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`US008618607B 1
`
`(10)Patent No.:US 8,618,607 Bl
`
`c12) United States Patent
`(45)Date of Patent:
`Dec. 31, 2013
`
`
`Rashed et al.
`
`(58)Field of Classification Search
`
`(54)SEMICONDUCTOR DEVICES FORMED ON A
`
`USPC ................. 257/204, 359, 369, 379, 532, 536,
`
`
`
`
`
`CONTINUOUS ACTIVE REGION WITH AN
`
`
`257/E21.564, 568, 602, 656, 23.144, 152,
`
`ISOLATING CONDUCTIVE STRUCTURE
`
`
`257/27.024, 26, 81, 97, 98, 107, 29.226,
`
`POSITIONED BETWEEN SUCH
`257/276
`
`SEMICONDUCTOR DEVICES, AND
`
`
`See application file for complete search history.
`METHODS OF MAKING SAME
`
`
`
`
`
`References Cited
`
`U.S. PATENT DOCUMENTS
`
`(56)
`(75)Inventors: Mahbub Rashed, Santa Clara, CA (US);
`
`
`
`David Doman, Austin, TX (US); Marc
`
`
`Tarabbia, Pleasant Valley, NY (US);
`5,536,955 A * 7/1996 Ali ................................ 257/204
`
`
`
`Irene Lin, Los Altos Hills, CA (US);
`
`
`
`6,147,857 A * 11/2000 Worley et al. .............. 361/301.2
`Jeff Kim, San Jose, CA (US); Chinh
`
`
`
`6,558,998 B2 * 5/2003 Belleville et al. ............. 438/210
`
`
`Nguyen, Austin, TX (US); Steve Soss,
`
`
`
`
`7,189,602 B2 * 3/2007 Jiang et al. ....... 438/142
`
`Cornwall, NY (US); Scott Johnson,
`
`
`
`
`7,282,803 B2 * 10/2007 Cathelin et al. ............... 257 /7 58
`
`Wappingers Falls, NY (US); Subramani
`
`
`
`7,960,269 B2 * 6/2011 Lo et al ......................... 438/598
`
`
`
`8,421,158 B2 * 4/2013 Lin ............................... 257 /379
`
`Kengeri, San Jose, CA (US); Suresh
`
`
`
`
`8,453,094 B2 * 5/2013 Kornachuk et al. ........... 716/126
`
`
`Venkatesan, Malta, NY (US)
`
`
`
`8,471,391 B2 * 6/2013 Fox et al. ...................... 257 /776
`
`
`
`
`8,492,900 B2 * 7/2013 Lin et al. ....................... 257 /773
`
`
`
`
`2002/0063291 Al* 5/2002 Brown et al. ....... 257 /359
`
`
`
`2009/0101940 Al* 4/2009 Barrows et al. ............... 257 /204
`
`
`
`(73)Assignee: GLOBALFOUNDRIES Inc., Grand
`Cayman (KY)
`
`* cited by examiner
`( *) Notice: Subject to any disclaimer, the term ofthis
`
`
`
`- Michael Lebentritt
`
`Primary Examiner
`
`
`
`
`patent is extended or adjusted under 35
`
`
`(74)Attorney, Agent, or Firm - Williams, Morgan &
`
`
`U.S.C. 154(b) by O days.
`
`Amerson, P.C.
`
`(21)Appl. No.: 13/539,830
`
`(57)
`
`ABSTRACT
`
`(22)Filed:Jul. 2, 2012
`
`(2006.01)
`
`One illustrative device disclosed herein includes a continuous
`
`
`
`
`
`
`
`
`
`
`
`active region defined in a semiconducting substrate, first and
`
`
`second transistors formed in and above the continuous active
`
`
`
`
`region, each of the first and second transistors comprising a
`(51) Int. Cl.
`
`
`
`
`plurality of doped regions formed in the continuous active
`HOJL21/02
`
`
`
`
`
`region, a conductive isolating electrode positioned above the
`(52) U.S. Cl.
`
`
`
`
`
`
`continuous active region between the first and second tran
`USPC .... 257/359; 257/369; 257/379; 257/E21.602;
`
`
`
`
`
`sistors and a power rail conductively coupled to the conduc
`
`257/E21.656; 257/E23.144; 257/E23.152;
`tive isolating electrode.
`
`
`257/E27.029; 257/E27.081; 257/E29.226;
`257/E29.276
`
`
`
`
`36 Claims, 23 Drawing Sheets
`
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`U.S. Patent Dec. 31, 2013 Sheet 1
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`U.S. Patent
`Dec. 31, 2013 Sheet 4 of 23
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`U.S. Patent Dec. 31, 2013
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`Dec. 31, 2013 Sheet 8 of 23
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`Dec. 31, 2013 Sheet 10 of 23
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`1
`
`BACKGROUND OF THE INVENTION
`
`2
`dummy gate structures that are provided in an attempt to
`
`
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`SEMICONDUCTOR DEVICES FORMED ON A
`
`
`
`
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`improve dimensional accuracy when forming the gate struc
`
`CONTINUOUS ACTIVE REGION WITH AN
`
`tures 30 for the device 10.
`
`ISOLATING CONDUCTIVE STRUCTURE
`FIG. 2 depicts another illustrative prior art device 50. The
`
`
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`POSITIONED BETWEEN SUCH
`
`
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`device comprises illustrative PFET devices 20Pl and 20P2
`
`
`SEMICONDUCTOR DEVICES, AND
`
`formed above spaced apart active regions. The device 50 also
`METHODS OF MAKING SAME
`
`
`
`includes illustrative NFET transistors that are
`22Nl, 22N2
`
`
`also formed above spaced apart active regions. FIG. 2 depicts
`
`
`an illustrative relatively high voltage power rail 40H that is
`
`
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`10 conductively coupled to the illustrative source regions (''S")
`1. Field of the Invention
`
`
`
`contacts of the PFET devices 20Pl, 20P2 via illustrative 52H.
`Generally, the present disclosure relates to the manufacture
`
`
`
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`
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`relatively low voltage Also depicted in FIG. 2 is an illustrative
`
`
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`of sophisticated semiconductor devices, and, more specifi
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`power rail 40L that is conductively coupled to the source
`
`
`
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`cally, to a plurality of semiconductor devices formed in and
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`regions of the NFET devices 22Nl, 22N2 via illustrative
`
`
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`above a continuous active region and a conductive isolating
`15 contacts
`52L.
`
`
`
`
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`structure formed above the active region between the devices.
`With each new technology generation, all dimensions of
`
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`
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`2. Description of the Related Art
`
`
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`the integrated circuit product are typically reduced. For
`The fabrication of advanced integrated circuits, such as
`
`
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`
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`example, as device dimensions are reduced, the lateral spac
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`
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`CPU's, storage devices, ASIC's (application specific inte
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`
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`ing 39 (see FIG. 1) between adjacent active regions, e.g., the
`
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`
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`grated circuits) and the like, requires the formation of a large 20
`
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`the active regions lateral spacing 39 between 12PA and 12PB,
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`
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`number of circuit elements in a given chip area according to
`
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`also decreases. In some cases, the lateral spacing 39 may be as
`
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`a specified circuit layout. Field effect transistors (FETs) rep
`
`
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`little as about 40 nm. As this lateral spacing decreases, there
`
`
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`resent one important type of circuit element that substantially
`
`
`
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`is an increased risk of creating short circuits between the two
`
`
`
`
`determines performance of the integrated circuits. Field
`
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`
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`adjacent cells. Of course, one way to rectify this problem
`
`
`
`
`effect transistors are typically either NFET devices or PFET 25
`
`
`would be to simply increase the spacing between adjacent
`
`
`
`
`devices. During the fabrication of complex integrated cir
`
`
`
`
`active regions. However, such an approach would be very
`
`
`
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`cuits, millions of transistors, e.g., NFET transistors and/or
`costly in terms of the plot space on the device that is lost and
`
`
`
`PFET transistors, are formed on a substrate including a crys
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`
`
`
`would run counter to the trend in integrated circuit products of
`
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`
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`talline semiconductor layer. A field effect transistor, irrespec
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`
`
`
`reducing the size of such products. Other techniques have
`
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`tive of whether an NFET transistor or a PFET transistor is 30
`
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`
`
`been tried to alleviate this problem, e.g., a so-called Rx-tuck
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`
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`
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`considered, typically comprises so-called PN junctions that
`
`
`process, but such processes also tend to consume excessive
`
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`
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`are formed by an interface ofhighly doped regions, referred to
`
`
`amounts of chip plot space and may result in considerable
`
`
`as drain and source regions, with a slightly doped or non
`device performance degradation.
`doped region, referred to as a channel region, disposed
`
`
`The present disclosure is directed to a plurality of semi-
`
`
`
`
`
`between the highly doped source/drain regions. The channel
`
`
`
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`35 conductor devices formed in and above a continuous active
`
`
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`length of a transistor is generally considered to be the lateral
`
`
`region and a conductive isolating structure formed above the
`
`
`distance between the source/drain regions.
`
`
`
`
`
`active region between the devices that may avoid, or at least
`
`
`
`As device dimensions have continued to shrink over recent
`
`
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`reduce, the effects of one or more of the problems identified
`
`years, it is becoming more challenging to accurately and
`
`
`
`above.
`repeatedly manufacture integrated circuit products that meet 40
`
`
`
`
`
`
`performance criteria established for such integrated circuit
`SUMMARY OF THE INVENTION
`
`
`
`
`products. Typically, semiconductor devices are formed on
`
`
`discrete islands of semiconducting substrate, i.e., active
`The following presents a simplified summary of the inven
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`
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`regions that are defined in the substrate by isolation struc
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`
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`tion in order to provide a basic understanding of some aspects
`
`
`
`
`prior 45 tures. For example, FIGS. an illustrative 1 and 2 depict
`
`
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`of the invention. This summary is not an exhaustive overview
`
`
`
`
`cells ("Cell art device 10 comprised of first and second 1" and
`
`
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`of the invention. It is not intended to identify key or critical
`"Cell 2"). The cells are intended to be representative in nature.
`
`
`
`
`elements of the invention or to delineate the scope of the
`
`
`For example, in one illustrative example, Cell 1 may be a
`
`
`
`invention. Its sole purpose is to present some concepts in a
`
`NAND circuit and Cell 2 may also be a NAND circuit. In
`
`
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`simplified form as a prelude to the more detailed description
`
`
`
`another example, inverter Cell 1 may be an and Cell 2 may be 50
`
`
`that is discussed later.
`a flip-flop.
`Generally, the present disclosure is directed to a device that
`
`
`
`
`
`
`
`
`
`comprises a plurality of semiconductor devices formed in and
`
`
`
`With continuing reference to FIGS. 1 and 2, a plurality of
`
`
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`above a continuous active region and a conductive isolating
`12PA, 12PB, 12NA and 12NB are
`
`
`spaced apart active regions
`
`
`
`
`
`structure formed above the active region between the devices,
`defined in a semiconducting substrate by one or more isola
`
`
`
`
`
`
`
`and various methods of making such a device. One illustrative
`tion structures. A plurality of PFET devices 20Pl-2 are 55
`
`
`
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`
`
`
`device disclosed herein includes a continuous active region
`of formed in and above the active region 12PA and a plurality
`
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`
`
`
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`defined in a semiconducting substrate, first and second tran
`PFET devices 20P3-4 are formed in and above the active
`
`
`
`
`
`
`sistors formed in and above the continuous active region, each
`source/ P-doped region 12PB. The PFET devices comprise
`
`
`
`
`
`
`
`of the first and second transistors comprising a plurality of
`drain regions 32P, while the NFET devices 22Nl-4 comprise
`
`
`
`
`
`
`active region, a conformed in the continuous example,60 doped regions N-doped source/drain regions 32N. In the depicted
`
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`the various PFET and NFET devices share a common elecductive isolating electrode positioned above the continuous
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`
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`
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`and a the first and second transistors region between active active trode structure 30 that extends across the separated
`
`
`
`
`
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`regions and the isolation region therebetween. For example, power rail conductively coupled to the conductive isolating
`
`
` electrode. PFET transistor 20Pl and NFET transistor 22Nl share a
`
`first includes device disclosed herein illustrative Another common gate electrode structure 30 that extends across both 65
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`in a semiconactive regions defined region and second continuous of the active regions 12PA, 12NA and the isolation
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`formed in and second PFET transistors substrate, first between those two active regions. The structures ducting 14 may be
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`BRIEF DESCRIPTION OF THE DRAWINGS
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`and above the first continuous active region, and first and and devices are schematically depicted in the drawings for
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`purposes of explanation only and so as to not obscure the
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`present disclosure with details that are well known to those
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`skilled in the art. Nevertheless, the attached drawings are
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`first and second PFET transistors, a first power rail conduc
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`first and second NFET transistors and a second power rail
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`trode, wherein the second power rail is adapted to be at a
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`15 understood by skilled artisans, such a special definition will
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`manner that directly and unequivocally provides the special
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`The disclosure may be understood by reference to the
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`The present disclosure is directed to a device that com-
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`following description taken in conjunction with the accom
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`20 prises a plurality of semiconductor devices formed in and
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`above a continuous active region and a conductive isolating
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`like elements, and in which:
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`structure formed above the active region between the devices,
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`prior examples of various FIGS. 1 and 2 depict illustrative
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`art semiconductor devices formed in a semiconducting sub
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`readily apparent to those skilled in the art upon a complete
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`25 reading of the present application, the presently disclosed
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`FIGS. 3A-3C are schematic depictions of illustrative
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`subject matter may be used with a variety of different devices
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`embodiments of semiconductor devices formed on continu
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`isolating electrode structures disclosed herein;
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`ucts, including, but not limited to, ASIC's, logic devices,
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`FIGS. 4A-4C are schematic depictions of illustrative
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`drawto the attached 30 memory devices, etc. With reference
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`examples of various possible configurations of illustrative
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`ings, various illustrative embodiments of the devices and
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`semiconductor devices disclosed herein;
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`methods disclosed herein will now be described in more
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`FIGS. S A-SE are plan and cross-sectional views depicting
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`semiconductor of illustrative various possible configu rations
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`drawings that explain FIG. 3A-3C are various schematic
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`devices disclosed herein;
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`certain aspects of the various devices disclose herein. As
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`views depicting FIGS. 6A-6D are various cross-sectional
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`another possible configuration of illustrative semiconductor
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`active continuous active region 112P and a second continuous
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`devices disclosed herein; and
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`region 112N formed in a semiconducting substrate. The
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`views depicting FIGS. 7A-7D are various cross-sectional
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`in the semiconducting active regions 112P, 112N are defined
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`yet another possible configuration ofillustrative semiconduc
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`40 substrate by isolation structures 113 that may be formed using
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`tor devices disclosed herein.
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`traditional techniques. The substrate may take the form of a
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`While the subject matter disclosed herein is susceptible to
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`silicon-on-insulator (SOI) substrate that is comprised of a
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`various modifications and alternative forms, specific embodi
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`bulk substrate, a buried insulation layer (a so-called BOX
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`layer) and an active layer positioned above the box layer. In
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`45 such an embodiment, the active regions 112P, 112N would be
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`understood, however, that the description herein of specific
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`embodiments is not intended to limit the invention to the
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`particular forms disclosed, but on the contrary, the intention is
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`silicon. Thus, the terms substrate or semiconducting substrate
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`to cover all modifications, equivalents, and alternatives fall
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`as used herein and in the appended claims should not be
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`ing within the spirit and scope of the invention as defined by
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`50 considered as limited to any particular configuration or mate
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`of PFET With continuing reference to FIG. 3A, a plurality
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`devices are formed in and above the active region
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`are formed in ofNFET devices Various illustrative embodiments of the invention are 112P and a plurality 122Nl-4
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`described below. In the interest of clarity, not all features of an 55 and above the active region 112N. The PFET devices 120 and
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`mateactual implementation are described in this specification. It the NFET devices 122 may be formed using traditional
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`will of course be appreciated that in the development of any rials and techniques. For example, the PFET devices 120 may
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`P-doped such actual embodiment, numerous implementation-specific be comprised of various P-doped regions 132P, e.g.,
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`decisions must be made to achieve the developers' specific source/drain regions, and the NFET devices 122 may be
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`goals, such as compliance with system-related and business60 comprised of various N-doped regions 132N. In the depicted
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`a related constraints, which will vary from one implementation example, the device 100 is a CMOS device that comprises
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`to another. Moreover, it will be appreciated
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`by the plurality of common gate structures that such a devel 130 that are shared
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`opment effort might be complex
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`various PFET devices and time-consuming, but 120 and NFET devices 122. The com-
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`above both of the would nevertheless be a routine undertaking for those of mon gate structures 130 are positioned
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`ordinary skill in the art having the benefit of this disclosure. active regions 112P, 112N and they each span the isolation
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`The present subject
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`material positioned matter will now be described with between the active regions 112P, 112N. In
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`reference to the attached figures. Various structures, systems other applications, the device 100 may not have this illustra-
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`DETAILED DESCRIPTION
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`electrodes 150PG and 150NG formed on number of isolating tive common gate structure As will be appreconfigu ration.
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`ciated by one skilled in the art after a complete reading of the the device 100, nor the number of transistors that may be
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`present application, the gate structures 130 may be formed associated with each of the isolating electrodes 150PG and
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`using a variety of different materials and by performing a 150NG. Moreover, the number of transistors associated with
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`variety of known techniques. For example, the gate insulation each of the isolating electrodes 150PG and 150NG need not
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`layer in such a gate structure 130 may be comprised of a be the same for either of the active regions 112P or 112N, and
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`variety of different insulating materials, e.g., silicon dioxide, it need not be uniform within either of the active regions 112P,
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`a so-called high-k insulating material (k value greater than 112N. For example, the devices 100 disclosed herein may be
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`10). The gate electrode in such a gate structure 130 may be employed in situations wherein there are hundreds if not
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`comprised of polysilicon or it may contain at least one metal 10 thousands of transistors formed in each of the active regions
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`layer. The gate structures 130 of the transistor 100 may be 112P, 112N and hundreds of isolating electrodes 150PG and
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`made using so-called "gate first" or "gate last" techniques. 150NG. FIG. 3C is a simplistic line-based drawing indicating
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`Thus, the presently disclosed inventions should not be conone example of a device 100 comprised of fourteen PFET
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`sidered as limited to any particular materials of construction devices 120, five isolating electrodes 150PG that are coupled
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`for the gate structures 13 0 nor the manner in which such a gate 15 to the power rail 140H, fourteen NFET devices 122 and five
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`structure 130 is formed.
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`isolating electrodes 150NG that are coupled to the power rail
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`Still with continuing reference to FIG. 3A, the device 100 140L. Thus, the presently disclosed inventions should not be
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`further comprises an isolating electrode 150PG that is conconsidered as limited to any particular number or arrange
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`ductively coupled to a schematically depicted power rail ment of transistor devices or any particular number or
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`140H at a logically high voltage, e.g., V dd· The device also 20 arrangement of the isolating electrodes 150PG, 150NG.
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`includes an isolating electrode 150NG that is conductively FIG. 4A-4C depict various illustrative examples that sche
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`coupled to a power rail 140L that is at a logically low voltage, matically depict how the device 100 may be configured in
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`e.g., ground. Of course, the absolute magnitude of the voltvarious situations. FIG. 4A depicts the illustrative example
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`ages on the power rails 140H, 140L may vary depending upon wherein the isolating electrodes 150PG, 150NG are posi
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`the particular application, but the voltage on the power rail 25 tioned between source regions ("S") of the respective transis
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`140H will be relatively higher than the voltage on the power tors. The drain regions ("D") of the various transistors are also
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`rail 140L. In the illustrative example shown in FIG. 3A, the depicted in FIG. 4A. More specifically, in FIG. 4A, the iso
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`isolating electrodes 150PG, 150NG are separated by a dislating electrode 150PG is positioned between the source
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`tance 142. In the depicted embodiment, the isolating elecregions of the PFET devices 120P2 and 120P3, while the
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`trode 150PG spans across the entirety of the active region isolating electrode 150NG is positioned between the source
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`112P, while the isolating electrode 150NG spans across the regions of the NFET devices 122N2 and 122N3. In this illus-
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`entirety of the active region 112N. In one illustrative emboditrative example, the source regions of the PFET devices
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`ment, the isolating electrodes 150PG and 150NG have the 120P2-3 are coupled to the power rail 140H by schematically
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`same structure and configuration as the gate structures 130, depicted conductive structures 144, while the source regions
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`and they may be initially formed at the same time the gate 35 of the NFET devices 122N2-3 are coupled to the power rail
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`structures 130 are formed. In other cases, the isolating elec140L by schematically depicted conductive structures 146.
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`trodes 150PG and 150NG may be comprised of different FIG. 48 depicts the illustrative example wherein the iso-
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`materials, may be a different physical size and/or may be lating electrodes 150PG, 150NG are positioned between a
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`formed at different times as compared to the gate structures source region (''S") on one adjacent transistor and a drain
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`130. In one illustrative embodiment, the isolating electrodes region ("D") on the other adjacent transistor. More specifi
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`150PG and 150NG and the gate structures 130 are all initially cally, in FIG. 48, the isolating electrode 150PG is positioned
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`formed as elongated continuous line-type structures. Therebetween the source region of the PFET device 120P2 and the
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`after, the isolating electrodes 150PG and 150NG are defined drain region of the PFET device 120P3, while the isolating
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`by performing another etching process. The isolating elecelectrode 150NG is positioned between the source region of
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`trodes 150PG and 150NG may be conductively coupled to the 45 the NFET device 122N2 and the drain region of the NFET
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`power rails 140H, 140L, respectively, by any of a variety of device 122N3. In this illustrative example, the source region
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`different conductive structures that are formed in a layer of of the PFET device 120P2 is conductively coupled to the
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`insulating material positioned above the substrate. The isopower rail 140H by schematically depicted conductive struc
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`lating electrodes 150PG and 150NG each have a long axis tures 144, while the source region of the NFET device 122N2
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`and, in one embodiment, the long axis of the isolating elec-50 is coupled to the power rail 140L by schematically depicted
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`trade 150PG is substantially aligned with the long axis of the conductive structures 146. The drain region of the PFET
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`isolating electrode 150NG.
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`device 120P3 and the drain region of the NFET device 122N3
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`FIG. 38 depicts one illustrative embodiment
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`tive unit cell lOOA of the device
`strap 148 and illustrative 100. In this example, the unit contacts.
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`FIG. 4C depicts 120P2 and 120P3 that 55 the illustrative example wherein the iso-
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`cell lOOA comprises PFET transistors
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`are positioned on opposite
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`lating electrodes sides of the isolating electrode 150PG, 150NG are positioned between
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`150PG and NFET transistors
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`drain regions 122N2 and 122N3 that are ("D") of the respective transistors. More spe
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`positioned on opposite
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`cifically, in FIG. 4C, the isolating sides of the isolating electrode electrode 150PG is posi
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`150NG. Stated another way, the isolating
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`tioned between electrode 150PG is the drain regions of the PFET devices 120P2
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`positioned above a space between the adjacent doped regions 60 and 120P3, while the isolating electrode 150NG is positioned
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`of the transistors
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`between the drain regions 120P2 and 120P3, while the isolating elec of the NFET devices 122N2 and
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`trode 150NG is positioned above a space between
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`122N3. In this illustrative the adja example, only the isolating elec
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`cent doped regions of the transistors
`trodes 150PG, 150NG are coupled 122N2 and 122N3. Of to the power rails 140H,
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`course, as will be appreciated by one skilled
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`140L, respectively. in the art after a In this example, the drain region of the
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`complete reading of the present application, the inventions 65 PFET device 120P3 and the drain region of the NFET device
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`disclosed herein are not limited in terms of how many tran122N3 are conductively coupled to one another via a conduc
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`sistors may be formed in the active regions 112P, 112N, the tive strap 148 and illustrative contacts, while the drain region
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`of the NFET of the PFET device 120P2 and the drain region
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`the insulating layers 180, 182. In one illustrative example,
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`via a device 122N2 are conductively coupled to one another
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`of silicon dioxinsulating layers 180, 182 may be comprised
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`contacts. The various conductive strap 149 and illustrative
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`of silicon ide and the insulating layer 181 may be comprised
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`conductive structures
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`144, 146, 148, 149 and the depicted
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`nitride. The thickness of the various layers ofinsulating mate
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`they or material, contacts may be of any desired configu ration
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`rial may vary depending upon the particular application and
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`may be formed in one or more layers of insulating materials
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`they may be formed by performing a variety of known tech
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`positioned above the substrate, and they may be formed using
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`niques, e.g., chemical vapor deposition (CVD), atomic layer
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`a variety of different techniques.
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`deposition (ALD), or plasma enhanced versions of those pro-
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`illustrative With reference to FIGS. SA-SE, further
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`10 cesses. The various conductive structures, such as the power
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`embodiments of various inventions disclosed herein will be
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`rails 140H, 140L and the previously described contacts 190P,
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`view of one further described. FIG. SA is a schematic plan
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`of 192P, 190N and 192N, may be comprised of a variety
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`illustrative embodime