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`(54) Title: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
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`n-ch MISFET
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`(57) Abstract: A semiconductor device comprising an n-channel conductivitytype field-effect transistor having a channel forming
`region in a first region in one major surface of a semiconductor substrate, and a p-channel conductivity type field-effect transistor
`having a channel forming region in a second region different from the first region in the one major surface of the semiconductor
`substrate, wherein the inner stress generated in the channel forming region of the n-channel conductivity type field-effect transistor
`@\{ is different from the inner stress generated in the channel forming region ofthe p-channel conductivity type field-eflect transistor.
`> The inner stress generated in the channel forming region of the n-channel conductivitytype field-effect transistor is a tensile stress
`and the innerstress generated in the channel formingregion of the p-channel conductivity type field-effect transistoris a compressive
`je
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`[3A]
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`TSMC 1009
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`WO 02/43151 .
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`WO 02/43151
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`PCT/JP01/05633
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`PCT/JP01/05633
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`WO 02/43151
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`PCT/JP01/05633
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`WO 02/43151
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`PCT/JP01/05633
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`WO 02/43151
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`PCT/JP01/05633
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`WO 02/43151
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`PCT/JPO1/05633
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`WO 02/43151
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`PCT/JP01/05633
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`WO 02/43151
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`PCT/JP01/05633
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`WO 02/4315]
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`PCT/JP01/05633
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`29
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`

`WO 02/43151
`
` PCT/IPO1/05633
`
`30
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`WO 02/43151
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`PCT/JP01/05633
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`3
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