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Process for Etching Oxides in an Electromagnetically Coupled Planar Plasma Apparatus

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PROCESS FOR ETCHING OXIDES IN AN ELECTROMAGNETICALLY COUPLED PLANAR PLASMA APPARATUS

07/984,045 | U.S. Patent Application

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Filed Dec. 1, 1992

Case Type Utility - 156/643000

Status Abandoned -- File-Wrapper-Continuation Parent Application

Last Updated: 5 years ago

Date	#	Transaction
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PROCESS FOR ETCHING OXIDES IN AN ELECTROMAGNETICALLY COUPLED PLANAR PLASMA APPARATUS

07/984,045 | U.S. Patent Application

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