throbber
Declaration of Rachel J. Watters on Authentication of Publication
`
`I, Rachel J, Watters, am a librarian, and the Head of Resource Sharing for the
`
`General Library System, Memorial Library, located at 728 State Street, Madison,
`
`Wisconsin, 53706. Part of my job responsibilities include oversight of Wisconsin
`
`TechSearch (“WTS”), an interlibrary loan department at the University of Wisconsin-
`
`Madison.
`
`| have workedasa librarian at the University of Wisconsin library system
`
`since 1998, starting as a graduate student employee in the Kurt F. Wendt Engineering
`
`Library and WTS, then as a librarian in Interlibrary Loan at Memorial Library.
`
`I began
`
`professional employment at WTS in 2002 and became WTSDirector in 2011.
`
`In 2019,
`
`] became of Head of Resource Sharing for UW-Madison’s General Library System.
`
`|
`
`have a master’s degree in Library and Information Studies from the University of
`
`Wisconsin-Madison. Through the course of my studies and employment, [ have
`
`become well informed about the operations of the University of Wisconsin library
`
`system, which follows standard library practices.
`
`This Declaration relates to the dates of receipt and availability of the following:
`
`Wolf, S. (1995). Silicon Processingfor the VLSI Era, Volume 3:
`The submicron MOSFET, Sunset Beach, CA: Lattice Press.
`
`
`
`Standard operating procedures for materials at the University of Wisconsin-
`
`Madison Libraries, When a volume was received by the Library, it would be checked
`
`in, addedto library holdings records, and made available to readers as soonafterits
`
`arrival as possible. The procedure normally took a few days or at most 2 to 3 weeks.
`
`Dell Ex. 1013
`
`Page 1
`
`Dell Ex. 1013
`Page 1
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`Exhibit A to this Declarationis a true and accurate copy ofthe front and back
`
`covers, front matter, and back inside cover of the Silicon Processingfor the VLSI Era.
`
`Volume 3: The submicron MOSFET(1995) publication, which includes a stamp onthe
`
`inside back cover showingthat this book is the property of the Kurt F. Wendt Library at
`
`the University of Wisconsin-Madison.
`
`Attached as Exhibit B is the cataloging system record of the University of
`
`Wisconsin-MadisonLibraries for its copy of the Silicon Processingfor the VLSI Era.
`
`Volume 3: The submicron MOSFET(1995) publication. As shown in the “Receiving
`
`date” field of this Exhibit, the University of Wisconsin-Madison Libraries ownedthis
`
`book and hadit cataloged in the system as of February 2, 2002.
`
`Membersofthe interested public could locate the Silicon Processingfor the VLSI
`
`Era. Volume 3: The submicron MOSFET(1995) publication after it was cataloged by
`
`searching the publiclibrary catalog or requesting a search through WTS. The search
`
`could be done bytitle, author, and/or subject key words. Membersofthe interested
`
`public could access the publication by locating it on the library’s shelves or requestingit
`
`from WTS.
`
`[ declare that all statements made herein of my own knowledgeare true and that
`
`all statements made on information and belief are believed to be true; and further that
`
`these statements were made with the knowledgethat willful false statements andthe like
`
`Dell Ex. 1013
`
`Page 2
`
`Dell Ex. 1013
`Page 2
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`so made are punishable by fine or imprisonment, or both, under Section 1001 of Title 18
`
`of the United States Code.
`
`Date: October 25, 2022
`
`Memorial Library
`728 State Street
`Madison, Wisconsin 53706
`
`J. Watters
`R
`Head of Resource Sharing
`
`Dell Ex. 1013
`
`Page 3
`
`Dell Ex. 1013
`Page 3
`
`

`

`
`
`
`
`
`
`
`EXHIBIT A
`EXHIBIT A
`
`
`Dell Ex. 1013
`Page 4
`
`

`

`for the VLSI Era
`Volume3 - The Submicron MOSFET
`
`
`
`Silicon Processing
`
`Page 5
`
`Dell Ex.1013
`
`Dell Ex. 1013
`Page 5
`
`

`

`RieeesRe
`
`earoyhatertTeal0i]1aiaele)eit[ea]Ermery
`
`clo)PeeaeyaaeeeeCeCeamT:
`
`;eterssteetmecrayeT)iSTScatanet
`
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`ateteitorMe;:LefTeeeToiare[eesmotoll
`a
`aesiedeepaApaceaMTsaeBatebyBeat=Pecaola
`eae]|)Te:|iPe)ey
`HlSeteaeeaweee
`ELAMMetshitsmC)eeeee
`
`ABojouysa,sseo01g-|BWNjoO,
`
`Ta}bL:Ble)U0)mectsr-
`CmteClmomenMeErptmmTaRTa)
`
`retaenN
`
`ere
`
`eyeCes
`
`crea
`
`
`
`AJIOMADINVLSAg
`
`esimeice
`
`SeeCe]ae
`
`Dell Ex. 1013
`
`
`
`
`
`LAYSOWUoudIluqnsay]-€SLUN|OA
`
`Acdsee
`
`JOM'S
`
`fa)
`
`i
`
`e VLSI Er
`
`a
`
`WISELOSo90eea
`
`SERee
`
`Dell Ex. 1013
`Page 6
`
`

`

`SILICON PROCESSING
`
`FOR
`
`THE VLSI ERA
`
`VOLUME 3:
`
`THE SUBMICRON MOSFET
`
`STANLEY WOLF Ph.D.
`Professor, Department of Electrical Engineering
`California State University, Long Beach
`Long Beach, California
`
`LATTICE PRESS
`
`Sunset Beach, California
`
`
`Dell Ex. 1013
`
`Page 7
`
`Dell Ex. 1013
`Page 7
`
`

`

` DISCLAIMER
`
`This publication is based on sources and informationbelievedto be reliable, but the
`authors and Lattice Press disclaim any warranty or liability based on orrelating to the
`contents ofthis publication.
`
`Published by:
`
`Latlice Press,
`Post Office Box 340
`Sunset Beach, California 90742, U.S.A.
`
`Cover design by Roy Montibon, Visionary Art Resources, Inc., Los Angeles, CA.
`Copyright © 1995 by Lattice Press.
`All rights reserved. Nopart ofthis book may be reproduced or transmitted in any form
`or by any means, electronic or mechanical, including photocopying, recording or by any
`informationstorage and retrieval system without written permission from the publisher,
`exceptfor the inclusion of brief quotations in a review,
`
`Library of Congress Cataloging in Publication Data
`Wolf, Stanley
`
`Silicon Processing for the VLSI Era
`Volume 3: The Submicron MOSFET
`
`Includes Index
`1. Integratedcircuits-Very large scale
`integration, 2. Silicon.
`I, Title
`
`ISBN 0-961672-5-3
`
`98765432
`
`PRINTED IN THE UNITED STATES OF AMERICA
`
`
`
`|
`
`|
`
`Dell Ex. 1013
`
`Page 8
`
`Dell Ex. 1013
`Page 8
`
`

`

` ege6lSS990684
`
`(OUINOOIEL
`
`SLETSSTIOLP
`
`Dell Ex. 1013
`
`Page 9
`
`Dell Ex. 1013
`Page 9
`
`

`

`
`
`
`
`EXHIBIT B
`EXHIBIT B
`
`
`Dell Ex. 1013
`Page 10
`
`

`

`10/25/22, 10:10 AM
`
`Physical Item Editor
`
`Manage Patron Services
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`| Scan In Items
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`Resource
`description
`
`Silicon processing for the VLSI era / Stanley Wolf, Richard N. Tauber. Wolf, Stanley, 1943- Lattice Press, Sunse
` K
`t Beach, Calif. : c1986- [0961672153 (v. 3)]
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`https://wisconsin-madison.alma.exlibrisgroup.com/ng/page;u=%2Frep%2Faction%2FpageAction.resource_editor.physical.item_general.xml.do%
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`10/25/22, 10:10 AM
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`
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`Storage location ID(cid:632)
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`
`/2
`
`Dell Ex. 1013
`Page 12
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`!, Rachel J, Watters, ama librarian, and the Head of Resource Sharing forthe
`
`General Library System, Memorial Library, located at 728 State Street, Madison,
`
`Wisconsin, 53706. Part of my job responsibilities include oversight of Wisconsin
`
`TechSearch (“WTS”), aninterlibrary loan department at the University of Wisconsin-
`
`Madison.
`
`| have workedasa librarian at the University of Wisconsin library system
`
`since 1998, starting as a graduate student employee in the Kurt F. Wendt Engineering
`
`Library and WTS,then as a librarian in Interlibrary Loan at Memorial Library.
`
`I began
`
`professional employment at WTS in 2002 and became WTSDirector in 2011.
`
`In 2019,
`
`I became of Head of Resource Sharing for UW-Madison’s General Library System.
`
`|
`
`have a master’s degree in Library and Information Studies from the University of
`
`Wisconsin-Madison, Through the course of my studies and employment, I have
`
`become well informed about the operations of the University of Wisconsin library
`
`system, which follows standard library practices.
`
`This Declaration relates to the dates of receipt and availability of the following:
`
`Wolf, Stanley and Tauber, Richard N. (2002). Silicon Processing
`for the VLSI Era. Volume 4: Deep-submicron process technology.
`Sunset Beach, CA: Lattice Press.
`
`Standard operating
`
`
`
`
`
`procedures for materials at the University of Wisconsin-
`
`Madison Libraries, When an issue was received by the Library, it would be checkedin,
`
`stamped with the date of receipt, added to library holdings records, and made available
`
`Dell Ex. 1013
`
`Page 13
`
`Dell Ex. 1013
`Page 13
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`to readers as soon afterits arrival as possible. The procedure normally took a few days
`
`or at most 2 to 3 weeks.
`
`Exhibit A to this Declaration is a true and accurate copy of the front matter ofthe
`
`Silicon Processingfor the VLSI Era. Volume 4: Deep-submicron process technology
`
`(2002) publication, which includes a stamp onthetitle page showingthat this bookis
`
`the property of the General Library System at the University of Wisconsin-Madison.
`
`Exhibit A also includes a true and accurate copy of a front matter verso page with
`
`library date stamp ofSilicon Processingfor the VLSI Era. Volume 4: Deep-submicron
`
`process technology (2002), from the University of Wisconsin-Madison Library
`
`collection. Based on this information, the date stamp on the front matter verso page
`
`indicates Silicon Processingfor the VLSI Era. Volume 4: Deep-submicron process
`
`technology(2002) was received by the General Library System, University of
`
`Wisconsin-Madison Libraries on November 26, 2002.
`
`Based on the information in Exhibit A,it is clear that the volume wasreceived by
`
`the library on or before November 26, 2002, catalogued and available to library patrons
`
`within a few days or at most 2 to 3 weeks after November 26, 2002.
`
`Membersof the interested public could locate the Silicon Processingfor the VLSI
`
`Era. Volume 4: Deep-submicron process technology(2002) publicationafter it was
`
`cataloged by searching the public library catalog or requesting a search through WTS.
`
`The search could be donebytitle, author, and/or subject key words. Members of the
`
`2
`
`Dell Ex. 1013
`
`Page 14
`
`Dell Ex. 1013
`Page 14
`
`

`

`Declaration of Rachel J, Watters on Authentication of Publication
`
`interested public could access the publication by locating it on the library’s shelves or
`
`requesting it from WTS.
`
`I declare that all statements made herein of my own knowledgearetrue and that
`
`all statements made oninformation and belief are believed to be true; and furtherthat
`
`these statements were made with the knowledge that willful false statements and the like
`
`so madeare punishable by fine or imprisonment, or both, under Section 1001 of Title 18
`
`of the United States Code.
`
` Date: October 21, 2022
`
`
`J. Watters
`Head
`of Resource Sharing
`
`
`Memorial Library
`728 State Street
`Madison, Wisconsin 53706
`
`Dell Ex. 1013
`
`Page 15
`
`Dell Ex. 1013
`Page 15
`
`

`

`
`
`
`
`
`
`
`EXHIBIT A
`EXHIBIT A
`
`
`Dell Ex. 1013
`Page 16
`
`

`

`FLEELILPOLT
`
`wooswitli
`
`pl8l
`
`hie)
`
`a)Wt
`
`ater
`
`d04
`
`Blas
`
`Sa
`
`iiteb|
`
`va
`
`
`
`iTSLBDTe)vaceesses0esa
`
`Dell Ex. 1013
`Page 17
`
`

`

`(AMIN srr
`WV IER,
`
`Dell Ex. 1013
`
`Page 18
`
`Dell Ex. 1013
`Page 18
`
`

`

`THE VLSI ERA
`
`VOLUME 4:
`
`DEEP-SUBMICRON PROCESS TECHNOLOGY
`
`
`
`SILICON PROCESSING
`
`FOR
`
`
`
`Dell Ex. 1013
`
`Page 19
`
`Dell Ex. 1013
`Page 19
`
`

`

`SILICON PROCESSING
`
`FOR
`
`THE VLSI ERA
`
`VOLUME4:
`
`DEEP-SUBMICRON
`PROCESS TECHNOLOGY
`
`STANLEY WOLF Ph.D.
`
`LATTICE PRESS
`
`Sunset Beach, California
`
`
`
`Dell Ex. 1013
`
`Page 20
`
`Dell Ex. 1013
`Page 20
`
`

`

`DISCLAIMER
`
`This publication is based on sources and information believed to be reliable, but the
`authors and Lattice Press disclaim any warranty orliability based on or relating tothe
`contents of this publication,
`
`Published by:
`
`LATTICE PRESS
`Post Office Box 340
`Sunset Beach, California 90742, U.S.A.
`
`Cover design by: S.C. Ross Wolf.
`
`Copyright © 2002 by Lattice Press.
`All rights reserved. No part ofthis book may be reproduced or transmitted in any form
`or by any means,electronic or mechanical, including photocopying, recording or by any
`information Storage and retrieval system without written permission from the publisher,
`exceptfor the inclusion of brief quotationsin a review,
`Library of Congress Cataloging in Publication Data
`Wolf, Stanley
`
`Silicon Processing for the VLSI Era
`Volume 4: Deep-Submicron Process Technology
`Includes Index
`1. Integrated circuits-Very large scale
`integration, 2, Silicon.
`I, Title
`
`ISBN 0-9616721-7-X
`
`987654321]
`
`PRINTED IN THE UNITED STATES OF AMERICA
`
`
`
`Dell Ex. 1013
`
`Page 21
`
`Dell Ex. 1013
`Page 21
`
`

`

`
`
`=
`
`A
`
`MASTER TABLE OF CONTENTS
`
`PREFACE
`
`Chap. 1 - THE EVOLUTION OF THE STRUCTURE OF MOSFETS
`Chap. 2 - 300-MM SILICON WAFERS
`
`Chap. 3 - GATE DIELECTRICS: THIN GATE OXIDES
`
`Chap. 4 - HIGH-A DIELECTRICS
`Chap. 5 - THE STRUCTURE OF DEEP-SUBMICRON MOSFETS:
`181
`Retrograde-Wells; Super-Steep Retrograde Channel Doping;
`Drain Engineering; Punchthrough-Control Implants
`
`145
`
`Chap. 6 - DEEP-SUBMICRON LITHOGRAPHYI: PHOTORESISTS
`
`Chap. 7 - DEEP-SUBMICRON LITHOGRAPHYIl:
`OPTICS AND HARDWARE
`
`Chap. 8 - CHEMICAL MECHANICAL POLISHING (CMP)
`
`Chap. 9 - SHALLOW TRENCH ISOLATION (STI)
`
`Chap. 10 - SILICON-GERMANIUM (Si-Ge) TECHNOLOGY
`FOR HIGH-PERFORMANCE TELECOMMUNICATIONSICs
`
`Chap. 11 - SILICON-ON-INSULATOR (SOI) TECHNOLOGY
`
`Chap. 12 - MULTILEVEL INTERCONNECTS FOR ULSI
`Chap. 13 - POLYCIDES AND SALICIDES OF TISI,, CoSi, AND NiSi
`Chap. 14 - LOW-A DIELECTRICS
`Chap. 15 - DUAL-DAMASCENE INTERCONNECTS
`Chap. 16 - COPPER INTERCONNECT PROCESS TECHNOLOGY
`
`INDEX
`
`227
`
`299
`
`313
`
`433
`
`475
`
`501
`
`573
`
`603
`
`639
`
`671
`
`711
`
`795
`
`Dell Ex. 1013
`
`Page 22
`
`Dell Ex. 1013
`Page 22
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`I, Rachel J. Watters, ama librarian, and the Head of Resource Sharing for the
`
`General Library System, Memorial Library, located at 728 State Street, Madison,
`
`Wisconsin, 53706. Part of my job responsibilities include oversight of Wisconsin
`
`TechSearch (“WTS”), an interlibrary loan departmentat the University of Wisconsin-
`
`Madison.
`
`I have worked as a librarian at the University of Wisconsin library system
`
`since 1998, starting as a graduate student employee in the Kurt F, Wendt Engineering
`
`
`
`Library and WTS, then asalibrarian in Interlibrary Loan at Memorial Library. | began
`
`professional employment at WTS in 2002 and became WTS Director in 2011.
`
`In 2019,
`
`I became of Head of Resource Sharing for UW-Madison’s General Library System.
`
`I
`
`have a master’s degree in Library and Information Studies from the University of
`
`Wisconsin-Madison. Through the course of my studies and employment, | have
`
`become well informed about the operations of the University of Wisconsin library
`
`system, which follows standard library practices.
`
`This Declaration relates to the dates of receipt and availability of the following:
`
`Streetman, Ben G. and Banerjee, Sanjay. (2000). Solid State
`Electronic Devices. Upper Saddle River, NJ: Prentice Hall.
`
`
`rocedures for materials at the University of Wisconsin-
`
`Madison Libraries. When a book wasreceived by the Library, it would be checked in,
`
`addedto library holdings records, and made available to readers as soonafterits arrival
`
`as possible. The procedure normally took a few days or at most 2 to 3 weeks.
`
`Dell Ex. 1013
`
`Page 23
`
`Dell Ex. 1013
`Page 23
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`Exhibit A to this Declaration is true and accurate copy ofthe front matter of the
`
`Solid State Electronic Devices (2000) publication, which includes a stamp on the verso
`
`page showingthat this bookis the property of the General Library System at the
`
`University of Wisconsin-Madison.
`
`Attached as Exhibit B is the cataloging system record of the University of
`
`Wisconsin-Madison Libraries for its copy of the So/id State Electronic Devices (2000)
`
`publication. As shown in the “Receiving date”field of this Exhibit, the University of
`
`Wisconsin-Madison Libraries ownedthis book and had it cataloged in the system as of
`
`January 22, 2004.
`
`Membersofthe interested public could locate the Solid State Electronic Devices
`
`(2000) publication after it was cataloged by searching the public library catalog or
`
`requesting a search through WTS. The search could be donebytitle, author, and/or
`
`subject key words. Membersof the interested public could access the publication by
`
`locating it on the library’s shelves or requesting it from WTS.
`
`I declare that all statements made herein of my own knowledgeare true and that
`
`all statements made on information and belief are believed to be true; and furtherthat
`
`these statements were madewith the knowledgethat willful false statements and the like
`
`so made are punishable by fine or imprisonment, or both, under Section 1001 of Title 18
`
`of the United States Code.
`
`Dell Ex. 1013
`
`Page 24
`
`Dell Ex. 1013
`Page 24
`
`

`

`Declaration of Rachel J. Watters on Authentication of Publication
`
`Date: October 14, 2022
`
`Memorial Library
`728 State Street
`Madison, Wisconsin 53706
`
`
` J. Watters
`
`of Resource Sharing
`
`Dell Ex. 1013
`
`Page 25
`
`Dell Ex. 1013
`Page 25
`
`

`

`
`
`
`
`
`
`
`EXHIBIT A
`EXHIBIT A
`
`
`Page 26
`
`Dell Ex. 1013
`Page 26
`
`

`

`FIFTH EDITION
`
`|a;iCL
`
`UAL
`EURODEVICE
`
`Page 27
`
`BEN G. STREETMAN = SANJAY BANERJEE
`
`Prentice Hall Series in Solid State Physical Electronics, Nick Holonyak, Jr., Series Editor
`
`Dell Ex. 1013
`
`Dell Ex. 1013
`Page 27
`
`

`

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`Dell Ex. 1013
`
`Dell Ex. 1013
`Page 28
`
`

`

`incorporates the basics of semiconductor materials and conduction processesin solids
`needed to understandp-n junctions, bipolar and metal oxide semiconductor (MOS)
`transistors, optoelectronic and other devices.
`greatly expanded and updated discussion of device fabrication processes and CMOSintegrated
`circuit technology, along with new data in the Appendices, provides a useful understanding
`of how semiconductor devices are made.
`extensive discussion of circuit and other application examples to provide students with feedback
`aboutthe practical relevanceof the tea
`completely updated discussion af MOSdevices, both in the underlying theory as well as
`discussion of short channel, high field and hot carrier effects in scaled MOSFETs, recognizing
`the current preponderance of CMOS.
`updated, consolidated treatment of optoelectronic devices, including sources such as blue
`GaN-based LEDs and semiconductor vertical-cavity surface-emitting lasers, as well as detectors
`such as avalanche and resonant-cavity photodiodes.
`includesa listing of the key equations for semiconductor devices onthe inside covers of the book,
`arranged thematically to help students digest the concepts.
`about 200 problems and current references which extend conceptsin the text.
`
`Page 29
`
`Te is the fifth edition of the most widely used introductory book on semiggug
`physics, devices and technology. Previous editions have beentranslated
`and Polish. The book was written with two basic goals in mind: 1) develop t
`physics concepts to understand current and future devices; 2) provide a sou
`of current semiconductor devices and technology so that their applications
`optoelectronic circuits and systems can be appreciated.
`
`seeveoal
`ASOEBLIYLYLAa
`
`b89081141418a
`
`BEN G. STREETMANis Dean of the College of Engineering at The
`University of Texas at Austin and holds the Dula D. Cockrell Centennial
`Chair in Engineering. He is a Professor of Electrical and Computer
`Engineering and was the founding Director of the Microelectronics
`Research Center. He has taughtat the Tel Same eaegee
`Champaignas well as the University of Texas at Austin. He has received
`numerous awards including the Education Medal of IEEE, The Frederick
`Emmons Terman Medal of the ASEE, and membership in the National
`Academy of Engineering. He has published more than 270 articles in tate]
`technicalliterature. Thirty-three students of Electrical Engineering, Materials
`Science, and Physics have received their Ph.D.s under his direction.
`
`STARA anit eRmelt) Clam itisa aiteiner Baeeeterateraapteaioe)
`and Computer Engineering, and Director of the Microelectronics Research
`Center at The University of Texas at Austin. He has more than 225archival
`refereed publications and 12 U.S.patents, and has supervised 18 Ph.D.
`students. His honors include the NSF Presidential NCTeM Mercer Wnrlct
`(1988), the Texas Atomic Energy Centennial Fellowship (1990-1997),
`Distinguished National Lecturer for the IEEE Electron Devices Society
`(1997-), and Fellow of the IEEE (1996).
`
`ISBN O-13-025538-b
`
`iaOs
`
`Upper Saddle River, NJ 07458
`http://www.prenhall.com
`
`|
`
`|
`
`9'780130!255389
`
`Dell Ex. 1013
`
`Dell Ex. 1013
`Page 29
`
`

`

`
`
`FIFTH EDITION
`
`Solid State
`Electronic Devices
`
`BEN G. STREETMAN AND SANJAY BANERJEE
`
`Microelectronics Research Center
`Department ofElectrical and Computer Engineering
`The University ofTexas at Austin
`
` ereA(e)
`PRENTICE HALL
`gral
`aes! Upper Saddle River, New Jersey 07458
`
`Dell Ex. 1013
`
`Page 30
`
`
`
`Dell Ex. 1013
`Page 30
`
`

`

`
`
`Library ef Congress Cataloging-in-Publication Data
`Streetman, Ben G
`Solid state electronic devices / Ben G, Streetman and Sanjay
`Banerjee -- Sth ed.
`p.em,
`-- (Prentice Hall series in solidstate physical
`electronics)
`Includes bibliographical references and inidlex.
`ISBN 0-13-025538-6 (cuscbound)
`L. Semiconductors.
`1. Banerjee, Sanjay.
`IL, Series
`TRK787TLSS.S77|2000
`621.3815'2--de2]
`99-1 6063
`cir
`
`IL Title.
`
`Publisher: Tom Robbins
`Assistant Vice President of Preduction and Manufacturing: David W. Riceardi
`Editor-in-Chief? Marcia Horton
`Associate Editor: Alice Dworkin
`
`Cover Design: Joseph Sengotta
`Cover: Fourth Generation PowerPC Microprocessor chip courtesy of Motorola, Inc.
`Photograph by Kobi Benzyi and Pradipto Mukherjee
`Manufacturing Manager; Trudy Pisciotti
`
`
`iejusnalei ©2000, 1995, 1990, 1980, 1972 by Prentice Hall, Inc.
`pee=Upper Saddle River, New Jersey 07458
`
`All rights reserved, No part of this book may be
`reproduced, in any form or by any means,
`without permission in writing from the publisher.
`
`Printed in the United States of America
`
`lO 9
`
`8
`
`7
`
`8
`
`5
`
`TSBN O-13-0255348-6
`
`Prentice Hall International (UK) Limited, London
`Prentice Hall of Australia Ply. Limited, Sydney
`Prentice Hall Canada Ine., feronto
`Prentice Hall Hispanoamericana, $.A.,Mexico
`ee us = ts cee es Delhi
`Prentice
`Hall
`of Japan,
`Inc. Tokyo
`Prentice [all Asia Pte. Lid., Singapore
`Editora Prentice Hall doBrasil, Lida., Rio deJaneiro
`
`General Library System
`University of Wisconsin « Madieon
`4 Ore,
`728 State Sireet
`Madison, W! 53706-1494
`U.S.A.
`
`
`
`aeeeeee
`Dell Ex. 1013
`
`Page 31
`
`Dell Ex. 1013
`Page 31
`
`

`

`
`
`
`
`EXHIBIT B
`EXHIBIT B
`
`
`Page 32
`
`Dell Ex. 1013
`Page 32
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`

`

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`Solid state electronic devices / Ben G. Streetman and Sanjay Banerjee. Streetman, Ben G. Prentice Hall, Upper Saddle River, N.J. :
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