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`R O N M A L T I E L
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`19743 Yuba Court, Saratoga, CA 95070 – 408.446.3040
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`Web site: www.maltiel-consulting.com
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`• PNP and NPN transistors
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`Test Chip Development:
`• Created a library of test chip structures for process,
`ESD circuits, design rules, and device evaluation
`using GDS tools.
`• Measured test structures and evaluated their device
`properties
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`E mail: ron@maltiel-consulting.com
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`PROFESSIONAL SUMMARY:
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`Mr. Maltiel is a senior member of IEEE with more than 30 years experience in all phases of design and implementation of
`computer semiconductor devices. He has worked in the development and production of storage technology and
`semiconductor devices such as Dynamic Ram (DRAM), Flash (NAND, NOR), SSD, EEPROM, ROM, and Static RAM
`(SRAM) memories which were used in microprocessors, logic, digital, and analog products.
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`Mr. Maltiel studied semiconductors at Stanford University graduate school and went on to work at Intel, AMI, AMD, and
`Maxim. His teams included circuit, process, and device engineers and was responsible for integrating all of the various
`disciplines into one working product. Mr. Maltiel holds six semiconductor device, process, and measurement patents which
`have been cited more than 130 times.
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`Currently, Mr. Maltiel is an independent consultant in the areas of semiconductor design, process and manufacturing and has
`been retained as an expert witness on many patent cases. In addition, Mr. Maltiel maintains an informational website and
`database which is regularly visited by USPTO, US Department of Justice, technology departments, attorneys, and investors from 99
`countries. He is also fluent in Hebrew.
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`EXPERTISE:
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`Circuit and Process Development:
`• Analog
`• DRAM
`• Flash / EEPROM and ROM
`• SRAM
`• pMOS, nMOS, and CMOS
`• High voltage BICMOS
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`Process Steps Development:
`• Process flow design
`• Gate and polysilicon oxidation steps
`• Metal deposition and barrier layers steps
`• Etching, laser definition, poly or metal deposition and
`planarization process steps such as Chemical
`Mechanical Polishing (CMP)
`• Plasma and Trench etching steps
`• Cleaning and wafer gettering methods
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`Devices Development:
`• DRAM memory cells
`• SRAM memory cells
`• Flash / EEPROM and ROM memory cells
`• Precision resistors and capacitors
`• Transistors/ resistors/capacitors/JFET in FinFET,
`pMOS, nMOS, CMOS, and BICMOS processes
`• Polysilicon - polysilicon capacitors
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`Page 1 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 1 of 8
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`R O N M A L T I E L
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`PROFESSIONAL EXPERIENCE
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`INDEPENDANT CONSULTANT, 1993 - present
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`• Provides consulting in various aspects of semiconductor technology and semiconductor manufacturing.
`• Provides expert technical consultations and has testified at trials.
`• Designs and operates a popular semiconductor technology web site which includes current developments in the digital
`and analog fields such as DRAM, Flash (NAND, NOR), SSD, EEPROM, ROM, and SRAM. The site includes tutorials
`and educational information, industry news and resources, acronym and technical word definitions, and patent search or
`patent application information, and is regularly visited by major technology companies and universities from 99
`countries.
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`MAXIM INTEGRATED PRODUCTS , 1989 - 1993
`• Personally developed a high voltage BICMOS device, introduced it to production, and proved the feasibility of adding an
`EEPROM element to it.
`• Established MAXIM processes in a newly purchased fab, developed the company’s newest analog process, installed
`MAXIM’s production in a new foundry, and managed the relationship.
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`ADVANCED MICRO DEVICES , 1983 -1989
`• Managed consolidation of test chip development through the building of a company-wide standard test chip library. As a
`direct result of this project, the time needed to build test chips was reduced by 60%, structures were improved, and test
`program generation was accelerated.
`• Contributed to development of 256k SRAM, including process flow, a backend planarization scheme, and overseeing the
`building of generic test chip library.
`• Participated in defining 1M CMOS DRAM memory and proved feasibility of integrating trenches in the process.
`Coordinated the development of post groove planarization process and double poly module. The project ended
`successfully with a working first silicon.
`• Developed and proved feasibility of integrating EEPROM with DRAM CMOS process and devices. Reduced cell size
`by 40%, process steps by 15%, and improved EEPROM programming operation.
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`AMERICAN MICROSYSTEMS, INC., 1982 - 1983
`•
`Introduced and established the EEPROM device. Directed the design of the test chip, process flow determination,
`manufacture of several working runs and measurement of the electrical parameters.
`• Created a new process approach that improves poly dielectric strength and founded a new cell structure with multiple
`benefits over existing cells.
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`INTEL , 1980 - 1982
`Participated in the development of EEPROM technology with particular emphasis on the reliability aspects such as charge
`retention and cycling endurance. Work involved the study of failure mechanisms, making the necessary process changes, and
`evaluating the results. Regular interaction with fab and technology development was required. Improved operator utilization
`by 20%.
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`STANFORD UNIVERSITY , 1978 - 1980
`• E.E. research group on metallic impurities and their electrical behaviors.
`•
`Independent research included manufacturing of Si devices and electrical measurements of their properties.
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`EDUCATION
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`Engineer Degree, Material Science Engineering, Stanford University, 1980
`MS, Material Science and Engineering, Stanford University, 1978
`BS, Material Science and Engineering, Ben-Gurion University, 1977
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`Page 2 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 2 of 8
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`R O N M A L T I E L
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`PATENTS
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`Mr. Maltiel’s patents have been cited more than 130 times
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` •
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` Electrical measurements of profile of semiconductor devices during their manufacturing process - #4,978,923
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`• Method and apparatus for non-destructive data in a shadow memory array - #4,716,552
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`• Electrical measurements of properties of semiconductor devices during their manufacturing process - # 4,956,611
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`• Memory cell providing simultaneous non-destructive access to volatile and non-volatile data - #4,672,580
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`• Non-volatile dynamic ram cell - #4,611,309
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`• Gold-doped IC resistor region - #4,432,008
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`PROFESSIONAL AFFILIATIONS
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`IEEE Senior Member
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`IEEE Device Society
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`IEEE Circuits Society
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`IEEE Communications Society
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`IEEE-USA Consultants Database
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`Jewish High Tech
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`Page 3 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 3 of 8
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`R O N M A L T I E L
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`LITIGATION RELATED EXPERIENCE
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`Expert Engagements
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`Services Provided:
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`Patent Infringement
`Devlin Law Firm
`Ocean Semiconductor vs Analog Devices, Infineon, and Renesas.
`Technical consulting expert on semiconductor development and manufacturing case. Reviewed
`infringing patents. Wrote declarations.
`2020-1
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`Patent Infringement
`Quinn Emanuel
`IP Bridge vs Micron.
`Technical consulting expert on semiconductor development and manufacturing case. Reviewed
`infringing patents, contact and metallization manufacturing processes, and layout files. Wrote a
`declaration and the case was settled successfully.
`2020
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`Patent Infringement
`Mintz Levin
`Innovative Foundry Technologies Inc. vs TSMC.
`Technical consulting expert on semiconductor development and manufacturing case. Reviewed
`infringing patents, defendant’s FinFET, contact and metallization manufacturing processes, and GDS
`layout files. Assisted in overseas depositions where the case was settled successfully following the
`depositions.
`2018-9
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`Patent Infringement
`Nixon Peabody LLP
`Lone Star Silicon Innovations Inc. vs Nanya Technology.
`Testifying expert and technical consultant on semiconductor development and manufacturing in IPR
`cases. Wrote the expert reports and was deposed.
`2017-8
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`Patent Infringement
`TechKnowledge Law Group LLP
`ProMos vs Samsung.
`Testifying expert and technical consultant on semiconductor development and manufacturing in IPR
`cases. Wrote the expert reports and was deposed.
`2017-8
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`Patent Infringement
`Sidley Austin
`Netlist vs Hynix.
`Testifying expert and technical consultant on semiconductor product and device operations in an IPR
`Cases. Wrote the expert reports and was deposed.
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`Page 4 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 4 of 8
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`R O N M A L T I E L
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`2016-7
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`Patent Infringement
`Fitzpatrick, Cella, Harper & Scinto
`Intellectual Ventures vs. Canon.
`Testifying expert and technical consultant on semiconductor product and photovoltaic device
`operations. Case was settled following my deposition.
`2015
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`Patent Infringement
`TechKnowledge Law Group LLP
`Home Semiconductor vs. Samsung.
`Testifying expert and technical consultant on semiconductor device operations.
`2014 – 15
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`Patent Infringement
`Vinson & Elkins LLP
`Round Rock Research vs. Sandisk Corp.
`Testifying expert and technical consultant on patents relating to the manufacturing and operation of
`semiconductor memory in a system. Wrote invalidity and exhaustion declarations, was deposed,
`prior art searches, and analyzed patent infringements and validity.
`Several of the patents were dropped from the case following my declarations. Plaintiff withdrew case
`prior to trial.
`2013 – 14
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`Patent Board Declaration
`Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P
`NXP B.V. vs. Research In Motion
`Prepared declarations for the Patent Board Patent Trial and Appeal Board of the US Patent and
`Trademark Office regarding semiconductor development and manufacturing.
`2013 - 14
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`Patent Infringement
`Undisclosed
`Undisclosed
`Technical consultant regarding semiconductor development and manufacturing. Prior art searches,
`analyze patents infringement and validity.
`2012 – 13
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`Patent Infringement
`Agility IP Law, LLP
`Keranos vs. Analog Devices
`Technical consultant regarding semiconductor non volatile memory devices, wrote declarations, was
`deposed, and analyzed patents infringement and validity.
`2012 – 13
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`Patent Infringement
`Undisclosed
`Undisclosed
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`Page 5 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 5 of 8
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`R O N M A L T I E L
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`Technical consultant regarding semiconductor Flash and DRAM memory circuits, prior art searches,
`analyze patents infringement and validity.
`2012
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`Patent Infringement
`Barnes & Thornburg LLP
`Creative Integrated Systems vs. Nintendo
`Testifying expert and technical consultant for the operation of semiconductor memory in a system.
`Wrote declarations, was deposed and testified in court.
`2010 - 13
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`Patent Infringement
`Duane Morris LLP
`e.Digital vs. Pentax
`Testifying expert and technical consultant for the operation and storage of Flash memory in a
`system. Analyzed the product and prior art searches, reviewed patent file wrapper, and was deposed.
`Patent reexamination evaluation.
`2009 - 11
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`Antitrust
`Susman Godfrey LLP
`Tessera Technologies vs. Hynix Semiconductors case no. 1-06-cv-076688
`Testifying expert and technical consultant for the operation of DRAM memory system. Analyzed
`company’s methodologies of bringing new technology to the market and prior art searches, reviewed
`depositions, was deposed;
`2009 - 11
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`Patent Infringement
`Undisclosed
`Undisclosed
`Computer system testifying expert, technical consulting, prior art searches, analyze patents
`infringement and validity.
`2008 - 9
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`Patent Infringement
`Munger, Tolles & Olson LLP
`Hynix vs. Rambus
`DRAM Memory testifying Expert, technical consulting for Rambus. Was deposed and provided
`expert report. Witness testimony provided in March 2008. Rambus won the case on all claims. Jury
`stated they found Mr. Maltiel the more believable expert.
`2007 - 8
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`Patent Infringement
`White & Case LLP
`Hynix vs. Rambus - European Commission in Brussels, Belgium
`DRAM Memory testifying Expert, technical consulting, provided expert report.
`2007 - 8
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`Page 6 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 6 of 8
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`R O N M A L T I E L
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`Patent Infringement
`Undisclosed
`Undisclosed
`Non volatile memory expert consultant, patent infringement analysis, and preparation for expert
`witness testimony
`2006
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`Wrongful Termination
`Jordan Kushner
`Undisclosed
`Evaluate quality of technical work in case where employee was fired. Was deposed and provided
`expert declarations
`2003
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`Patent Infringement Matters (3)
`Venable Baetjer
`Patent Enforcement Fund vs. NEC
`Semiconductor memory expert consultant, technical consultant, develop trade secret violation list,
`prior art searches, analyze patent’s infringement and validity. Provided several expert reports and
`declarations. Deposed for several days
`Approximately 3 separate cases various dates between 1993 and 1995
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`Date:
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`Patent Infringement
`Fish and Richardson
`Undisclosed
`Expert consultant and prior art searches of ESD circuits
`2007
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`Patent Infringement
`Townsend and Townsend
`Undisclosed
`Expert consultant and prior art searches of EEPROM memory
`2006
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`Patent Infringement
`Undisclosed
`Undisclosed
`Non volatile memory device expert consultant, technical consulting, and preparation for Expert
`Witness testimony
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`Date: 2006
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`Type of Matter:
`Law Firm:
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`Theft of Trade secrets, Patent Infringements
`Paul Hasting
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`Page 7 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 7 of 8
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`Undisclosed
`Expert consultant, prior art searches, analyze patents.
`2004
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`Patent Infringement and Theft of Trade Secret Matters
`Heller Ehrman LLP
`Atmel vs. ISD
`Services Provided:. EEPROM device and circuits expert consultant, technical consultant, develop
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`trade secret violation list, prior art searches, analyze patent’s infringement and validity, EEPROM
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`circuits infringement analysis, mask layers evaluation, ESD structures analysis. For several years
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`worked full time as an outside expert on various EEPROM and other cases.
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`Date:
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`Approximately 6 separate cases various dates 1995 to 2000
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`Page 8 of 8
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`Micron et al. - Exhibit 1004
`Micron et al. v. Netlist - IPR2022-00418
`Page 8 of 8
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