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HIGH TEMPERATURE SILICON SURFACE PROVIDING HIGH SELECTIVITY IN AN OXIDE ETCH PROCESS

09/645,924 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Aug. 24, 2000
Examiner GEORGE A GOUDREAU
Class 118
Art Group 1763
Patent No. 6,399,514
Case Type Utility - 118/724000
Status Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362
Parent 07/826,310 Patented
Parent 07/722,340 Abandoned
Last Updated: 5 years ago
Date # Transaction