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Nobuaki Tsuchiya Yasumi Sago Masayoshi Ikeda

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ANELVA CORPORATION

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RF PLASMA PROCESSING METHOD AND RF PLASMA PROCESSING SYSTEM

10/359,081 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)

Filed Feb. 6, 2003

Examiner JIMMY T VU

Class 315

Art Group 2821

Patent No. 6,774,570

Case Type Utility - 315/111210

Status Patented Case

Child 2002-033167

Last Updated: 4 years, 5 months ago

Date	#	Transaction
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RF PLASMA PROCESSING METHOD AND RF PLASMA PROCESSING SYSTEM

10/359,081 | U.S. Patent Application

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