`
`Daniel L. Flamm
`476 Green View Drive, Walnut Creek, CA 94596
`(925) 826‑ 3113 dlf@alum.mit.edu
`
`
`
`
`Profile
`Internationally recognized scientist/chemical engineer with experience in nanotechnology, process
`control, applied chemistry, instrumentation, and computer software and hardware. Former
`chemical/electrical engineering professor, researcher, inventor, corporate founder/board member.
`Experienced programmer and network administrator. Patent attorney and technical expert in domestic
`and international patent disputes and litigation.
`Education and Professional Certifications
`Massachusetts Institute of Technology, Bachelor of Science (Mathematics, minor Physics), 1964
`Massachusetts Institute of Technology, Master of Science (Chemical Engineering), 1966
`Massachusetts Institute of Technology, Doctor of Science (Chemical Engineering), 1970
`Golden Gate University School of Law, Juris Doctor (Intellectual Prop. Certif. with Distinction), 2004
`California Bar No. 239,825
`
`U.S. Patent Bar No. 54,100
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`Texas Prof. Engineer No. 34,308
`Employment
` 2008–present
`Microtechnology Law and Analysis, Walnut Creek, Cal.
`Patent and Trademark Attorney, Semiconductor Processing & Intellectual Property Consultant.
`Patent drafting/prosecution/strategy in areas such as photovoltaics, digital image technology,
`data networking, internet servers, business methods, plasma sources, thin film technologies, and
`material delivery systems. Work included PCT and international practice, infringement
`analysis, scientific technical analysis, and art searches, trademark prosecution, and general
`counsel services.
`2007–2008
`Buchanan Ingersoll and Rooney, LLP, Redwood Shores, Cal.
`Associate.
`Patent drafting and prosecution in areas such as multimedia, digital voice and video
`recognition, optical network switching, food supplement production, integrated circuit
`processing, gene databases, focused ion beam systems, high frequency device modeling, and
`endpointing.
`2006–2006
`Sughrue Mion, PLLC, Mountain View, Cal.
`Contract Associate.
`Patent drafting and prosecution in areas such as multimedia, digital voice and video
`recognition, optical network switching, food supplement production, integrated circuit
`processing, gene databases, focused ion beam systems, high frequency device modeling, and
`endpointing.
`1989–2005
`Microtechnology Analysis Grp, Walnut Creek, Cal.
` CEO & Technical Consultant
`Technical, scientific, engineering consulting, co-development and market research for domestic
`semiconductor device & equipment manufacturers such as National Semiconductor, Applied
`Materials, ASM America, Lam Research Corporation and others. Experts and expert services
`provided to law firms and corporate counsel. Joint semiconductor equipment product and
`intellectual property development, and technical support for multinational Japanese
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`Exhibit 2004
`IPR2017-0406 Page 1
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`1972–1976
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`1977–1989
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`corporation.
`
`University of California, Berkeley, Cal. 1988–1998
`McKay Lecturer, Department of Electrical Engineering and Computer Science
`Taught graduate seminars in plasma processing and display technology, conducted research in
`semiconductor processing such plasma sources for pattern definition and extreme UV
`lithography semiconductor technology at University of California and Lawrence Livermore
`Laboratories.
`AT&T Bell Laboratories, Murray Hill, New Jersey
`Distinguished Member of Technical Staff
`Pioneering research in plasma etching, plasma, chemical vapor deposition, optoelectronics
`materials processing. Discovered/patented novel plasma chemistries and plasma sources,
`directional plasma CVD, fluorinated silicon nitride, oxygen enhanced diamond film deposition,
`laser-induced fluorescence diagnostics, photochemical-distillation purification technology.
`Managed design, purchase, installation and operations of Materials Research Division computer
`network. Personally did systems software support. Developed prototype instrumentation,
`computer hardware and Unix software to automate laboratory experiments. Member of patent
`and licensing review committees.
`Texas A&M University, College Station, Texas
`Assistant Professor
`Taught core chemical engineering courses and performed research directed to air pollution
`chemistry and analyses. Developed exhaust and ambient air sampling and analysis techniques
`in collaboration with the EPA and Texas State Air Control Board. Research in corona discharge
`purification and ozone generation.
`
`Other Employment:
`Crystalline Materials, San Ramon, Cal., Founder and Vice President of Research and Development. Invented
`and developed diamond manufacturing technology
`Mattson Technology, Sunnyvale, Cal., Vice President of Technology. Managed process and product
`development
`Solid State Technology, West Coast Editor. Reported technology news, wrote articles, gathered and reviewed
`content.
`Foxboro Company, Foxboro, Mass., Senior Design Programmer. Designed and coded process control
`programs, direct digital control drivers and application software, supervised compiler and assembler
`subcontracts.
`Stanford University and NASA Ames Research Center, Stanford/Mountain View Cal. Summer Faculty
`Fellow. Developed air purification technology for space cabin atmospheres.
`Texas State Air Pollution Control Services, Austin, Texas. Consultant. Developed new techniques for source
`and ambient air pollution sampling and analysis.
`Shell Development Co., Shell Chemical Co., Emeryville, Cal. and New York City. Engineer. Simulated
`chemical refinery problems.
`Moleculon Corp., Cambridge, Mass. Consultant. Programmed computational chemistry codes.
`IBM Corp., Santurce, Puerto Rico. Systems Engineer. Designed and programmed business and accounting
`applications.
`
`
`Short Course Instructor/Director
`Organizer/Instructor of short courses on Plasma Etching Technology, Plasma Chemistry, Flat Panel Displays.
`Creating and Managing Intellectual Property in the Semiconductor Industry and Diamond Films for
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`Exhibit 2004
`IPR2017-0406 Page 2
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`organizations such as SEMI (Semiconductor Equipment and Materials Institute), IUPAC (International Union
`of Pure and Applied Chemistry), SPIE (International Society for Optical Engineering) and University of
`California Berkeley Continuing Education.
`
`Selected Board and Committee Memberships
`MIT Educational Counselor (2004‑ present), No. Calif. Plasma Etch Users' Group (1991‑ present),
`SEMI Technology Symposium, (2000-2005); Board of Directors, Yield Up International Corporation,
`(1998‑ 2000), National Research Council, Panel for NIST CST Program Assessment, (1997-2000),
`National Science Foundation, Technology Center Review Board, 1988, IUPAC Subcommittee on
`Plasma Chemistry, (1980-1987), AWWA Joint Task Group, Std. Methods Dissolved Ozone (1978‑
`1985), National Science Foundation CPE Advisory Board, (1981‑ 1983), National and international
`technical meeting/conference organizer, chair, committee member for professional societies such as
`American Vacuum Society, SEMI, IUPAC, Gordon Conferences and SPIE.
`
`Misc. Honors, Awards
`Japan Society for the Promotion of Science Fellowship, Bell Laboratories Exceptional Contribution Award
`(for discovery and development of fluorinated PECVD nitride), Tegal Corporation Thinker Award, Bell
`Laboratories Exceptional Contribution Award (for development and support of a divisional computer system),
`Bell Laboratories Distinguished Member of Technical Staff Award, Bell Laboratories Lump Sum Award (for
`conception and development of low pressure gaseous etching), NASA Certificate of Recognition for "Corona
`Discharge Air Purification System," NASA Certificate of Recognition for "Electric Discharge for Treatment
`of Trace Contaminants," National Science Foundation Graduate Fellowship.
`
`Technical Publications/Patents
`Author of more than 150 articles and books in areas such as materials processing, plasma chemistry and
`physics, air pollution and general chemical engineering. Inventor/Co-Inventor of more than 20 U.S. patents.
`
`Samples, in the Area of Semiconductor Processing
`Multi-Temperature Processing, U.S. Pat. RE40,264, Apr. 29, 2008.
`Process Depending on Plasma Discharges Sustained by Inductive Coupling, U.S. Pat. 6,017,221, Jan. 25, 2000
`Process Optimization in Gas Phase Dry Etching, U.S. Pat. 5,711,849, Jan. 29, 1998
`Device Fabrication by Plasma Etching, U.S. Pat. 4,314,875, Feb. 9, 1982
`Plasma Etching of Silicon, U.S. Pat. 4,310,380, Jan. 12, 1982.
`Devices and Process for Producing Devices Containing Silicon Nitride Films, U. S. Pat. 4,960,656, Oct. 2,
`1990.
`Plasma Etching, An Introduction, Academic Press, 1989.
`Plasma Etching (with J.A. Mucha), Ch. 15 in The Chemistry of the Semiconductor Industry, S.J. Moss and A.
`Ledwith eds., Chapman and Hall, 1987.
`Profiles and Chemistry Effects in Polysilicon and Tungsten Silicode EPROM “Stack” Etching, with R.
`Sadjadi and J. R. Perry,p.; p24 in SPIE Proc. Vol. 1803, 1993.
`Aniosotropic Etching of SiO2 in Low-Frequency CF4/O2 and NF3/Ar Plasmas
`Hydrogen Passivation of Point Defects In Silicon, with J.L. Benton, C. J. Doherty, S.D. Ferris, L. C.
`Kimerling, and H. J. Leamy, Appl. Phys. Lett., p. 670, 1980.
`Plasma Etching for III-V Compound Devices, Part I, Part II, with D. Ibbotson, in Solid State Technology, p.
`77, Oct. 1988, p. 105, Nov. 1988.
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`Exhibit 2004
`IPR2017-0406 Page 3
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