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LOW FREQUENCY INDUCTIVE RF PLASMA REACTOR

08/374,404 | U.S. Patent Application

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Location FILE REPOSITORY (FRANCONIA)
Filed Jan. 17, 1995
Examiner JOHN W ELDRED
Class 422
Art Group 2201
Patent No. 5,534,231
Case Type Utility - 422/186000
Status Patented Case
Parent 07/460,707 Abandoned
Last Updated: 4 years, 4 months ago
Date # Transaction