Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 1 of 15
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`Exhibit 26
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`| HAO WALA NAMAN UTAMA UNATAL AL ON MAN MATERIAL
`
`USO10056274B2
`
`( 12 ) United States Patent
`Rice et al .
`
`( 10 ) Patent No . : US 10 , 056 , 274 B2
`( 45 ) Date of Patent :
`Aug . 21 , 2018
`
`( 72 )
`
`( 54 ) SYSTEM AND METHOD FOR FORMING A
`SEALED CHAMBER
`( 71 ) Applicant : APPLIED MATERIALS ISRAEL
`LTD . , Rehovot ( IL )
`Inventors : Michael R . Rice , Pleasanton , CA ( US ) ;
`Paul Reuter , Austin , TX ( US ) ; William
`( Ty ) Weaver , Austin , TX ( US ) ; Travis
`Morey , Austin , TX ( US ) ; Natan
`Schlimoff , Rehovot ( IL ) ; Igor Krivts
`( Krayvitz ) , Rehovot ( IL ) ; Israel
`Avneri , Ramat - Gan ( IL ) ; Yoram Uziel ,
`Misgav ( IL ) ; Erez Admoni ,
`Petach - Tikva ( IL )
`( 73 ) Assignee : APPLIED MATERIALS ISRAEL
`LTD . , Rehovot ( IL )
`Subject to any disclaimer , the term of this
`patent is extended or adjusted under 35
`U . S . C . 154 ( b ) by 0 days .
`( 21 ) Appl . No . : 15 / 040 , 904
`( 22 ) Filed :
`Feb . 10 , 2016
`Prior Publication Data
`( 65 )
`US 2016 / 0163570 A1 Jun . 9 , 2016
`
`( * ) Notice :
`
`Related U . S . Application Data
`( 63 ) Continuation
`of
`application
`PCT / US2014 / 050593 , filed on Aug . 11 , 2014 .
`( Continued )
`
`No .
`
`( 51 ) Int . Cl .
`HOTL 21 / 67
`HOIL 21 / 68
`
`( 52 )
`
`( 2006 . 01 )
`( 2006 . 01 )
`( Continued )
`U . S . CI .
`CPC . . HOLL 21 / 67126 ( 2013 . 01 ) ; HOIL 21 / 67748
`( 2013 . 01 ) ; HOIL 21 / 67751 ( 2013 . 01 ) ; HOLL
`21 / 68714 ( 2013 . 01 )
`
`( 56 )
`
`( 58 ) Field of Classification Search
`CPC . . . . . . . . . HO1L 21 / 67126 ; HO1L 21 / 67748 ; HOIL
`21 / 67751 ; HO1L 21 / 68714 ; HOIL
`21 / 68764 ; HO1L 21 / 68785
`See application file for complete search history .
`References Cited
`U . S . PATENT DOCUMENTS
`4 , 191 , 385 A
`*
`3 / 1980 Fox . . . . . . . . . . . . . . . . . . . HO1L 21 / 67011
`277 / 432
`3 / 1989 Ukai . . . . . . . . . . . . . . . . . . . . . HO1J 37 / 185
`4 , 816 , 638 A
`*
`156 / 345 . 31
`( Continued )
`FOREIGN PATENT DOCUMENTS
`5 / 2007
`2007116059 A
`6 / 1993
`05140743 A
`2015023603
`2 / 2015
`
`JP
`WO
`wo
`
`OTHER PUBLICATIONS
`PCT / US2014 / 050593 , “ International Preliminary Report on Patent
`ability ” , dated Feb . 25 , 2016 , 8 pages .
`( Continued )
`Primary Examiner — James Keenan
`( 74 ) Attorney , Agent , or Firm — Kilpatrick Townsend &
`Stockton LLP
`ABSTRACT
`( 57 )
`According to an embodiment of the invention , there is
`provided a system , comprising : a first chamber ; a second
`chamber ; a chuck ; a movement system ; wherein the first
`chamber comprises : a first element that has a first surface ; a
`first chamber housing that comprises a second surface ;
`wherein the first surface and the second surface come into
`proximity with each other at a first interface ; a supporting
`element for supporting the chuck when the chuck is posi
`tioned within the first chamber ; and a first dynamic seal
`formed at the first interface and is arranged to seal the first
`chamber from the movement system ; wherein the second
`chamber comprises : a second chamber housing ; a movement
`( Continued )
`
`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 2 of 15
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`170
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`121
`
`116
`
`125 .
`125
`114
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`115 .
`
`116
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`125
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`113 .
`
`120
`
`140
`
`100
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`

`

`US 10 , 056 , 274 B2
`Page 2
`
`2 / 2006 Kim . . . . . . . . . . . . . . . . . . HO1L 21 / 67126
`7 , 001 , 129 B2 *
`414 / 217
`4 / 2006 Kim . . . . . . . . . . . . . . . . . HO1L 21 / 67253
`7 , 022 , 009 B2 *
`414 / 935
`4 / 2006 Pharand . . . . . . . . . . . . HO1L 21 / 67751
`7 , 026 , 581 B2 *
`118 / 724
`9 / 2008 Naftali . . . . . . . . . . . . . . HOLL 21 / 67126
`7 , 428 , 850 B2 *
`73 / 865 . 8
`2 / 2010 Lubomirsky . . . HO1L 21 / 67126
`7 , 654 , 221 B2 *
`118 / 319
`7 , 828 , 504 B2 * 11 / 2010 Pharand . . . . . . . . . . . HO1L 21 / 67201
`414 / 217
`9 , 302 , 358 B2 *
`4 / 2016 Krayvitz
`( Krivts )
`2003 / 0185715 Al 10 / 2003 Krivts et al .
`2006 / 0102078 A15 / 2006 Fairbairn et al .
`2013 / 0004288 AL
`1 / 2013 Reed et al .
`2013 / 0196514 AL 8 / 2013 Ewert et al .
`
`. . . HOIL 21 / 6719
`
`. . . . . . . . .
`
`OTHER PUBLICATIONS
`PCT / US2014 / 050593 , “ International Search Report and Written
`Opinion ” , dated Nov . 25 , 2014 , 11 pages .
`* cited by examiner
`
`system that is arranged to introduce movement between ( a )
`the first chamber housing and ( b ) the first element and the
`chuck ; and a movement control element for mechanically
`coupling the first element to the movement system .
`13 Claims , 7 Drawing Sheets
`
`Related U . S . Application Data
`( 60 ) Provisional application No . 61 / 865 , 042 , filed on Aug .
`12 , 2013 .
`( 51 ) Int . Ci .
`( 2006 . 01 )
`HOIL 21 / 677
`HOIL 21 / 687
`( 2006 . 01 )
`References Cited
`U . S . PATENT DOCUMENTS
`6 , 899 , 765 B2 *
`5 / 2005 Krivts . . . . . . . . . . . . . . . HO1L 21 / 67126
`118 / 719
`
`( 56 )
`
`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 3 of 15
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`

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`U . S . Patent
`
`Aug . 21 , 2018
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`Sheet 1 of 7
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`US 10 , 056 , 274 B2
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`125
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`116
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`- - -
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`- - - - - - - -
`-
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`113
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`140
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`FIG . 1
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`112
`122
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`100
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`170
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`130
`10 10
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`L
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`115
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`110
`110
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`-
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`-
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`- -
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`-
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`-
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`- -
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`116
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`111
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 4 of 15
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`125
`114
`121 .
`
`120
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`

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`U . S . Patent
`
`Aug . 21 , 2018
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`of 7
`Sheet 2 of 7
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`US 10 , 056 , 274 B2
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`230
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`-
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`116
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`210
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`-
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`-
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`-
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`-
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`-
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`-
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`-
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`-
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`112
`124 113
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`170
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`10 130
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`-
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`119
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`140
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`240
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`124
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`220
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`110
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`-
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`-
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`-
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`-
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`FIG . 2
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`200
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 5 of 15
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`120
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`-
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`-
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`116
`125
`114
`114
`121 121
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`U . S . Patent
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`Aug . 21 , 2018
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`Sheet 3 of 7
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`US 10 , 056 , 274 B2
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`310
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`of 320
`125
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`|
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`- - -
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`)
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`-
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`116
`113 _
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`170
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`10 10 130
`130
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`1
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`110
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`116 116
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`111
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`140
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`FIG . 3
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`112 112
`122
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`300
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`120
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`320
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`114
`121 P
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 6 of 15
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`U . S . Patent
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`Aug . 21 , 2018
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`Sheet 4 of 7
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`US 10 , 056 , 274 B2
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`129
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`116 110125
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`113 113
`113
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`-
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`-
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`- -
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`10 110 130 130
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`110
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`-
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`115
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`140
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`FIG . 4
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`112 112
`122
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`400
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`111
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 7 of 15
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`-
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`- -
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`-
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`116
`125
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`-
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`-
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`D
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`114
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`121
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`120 120
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`129 129
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`

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`U . S . Patent
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`Aug . 21 , 2018
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`Sheet 5 of 7
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`US 10 , 056 , 274 B2
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`112
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`160
`160
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`114 114
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`511
`509
`507
`505
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`Chamber ( Lower Pressure )
`Volume
`to
`
`T
`
`-
`
`inoer
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`* * *
`
`sta
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`113
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`Third Pressure Af . 15
`Second Pressure A ” ???
`First Pressure
`Annulus
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`Air folet
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`FIG . 5
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`116
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 8 of 15
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`Air Flow
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`Air Beoring Gop
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`( Higher Pressure )
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`112
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`

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`U . S . Patent
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`Aug . 21 , 2018
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`Sheet 6 of 7
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`US 10 , 056 , 274 B2
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`- - -
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`. . .
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`-
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`170
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`111
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 9 of 15
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`112 112
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`124 113
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`101442
`1 P 612
`B E
`140
`240V
`612
`610
`240
`124
`110 P
`112
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`130
`10 10 130
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`FIG . 6
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`600 600
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`120
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`L
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`-
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`- - -
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`-
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`- -
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`-
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`-
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`-
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`-
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`- -
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`114
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`121125
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`

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`U . S . Patent
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`Aug . 21 , 2018
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`Sheet 7 of 7
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`US 10 , 056 , 274 B2
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`second chamber , and a movement system . The first chamber includes ( i ) a first element that has a first surface , ( ii )
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`mechanically coupling the first element to the movement system . 710
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`Placing a substrate on a chuck that is located within a first chamber of the system . The system also includes a
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`formed at the first interface and is arranged to seal the first chamber from the movement system . The each other at a first interface , ( iii ) a supporting element for supporting the chuck ; and ( iv ) a first dynamic seal a first chamber housing that includes a second surface , the first surface and the second surface come into proximity with
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`second chamber includes ( i ) a second chamber housing ; a movement system that is arranged to introduce movement between ( a ) the
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`first chamber housing and ( b ) the first element and the chuck , and a movement control element for
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`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 10 of 15
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`Applying an inspection or manufacturing process within the first chamber while sealing , by the first dynamic seal ,
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`from reaching the substrate . The applying may include introducing movement , by the movement system , between the
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`substrate and the first chamber housing . 720
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`the first chamber from the second chamber . Thus , contaminants generated within the second chamber are prevented
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`FIG . 7
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`700 700
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`

`

`US 10 , 056 , 274 B2
`
`SYSTEM AND METHOD FOR FORMING A
`SEALED CHAMBER
`
`chuck ; and a movement control element for mechanically
`coupling the first element to the movement system .
`According to an embodiment of the invention there is
`CROSS - REFERENCES TO RELATED
`provided chamber elements defining a first chamber to be
`5 utilized during a semiconductor manufacturing stage or a
`APPLICATIONS
`semiconductor inspection stage , the chamber elements com
`prising : a first element that has a first surface ; a first chamber
`This application is a continuation of and claims priority to
`housing that comprises a second surface ; wherein the first
`PCT / US2014 / 050593 , filed Aug . 11 , 2014 ; which claims the
`benefit of U . S . Provisional Patent Application No . 61 / 865 ,
`surface and the second surface come into proximity with
`042 , filed Aug . 12 , 2013 . The disclosures of each of the 10 each other at a first interface ; a supporting element for
`PCT / IB2014 / 061637 and 61 / 865 , 042 applications are herein
`supporting a chuck to be positioned within the first chamber ;
`incorporated by reference in their entirety for all purposes .
`wherein the first element is arranged to be moved in relation
`to the first chamber housing by a movement control element
`BACKGROUND OF THE INVENTION
`that mechanically couples the first element to a movement
`system that is positioned outside the first chamber ; and a first
`The present invention relates to semiconductor inspection
`dynamic seal formed at the first interface and is arranged to
`systems and / or processing , and more particularly to cham
`seal the first chamber from the movement system .
`bers for processing or inspecting substrates such as semi
`According to an embodiment of the invention , the system
`conductor wafers , reticles , and the like for the manufacture
`of integrated circuits ( ICs ) . Integrated circuits are manufac - 20 further comprised pressure control elements for maintaining
`tured by building semiconductor devices on one or more
`the first chamber at a lower pressure level than the second
`substrates in a process chamber . The semiconductor devices
`chamber . According to another embodiment of the inven
`are interconnected to form the IC . A semiconductor wafer
`tion , the internal and second chambers are maintained at
`substantially a same pressure level . According to an embodi
`may have one , or many , or a few ICs .
`Semiconductor devices are fabricated on substrates such 25 ment of the invention , the system further comprises filtering
`as silicon wafers by processes that involve depositing ,
`elements arranged to prevent contaminants generated within
`patterning , and removing of materials on the substrates .
`the second chamber to enter the first chamber . According to
`Deposition processes such as chemical vapor deposition
`an embodiment of the invention , the first element is a plate .
`( CVD ) or physical vapor deposition ( PVD ) may be used to
`According to another embodiment , the first element defines
`deposit a layer of material on a substrate . Photolithography 30 an aperture and the supporting element and the movement
`techniques may be used to create a pattern on a layer of
`control element are connected to each other to form a
`material to control where etching , depositing , or implanting
`support and movement control module that passes through
`will occur . Etch processes may be used to remove portions
`the aperture .
`of a deposited layer , so that other materials may be deposited
`According to an embodiment of the invention , the system
`in the removed portions . Ion implantation processes may be 35 further comprises a second dynamic seal formed at a second
`used to change the properties of a deposited layer of material
`interface between the aperture and the support and move
`by physically bombarding and implanting dopants into the
`ment control module . According to an embodiment of the
`deposited layer . By using various ones of these process
`invention , the aperture is located at a center of the first
`steps , semiconductor devices , and , thus , integrated circuits
`element . According to another embodiment of the invention ,
`40 the supporting element and the movement control element
`are created on the substrate .
`There is a need to allow efficient and relatively contami
`are connected to each other to form a support and movement
`nation free system and method for moving a substrate while
`control module ; and wherein the support and control module
`maintaining predefined conditions within a first chamber in
`further comprises a horizontal movement stage . According
`which the substrate is placed .
`to an embodiment of the invention , the system
`further
`45 comprises a load lock mechanism for allowing the insertion
`BRIEF SUMMARY OF THE INVENTION
`of a substrate to the first chamber and a removal of the
`substrate from the first chamber .
`According to various embodiments of the invention there
`BRIEF DESCRIPTION OF THE DRAWINGS
`may be provided a system that may include a first chamber ,
`a second chamber , a chuck and a movement system .
`Any combinations of any of the components of any of the
`The subject matter regarded as the invention is particu
`figures can be provided . Any combination of any of the
`larly pointed out and distinctly claimed in the concluding
`mentioned above systems can be provided .
`portion of the specification . The invention , however , both as
`According to an embodiment of the invention , there is
`to organization and method of operation , together with
`provided a system , comprising : a first chamber ; a second 55 objects , features , and advantages thereof may best be under
`chamber ; a chuck ; a movement system ; wherein the first
`stood by reference to the following detailed description
`chamber comprises : a first element that has a first surface ; a
`when read with the accompanying drawings in which :
`first chamber housing that comprises a second surface ;
`FIG . 1 illustrates a system according to an embodiment of
`wherein the first surface and the second surface come into
`the invention ;
`proximity with each other at a first interface ; a supporting 60
`FIG . 2 illustrates a system according to an embodiment of
`element for supporting the chuck when the chuck is posi -
`the invention ;
`tioned within the first chamber ; and a first dynamic seal
`FIG . 3 illustrates a system according to an embodiment of
`formed at the first interface and is arranged to seal the first
`the invention ;
`chamber from the movement system ; wherein the second
`FIG . 4 illustrates a system according to an embodiment of
`chamber comprises : a second chamber housing ; a movement 65 the invention ;
`system that is arranged to introduce movement between ( a )
`FIG . 5 illustrates a first dynamic seal according to an
`the first chamber housing and ( b ) the first element and the
`embodiment of the invention ;
`
`50
`
`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 11 of 15
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`

`

`US 10 , 056 , 274 B2
`
`and even eliminate the amount of contaminating elements
`FIG . 6 illustrates a system according to an embodiment of
`generated within the first chamber . The first chamber can be
`the invention ; and
`free of moving parts .
`FIG . 7 illustrates a method according to an embodiment
`The first and second chambers can be isolated from each
`of the invention .
`It will be appreciated that for simplicity and clarity of 5 other by using one or more dynamic seals .
`The first chamber can include a first element such as a
`illustration , elements shown in the figures have not neces -
`sarily been drawn to scale . For example , the dimensions of
`plate that has a first surface . The first surface of the plate and
`some of the elements may be exaggerated relative to other
`a second surface of the housing of the first chamber are
`elements for clarity . Further , where considered appropriate ,
`proximate to each other at a first interface . A first dynamic
`reference numerals may be repeated among the figures to
`seal can be formed at the first interface and can include one
`or more air bearings that allow a contactless sealing .
`indicate corresponding or analogous elements .
`The first and second surfaces may be horizontal , wherein
`DETAILED DESCRIPTION OF THE
`the second plate can be positioned above the first surface as
`INVENTION
`illustrated in FIGS . 1 - 3 .
`The combination of the housing of the first chamber and
`the first element can form an inner space of radial symmetry
`In the following detailed description , numerous specific
`or an inner space of other geometrical properties .
`forth in order to provide a thorough under -
`standing of the invention . However , it will be understood by
`The second chamber can be maintained at a higher
`those skilled in the art that the present invention may be 20 pressure in relation to the first chamber or at the same
`practiced without these specific details . In other instances ,
`pressure level .
`well - known methods , procedures , and components have not
`The first element has to withstand a limited load that is
`been described in detail so as not to obscure the present
`responsive to the pressure difference between the first and
`invention .
`second chamber .
`The subject matter regarded as the invention is particu - 25
`Contamination which is generated by the movement sys
`larly pointed out and distinctly claimed in the concluding
`tem ( for example , XY stage , XYZ stage , RO stage or ROZ
`portion of the specification . The invention , however , both as
`stage ) , by bearing and from plastic cables may be prevented
`to organization and method of operation , together with
`from reaching the first chamber due to a positive air flow
`objects , features , and advantages thereof , may best be under -
`formed by the first dynamic seal . The first dynamic seal can
`stood by reference to the following detailed description 30 be arranged to generate an air flow directed towards the
`second chamber and thus repel contamination from entering
`when read with the accompanying drawings .
`the first chamber .
`It will be appreciated that for simplicity and clarity of
`FIG . 1 illustrates a system 100 according to an embodi
`illustration , elements shown in the figures have not neces
`ment of the invention .
`sarily been drawn to scale . For example , the dimensions of
`System 100 includes a first chamber 110 , a second cham
`some of the elements may be exaggerated relative to other
`ber 120 , a chuck 130 , and a movement system 140 such as
`elements for clarity . Further , where considered appropriate ,
`an XYZ mechanical stage capable of moving the chuck 130
`reference numerals may be repeated among the figures to
`along three directions that are normal to each other .
`indicate corresponding or analogous elements .
`System 100 includes a housing that may include a first
`Because the illustrated embodiments of the present inven - 40 chamber housing 111 and a second chamber housing 121 . It
`is noted that the first and second chamber housings 111 and
`tion may , for the most part , be implemented using electronic
`components and modules known to those skilled in the art ,
`121 can share at least one structural element such as
`details will not be explained in any greater extent than that
`horizontal plates 125 that have the second surface 114
`considered necessary as illustrated above , for the under -
`The first chamber 110 may include :
`standing and appreciation of the underlying concepts of the 45
`a . A first element 112 that has a first surface 113 .
`present invention and in order not to obfuscate or distract
`. A first chamber housing 111 that includes a second
`from the teachings of the present invention .
`surface 114 .
`The assignment of the same reference numbers to various
`c . A supporting element 115 for supporting the chuck
`when the chuck is positioned within the first chamber .
`components may indicate that these components are similar
`to each other .
`d . A
`first dynamic seal 116 formed at a first interface
`Dual Chamber System
`( wherein the first and second surfaces 113 and 114 are
`There is provided a system that prevents sources of
`parallel and proximate to each other ) and is arranged to
`seal the first chamber 110 from the movement system
`contamination from contaminating an inspected substrate .
`The system includes a first chamber and a second chamber .
`140 .
`The first chamber can be located above the second chamber 55
`The second chamber 120 may include the movement
`but other spatial relationships between the chambers may
`system 140 and a movement control element 122 for
`mechanically coupling the first element 112 to the move
`exist .
`The substrate , during inspection or manufacturing pro
`ment system 140 .
`cesses , is located in the first chamber in which predeter
`The movement system 140 is arranged to introduce move
`mined conditions ( contamination level , vacuum level , tem - 60 ment between the ( a ) the first chamber housing 111 and the
`perature and the like ) are maintained even when the
`second chamber housing 121 , and ( b ) the first element 112
`substrate is moved in relation to a housing of the first
`and the chuck 130 .
`The first chamber 110 is illustrates in FIG . 1 as including
`chamber .
`The movement may be introduced by a movement system
`a column 170 of an inspection or review system . It is noted
`( such as mechanical stage ) located within the second cham - 65 that the first chamber 110 can include multiple inspection ,
`ber . Cables , control device and various other components
`metrology , review tools or can allow such tools to view the
`can be located within the second chamber in order to reduce
`substrate 10 ( for exampleby having a sealed window
`
`50
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`35
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`b
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`US 10 , 056 , 274 B2
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`The first surface 113 has an air bearing annular groove
`within the first chamber housing 111 ) . The first chamber 110
`505 , a first pressure ( in one embodiment , atmospheric pres
`can be used for manufacturing processes such as deposition ,
`deposition and the like .
`sure ) annular groove 507 , a second pressure ( in one embodi
`ment , relatively low vacuum ) annular groove 509 , and a
`FIG . 2 illustrates system 200 according to an embodiment
`third pressure ( in one embodiment , relatively high vacuum )
`of the invention . System 200 differs from system 100 by 5
`annular groove 511 . These elements provide the first
`including a load lock mechanism 210 for loading and
`dynamic seal 116 .
`unloading substrates from and to the first chamber 110 .
`In one embodiment , the grooves are arranged so that they
`System 200 also illustrates first and second chamber
`provide seals for increasing levels of vacuum going from
`pressure control elements 220 and 230 for controlling the
`pressure within each of the first and second chambers 110 10 outside the chamber to inside the chamber , so that the
`and 120 . The pressure control elements 220 and 230 may
`chamber in this embodiment is at a relatively high vacuum .
`include vacuum pumps , exhaust pumps , pressure valves ,
`However , it will be appreciated by those skilled in the art
`pressure sensors and the like . The pressures within the first
`that the arrangement of the grooves , and their order , will
`and second chambers may be equal to each other or may
`depend on the application , the relative pressure differential
`differ from each other .
`15 inside and outside the chamber , and the like . It also will be
`FIG . 2 also illustrates the first element 112 as including an
`appreciated that the number of grooves is not critical , but
`aperture 119 ( located in its center ) through which a support
`may be varied as desired .
`and movement control module 240 passes . The support and
`Each plenum , annular grooves 507 , 509 , and 511 , and its
`movement control module 240 includes the supporting ele -
`isolating land act to remove residual gas from the air bearing
`ment 115 and the movement control element 122 . Elements 20 annular groove 505 until the required level of isolation is
`115 and 122 may be connected to each other .
`achieved at the seal interface . One or more exhaust conduits
`The aperture 119 can be sealed by a flexible bellows or
`( not shown ) , which may be similar to the exhaust ports in the
`can be sealed by elements such as a second dynamic seal 124
`gas exhaust system disclosed in the commonly assigned U . S .
`that is formed at second interface between the aperture 119
`Pat . No . 6 , 163 , 033 , are coupled to each plenum to remove
`and the support and movement control module 240 .
`25 the residual gas . The conduits are connected to one or more
`FIG . 3 illustrates system 300 according to an embodiment
`vacuum pumps ( not shown ) . The vacuum pumps may be
`operated separately , or under the control of the system
`of the invention .
`System 300 differs from system 100 by allowing the first
`controller . The necessary number of plenum stages depends
`upon the level of vacuum required and the pumping rate of
`and second chambers to be maintained at the same pressure
`level by sharing at least one pressure control element 310 . 30 the vacuum pumps in conjunction with the precision of the
`Vacuum may be shared between both chambers and a
`air bearing gap .
`filtering element such as filters 320 ( or multiple filters ) may
`In another implementation , the groove structure 505 - 511
`be located between the first and second chambers 110 and
`is provided on the second surface 114 , rather than on the first
`120 in order to block contamination generated in the second
`surface . As discussed above , each plenum , vacuum annular
`35 grooves 507 , 509 , and 511 , and its isolating land act to
`chamber 120 to enter the first chamber 110 .
`The filtering elements may be positioned at an outlet of a
`remove residual gas from the air bearing annular groove 505
`pipe ( not shown ) that is connected to both chambers . The
`until the required level of isolation is achieved at the seal
`filtering element , additionally or alternatively , may be
`interface .
`located in a sealing plate or externally to the first and second
`The number of grooves and differ from four . The second
`40 dynamic seal 124 of FIG . 4 can resemble or be the same as
`chambers .
`FIG . 4 illustrates system 400 according to an embodiment
`the first dynamic seal 116 .
`Z - Stage Embodiments
`of the invention . System 400 differs from system 100 by
`having a second chamber 120 that is maintained at ambient
`According to various embodiments illustrated above the
`( atmospheric ) conditions and its second chamber housing
`movement system included a XYZ stage . It is noted that the
`121 may include one or more apertures ( such as 129 ) to the 45 different stages for moving the chuck along various direc
`tions can be separated from each other .
`environment that surrounds the system 400 .
`FIG . 6 illustrates system 600 in which a Z stage ( for
`First Dynamic Seal
`FIG . 5 illustrates the first dynamic seal 116 according to
`vertical movement ) 610 can be connected between the
`an embodiment of the invention . The first dynamic seal 116
`supporting element 115 and the movement control element
`is defined at a first interface 160 where the first surface 113 50 122 , be integrated within one of these elements ( 115 and
`122 ) or otherwise separated from the XY stage of the
`and the second surface 114 are close to each other .
`It is assumed that the first interface 160 has an annular
`movement system .
`shape . The first dynamic seal 116 includes an air bearing
`FIG . 6 illustrates Z stage 610 as being connected between
`annular groove 505 and an isolating land ( adjacent to the
`two parts of the movement control element 122 and is sealed
`groove ) to provide a relatively contactless seal between the 55 by a flexible metallic below 612 , to complete the sealing of
`first and second surfaces 113 and 114 with a film of gas .
`the second chamber 120 .
`One or more gas pumps ( not shown ) provide compressed
`FIG . 7 illustrates method 700 according to an embodi
`gas to the air bearing annular groove 505 via one or more gas
`ment of the invention .
`supply conduits ( not shown ) . In one embodiment , the gas
`Method 700 starts by stage 710 of placing a substrate on
`supply conduits may be an array of gas nozzles and flow 60 a chuck that is located within a first chamber of the system .
`restrictors similar to the gas supply system disclosed in the
`The system also includes a second chamber , and a move
`commonly assigned U . S . Pat . No . 6 , 163 , 033 . The one or
`ment system . The first chamber includes ( i ) a first element
`more gas pumps may be operated separately , or under
`that has a first surface , ( ii ) a first chamber housing that
`control of the above - mentioned system controller . The sec -
`includes a second surface , the first surface and the second
`ond surface 114 may be smooth , and in one embodiment , the 65 surface come into proximity with each other at a first
`first surface 113 is planar to enhance the low - friction char -
`interface , ( iii ) a supporting element for supporting the
`acteristic of the interface .
`chuck ; and ( iv ) a first dynamic seal formed at the first
`
`Case 6:20-cv-00636-ADA Document 92-5 Filed 03/31/21 Page 13 of 15
`
`

`

`US 10 , 056 , 274 B2
`
`circuitry or of logical representations convertible into physi
`interface and is arranged to seal the first chamber from the
`cal circuitry , such as in a hardware description language of
`movement system . The second chamber includes ( i ) a sec -
`any appropriate type .
`ond chamber housing ; a movement system that is arranged
`However , other modifications , variations and alternatives
`to introduce movement between ( a ) the first chamber hous .
`ing and ( b ) the first element and the chuck ; and a movement 5 are also possible . The specifications and drawings are ,
`accordingly , to be regarded in an illustrative rather than in a
`control element for mechanically coupling the first element
`restrictive sense .
`to the movement system .
`In the claims , any reference signs placed between paren
`Stage 710 is followed by stage 720 of applying an
`theses shall not be construed as limiting the claim . The word
`inspection or manufacturing process within the first chamber
`while sealing , by the first dynamic seal , the first chamber 10 “ comprising ' does not exclude the presence of other ele
`ments or steps then those listed in a claim . Furthermore , the
`from the second chamber . Thus , contaminants generated
`terms “ a ” or “ an , " as used herein , are defined as one or more
`within the second chamber are prevented from reaching the
`than one . Also , the use of introductory phrases such as “ at
`substrate .
`least one ” and “ one or more ” in the claims should not be
`The applying may include introducing movement , by the 15 construed to imply that the introduction of another claim
`movement system , between the substrate and the first cham
`element by the indefinite articles “ a ” or “ an ” limits any
`ber housing .
`particular claim containing such introduced claim element to
`??? -
`Stage 700 can be executed by any of the systems men inventions containing only one such element , even when the
`tioned above .
`same claim includes the introductory phrases " one or more ”
`In the foregoing specification , the invention has been 20 or “ at least one ” and indefinite articles such as “ a ” or “ an . ”
`described with reference to specific examples of embodi -
`The same holds true for the use of definite articles . Unless
`ments of the invention . It will , however , be evident that
`stated otherwise , terms such as “ first ” and “ second ” are used
`various modifications and changes may be made therein
`to arbitrarily distinguish between the elements such terms
`without departing