`
`IN THE UNITED STATES DISTRICT COURT
`FOR THE WESTERN DISTRICT OF TEXAS
`WACO DIVISION
`
`
`
`
`
`
`DEMARAY LLC,
`
`Plaintiff,
`
`v.
`
`INTEL CORPORATION,
`
`
`
`Defendant.
`
`
`
`
`
`
`
`DEMARAY LLC,
`
`Plaintiff,
`
`v.
`
`SAMSUNG ELECTRONICS CO., LTD (A
`KOREAN COMPANY), SAMSUNG
`ELECTRONICS AMERICA, INC.,
`SAMSUNG SEMICONDUCTOR, INC., and
`SAMSUNG AUSTIN SEMICONDUCTOR,
`LLC,
`
`
`
`Defendants.
`
`
`
`
`
`
`
`Case No. 6:20-cv-00634-ADA
`
`JURY TRIAL DEMANDED
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`
`
`
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`Case No. 6:20-cv-00636-ADA
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`JURY TRIAL DEMANDED
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`
`
`
`
`
`
`PLAINTIFF DEMARAY LLC’S
`REPLY CLAIM CONSTRUCTION BRIEF
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`10920342
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 2 of 15
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`TABLE OF CONTENTS
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`Page
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`I.
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`II.
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`“Substrate” (’657 Patent, cls. 1, 2, 7, 11; ’276 Patent, cls. 1, 2, 6, 10) ................................ 1
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`“Pulsed DC power” (’657 Patent, cls. 1, 2, 11; ’276 Patent, cls. 1, 6) ................................. 3
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`A.
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`B.
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`Defendants Seek To Add Limitations Requiring Constant Pulsing...................... 3
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`Defendants’ Attempt To Import Preset Parameters Should Be Rejected ............. 5
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`III.
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`“Narrow band rejection filter” (’657 Patent, cls. 1, 2, 20; ’276 Patent,
`cls. 1, 6) .................................................................................................................................. 7
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`IV.
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`“Reconditioning the target” (’657 Patent, cl. 1) ................................................................... 9
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`V.
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`“Substantially constant” (’276 Patent, cl. 10) ..................................................................... 10
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 3 of 15
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`TABLE OF AUTHORITIES
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`
`
`Page(s)
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`
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`Cases
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`Elbex Video, Ltd. v. Sensormatic Elecs. Corp.,
`508 F.3d 1366 (Fed. Cir. 2007)..................................................................................................8
`
`GPNE Corp. v. Apple Inc.,
`830 F.3d 1365 (Fed. Cir. 2016)................................................................................................10
`
`Phillips v. AWH Corp.,
`415 F.3d 1303 (Fed. Cir. 2005)..................................................................................................6
`
`ScriptPro LLC v. Innovation Assocs., Inc.,
`833 F.3d 1336 (Fed. Cir. 2016)..................................................................................................6
`
`
`
`---------------------------
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` *
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` Unless otherwise noted, internal citations and subsequent history are omitted, and emphasis is
`added.
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`The “Demaray Patents” are U.S. Patent Nos. 7,381,657 and 7,544,276 (“’657 patent” and “’276
`patent,” respectively) (Exs. 1-2). All exhibits are attached to the previously filed Declaration of C.
`Maclain Wells (“Wells”). Also referenced is the previously filed Declaration of Dr. Alexander
`Glew (“Glew”).
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 4 of 15
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`Defendants eschew established claim construction principles and, rather than engage with
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`the claim language itself, seek to import limitations into the claims based upon extrinsic evidence.
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`To the limited extent defendants cite the intrinsic record at all, they fail to identify any clear,
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`unambiguous statements giving rise to lexicography or disclaimers. For these reasons, the Court
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`should give the claim terms at issue the full scope of their plain and ordinary meaning.
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`I.
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`“Substrate” (’657 Patent, cls. 1, 2, 7, 11; ’276 Patent, cls. 1, 2, 6, 10)
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`Defendants admit “there appears to be no disagreement on what constitutes a ‘substrate’ in
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`practice.” Resp. 5. The term has a plain and ordinary meaning in the context of the patents and no
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`construction is needed. Defendants do not even attempt to dispute Demaray’s evidence that the
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`patents embrace all substrates, including those comprising insulating layers (see Br. 6; Ex. 1, 2:61–
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`62 (“substrate can be any material and, in some embodiments, is a silicon wafer.”)), nor do
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`defendants present any contrary intrinsic evidence. Defendants’ proposed construction is instead
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`patched together from cherry-picked, then edited, and then augmented, extrinsic definitions.
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`Rather than address the term in the full context of the claims, defendants only address an
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`“insulating substrate” in the preamble to claim 1 of the ’657 patent. Resp. 3 n.2. But defendants fail
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`to overcome the presumption that preambles are not limiting. Defendants do not disagree with
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`Demaray’s point that the body of claim 1 recites all the material steps of the invention independent
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`of the term “insulating substrate.” See, e.g., Ex. 1, cl. 1. Defendants’ argument that the preamble
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`was relied upon to distinguish the claims during prosecution is incorrect. The amendment to which
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`defendants point included “narrow band rejection filter” and “RF bias” limitations that the file
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`history makes clear were the basis for allowance. Ex. 4 at -2514–15. The applicants argued that
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`“claim 62 is allowable” because the prior art combination “does not teach or suggest the
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 5 of 15
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`combination of ‘providing pulsed DC power to the
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`target through a narrow band rejection filter such
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`that the target alternates between positive and
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`negative voltages’ and ‘providing an RF bias at a
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`frequency that corresponds to the narrow band
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`rejection filter to the substrate.’” Id. at -2518–20.
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`Nowhere in that exchange (for claim 62 or 85, which are now independent claims 1 and 2) did the
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`applicants rely on the term “insulating substrate” to distinguish the prior art.
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`In addition, recognizing that even in the context of the preamble their proposed
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`construction is fatally flawed, defendants now propose new, previously undisclosed additional
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`limitations: “base support structure … for example the entirety of a wafer and all layers on that
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`wafer.” Defendants argue that this convoluted addition is necessary because an “insulating
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`substrate” must be wholly insulating, “including all materials in the substrate if it is composed of
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`multiple materials” (e.g., all previously deposited films). Resp. 5. That is also incorrect. The
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`patents teach the use of both conductive and insulating elements in the production of “optical
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`devices and production of semiconductor devices … [that] hold promise for integrated optical and
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`electronic signal processing on a single semiconductor-like substance.” Ex. 1, 1:15–29. Indeed,
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`claim 1 of the ’657 patent calls for a “conductive target” of the type used in such products. Id., cl.
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`1. Defendants’ own dictionaries (Resp. 5) recognize that wafers and previously deposited thin-
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`films (i.e., the substrates for subsequent depositions) are used to form “the parts of an integrated
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`circuit,” which, by definition, need to include conductive elements. Defendants do not even
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`address preferred embodiments that involve substrates that include layers of insulating materials
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`deposited on top of other materials. Id., 7:62–65 (“[t]ypically, substrate 16 can be a silicon wafer or
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 6 of 15
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`a silicon wafer coated with a layer of silicon oxide ….”). The intrinsic record plainly does not
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`exclude substrates with insulating layers on top of conductive elements.
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`Indeed, defendants’ own citations defeat their new proposal. They cite portions of the
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`specification showing examples of an insulating substrate such as glass (Resp. 7 (citing Ex. 1, 2:63
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`& 7:65–8:1)), but the specification discusses glass substrates being used both with conductive
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`elements and being doped. Ex. 1, 2:61–65 (glass layer in semiconductor device), 1:37-43 (doping
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`glass). The example glasses include boro-aluminosilicate glasses (id., 7:65–8:4 (i.e., Corning
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`1737)) of the type commonly used with, e.g., transistor structures. See Br. 6. Defendants’
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`contention that claim differentiation applies (Resp. 6) is grammatical sleight of hand. The preamble
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`of ’657 patent, claim 2 refers to the type of thin-film deposited, not the nature of the substrate.
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`II.
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`“Pulsed DC power” (’657 Patent, cls. 1, 2, 11; ’276 Patent, cls. 1, 6)1
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`“Pulsed DC power” should be given its plain and ordinary meaning. The claim language
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`itself makes clear that the pulses of DC power “alternate[] between positive and negative
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`voltages.” This precisely tracks the specification and applicants’ statements during prosecution.
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`Defendants do not even attempt to dispute Demaray’s evidence that pulses of DC can take many
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`forms and that various parameters can change (Br. 9–10), nor do they present any contrary intrinsic
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`evidence. Defendants accuse Demaray of redrafting the claim to remove the “pulsed” limitation.
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`Resp. 8. Not so—Demaray’s proposal reflects the contextual claim language, which is not in
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`dispute, that the pulses “alternate[] between positive and negative voltages.” See, e.g., Ex. 1, cl. 1.
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`A.
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`Defendants Seek To Add Limitations Requiring Constant Pulsing
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`The patents disclose using occasional pulses of DC power that alternate between negative
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`and positive potentials, rather than continuous DC power, because “[d]uring the positive period,
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`1 Defendants do address “pulsed DC power supply” in their brief, confirming that the term
`needs no separate construction. Br. 12.
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`the insulating layer on the surface of target 12 is discharged and arcing is prevented.” Ex. 1, 5:39–
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`41; see Glew, ¶ 20. Defendants assert that this benefit can only be achieved by constant pulsing
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`(Resp. 12–15), but the patents teach otherwise. The patents explain that “[t]o obtain arc free
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`deposition, the pulsing frequency exceeds a critical frequency that depend on target material,
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`cathode current and reverse time.” Ex. 1, 5:41–45. When an arc is impending, the cathode current
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`increases and the voltage to the target decreases (see, e.g., Ou Ex. 18 at 113 (arc detection at
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`current threshold))—by monitoring one of these parameters and setting a threshold, pulses can be
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`provided as necessary (i.e., at a frequency that exceeds a critical frequency) to obtain arc free
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`deposition. For example, the patents identify the “AE Pinnacle Plus” as an example of a pulsed DC
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`power supply. Ex. 1, 5:46–48. Defendants offer a 2002 Pinnacle Plus manual as evidence that this
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`power supply required constant pulsing (Resp. 13–14)—but the manual states the opposite:
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`Ou Ex. 18 at 67 (annotated). Indeed, the manual states “pulsing at the current threshold” is its
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`“default setting.” Id. at 73. “If the unit is set to pulse at the current threshold, pulsing is disabled
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`until the Pinnacle Plus+ unit detects current flow above the current threshold. At this point the
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`unit will begin to pulse.” Id. Any construction requiring constant pulsing would exclude the
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`default setting in the exemplar power supply identified in the specification.
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`Defendants also attempt to classify pulsing of DC power at arc detection as “conventional
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`DC sputtering” because continuous DC power with power shut off at arc detection was allegedly
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`“conventional in the 1990s.” Resp. 7. First, the claims are not directed at pulsed DC power
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`standing alone and such power supplies in the art are not relevant to claim construction. Second,
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`some conventional DC power sources used pulses (e.g., with pulse width modulation of voltage),
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`but during the pulses the voltage remained at the same polarity. During prosecution the applicants
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`recognized that there were different possible definitions of “pulsed DC power” (e.g., when the
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`voltage maintains the same polarity and when polarity reverses). The applicants “explicitly defined
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`pulsed DC power to refer to power that oscillates between positive and negative voltages” in
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`contrast to pulsed DC power in which the “DC power can be shunted to ground so that the voltage
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`on the target was brought from a high negative voltage to near ground voltage” but with which
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`“the target remains at a negative voltage throughout the deposition.” Ex. 3 at -1305. This
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`exchange is consistent with the contextual language of the claims and Demaray’s proposal.
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`B.
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`Defendants’ Attempt To Import Preset Parameters Should Be Rejected
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`Defendants’ attempt to import a “square wave” limitation should be rejected. Defendants
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`state that “Pulsed DC Power Necessarily Has a Square Waveform” (Resp. 10), but do not actually
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`argue, let alone offer support, that square waves are the only suitable form of pulsed DC power.
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`The only evidence establishes that square waveforms are not required. Glew, ¶ 43. Defendants
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`instead argue that the “‘square wave’ shape was inextricably linked to the narrow band rejection
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`filter” during prosecution. Resp. 11. But, defendants do not identify any unambiguous disclaimer
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`of other waveforms or to lexicography through which the applicants defined “pulsed DC power” as
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`strictly limited to square waves. Id. Instead, defendants point to statements from Dr. Demaray that
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`the testing he performed involved a square wave. Id. (citing Ex. 4 at ¶ 3 (Pinnacle Plus “produced a
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`10 kW square wave ....”)). But claims are not limited to characteristics of example
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`implementations tested by inventors any more than by preferred embodiments in specifications.
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`Defendants’ proposal would also add needless complexity as they concede that the “square wave”
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`need not be “perfect.” Id. at 12. As with defendants’ other proposals—seeking to create non-
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`infringement arguments not supported by the claims as written—defendants’ rewriting of “pulsed
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`DC power” as “DC power in the form of a square wave” makes the language less clear.
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`Defendants’ attempt to add preset parameter requirements in order to exclude pulses of DC
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`power upon arc detection (Resp. 14–15) fares no better. First, defendants improperly seek to limit
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`the claims based on examples from the specification. The patents state that these examples are
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`“exemplary only and are not intended to be limiting.” Ex. 1, 22:59–67. And it is black letter law
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`that courts must “avoid importing limitations from the specification into the claims.” Phillips v.
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`AWH Corp., 415 F.3d 1303, 1323 (Fed. Cir. 2005). Further, the specification discusses alternatives
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`that use other parameters: “[t]o obtain arc free deposition, the pulsing frequency exceeds a critical
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`frequency that depend on target material, cathode current and reverse time.” Ex. 1, 5:41–45; see
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`also Ex. 15 at 1 (“If a system is pulsed, the power may either contain a periodic transient followed
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`by a return to steady state … the transient may be self-generated or may occur in response to a
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`plasma event, such as an arc.”). As discussed above, the cathode current begins to rise when an
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`arc is imminent. See Ex. 18 at 73 (threshold current used for arc detection). “[A] specification’s
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`focus on one particular embodiment or purpose cannot limit the described invention where that
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`specification expressly contemplates other embodiments or purposes.” ScriptPro LLC v.
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`Innovation Assocs., Inc., 833 F.3d 1336, 1341 (Fed. Cir. 2016).
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`Defendants’ inability to consistently identify the parameters in their proposed construction
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`underscores the impropriety of their approach. Regarding amplitude, defendants cite to a
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`discussion in the patents regarding the amplitude of the pulse during arc suppression that “‘allow[s]
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`charge neutralization of the surface of [the] target,’ thus ‘decreasing the rate of micro arcing.’”
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`Resp. 13 (citing Ex. 1, 12:15–21). Defendants then point to the “setpoint” in the manual for the
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`Pinnacle Plus, the power supply provided as an example in the patents, and claim that it “provided
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`its power at a set frequency, reverse time, and amplitude.” Id. (citing Ex. 18 at 4-19 and identifying
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`the “setpoint” as the amplitude). But, the setpoint for the Pinnacle Plus is the amplitude of the DC
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`power during sputtering, not the amplitude of the arc suppression pulse, and it does not determine
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`whether the voltage goes positive to provide the arc suppression benefits discussed in the patents.
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`Defendants also argue that the stated goal of “prevent[ing]” arcing excludes pulsing at arc
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`detection. Id. at 14. Beyond the fact that no such limitation appears in the claims, this makes no
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`sense. Extinguishing an arc when it is imminent constitutes “preventing” arcing. This is exactly
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`what is described in the Pinnacle Plus manual on which defendants rely. Ou Ex. 18 at 73 (“If the
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`unit is set to pulse at the current threshold … At this point the unit will begin to pulse.”).
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`Defendants also point to a disclosure in the patents: “the pulsing frequency exceeds a critical
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`frequency.” Resp. 13 (citing Ex. 1, 5:36-43). A POSITA would understand that this refers to
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`having arc suppression sufficiently frequent to prevent damage from arcing. Ou Ex. 15 (Glew Tr.)
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`at 172:22–25 (“It doesn’t necessarily mean that it’s at a fixed value. It’s just saying that you have
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`to refresh the positive at least this often in order to avoid arcing.”). When the system is configured
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`to pulse only when an arc is imminent, the “pulsing frequency” is as close as possible to that
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`critical frequency to maximize deposition time. Id. at 173:9–174:20. This does not require a fixed
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`time period between pulses. Regarding reverse time, the patents state: “[t]he reverse time on this
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`embodiment of power supply 14 can be adjusted between 0 and 5 μs.” Ex. 1, 5:53–55. At 0 μs, the
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`reverse time is not preset at zero (where there would be no arc suppression), it means voltage
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`should go positive and return to normal as quickly as possible. Ou Ex. 15 at 176:22–178:20.
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`III.
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`“Narrow band rejection filter” (’657 Patent, cls. 1, 2, 20; ’276 Patent, cls. 1, 6)
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`Despite defendants’ ever-changing construction changed on the eve of this brief, the only
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`dispute defendants raise on this term is whether the construction of narrow band rejection filter
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`should address frequencies passed in addition to those rejected. Resp. 15. Rejecting and passing
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 11 of 15
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`frequencies are different subjects, and adding extraneous “passing” limitations would be improper.
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`Defendants’ proposal that “[substantially] all frequencies outside of the narrow band” must be
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`passed is not required by the term’s plain meaning. Contextual claim language provides, for
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`example, that the filter “rejects at a frequency of the RF bias power supply” (Ex. 2 (’276 Patent),
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`cl. 1), “operat[es] at a frequency of the RF bias power supply” (id., cl. 2), and an “RF bias [at a
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`frequency] that corresponds to the narrow band rejection filter” (Ex. 1 (’657 Patent), cls. 1, 2). The
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`specifications similarly focus on the frequency rejected: “[f]ilter 15 prevents the bias power from
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`power supply 18 from coupling into pulsed DC power supply 14.” Id., 5:56–65.
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`Defendants point to examples from the prosecution history about the filter passing
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`frequencies, but fail to identify any statements giving rise to lexicography or prosecution
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`disclaimer. See Resp. 15–16. Although defendants cite basic prosecution disclaimer caselaw, they
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`never point to any passages having the “clarity and deliberateness” required for disclaimer under
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`that law. Notably, here, the applicants discussed the claimed filter without any reference
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`whatsoever to “passing” See, e.g., Ex. 4 (’657 FH) at -2521 (“A filter that blocks too many of the
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`constituent frequencies of the pulsed DC waveform results in the target voltage not attaining a
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`positive voltage. A filter that does not block the RF bias voltage can result in failure of the DC
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`power supply.”); Ou Ex. 3 (’356 FH) at 1457 (similar); 1302 (“The band rejection filter is arranged
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`to reject RF power at the frequency of the RF bias to the substrate.”). Neither the prosecution
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`history nor specification supports adding the new limitation urged by defendants. See Elbex Video,
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`Ltd. v. Sensormatic Elecs. Corp., 508 F.3d 1366, 1372 (Fed. Cir. 2007) (no “clear and
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`unmistakable” disclaimer when unsupported by specification and prosecution history as a whole).
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`Defendants also contend their proposal is appropriate to prevent Demaray from arguing
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`that a filter which “rejects … additional frequencies outside that band could still be a NBRF.”
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`Resp. 15. The term (and Demaray’s construction) defines rejection in a “narrowband,” not mere
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`broadband rejection typically seen with, e.g., low-pass or high-pass filters alone. See, e.g., Ex. 3
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`(’356 FH) at -1302 (distinguishing a narrow band rejection filter from “a conventional high or low
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`pass filter”). That said, this is a “comprising” claim and a filter that is directed at rejecting
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`frequencies in narrowband, but that is also engineered to do other things as well (e.g., a dual-notch
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`filter rejecting at a second frequency), certainly be encompassed by the claim term.
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`Defendants deny that they are attempting to capture prior art in redefining contextual
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`language (i.e., “operating at,” “corresponds to,” “rejects at”), but in response offer only
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`mischaracterizations of the prior art disclosures and misreading of the claim language. See Resp.
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`18. As Demaray explained, Hirose (cited in the IPRs) affirmatively seeks to offset its filter from
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`the frequency of the RF power supply. Contrary to defendants’ misrepresentation, Dr. Glew did not
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`agree that Hirose discloses a narrow band rejection filter that “corresponds to,” “rejects at”, or is
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`“operating at” a frequency of the RF bias power supply. Ou Ex. 19, ¶ 78 (“a narrow band rejection
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`filter, which filter circuit 20 [in Hirose] is not” and filter circuit 20 is “more than 10% shift[ed]
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`from the frequency of the RF power supply”). Defendants also argue that this contextual language
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`should be redefined because the narrowband rejection filter attenuates more than a single
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`frequency. Resp. 17. The specification is clear that the filter is set to correspond to the RF bias
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`frequency and attenuates signals at that frequency and within the narrowband and thus “prevents
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`the bias power from power supply 18 from coupling into pulsed DC power supply 14.” Id., 5:56–
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`65. This is reflected in the claim language as written but not in defendants’ rewrites.
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`IV.
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`“Reconditioning the target” (’657 Patent, cl. 1)
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`There is no requirement in the claims, specification, or elsewhere that reconditioning
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`happen “between depositions.” “Reconditioning the target” is instead described as “includ[ing]
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`reactive sputtering in the metallic mode and then reactive sputtering in the poison mode.” Ex. 1, cl.
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`1; see also id., 17:10–11; 18:11–15, 20:54–55. Defendants argue there is a distinction between
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`“reconditioning” and “conditioning” based on claim 1 of the parent ’356 patent. Resp. 19. First, the
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`term “conditioning” appears nowhere in the ’657 patent claims, and the specification makes no
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`such distinction. Id., 20:52–55 (“recondition process … to condition target 12.”); see GPNE Corp.
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`v. Apple Inc., 830 F.3d 1365, 1370–71 (Fed. Cir. 2016) (declining to apply claim differentiation
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`based on parent patent). Second, even if there was a difference, reconditioning does not require a
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`prior deposition; for example, the target can require cleaning even after its initial setup.
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`Regarding the “metallic” and “poison” modes that make up the reconditioning process,
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`Demaray’s proposals closely track the specification. Ex. 1, 11:27–37; 11:66–12:9. Defendants’
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`suggestion that these terms do not require construction, but that other far more readily
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`understandable claim terms do, makes no sense. Defendants do not argue that Demaray’s proposal
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`is inconsistent with the plain and ordinary meaning of the claim terms. They merely point out other
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`purported characterizations in the specification. Resp. 19. But claim construction is not about
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`importing every callout from the specification into the claims. Demaray’s constructions would help
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`jurors understand technical terms they never would have encountered, and they should be adopted.
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`V.
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`“Substantially constant” (’276 Patent, cl. 10)
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`Defendants attempt to require that the substrate achieve a homogenous temperature at a
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`predefined set point. These new requirements are extraneous, as there is no basis in the claims
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`for them. In addition, they are technologically unfounded. Substrates do not typically have
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`uniform temperatures. See Glew, ¶ 71; Ou Ex. 15 (Glew Tr.) at 278:4–5 (“the edges are almost
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`always colder than the center.”). Defendants’ extrinsic evidence does not hold otherwise. See Ou
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`Ex. 21, 2:2–3 (“it is not easy to control the wall surface temperature”), 2:48–53 (contemplating
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`controlling temperature of “top plate installed opposite to the sample”).
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 14 of 15
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`Dated: March 19, 2021
`
`/s/ C. Maclain Wells
` By: C. Maclain Wells
`
`Richard D. Milvenan
`State Bar No. 14171800
`Travis C. Barton
`State Bar No. 00790276
`MCGINNIS LOCHRIDGE LLP
`600 Congress Ave., Suite 2100
`Austin, Texas 78701
`Telephone: (512) 495-6005
`Facsimile: (512) 505-6305
`rmilvenan@mcginnislaw.com
`tcbarton@mcginnislaw.com
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`Morgan Chu (pro hac vice)
`Benjamin W. Hattenbach (pro hac vice)
`Annita Zhong (pro hac vice)
`C. Maclain Wells (pro hac vice)
`IRELL & MANELLA LLP
`1800 Avenue of the Stars, Suite 900
`Los Angeles, California 90067
`Telephone: (310) 277-1010
`Facsimile: (310) 203-7199
`mchu@irell.com
`bhattenbach@irell.com
`azhong@irell.com
`mwells@irell.com
`
`Darish Huynh (pro hac vice)
`IRELL & MANELLA LLP
`840 Newport Center Drive, Suite 400
`Newport Beach, CA 92660
`Telephone: (949) 760-0991
`Facsimile: (949) 760-5200
`dhuynh@irell.com
`Attorneys for Demaray LLC
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`Case 6:20-cv-00636-ADA Document 83 Filed 03/19/21 Page 15 of 15
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`CERTIFICATE OF SERVICE
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`The undersigned certifies that on March 19, 2021 all counsel of record who are deemed
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`to have consented to electronic service are being served with a copy of this document via the
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`Court’s CM/ECF system.
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`By: /s/ Darish Huynh
`Darish Huynh
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