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HIGH PRESSURE HIGH NON-REACTIVE DILUENT GAS CONTENT HIGH PLASMA ION DENSITY PLASMA OXIDE ETCH PROCESS

08/733,554 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Oct. 21, 1996
Examiner RODNEY GLENN MCDONALD
Class 216
Art Group 1753
Patent No. 6,238,588
Case Type Utility - 216/068000
Status Patented Case
Parent 08/648,254 Patented
Parent 08/580,026 Abandoned
Parent 08/41,796 Patented
Parent 07/722,340 Abandoned
Parent 08/503,467 Patented
Parent 08/138,060 Patented
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Last Updated: 4 years, 11 months ago
Date # Transaction