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REDUCED VARIATION IN INTERCONNECT RESISTANCE USING RUN-TO-RUN CONTROL OF CHEMICAL-MECHANICAL POLISHING DURING SEMICONDUCTOR FABRICATION

09/401,914 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Sept. 23, 1999
Examiner DEVEN M COLLINS
Class 257
Art Group 2823
Patent No. 6,157,078
Case Type Utility - 257/734000
Status Patented Case
Last Updated: 3 years, 1 month ago
Date # Transaction