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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition | Maurice Francombe, John Vossen | ISBN 9780125330183
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`Home» Materials Science» Structural Materials»Plasma Sources for Thin Film Deposition and Etching
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition
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`Francombe & Vossen
`18 Aug 1994
`Academic Press
`9780125330183
`9780080925134
`328
`229 X 152
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition
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`M.A. Lieberman and R.A. Gottscho, Design of High Density Plasma Sources for Materials Processing. O.A. Popov,
`Electron Cyclotron Resonance Plasma Sources and Their Use in PlasmaAssisted Chemical Vapor Deposition of Thin
`Films. S.L. Rohde, Unbalanced Magnetron Sputtering. C. Steinbruchel, The Formation of Particles in ThinFilm Processing
`Plasmas. References. Author Index. Subject Index.
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`http://store.elsevier.com/product.jsp?isbn=9780125330183&_requestid=1611063
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`1/2
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`Micron et al. Ex.1027 p.1
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`10/3/2016
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition | Maurice Francombe, John Vossen | ISBN 9780125330183
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`Micron et al. Ex.1027 p.2