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Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor

10/786,424 | U.S. Patent Application

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Location ELECTRONIC
Filed Feb. 25, 2004
Examiner RODNEY GLENN MCDONALD
Class 156
Art Group 1753
Case Type Utility - 156/345000
Status Abandoned -- Failure to Respond to an Office Action
Parent 09/970,121 Patented
Parent 09/675,319 Patented
Parent 08/648,254 Patented
Parent 08/580,026 Abandoned
Parent 08/41,796 Patented
Parent 07/722,340 Abandoned
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Last Updated: 4 years, 8 months ago
Date # Transaction