`
`
`UNITED STATES PATENT AND TRADEMARK OFFICE
`
`_________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`_________________
`
`APPLIED MATERIALS, INC.
`
`Petitioner
`
`v.
`
`DEMARAY LLC
`Patent Owner
`
`_________________
`
`Case IPR2021-00104
`Patent No. 7,381,657
`_________________
`
`PETITIONER’S CURRENT LIST OF EXHIBITS
`
`
`
`Case IPR2021-00104
`Patent No. 7,381,657
`
`Previously
`Submitted
`
`LIST OF EXHIBITS
`
`Ex. No. Description
`
`Ex. 1001 U.S. Patent No. 7,381,657
`
`Ex. 1002 Declaration of Dr. Vivek Subramanian
`
`Ex. 1003 Curriculum Vitae of Dr. Vivek
`Subramanian
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`X
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`X
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`X
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`X
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`X
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`X
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`X
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`X
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`X
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`Ex. 1004 Prosecution History of U.S. Patent No. 7,381,657
`
`Ex. 1005 U.S. Patent No. 6,342,134 to Barber et al.
`
`Ex. 1006 U.S. Patent No. 6,485,602 to Hirose
`
`Ex. 1007 U.S. Patent No. 5,651,865 to Sellers
`
`Ex. 1008 A. Belkind et al., Pulsed-DC reactive sputtering of
`dielectrics: Pulsing parameter effects (2000)
`
`Ex. 1009 U.S. Patent No. 4,464,223 to Gorin
`
`Ex. 1010 U.S. Patent No. 6,132,564 to Licata
`
`Ex. 1011 U.S. Patent No. 5,942,089 to Sproul
`
`Ex. 1012 U.S. Patent No. 6,352,629 to Wang
`
`Ex. 1013 S. Gibilisco, Handbook of Radio & Wireless Technology
`(1999)
`
`Ex. 1014 J. Joo, Low-temperature polysilicon deposition by ionized
`magnetron sputtering (2000)
`
`Ex. 1015 B. Chapman, Glow Discharge Processes
`
`Ex. 1016 U.S. Patent No. 4,579,618 to Celestino
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`1
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`Case IPR2021-00104
`Patent No. 7,381,657
`Ex. 1017 International Publication No. WO 02/23588 to Quon
`X
`
`Ex. 1018 International Publication No. WO 01/6300 to Johnson
`
`Ex. 1019 U.S. Patent No. 6,695,954 to Hong
`
`Ex. 1020 U.S. Patent No. 6,153,068 to Ohmi
`
`Ex. 1021 U.S. Patent No. 4,846,920 to Keller
`
`Ex. 1022 U.S. Patent No. 6,911,351 to Kidoguchi
`
`Ex. 1023 U.S. Patent No. 5,302,882 to Miller
`
`Ex. 1024 Pinnacle Plus+ 10KW (325-650 Vdc) Master/Slave AE
`Bus, DeviceNet, MDXL User, UHF Output User Manual
`(March 2005)
`Ex. 1025 The Advanced Energy MDX Magnetron Drive,
`Advanced Energy Industries, Inc. (March 1993)
`Ex. 1026 Pinnacle 10x6 kW DeviceNet, MDXL User 5702063-C,
`User Manual, (May 2000)
`Ex. 1027 U.S. Patent Publication No. 2002/0027249 A1 to
`Takemura
`Ex. 1028 U.S. Patent Publication No. 2002/0144889 to Tao
`
`Ex. 1029 E. Dogheche, Growth and optical characterization of
`aluminum nitride thin films deposited on silicon by
`radio-frequency sputtering, Applied Physics Letters
`(1999)
`Ex. 1030 U.S. Patent No. 6,506,686 to Masuda
`
`Ex. 1031 K. Nam, A study on the high rate deposition of CrN films
`with x
`controlled microstructure by magnetron sputtering,
`Surface & Coatings Technology (2000)
`Ex. 1032 D. Mattox, Handbook of Physical Vapor Deposition
`(PVD) Processing – Film Formation, Adhesion, Surface
`Preparation and Contamination Control (1998)
`Ex. 1033 U.S. Patent No. 5,830,327 to Kolenkow
`
`X
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`X
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`X
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`X
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`X
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`X
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`2
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`Case IPR2021-00104
`Patent No. 7,381,657
`Ex. 1034 U.S. Patent Publication No. 2001/0041252 to Laird
`X
`
`Ex. 1035 M. Ruske, Properties of SiO2 and Si3N4 layers deposited
`by MF twin magnetron sputtering using different target
`materials, Thin Solid Films (1999)
`Ex. 1036 W. Sproul, High-rate reactive DC magnetron sputtering
`of
`oxide and nitride superlattice coatings (1998)
`Ex. 1037 U.S. Patent Publication No. 2003/0029563 to Kaushal
`
`Ex. 1038 U.S. Patent No. 6,627,323 to Nagaraj
`
`Ex. 1039 I. Safi, A novel reactive magnetron sputtering technique
`for producing insulating oxides of metal alloys and other
`compound thin films (2000)
`Ex. 1040 U.S. Patent No. 6,001,227 to Pavate
`
`Ex. 1041 S. Wolf et al., Silicon Processing for the VLSI Era, Vol.
`1 (2000)
`Ex. 1042 Declaration of Dr. Ingrid Hsieh-Yee
`
`Ex. 1043 U.S. Patent Publication No. 2001/0031383 to Sakawaki
`
`Ex. 1044 U.S. Patent No. 4,895,631 to Wirz
`
`Ex. 1045 U.S. Patent No. 7,041,391 to Ando
`
`Ex. 1046 U.S. Patent No. 6,657,260 to Yamazaki
`
`Ex. 1047 A. Billard, Low-frequency modulation of pulsed d.c. or
`r.f. discharges for controlling the reactive magnetron
`sputtering process, Surface & Coatings Technology
`(1996)
`Ex. 1048 P. Kelly, The deposition of aluminum oxide coatings by
`reactive unbalanced magnetron sputtering (1996)
`Ex. 1049 U.S. Patent No. 7,247,227 to Hanson
`
`Ex. 1050 U.S. Patent No. 7,391,072 to Forbes
`
`Ex. 1051 International Publication No. WO 96/06203 to O’Brien
`
`X
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`X
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`X
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`X
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`X
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`X
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`X
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`3
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`
`Ex. 1052 File History of U.S. Patent No. 7,378,356
`
`Case IPR2021-00104
`Patent No. 7,381,657
`X
`
`Ex. 1053 Applied Physics Letters, Vol. 74, No. 9 (March 1, 1999)
`Webpages
`https://aip.scitation.org/toc/apl/74/9?size=all& and
`https://aip.scitation.org/doi/10.1063/1.123501 (visited
`Sept. 2020)
`
`Ex. 1054 U.S. Patent No. 5,331,218 to Moody
`
`Ex. 1055 Overall Revision of the Rules Regarding Industrial
`Scientific and Medical (ISM) Equipment, 50 Fed. Reg.
`36,061 (September 5, 1985)
`Ex. 1056 U.S. Patent No. 6,409,965 to Nagata
`
`Ex. 1057 U.S. Patent No. 6,284,110 to Sill
`
`Ex. 1058 U.S. Patent No. 5,148,133 to Zennamo
`
`Ex. 1059 P. Kelly et al., Reactive pulsed magnetron sputtering
`process for alumina films (2000)
`Ex. 1060 U.S. Patent Application No. 09/145,323 to Miller et al.
`
`Ex. 1061 U.S. Patent No. 4,960,651 to Pettigrew
`
`Ex. 1062 Pinnacle 20 kW DeviceNet, MDXL User 5702199-A,
`User Manual, (April 2001)
`Ex. 1063 U.S. Patent No. 6,010,583 to Annavarapu
`
`Ex. 1064 RESERVED
`
`
`
`Ex. 1065 Pinnacle Plus Pulsed DC Power Supply Data Sheet
`(April 1999)
`Ex. 1066 Advanced Energy Industries, Inc. SEC 10-K (2000)
`
`Ex. 1067 Pinnacle Plus 10kW User 5702269-B, User Manual,
`(June 2002)
`
`X
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`X
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`X
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`4
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`Case IPR2021-00104
`Patent No. 7,381,657
`Ex. 1068 Japanese Patent Publication No. JPH10102247A to
`X
`Aokura and certified English translation of
`JPH10102247A
`
`Ex. 1069 U.S. Patent Application Publication US 2001/0047838 to
`Segal
`RESERVED
`
`Exs.
`1070-
`1074
`
`X
`
`
`
`Ex. 1075 Complaint filed Demaray LLC v. Intel Corporation, Case
`No. 6-20-cv-00634 (W.D. Tex.)
`Ex. 1076 Complaint filed in Demaray LLC v. Samsung Electronics
`Co., Ltd. et al., Case No. 6-20-cv-00636 (W.D. Tex.)
`Ex. 1077 First Amended Complaint filed in Applied Materials, Inc.
`v. Demaray LLC, Case No. 5-20-cv-05676 (N.D. Cal.)
`Ex. 1078 Preliminary Injunction Motion filed in Applied
`Materials, Inc. v. Demaray LLC, Case No. 5-20-cv-
`05676 (N.D. Cal.)
`Ex. 1079 Docket Report (October 21, 2020) Applied Materials,
`Inc. v. Demaray LLC, Case No. 5-20-cv-05676 (N.D.
`Cal.)
`Ex. 1080 Docket Report (October 21, 2020) Demaray LLC v. Intel
`Corporation, Case No. 6-20-cv-00634 (W.D. Tex.)
`Ex. 1081 Docket Report (Oct. 21, 2020) Demaray LLC v. Samsung
`Electronics Co., Ltd. et al., Case No. 6-20-cv-00636
`(W.D. Tex.)
`Ex. 1082 Order Governing Proceedings (October 5, 2020)
`Demaray LLC v. Intel Corporation, Case No. 6-20-cv-
`00634 (W.D. Tex.)
`RESERVED
`
`Ex.1083-
`1092
`
`Ex. 1093 Excerpt of Board Call From Transcript of Cross-
`Examination of Dr. Zhang
`
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`5
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`Dated: November 18, 2021
`
`Case IPR2021-00104
`Patent No. 7,381,657
`
`Respectfully submitted,
`
`By: /Joseph E. Palys/
` Joseph E. Palys (Reg. No. 46,508)
` Counsel for Petitioner
`
`
`
`
`
`6
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`CERTIFICATE OF SERVICE
`
`Case IPR2021-00104
`Patent No. 7,381,657
`
`I hereby certify that on November 18, 2021, I caused a true and correct copy
`
`of the foregoing document Petitioner’s Current List of Exhibits to be served
`
`electronically on counsel for Patent Owner at the following addresses:
`
`hzhong@irell.com
`mwells@irell.com
`bhattenbach@irell.com
`dhuynh@irell.com
`DemarayIPRs@irell.com
`
`
`By:
`
`
`/Joseph E. Palys/
`Joseph E. Palys (Reg. No. 46,508)
`
`
`
`
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`
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