PTO/AIN14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
`Application Data Sheet 37 CFR 1.76
`
`Attorney Docket Number 02074-24012.NP.CIP2
`
`.
`.
`Application Number
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`
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`
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`Title of Invention
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`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`
`The application data sheet is part of the provisional or nonprovisional application for which it is being submitted. The following form contains the
`bibliographic data arranged in a format specified by the United States Patent and Trademark Office as outlined in 37 CFR 1.76.
`This document may be completed electronically and submitted to the Office in electronic format using the Electronic Filing System (EFS) or the
`document may be printed and included in a paper filed application.
`
`
`
`Secrecy Order 37 CFR 5.2
`
`I:I Portions or all of the application associated with this Application Data Sheet may fall under a Secrecy Order pursuant to
`37 CFR 5.2 (Paper filers only. Applications that fall under Secrecy Order may not be filed electronically.)
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`Inventor
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`1
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`Inventor Information:
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`Legal Name
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`Prefix Given Name
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`Middle Name
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`Family Name
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`Suffix
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`Residence Information (Select One) 0 US Residency
`(9 Non US Residency 0 Active US Military Service
`City
`Tansui
`Country of Residence i
`ITW
`
`
`
`
`
`Mailing Address of Inventor:
`
`Address 1
`
`Address 2
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`4, Lane 32, Chung—Cheng Road
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`City
`Postal Code
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`Tansui, Taipei County
`251
`
`StatelProvince
`TW
`
`Inventor Information blocks may be
`Inventors Must Be Listed - Additional
`All
`generated within this form by selecting the Add button.
`
`Add
`
`Correspondence Information:
`
`Enter either Customer Number or complete the Correspondence Information section below.
`For further information see 37 CFR 1.33(a).
`
`Customer Number
`
`20551
`
`Email Address
`
` Addams"
`
`|:| An Address is being provided for the correspondence Information of this application.
`
`
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`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
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`Application Information:
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`Title of the Invention
`
`
`
`Attorney Docket Number
`
`
`Nonprovisional
`Application Type
`
`
`
`Utility
`Subject Matter
` Total Number of Drawing Sheets (if any)
`Suggested Figure for Publication (if any)
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`PTO/AIN14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
` Attorney Docket Number
`02074-24012.NP.C|P2
`
`Application Data Sheet 37 CFR 1.76
`
`Application Number
`
`Title of Invention
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`
`
`
`
`Publication Information:
`
`
`
`
`
`
`|:| Request Early Publication (Fee required at time of Request 37 CFR 1.219)
`
`El
`
`Request Not to Publish. I hereby request that the attached application not be published under
`35 U.S.C. 122(b) and certify that the invention disclosed in the attached application has not and will not be the
`subject of an application filed in another country, or under a multilateral international agreement, that requires
`publication at eighteen months after filing.
`
`Representative Information:
`
`Representative information should be provided for all practitioners having a power of attorney in the application. Providing
`this information in the Application Data Sheet does not constitute a power of attorney in the application (see 37 CFR 1.32).
`Either enter Customer Number or complete the Representative Name section below.
`If both sections are completed the customer
`Number will be used for the Representative Information during processing.
`
`
`Please Select One:
`
`Customer Number
`
`20551
`
`@ Customer Number
`
`0 us Patent Practitioner 0 Limited Recognition (37 CFR11_9)
`
`Domestic Benefit/National Stage Information:
`This section allows for the applicant to either claim benefit under 35 U.S.C. 119(e), 120, 121, or 365(c) or indicate National Stage
`entry from a PCT application. Providing this information in the application data sheet constitutes the specific reference required
`by 35 U.S.C. I 19(e) or 120, and 37 CFR 1.78.
`When referring to the current application, please leave the application number blank.
`
`Prior Application Status
`
`Pending
`
`
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`Continuity Type
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`Continuation in part of
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`Pending
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`Continuity Type
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`Continuation in pad of
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`Expired
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`Continuity Type
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`Claims benefit of provisional
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` Continuation in part of
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`Pending
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`Continuity Type
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`Patented
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`Application Number
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`Prior Application Status
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`Application Number
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`13802112
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`Prior Application Status
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`Application Number
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`13479148
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`Prior Application Status
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`Application Number
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`Prior Application Status
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`Filing Date (YYYY-MM-DD)
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`2013-03-13
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`Filing Date (YYYY-MM-DD)
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`2012-05-23
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`Filing Date (YYYY-MM-DD)
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`2011-05-23
`
`Filing Date (YYYY-MM-DD)
`
`2013—03—12
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`Remove
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`Prior Application Number
`
`13802112
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`Prior Application Number
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`13479148
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`Prior Application Number
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`61489074
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` 13797704
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`Prior Application Number
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`PTO/AlAl14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
`
`Attorney Docket Number
`02074-24012.NP.C|P2
`
`
`
`
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`Title of Invention
`
`
`
`
`Application Number
`
`
`Application Data Sheet 37 CFR 1.76
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`Application
`Number
`
`.
`.
`ContinUIty Type
`
`Prior Application
`
`Filing Date
`(YYYY—M M—DD)
`
`13797704
`
`Continuation in part of
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`12726786
`
`2010-03-18
`
`Prior Application Status
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`Patented
`
`Application
`Number
`
`.
`.
`ContinUIty Type
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`Prior Application
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`Filing Date
`(YYYY-M M-DD)
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`12726786
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`Continuation in part of
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`12255823
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`2008-10-22
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`Prior Application Status
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`Patented
`
`Application
`Number
`
`.
`.
`ContinUIty Type
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`Prior Application
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`Filing Date
`(YYYY-M M-DD)
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`12255823
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`Continuation in part of
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`12168110
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`2008-07-05
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`
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`Prior Application Status
`
`Expired
`
`Patent Number
`
`8622787
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`ISSUE Date
`(YYYY-MM-DD)
`
`2014-01-07
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`Remove
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`Patent Number
`
`8393934
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`ISSUE Date
`(YYYY—MM—DD)
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`2013-03-12
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`Remove
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`
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`Patent Number
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`8398466
`
`ISSUE Date
`(YYYY-MM-DD)
`
`2013-03-19
`Remove
`
`Application Number
`
`Continuity Type
`
`Prior Application Number
`
`Filing Date (YYYY-MM-DD)
`
`12168110
`
`Claims benefit of provisional
`
`60976198
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`2007-09-28
`
`Patented
`
`Prior Application Status
`Afi‘tifiiii?”
`ContinUiWTvpe
`12726786
`Continuation in part of
`
`misfit?”
`11560817
`
`(Yttlt’moiitfim
`2006-11-16
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`PatentNumber
`7762872
`
`(visit/$1130)
`2010-07-27
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`Remove
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`Prior Application Number
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`11357713
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`Prior Application Number
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`60681798
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`Prior Application Number
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`11223786
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`
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`Filing Date (YYYY-MM-DD)
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`2006-02-17
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`Filing Date (YYYY-MM-DD)
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`2005-05-16
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`Filing Date (YYYY-MM-DD)
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`2005-09-09
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`Prior Application Number
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`61246816
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`Prior Application Number
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`13034213
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`
`
`
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`Filing Date (YYYY-MM-DD)
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`2009-09-29
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`Filing Date (YYYY-MM-DD)
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`2011-02-24
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`KINIK EXHIBIT 1002
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`w
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`Prior Application Status Abandoned
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`Application Number
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`11560817
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`Prior Application Status
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`Application Number
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`11357713
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`Continuity Type
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`Continuation in part of
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`Expired
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`Continuity Type
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`Claims benefit of provisional
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`Prior Application Status Abandoned
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`Application Number
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`11560817
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`Prior Application Status
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`Continuity Type
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`Continuation in part of
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`Patented
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`Prior Application Status
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`Application Number
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`12850747
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`Prior Application Status
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`Application Number
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`13797704
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`Prior Application Status
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`

`PTO/AlAl14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
` Attorney Docket Number
`02074-24012.NP.C|P2
`
`Application Data Sheet 37 CFR 1.76
`
`
`Application Number
`
`
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`Title of Invention
`
`
`
`
`Application Number
`
`Continuity Type
`
`Prior Application Number
`
`Filing Date (YYYY-MM-DD)
`
`Claims benefit of provisional
`
`61333162
`
`2010-05-10
`
` 13034213
`Add
`Additional Domestic BenefitiNational Stage Data may be generated within this form
`by selecting the Add button.
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`Foreign Priority Information:
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`This section allows for the applicant to claim priority to a foreign application. Providing this information in the application data sheet
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`constitutes the claim for priority as required by 35 U.S.C. 119(b) and 37 CFR 1.55_(d). When priority is claimed to a foreign application
`that is eligible for retrieval under the priority document exchange program (PDX) Ithe information will be used by the Office to
`automatically attempt retrieval pursuant to 37 CFR 1.55(h)(1) and (2). Under the PDX program, applicant bears the ultimate
`
`responsibility for ensuring that a copy of the foreign application is received by the Office from the participating foreign intellectual
`
`property office, or a certified copy of the foreign priority application is filed, within the time period specified in 37 CFR 1.55(g)(1).
`
`
`Application Number
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`_
`Access Codei (if applicable)
`
`Filing Date (YYYY-MM-DD)
`Country i
`
`Additional Foreign Priority Data may be generated within this form by selecting the
`Add
`Add button.
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`
`Statement under 37 CFR 1.55 or 1.78 for AIA (First Inventor to File) Transition
`Applications
`
`
`This application (1) claims priority to or the benefit of an application filed before March 16, 2013 and (2) also
`contains, or contained at any time, a claim to a claimed invention that has an effective filing date on or after March
`|:| 16, 2013.
`NOTE: By providing this statement under 37 CFR 1.55 or 1.78, this application, with a filing date on or after March
`16, 2013, will be examined under the first inventor to file provisions of the AIA.
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`PTO/AIN14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
` Attorney Docket Number
`O2074-24012.NP.CIP2
`
`Application Data Sheet 37 CFR 1.76
`
`Application Number
`
`Title of Invention
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`
`
`
`
`If checked, the undersigned hereby grants the USPTO authority to provide the European Patent Office (EPO),
`the Japan Patent Office (JPO), the Korean Intellectual Property Office (KIPO), the World Intellectual Property Office (WIPO),
`and any other intellectual property offices in which a foreign application claiming priority to the instant patent application
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`does not wish the EPO, JPO, KIPO, WIPO, or other intellectual property office in which a foreign application claiming priority
`to the instant patent application is filed to have access to the instant patent application.
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`In accordance with 37 CFR 1.14(h)(3), access will be provided to a copy of the instant patent application with respect
`to: 1) the instant patent application-as—filed; 2) any foreign application to which the instant patent application
`claims priority under 35 U.S.C. 119(a)—(d) if a copy of the foreign application that satisfies the certified copy requirement of
`37 CFR 1.55 has been filed in the instant patent application; and 3) any US. application—as—filed from which benefit is
`sought in the instant patent application.
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`In accordance with 37 CFR 1.14(c), access may be provided to information concerning the date of filing this Authorization.
`
`Applicant Information:
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`Providing assignment information in this section does not substitute for compliance with any requirement of part 3 of Title 37 of CFR
`to have an assignment recorded by the Office.
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`Applicant
`
`1
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`If the applicant is the inventor (or the remaining joint inventor or inventors under 37 CFR 1.45), this section should not be completed.
`The information to be provided in this section is the name and address of the legal representative who is the applicant under 37 CFR
`1.43; or the name and address of the assignee, person to whom the inventor is under an obligation to assign the invention, or person
`who otherwise shows sufficient proprietary interest in the matter who is the applicant under 37 CFR 1.46. If the applicant is an
`applicant under 37 CFR 1.46 (assignee, person to whom the inventor is obligated to assign, or person who otherwise shows sufficient
`proprietary interest) together with one or more joint inventors, then the joint inventor or inventors who are also the applicant should be
`identified in this section.
`
`
` O Person who shows sufficient proprietary interest
`
`0 Legal Representative under 35 U.S.C. 117
`
`0 Joint Inventor
`
`
`
`
`
`
`0 Person to whom the inventor is obligated to assign.
`
`If applicant is the legal representative, indicate the authority to file the patent application, the inventor is:
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`
`
`Name ofthe Deceased or Legally lncapacitated InventorD:|:|
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`PTO/AIN14 (11-13)
`Approved for use through 0181/2014. OMB 0651-0032
`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
`
` Application Data Sheet 37 CFR 1.76
`
`
`02074-24012.NP.CIP2
`
`
`
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
`Title of Invention
`
`
`
`
`Attorney Docket Number
`
`Application Number
`
`Mailing Address Information:
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`Address 1
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`Address 2
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`City
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`StateIProvince
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`Assignee Information including Non-Applicant Assignee Information:
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`Family Name
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`Address 2
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`StatelProvince
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`PTO/AlAl14 (11-13)
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`U.S. Patent and Trademark Office; U.S. DEPARTMENT OF COMMERCE
`Under the Paperwork Reduction Act of 1995, no persons are required to respond to a collection of information unless it contains a valid OMB control number.
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`Appllcatlon Data Sheet 37 CFR 1.76
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`Attorney Docket Number
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`02074-24012.NP.C|P2
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`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS
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`_ Title of Invention
`Additional Signature may be generated within this form by selecting the Add button.
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`Signature:
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`NOTE: This form must be signed in accordance with 37 CFR 1.33. See 37 CFR 1.4 for signature requirements and
`certifications
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`WIDavid W. Osborne]
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`Date (YYYY-MM-DD)
`
`2014-10-03
`
`This collection of information is required by 37 CFR 1.76. The information is required to obtain or retain a benefit by the public which
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`Thorpe North & Western, LLP
`Attorney Docket No.: 02074—24012.NP.CIP2
`
`CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED
`
`METHODS
`
`5
`
`PRIORITY DATA
`
`This application is a continuation-in-part of U. S. Patent Application Serial No.
`
`13/802,112, filed on March, 13, 2013, which is a continuation-in—part of United States
`
`Patent Application Serial No. 13/479,148, filed on May 23, 2012, which claims the
`
`benefit of U. S. Provisional Patent Application Serial no. 61/489,074, filed on May 23,
`
`10
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`2011. This application is also a continuation-in-part of U. S. Patent Application Serial
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`No. 13/797,704, filed March 12, 2013, which is a continuation-in-part of US. Patent
`
`Application Serial No. 12/726,786, filed on March 18, 2010, which is a is a continuation-
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`in-part of US. Patent Application Serial No. 12/255,823, filed October 22, 2008, which is
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`a continuation-in-part of US. Patent Application Serial No. 12/168,110, filed on July 5,
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`15
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`2008, which claims the benefit of US. Provisional Patent Application Serial No.
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`60/976,198, filed September 28, 2007. US. Patent Application Serial No. 12/726,786,
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`filed on March 18, 2010 is also a continuation-in-part of US. Patent Application Serial
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`No. 11/560,817, filed November 16, 2006, which is a continuation-in—part of US. Patent
`
`Application Serial No. 11/357,713, filed February 17, 2006, which claims the benefit of
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`20 US. Provisional Patent Application Serial No. 60/681,798, filed May 16, 2005. US.
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`Patent Application Serial No. 11/560,817 is additionally a continuation-in-part of US.
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`Patent Application Serial No. 11/223,786, filed September 9, 2005. US. Patent
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`Application Serial No. 13/797,704 is also a continuation-in-part of US. Patent
`
`Application Serial No. 12/850,747, filed August 5, 2010, which claims the benefit of
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`United States Provisional Patent Application Serial No. 61/246,816, filed on September
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`29, 2009. US. Patent Application Serial No. 13/797,704 is fiarther a continuation-in—part
`
`of US. Patent Application Serial No. 13/034,213, filed February 24, 2011, which claims
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`the benefit of US. Provisional Patent Application Serial No. 61/333,162, filed on May
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`10, 2010. Each of these applications is incorporated herein by reference.
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`

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`Thorpe North & Western, LLP
`Attorney Docket No.: 02074—24012.NP.CIP2
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`BACKGROUND OF THE INVENTION
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`The semiconductor industry currently spends in excess of one billion US. dollars
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`each year manufacturing silicon wafers that must exhibit very flat and smooth surfaces.
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`Known techniques to manufacture smooth and even-surfaced silicon wafers are plentiful.
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`The most common of these involves the process known as Chemical Mechanical
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`Polishing (CMP) which includes the use of a polishing pad in combination with an
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`abrasive slurry. Of central importance in all CMP processes is the attainment of high
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`performance levels in aspects such as uniformity of polished wafer, smoothness of the IC
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`circuitry, removal rate for productivity, longevity of consumables for CMP economics,
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`etc.
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`SUMMARY OF THE INVENTION
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`The present disclosure provides CMP pad dressers and associated methods,
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`including without limitation, methods directed to the manufacture and use of such
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`dressers. In one aspect, for example, a CMP pad dresser can include a support substrate
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`and a plurality of superabrasive particles secured to the support substrate with each
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`superabrasive particle extending away from the support substrate to a protrusion distance.
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`The plurality of superabrasive particles can be positioned such that the highest protruding
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`tip of each of the plurality of superabrasive particles align along a designated profile with
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`a tip variation of from about 5 microns to about 100 microns. In another aspect, the
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`highest protruding tip of each of the plurality of superabrasive particles align along the
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`designated profile with a tip variation of from about 10 microns to about 50 microns. In
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`yet another aspect, the highest protruding tip of each of the plurality of superabrasive
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`particles align along the designated profile with a tip variation of from about 20 microns
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`to about 40 microns. In a filrther aspect, the highest protruding tip of each of the plurality
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`of superabrasive particles align along the designated profile with a tip variation of less
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`than about 20 microns. The designated profile can include any geometric configuration
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`that can be useful in dressing a CMP pad, and any such configuration is considered to be
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`within the present scope. Non-limiting examples can include a plane, a slope, a curved
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`shape, a dome shape, and the like, including appropriate combinations thereof
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`Thorpe North & Western, LLP
`Attorney Docket No.: 02074—24012.NP.CIP2
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`The positioning of superabrasive particles relative to the support substrate can
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`also be described in terms of the depths that the superabrasive particles cut into a CMP
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`pad when used to abrade the CMP pad. In one aspect, for example, the protrusions of the
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`plurality of superabrasive particles produce cutting depths of less than about 20 microns
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`5
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`when used to abrade a CMP pad. In another aspect, the protrusions of the plurality of
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`superabrasive particles produce cutting depths of from about 1 micron to about 20
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`microns when used to abrade a CMP pad. In yet another aspect, the protrusions of the
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`plurality of superabrasive particles produce cutting depths of from about 10 microns to
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`about 20 microns when used to abrade a CMP pad.
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`10
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`As another exemplary aspect of the present disclosure, a CMP pad dresser can
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`include a rigid support substrate and a mono layer of a plurality of superabrasive particles
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`coupled to the support substrate, where each superabrasive particle in the mono layer
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`extends from the support substrate to a protrusion distance. In one aspect, the difference
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`in protrusion distance between the highest protruding tip and the second highest
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`protruding tip of the mono layer of superabrasive particles is less than or equal to about 50
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`microns, and the difference in protrusion distance between the highest 1% of the
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`protruding tips of the mono layer of superabrasive particles is within about 80 microns or
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`less. In another aspect, the difference in protrusion distance between the highest
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`protruding tip and the second highest protruding tip is less than or equal to about 10
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`20
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`microns. In yet another aspect, the difference in protrusion distance between the highest
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`protruding tip and the second highest protruding tip is less than or equal to about 10
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`microns. In a fiarther aspect, the difference in protrusion distance between the highest
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`protruding tip and the 10th highest protruding tip is less than or equal to about 20 microns.
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`In yet another aspect, the difference in protrusion distance between the highest protruding
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`tip and the 100th highest protruding tip is less than or equal to about 40 microns.
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`As yet another exemplary aspect of the present disclosure, a CMP pad dresser can
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`include a rigid support substrate and a mono layer of a plurality of superabrasive particles
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`coupled to the support substrate, where the plurality of superabrasive particles includes a
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`plurality of working superabrasive particles, such that rotating the dresser against a CMP
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`pad cuts asperities into the CMP pad having a cutting depth of less than or equal to about
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`50 microns. In another aspect, the cutting depth is from about 10 microns to about 50
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`microns. In yet another aspect, the plurality of working superabrasive particles includes
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`at least 100 working superabrasive particles. In a fiarther aspect, the plurality of working
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`superabrasive particles includes at least 1000 working superabrasive particles. In yet
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`another aspect, the plurality of working superabrasive particles includes from about 1000
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`5
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`to about 6000 working superabrasive particles. In another aspect, the plurality of
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`working superabrasive particles includes from about 2000 to about 5000 working
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`superabrasive particles. In a fiarther aspect, the plurality of working superabrasive
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`particles include at least about 1000 working superabrasive particles that protrude from
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`the rigid support substrate to distances within about 30 microns of one another.
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`10
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`As another exemplary aspect of the present disclosure, a method of dressing a
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`CMP pad can include applying a CMP pad dresser to a CMP pad, and moving at least one
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`of the CMP pad or the CMP pad dresser with respect to one another to cut asperities into
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`the CMP pad having a cutting depth of from about 10 microns to about 50 microns.
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`As a fiarther exemplary aspect of the present disclosure, a CMP pad dresser is
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`15
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`provided including a support substrate and a plurality of superabrasive particles secured
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`to the support substrate and positioned to engage and dress a CMP pad, where the
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`plurality of superabrasive particles cut to depths of less than 50 microns into a CMP pad
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`during a dressing procedure.
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`There has thus been outlined, rather broadly, various features of the invention so
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`20
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`that the detailed description thereof that follows may be better understood, and so that the
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`present contribution to the art may be better appreciated. Other features of the present
`
`invention will become clearer from the following detailed description of the invention,
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`taken with the accompanying claims, or may be learned by the practice of the invention.
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`BRIEF DESCRIPTION OF THE DRAWINGS
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`FIG. 1 is a schematic side view of a CMP pad dresser in accordance with an
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`embodiment of the present disclosure;
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`FIG. 2 is a schematic side view of a CMP pad dresser in accordance with an
`
`embodiment of the present disclosure;
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`FIG. 3 is a schematic side view of a CMP pad dresser in accordance with an
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`embodiment of the present disclosure; and
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`Thorpe North & Western, LLP
`Attorney Docket No.: 02074—24012.NP.CIP2
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`FIG. 4 is a schematic side view of a CMP pad dresser in accordance with an
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`embodiment of the present disclosure.
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`It will be understood that the above figures are merely for illustrative purposes in
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`5
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`furthering an understanding of the invention. Further, the figures are not drawn to scale,
`
`thus dimensions, particle sizes, and other aspects may, and generally are, exaggerated to
`
`make illustrations thereof clearer. Therefore, departure can be made from the specific
`
`dimensions and aspects shown in the figures in order to produce the heat spreaders of the
`
`present invention.
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`1 0
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`DETAILED DESCRIPTION
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`Before the present invention is disclosed and described, it is to be understood that
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`this invention is not limited to the particular structures, method steps, or materials
`
`disclosed herein, but is exte