Case 6:20-cv-00636-ADA Document 252 Filed 11/21/22 Page 1 of 47
`
`Exhibit 6
`in support of the Declaration
`of Kat Li
`
`

`

`US007544276B2
`
`(12) United States Patent
`Zhang et al.
`
`(10) Patent No.:
`(45) Date of Patent:
`
`US 7,544,276 B2
`Jun. 9, 2009
`
`(54) BIASED PULSE DC REACTIVE SPUTTERING
`OF OXDE FILMS
`
`(75) Inventors: Hongmei Zhang, San Jose, CA (US);
`Mukundan Narasimhan, San Jose, CA
`(US); Ravi B. Mullapudi, San Jose, CA
`(US); Richard E. Demaray, Portola
`Valley, CA (US)
`73) Assignee: Spring Works, LLC, Minnetonka, MN
`9.
`pring
`(US)
`Subject to any disclaimer, the term of this
`y
`patent is extended or adjusted under 35
`U.S.C. 154(b) by 529 days.
`(21) Appl. No.: 11/228,834
`(22) Filed:
`Sep. 16, 2005
`
`*) Notice:
`
`(65)
`
`Prior Publication Data
`US 2006/OO54496 A1
`Mar. 16, 2006
`
`Related U.S. Application Data
`(62) Division of application No. 10/101,863, filed on Mar.
`16, 2002, now Pat. No. 7,378,356.
`(51) Int. Cl.
`(2006.01)
`C23C I4/34
`(52) U.S. Cl. .............................. 204/298.08; 204/298.2:
`204/298.06
`(58) Field of Classification Search .............. 204/298.2,
`204/298.06, 298.08
`See application file for complete search history.
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`Primary Examiner Rodney G McDonald
`(74) Attorney, Agent, or Firm—Finnegan, Henderson,
`Farabow, Garrett & Dunner, LLP
`
`(57)
`
`ABSTRACT
`
`A biased pulse DC reactor for sputtering of oxide films is
`presented. The biased pulse DC reactor couples pulsed DC at
`a particular frequency to the target through a filter which
`filters out the effects of a bias power applied to the substrate,
`protecting the pulsed DC power supply. Films deposited uti
`lizing the reactor have controllable material properties Such
`as the index of refraction. Optical components such as
`waveguide amplifiers and multiplexers can be fabricated
`using processes performed on a reactor according to the
`present invention.
`
`13 Claims, 27 Drawing Sheets
`
`Case 6:20-cv-00636-ADA Document 252 Filed 11/21/22 Page 2 of 47
`
`18
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