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Taiwan Semiconductor Manufacturing Co., Ltd.

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

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Chun-Jen HSIAO Ya-Ping CHEN Chien-Hung LIN Wen-Pin LIU Chin-Wen CHEN

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PHOTORESIST REMOVAL METHOD USING RESIDUE GAS ANALYZER

16/503,571 | U.S. Patent Application

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Location ELECTRONIC

Filed July 4, 2019

Examiner SHAMIM AHMED

Class 216

Art Group 1713

Patent No. 11,020,778

Case Type Utility - 216/067000

Status Patented Case

Parent 62/696,888 Expired

Child 17/326,430 Patented

Last Updated: 1 year, 1 month ago

Date	#	Transaction
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PHOTORESIST REMOVAL METHOD USING RESIDUE GAS ANALYZER

16/503,571 | U.S. Patent Application

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