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`Applied Materials Revolutionizes Planarization Technology with Breakthrough Reflexion LK Ecmp System
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`Page 1 of 2
`http://www.businesswire.com/news/trome/20040711005007/enlApplied-Materials-Revolut...
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`Applied Materials Revolutionizes Planarization Technology with Breakthrough Reflexion... Page2 of 2
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`The Applied Reflexion LK Ecmp system introduces innovative electro-chemical mechanical planarization capability that prov¡des a high-
`performance, cost-effective and extendible solution for 6Snm and below copper/low k manufacturing.
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`July 12,2OO4 12:01 AM Eastern Daylight Time
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`SANTA CLARA, Calif.-(BUSINESS WRE)-July '12, 2004-Applied Materials, lnc. (Nasdaq:AMAT) today announces a major breakthrough
`in planarization technology with its revolutionary 300mm Applied Reflexion LK Ecmp(TM) system. lntroducing innovative electro-chemical
`mechanical planarization (Ecmp) capability on Applied's proven Reflexion LK platform, the new system is the industry's first and only CMP
`tool to provide this high-performance, cost-effective and extendible solution for copper/low k manufacturing at 65nm and beyond.
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`"Our excit¡ng new CMP system blazes the way to a new era of advanæd CMP capab¡l¡ty for copper/low k inlerconnects," said Dr. Ming Xi, general managerof Appl¡ed lvlaterials'
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`Reflexion LK Ecmp system achieves all of these challenging goals while improv¡ng throughput up lo 25 perænt and reducing operating cosl up to 30 percent @mpared to @nventional
`coppôr pol¡sh¡n9 systems."
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`Accord¡ng to Gartner Dataquest, the copper CMP markel was $232 million in 2003 and is forecast to grow at a 37olo compounded annual growth rate through 2006.
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`designed to clean low k hydrophobic fìlms, @mplements
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`the Ecmp procass and provides a complete dry-in/dry-out sequen@.
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`cost'Foradd¡tionalinfofmationonlhesystem,p|easev¡sit@.
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`Contacts
`Applied Materials, lnc.
`Betty Newboe, 408-563-0647 (Editorial/Media)
`Paul Bowman, 408-563-1698 (Financial Community)
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`Page 2 of 2
`http://www.businesswire.com/newslhome/20040711005007/enlApplied-Materials-Revolut...
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