Reply to Office Action of Jan. 29, 2020
`
`- 2 -
`
`ASML Netherlands B.V.
`Application No. 16/307,376
`
`Amendments to the Claims
`
`This listing of claims will replace all prior versions, and listings, of claims in the
`
`application.
`
`l—15.
`
`(Canceled)
`
`16.
`
`(Currently amended) A supercontinuum radiation source comprising:
`
`illumination optics arranged to receive a pulsed pump radiation beam having a power
`
`and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of
`
`the pulsed pump radiation beam,
`
`a plurality of waveguides each arranged to receive at least one of the plurality of
`
`pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate
`
`a supercontinuum sub-beam wherein the power of the pulsed pump radiation beam is spread
`
`over the plurality of waveguides, and
`
`collection optics arranged to receive the supercontinuum sub-beam from the plurality
`
`of waveguides and to combine them so as to form a supercontinuum radiation beam,
`
`wherein the pulsed pump radiation beam is passively coupled into the plurality of
`
`waveguides and through the plurality of waveguides without applying any amplification.
`
`17.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein the
`
`plurality of waveguides comprise integrated optics.
`
`18.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein the
`
`plurality of waveguides are formed from silicon nitride (Si3N4) and are surrounded by a
`
`cladding material or silicon or silicon dioxide (SiO2).
`
`19.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein the
`
`plurality of waveguides are formed on a common substrate.
`
`Atty. Dkt. No. 2857.7240001
`
`
`
`- 2 -
`
`ASML Netherlands B.V.
`Application No. 16/307,376
`
`Amendments to the Claims
`
`This listing of claims will replace all prior versions, and listings, of claims in the
`
`application.
`
`l—15.
`
`(Canceled)
`
`16.
`
`(Currently amended) A supercontinuum radiation source comprising:
`
`illumination optics arranged to receive a pulsed pump radiation beam having a power
`
`and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of
`
`the pulsed pump radiation beam,
`
`a plurality of waveguides each arranged to receive at least one of the plurality of
`
`pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate
`
`a supercontinuum sub-beam wherein the power of the pulsed pump radiation beam is spread
`
`over the plurality of waveguides, and
`
`collection optics arranged to receive the supercontinuum sub-beam from the plurality
`
`of waveguides and to combine them so as to form a supercontinuum radiation beam,
`
`wherein the pulsed pump radiation beam is passively coupled into the plurality of
`
`waveguides and through the plurality of waveguides without applying any amplification.
`
`17.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein the
`
`plurality of waveguides comprise integrated optics.
`
`18.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein the
`
`plurality of waveguides are formed from silicon nitride (Si3N4) and are surrounded by a
`
`cladding material or silicon or silicon dioxide (SiO2).
`
`19.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein the
`
`plurality of waveguides are formed on a common substrate.
`
`Atty. Dkt. No. 2857.7240001
`
`
`
`Reply to Office Action of Jan. 29, 2020
`
`- 3 -
`
`ASML Netherlands B.V.
`Application No. 16/307,376
`
`20.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein the
`
`plurality of waveguides have a width of the order of l um or less and a height of the order
`
`of 500 nm or less.
`
`21.
`
`(Previously presented) The supercontinuum radiation source of claim 17, wherein
`
`each of the plurality of waveguides has a length of 10 mm or less.
`
`22.
`
`(Canceled)
`
`23.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein the
`
`supercontinuum radiation beam has a spectrum which comprises radiation in the wavelength
`
`range of 400 to 2600 nm.
`
`24.
`
`(Previously presented) The supercontinuum radiation source of claim 16, comprising
`
`100 or more waveguides.
`
`25.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein the
`
`illumination optics and/or the collection optics comprises a plurality of groups of
`
`waveguides, the plurality of groups of waveguides being sequentially ordered and wherein
`
`the waveguides from each group of waveguides optically couple to a plurality of
`
`waveguides in the next group of waveguides in the sequence.
`
`26.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein the
`
`illumination optics and/or collection optics comprises a plurality oflensed fibers, each of
`
`the lensed fibers coupling to at least one of the plurality of waveguides.
`
`Atty. Dkt. No. 2857.7240001
`
`
`
`Reply to Office Action of Jan. 29, 2020
`
`- 4 -
`
`ASML Netherlands B.V.
`Application No. 16/307,376
`
`27.
`
`(Previously presented) The supercontinuum radiation source of claim 16, wherein:
`
`the illumination optics comprises a first optic and a focusing optic,
`
`the first optic is arranged to receive the radiation beam from the radiation source and
`
`to direct it onto the focusing optic, and
`
`the focusing optic is arranged to optically couple a different portion of the pump
`
`radiation beam to at least two of the plurality of waveguides.
`
`28.
`
`(Currently amended) An optical measurement system comprising:
`
`a supercontinuum radiation source comprising:
`
`illumination optics arranged to receive a pulsed pump radiation beam having
`
`a power and to form a plurality of pulsed sub-beams, each pulsed sub-beam
`
`comprising a portion of the pulsed pump radiation beam,
`
`a plurality of waveguides each arranged to receive at least one of the plurality
`
`of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as
`
`to generate a supercontinuum sub-beam wherein the power of the pulsed pump
`
`radiation beam is spread over the plurality of waveguides, and
`
`collection optics arranged to receive the supercontinuum sub-beam from the
`
`plurality of waveguides and to combine them so as to form a supercontinuum
`
`radiation beam,
`
`wherein the pulsed pump radiation beam is passively coupled into the
`
`plurality of waveguides and through the plurality of waveguides without applying
`
`any amplification.
`
`Atty. Dkt. No. 2857.7240001
`
`
`
`Reply to Office Action of Jan. 29, 2020
`
`- 5 -
`
`ASML Netherlands B.V.
`Application No. 16/307,376
`
`29.
`
`(Previously presented) An alignment mark measurement system comprising:
`
`a supercontinuum radiation source comprising:
`
`illumination optics arranged to receive a pulsed pump radiation beam having
`
`a power and to form a plurality of pulsed sub-beams, each pulsed sub-beam
`
`comprising a portion of the pulsed pump radiation beam;
`
`a plurality of waveguides each arranged to receive at least one of the plurality
`
`of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as
`
`to generate a supercontinuum sub-beam wherein the power of the pulsed pump
`
`radiation beam is spread over the plurality of waveguides; and
`
`collection optics arranged to receive the supercontinuum sub-beam from the
`
`plurality of waveguides and to combine them so as to form a supercontinuum
`
`radiation beam,
`
`wherein the pulsed pump radiation beam is passively coupled into the
`
`plurality of waveguides and through the plurality of waveguides without applying
`
`any amplification,
`
`an optical system operable to project the supercontinuum radiation beam onto an
`
`alignment mark on a substrate supported on a substrate table,
`
`a sensor operable to detect radiation diffracted/scattered by the alignment mark and
`
`to output a signal containing information related to a position of the alignment mark, and
`
`a processor configured to receive the signal from the sensor and to determine a
`
`position of the alignment mark relative to the substrate table in dependence thereon.
`
`30.
`
`(Previously presented) A lithographic apparatus comprising the alignment mark
`
`measurement system according to claim 29.
`
`3 l.
`
`(Canceled)
`
`32.
`
`(Canceled)
`
`Atty. Dkt. No. 2857.7240001
`
`
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