
`by Nomotofor the optical element in the conditioning system as taught by Van Berkel as
`
`modified by Novaksince including a pump upstream of the optical element, and a flow
`
`restrictor between the pump andthe optical element is commonly used to control the
`
`flow of coolant through the system to improve cooling (Nomoto, paras. [0026)).
`
`11.
`
`Claims 24-25 are rejected under 35 U.S.C. 103 as being unpatentable over Van
`
`Berkel et al. (US PGPub 2019/0033499, Van Berkel hereinafter) in view of Nomoto (US
`
`PGPub 2010/0073649).
`
`Regarding claim 24, Van Berkel discloses a conditioning system (Figs. 1-6,
`
`paras. [0041], [0048]-[0055],
`
`[0062]), comprising
`
`a liquid conditioning fluid comprising water (Figs. 1-6, paras. [0040]-[0041],
`
`[0048]-[0055],
`
`[0062], the coolant supply system supplies water as a coolant);
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 15
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-6, paras.
`
`[0019]-[0029],
`
`[0031]-[0032], [0041], [0048]-[0055], [0062], the coolant supply system is
`
`used to cool a mirror in a lithographic apparatus LA),
`
`wherein the conditioning system is configured to condition one or more optical
`
`elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror),
`
`wherein the conditioning system is configured to have a sub-atmospheric
`
`pressure at the one or more optical elements (Figs. 1-6, paras. [0041], [0048]-[0055],
`
`[0062], claim 24, a coolant supply unit 43 supplies fluid to the reflector 13 in a range
`
`including sub-atmospheric pressure, 0.001 bar to below 1 bar). Van Berkel does not
`
`appearto explicitly describe a flow restrictor, a pump, wherein the pump is downstream
`
`of the optical element and wherein the flow restrictor is upstream of the optical element.
`
`
`
`Nomoto disclosesaflow restrictor (Figs. 1-4, paras. [0050]-[0052], [0064]-[0067],
`
`flow rate adjusting valve 4 and shut-off valve 9 are disposed upstream of the heat
`
`exhausting member 11 to control the flow rate), and
`
`a pump (Figs. 1-4, paras. [0042]-[0045], pressure reducing pump 1 is provided
`
`downstream of the heat exhausting members 11 to reduce the pressure in each jacket),
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-4, paras.
`
`[0037]-[0043],
`
`the liquid cooling medium circulation system is disposed in an exposure
`
`apparatus to remove heat from components in the exposure apparatus),
`
`wherein the pump is downstream of the conditioned element (Figs. 1-4, paras.
`
`[0042]-[0045], pressure reducing pump 1 is provided downstream of the heat
`
`exhausting members 11 to reduce the pressure in each jacket) and
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 16
`
`wherein the flow restrictor is upstream of the conditioned element (Figs. 1-4,
`
`paras. [0050]-[0052],
`
`[0064]-[0067], flow rate adjusting valve 4 and shut-off valve 9 are
`
`disposed upstream of the heat exhausting member 11 and control the flow rate).
`
`It would have been obvious to oneof ordinary skill in the art before the effective
`
`filing date of the claimed invention to have includedaflow restrictor, a pump, wherein
`
`the pump is downstream of the conditioned element and wherein the flow restrictor is
`
`upstream of the conditioned element as taught by Nomotofor the optical element in the
`
`conditioning system as taught by Van Berkel since including a flow restrictor, a pump,
`
`wherein the pump is downstream of the optical element and wherein the flow restrictor
`
`is upstream of the optical element is commonly used to control the flow of coolant
`
`through the system to improve cooling (Nomoto, paras. [0026]).
`
`Regarding claim 25, Van Berkel as modified by Nomoto discloses wherein the
`
`conditioning system further comprises a conditioning fluid reservoir (Nomoto, Figs. 1-4,
`
`para. [0040], a reservoir 16 stores cooling medium 15).
`
`12.
`
`Claims 26-27 are rejected under 35 U.S.C. 103 as being unpatentable over Van
`
`Berkel as modified by Nomoto as applied to claim 24 above, and further in view of
`
`Novak (US Patent No. 5,998,889).
`
`Regarding claim 26, Van Berkel as modified by Nomoto does not appear to
`
`explicitly describe wherein the conditioning system comprises a sub-atmospheric
`
`pressure conditioning fluid reservoir.
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 17
`
`Novak discloses wherein the conditioning system comprises a sub-atmospheric
`
`pressure conditioning fluid reservoir (Fig. 10, col. 4,lines 24-63, the coolantfluid
`
`recirculating system 50 and tanks 51 and 52 are held at below atmospheric pressure).
`
`It would have been obvious to one of ordinary skill in the art before the effective
`
`filing date of the claimed invention to have included wherein the conditioning system
`
`comprises a sub-atmospheric pressure conditioning fluid reservoir as taught by Novak
`
`in the conditioning system as taught by Van Berkel as modified by Nomoto since
`
`including wherein the conditioning system comprises a sub-atmospheric pressure
`
`conditioning fluid reservoir is commonly used to preventliquid from leaking out of the
`
`system (Novak, col. 4, lines 24-41).
`
`Regarding claim 27, Van Berkel as modified by Nomoto in view of Novak
`
`discloses wherein the sub-atmospheric pressure conditioning fluid reservoir is
`
`connected to a vacuum pump and/or a gasinlet (Novak, Fig. 10, col. 4, lines 24-63, tank
`
`52 is connected to a vacuum source via vacuum connection 54. Tank 51 is connected
`
`to valve 53 to introduce air into the chamber51).
`
`13.
`
`Claim 28 is rejected under 35 U.S.C. 103 as being unpatentable over Van Berkel
`
`et al. (US PGPub 2019/0033499, Van Berkel hereinafter) in view of Tsuji et al. (US
`
`PGPub 2005/0140946, Tsuji hereinafter).
`
`Regarding claim 28, Van Berkel discloses a conditioning system (Figs. 1-6,
`
`paras. [0041], [0048]-[0055],
`
`[0062]), comprising
`
`

`

`Application/Control Number: 18/251 ,261
`Art Unit: 2882
`
`Page 18
`
`wherein the conditioning system is fora lithographic apparatus (Figs. 1-6, paras.
`
`[0019]-[0029],
`
`[0031]-[0032], [0041], [0048]-[0055], [0062], the coolant supply system is
`
`used to cool a mirror in a lithographic apparatus LA),
`
`wherein the conditioning system is configured to condition one or more optical
`
`elements of the lithographic apparatus (Figs. 1-6, paras. [0019]-[0029],
`
`[0031]-[0032],
`
`[0041], [0048]-[0055],
`
`[0062], the coolant supply system is used to cool a mirror),
`
`wherein the conditioning system is configured to have a sub-atmospher