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`UNITED STATES PATENT AND TRADEMARK OFFICE
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`BEFORE THE PATENT TRIAL AND APPEAL BOARD
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`MICRON TECHNOLOGY, INC.,
`INTEL CORPORATION, GLOBALFOUNDRIES U.S., INC., and
`SAMSUNG ELECTRONICS COMPANY, LTD.,
`Petitioners,
`
`v.
`
`DANIEL L. FLAMM,
`
`Patent Owner.
`
`
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`
`
`PTAB Case No. IPR2017-004061
`Patent No. 5,711,849
`
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`
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`PETITIONERS’ UPDATED EXHIBIT LIST
`
`
`
` 1
`
` Samsung Electronics Company, Ltd. was joined as a party to this proceeding via
`Motion for Joinder in IPR2017-01748.
`
`
`
`
`
`PTAB Case No. IPR 2017-00406
`Patent No. 5,711,849
`Petitioners’ Updated Exhibit List
`
`
`
`
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`
`
`Updated Exhibit List
`
`Exhibit #
`
`Description
`
`1001
`
`1002
`
`1003
`
`1004
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`1005
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`1006
`
`1007
`
`1008
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`1009
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`1010
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`1011
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`U.S. Patent No. 5,711,849 (“849 Patent”)
`
`File History for U.S. Patent No. 5,711,849
`
`Declaration of Dr. David Graves (“Graves Decl.”)
`
`Curriculum Vitae of Dr. David Graves
`
`Alkire et al., Transient Behavior during Film Removal in Diffusion-
`Controlled Plasma Etching, J. Electrochem. Soc.: Solid-State
`Science and Technology, March 1985, pp. 648-656 (“Alkire”)
`
`Kao et al., Analysis of Nonuniformities in the Plasma Etching of
`Silicon with CF4/O2, J. Electrochem. Soc., Vol. 137 No. 3, March
`1990, pp. 954-960 (“Kao”)
`
`Galewski et al., Modeling of a High Throughput Hot-Wall Reactor
`for Selective Epitaxial Growth of Silicon, IEEE Transactions On
`Semiconductor Manufacturing, Vol. 5 No. 3, August 1991, pp. 169-
`179 (“Galewski”)
`
`Klavs F. Jensen, Chemical Engineering in the Processing of
`Electronic and Optical Materials: A Discussion, Advances in
`Chemical Engineering, Vol. 16, 1991, pp. 395-412 (“Jensen 1991”)
`
`Jensen et al., Modeling and Analysis of Low Pressure CVD
`Reactors, J. Electrochem. Soc., Vol. 130, No. 9, September 1983,
`pp. 1950-1957 (“Jensen 1983”)
`
`Hess et al., Plasma-Enhanced Etching and Deposition,
`Microelectronics Processing, Chemical Engineering Aspects,
`Advances in Chemistry Series 221, pp. 377-440 (“Hess”)
`
`Klavs F. Jensen, Micro-Reaction Engineering Applications of
`Reaction Engineering to Processing of Electronic and Photonic
`Materials, Chemical Engineering Science, Vol. 42, No. 5, 1987, pp.
`
`
`
`
`
`
`
`PTAB Case No. IPR 2017-00406
`Patent No. 5,711,849
`Petitioners’ Updated Exhibit List
`
`923-958 (“Jensen 1987”)
`
`U.S. Patent No. 4,918,031 (“Flamm 031”)
`
`U.S. Patent No. 5,304,282 (“Flamm 282”)
`
`U.S. Patent No. 4,815,201 (“Harris”)
`
`U.S. Patent No. 5,453,157 (“Jeng”)
`
`Petition for Inter Partes Review, Lam Research Corp. v. Daniel L.
`Flamm, IPR2016-00466
`
`Declaration of Mariellen F. Calter regarding Alkire et al., Transient
`Behavior during Film Removal in Diffusion-Controlled Plasma
`Etching (1985), Kao et al., Analysis of Nonuniformities in the
`Plasma Etching of Silicon with CF4/O2 (1990), and Galewski et al.,
`Modeling of a High Throughput Hot-Wall Reactor for Selective
`Epitaxial Growth of Silicon (1992)
`
`Steinfeld et al., Chemical Kinetics and Dynamics, Prentice Hall,
`Inc., 1989
`
`Dennis M. Manos and Daniel L. Flamm, Plasma Etching: An
`Introduction, Academic Press, 1989
`
`G. B. Thomas, Calculus and Analytical Geometry, 4th Ed.,
`Addison-Wesley, 1968
`
`Affidavit of Jared Bobrow in Support of Petitioner’s Motion for
`Admission Pro Hac Vice
`
`Affidavit of Chad S. Campbell in Support of Petitioners’ Motion
`for Pro Hac Vice Admission Under 37 C.F.R. §42.10(c)
`
`Reply Declaration of Dr. David Graves (“Graves Reply Decl.”)
`
`Micron’s Hearing Demonstratives
`
`1012
`
`1013
`
`1014
`
`1015
`
`1016
`
`1017
`
`1018
`
`1019
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`1020
`
`1021
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`1022
`
`1023
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`1024
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`
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`
`
`Dated: March 5, 2018
`
`
`WEIL, GOTSHAL & MANGES LLP
`201 Redwood Shores Parkway
`Redwood Shores, CA 94065
`650-802-3237
`
`PERKINS COIE LLP
`1201 Third Avenue, Suite 4900
`Seattle, WA 98101
`206-359-8000
`
`WHITE & CASE LLP
`701 Thirteenth Street, NW
`Washington, DC 20005-3807
`202-626-3600
`
`PTAB Case No. IPR 2017-00406
`Patent No. 5,711,849
`Petitioners’ Updated Exhibit List
`Respectfully submitted,
`
`
`
`Lead Counsel
`Jeremy Jason Lang, Reg. No. 73,604
`
`Back-up Counsel
`Robert Stephen Magee, Reg. No. 70,227
`Jared Bobrow, Pro Hac Vice
`Chad Campbell, Pro Hac Vice
`Jonathan McFarland, Reg. No. 61,109
`Philip A. Morin, Reg. No. 45,926
`David M. Tennant, Reg. No. 48,362
`Nathan Zhang, Reg. No. 71,401
`
`Attorneys for Petitioners
`
`
`
`
`
`PTAB Case No. IPR 2017-00406
`Patent No. 5,711,849
`Petitioners’ Updated Exhibit List
`CERTIFICATE OF SERVICE
`
`The undersigned hereby certifies that a true copy of the foregoing
`
`
`
`
`UPDATED EXHIBIT LIST has been served in its entirety this 5th Day of March,
`
`2018, by electronic mail on Patent Owner via its attorneys of record:
`
`LEAD COUNSEL
`Justin J. Lesko
`justinlesko@patentit.com
`Registration No. 69,643
`Law Offices of Steve G. Lisa, Ltd.
`7689 East Paradise Lane, Suite 2
`Scottsdale, AZ 85260
`(773) 484-3285
`
`Dated: March 5, 2018
`
`
`WEIL, GOTSHAL & MANGES LLP
`201 Redwood Shores Parkway
`Redwood Shores, CA 94065
`650-802-3237
`
`PERKINS COIE LLP
`1201 Third Avenue, Suite 4900
`Seattle, WA 98101
`206-359-8000
`
`WHITE & CASE LLP
`701 Thirteenth Street, NW
`Washington, DC 20005-3807
`202-626-3600
`
`
`
`
`
`BACK-UP COUNSEL
`Rolf O. Stadheim
`stadheim@stadheimgrear.com
`Stadheim & Grear, Ltd.
`7689 East Paradise Lane, Suite 2
`Scottsdale, AZ 85260
`(480) 998-3547
`
`Respectfully submitted,
`
`
`
`Lead Counsel
`Jeremy Jason Lang, Reg. No. 73,604
`
`Back-up Counsel
`Robert Stephen Magee, Reg. No. 70,227
`Jared Bobrow, Pro Hac Vice
`Chad Campbell, Pro Hac Vice
`Jonathan McFarland, Reg. No. 61,109
`Philip A. Morin, Reg. No. 45,926
`David M. Tennant, Reg. No. 48,362
`Nathan Zhang, Reg. No. 71,401
`
`Attorneys for Petitioners
`
`
`
`
`
`
`
`
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