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`PATENT
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`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
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`APPLICANT:
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`Smith
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`CONF. NO.:
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`8145
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`APPLICATION NO.:
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`14/448,258
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`GROUP NO.:
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`2881
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`FILING DATE:
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`July 31, 2014
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`EXAMINER:
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`McCorrnack, Jason L.
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`TITLE:
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`Laser—driVen Light Source
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`RESPONSE TO OFFICE ACTION
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`Madam:
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`Applicant submits this paper in response to a non—final Office Action mailed
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`December 15, 2014. Applicant respectfully requests entry of the following amendments,
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`reconsideration and withdrawal of all grounds of objection and rejection, and passage of the case
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`to allowance. Applicant submits with this paper a fee and Petition for Extension of Time,
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`extending the due date for response to Tuesday, June 15, 2015. Applicant also submits herewith
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`a terminal disclaimer and fee, and fees for the new dependent claims. If any additional fees are
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`due, the Commissioner is hereby authorized to charge them to Attorney’ s Deposit Account No.
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`50-3081.
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`Amendments to the Claims begin on page 2 of this paper.
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`Applicant’s Remarks begin on page 6 of this paper.
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`Page 1 of 10
`Page 1 of 10
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`ASML 1109
`ASML 1109
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 2 of 10
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`AMENDMENTS TO THE CLAIMS
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`The following listing of claims replaces all previous versions and listings of claims in the
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`application.
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`1.
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`(currently amended) A plasma—based light source, comprising:
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`a pressurized chamber configured to contain an ionized gas at a ressure greater
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`than 10 atmos heres durin‘ 0 eration;
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`a substantially continuous laser for providing a beam of laser energy within a
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`wavelength ran are of up to about 2000 nm to the ionized gas within the
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`chamber to maintain a plasma, the beam configured to maintain the
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`plasma in an elongated form having a plasma length that is greater than
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`that of a plasma diameter; and
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`a tool optically coupled to the chamber for collecting light generated by the
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`plasma, the generated light having wavelengths of at least than 50 mm.
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`2.
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`(original) The light source of claim 1, wherein the plasma a length is at least 10 times that
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`of the plasma diameter.
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`3.
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`(original) The light source of claim 1, wherein the plasma length is at least 20 times that
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`of the plasma diameter.
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`4.
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`(original) The light source of claim 1, wherein the plasma length is at least 40 times that
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`of the plasma diameter.
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`5.
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`(original) The light source of claim 1, wherein the light generated by the plasma is
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`collected along an axis defined by the laser beam.
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`6.
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`(original) The light source of claim 1, wherein the laser comprises a continuous wave
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`(CW) laser.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 3 of 10
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`7.
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`(original) The light source of claim 1, wherein the gas is ignited to generate the ionized
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`gas without an ignition electrode and laser energy from a laser source is used to ionize or
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`excite the gas.
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`(currently amended) A plasma—based light source, comprising:
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`a pressurized chamber configured to contain an ionized gas at a pressure greater
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`than 10 atmos T heres during o eration;
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`a su.bstantially continuous laser for generating a beam of laser energy within a
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`wavelength range ofup to about 2000 nm;
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`an optical system coupled to the laser configured to maintain a plasma in an
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`elongated form having a plasma length that is greater than that of a plasma
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`diameter; and
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`a tool optically coupled to the chamber for collecting light generated by the
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`plasma, the generated light having wavelengths of at least 50 nm.
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`(original) The light source of claim 8, wherein the optical system is configured to sustain
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`the plasma such that the plasma length is at least 10 times that of the plasma diameter.
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`(original) The light source of claim 8, wherein the optical system is configured to sustain
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`the plasma such that the plasma length is at least 20 times that of the plasma diameter.
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`(original) The light source of claim 8, wherein the optical system is configured to sustain
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`the plasma such that the plasma length is at least 40 times that of the plasma diameter.
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`(original) The light source of claim 8, wherein the light generated by the plasma is
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`collected along an axis defined by the laser beam.
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`(original) The light source of claim 8, wherein the laser source comprises a continuous
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`wave (CW) laser.
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`10.
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`11.
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`12.
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`13.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 4 of 10
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`14.
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`15.
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`16.
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`17.
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`18.
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`19.
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`20.
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`(original) The light source of claim 8, wherein the gas is ignited to generate the ionized
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`gas without an ignition electrode and laser energy from a laser source is used to ionize or
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`excite the gas.
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`(currently amended) A method for producing light, comprising:
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`ionizing a gas within a pressurized chamber having a pressure greater than 10
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`atrnos _heres durin o eration; and
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`providing a beam of substantially continuous laser energy within a wavelength
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`range of up to about 2000 nrn to the ionized gas within the chamber to
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`maintain a plasma within the chamber,
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`wherein the laser beam is configured to maintain the plasma in an
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`elongated form having a plasma length that is greater than that of a
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`plasma diameter. the produced light having wayelentnths of at least
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`than 50 nm.
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`(original) The method of claim 15, wherein the plasma length is at least 10 times that of
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`the plasma diameter.
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`(original) The method of claim 15, wherein the plasma length is at least 20 times that of
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`the plasma diameter.
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`(original) The method of claim 15 , wherein the plasma length is at least 40 times that of
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`the plasma diameter.
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`(original) The method of claim 15 , wherein the light generated by the plasma is collected
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`along an axis defined by the laser beam.
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`(original) The method of claim 15 , wherein the laser comprises a continuous wave (CW)
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`laser.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 5 of 10
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`21.
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`22.
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`23.
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`24.
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`25.
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`(original) The method of claim 15, further comprising an optical system configured to
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`maintain the plasma in the elongated form.
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`(new) The plasma—based light source of claim 1 wherein the pressure is greater than 30
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`atmospheres during operation.
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`(new) The plasma—based light source of claim 8 wherein the pressure is greater than 30
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`atmospheres during operation.
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`(new) The method of claim 15 wherein the pressure is greater than 30 atmospheres during
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`operation.
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`(new) The method of claim 15 wherein the plasma length is not more than about 2 mm.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 6 of 10
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`Status of the claims
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`REMARKS
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`Claims 1-21 were pending in the application. Of these, claims 1, 8 and 15 are
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`independent. Claims 1, 8 and 15 are amended. New dependent claims 22-25 are added. Support
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`for the new and amended claims can be found in paragraphs 0013, 0069, 0070, 0143, 0164 and
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`0178 of the published application.
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`Rejections under 35 U.S.C. § 102
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`Claims 1, 8, 15 and 21 are rejected under 35 U.S.C. § 102 as anticipated by U.S.
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`Publication No. 2002/0044629 (“Hertz”).
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`Hertz describes a device for generating X—ray or EUV radiation (title of Hertz) in a
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`device having a low—pressure chamber, stating “FIG. 1 illustrates a preferred embodiment of the
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`inventive apparatus for generating X—ray or EUV radiation from a stable jet in a low—pressure
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`chamber...” (para. 0029; FIG. 1). Hertz states “this usually takes place at low pressure, to
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`prevent emitted soft X—rays or EUV radiation from being absorbed” (para. 0033). The low
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`pressure of Hertz are “maintained with a vacuum pump 13, which typically keeps the chamber
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`pressure at 10'3 — 10'4 mbar during operation” (para. 0041). When Hertz does reference high
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`pressure he describes, e.g., “Xenon 4 is urged under high pressure (usually 5-500 atmospheres)
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`from a pump (not shown) or a pressure vessel 5 through a small nozzle 6 having an orifice
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`diameter which usually is smaller than about 100 um and typically. . .results in a microscopic jet
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`2 of liquid...” (para. 0034).
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`Independent claims 1, 8 and 15 are hereby amended to recite the chamber having a
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`pressure greater than 10 atmospheres during operation, and light having wavelengths of at least
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`50 nm. These limitations are missing from Hertz. Moreover, Hertz would not work under the
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`claimed conditions as the wavelengths recited in these claims would be absorbed by, e.g., the
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`Xenon gas present in the chamber of Hertz if present at the claimed pressures.
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`Applicant submits that for at least these reasons these claims, and the claims that depend
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`therefrom, are not anticipated by Hertz.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 7 of 10
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`Rejections under 35 U.S.C. § 103
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`Claims 2, 3, 4, 9, 10, 11, 16, 17 and 18 are rejected as unpatentable over Hertz in View of
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`U.S. Publication No. 2003/0068012 (“Ahmad”).
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`Ahmad does not cure the deficiencies of Hertz discussed above. Ahmad does not use a
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`laser. Ahmad also relates to an EUV light source (title) and operates at a deep vacuum, stating
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`“a vacuum (in the range of 1 to 20 Pa) is realized in the entire discharge chamber 3 by means of
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`an oppositely connected vacuum system 9”( para. 0041 of Ahmad).
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`For at least these reasons, and the reasons discussed above with respect to Hertz, Ahmad
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`and Hertz, taken alone or in combination, do not teach or suggest all the elements of Applicant’s
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`amended independent claims. Neither reference teaches or suggests a plasma—based light source
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`having wavelengths of at least 50 nm in a chamber having an operating pressure greater than 10
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`atmospheres.
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`Claims 5, 7, 12, 14 and 19 are rejected over Hertz in view of U.S. Publication No.
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`2004/0238762 (“Mizoguchi”).
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`Mizoguchi fails to cure the defects of Hertz discussed above. For example, Mizoguchi
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`fails to teach or suggest a pressurized plasma chamber. Instead, Mizoguchi notes that “extreme
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`ultraviolet light with a wavelength of approximately 13 nm [] is emitted from an extreme
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`ultraviolet light source inside a vacuum chamber (not shown in the figures) .
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`.
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`. .” Mizoguchi at
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`para. 0005. Mizoguchi’s generation of EUV light “having a wavelength of several nanometers to
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`several tens of nanometers” (Mizoguchi at para. 0063) also differs from Applicant’s amended
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`claims, which now recite light having wavelengths of at least 50 nm.
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`Claims 6, 13 and 20 are rejected over Hertz in view of U.S. Patent No. 4,179,566. The
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`Office Action indicates this patent is to Conrad, but Applicant notes this patent number is to
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`Nadelson. Nadelson relates to an unrelated technology, namely Substituted Hydroxy Pyridones.
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`Nadelson does not relate to lasers, plasmas, or light sources.
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`Applicant previously cited U.S. Patent No. 4,152,625 to Conrad (“Conrad ’625”) and
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`responds below as if this is the patent intended by the examiner.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 8 of 10
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`Conrad ’625 fails to cure the deficiencies of Hertz discussed above. Conrad ’625 is not a
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`light source. Instead, Conrad ’625 describes manipulation of a magnetic field strength, a laser
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`output power and a laser output intensity to maintain a stationary plasma location and increase
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`plasma temperature (col. 2, lines 50-58).
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`Since neither Hertz, Ahmad, Mizoguchi nor Conrad ’625, either alone or in combination,
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`teach or suggest the claimed plasma—based light source having wavelengths of at least 50 nm in a
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`chamber having an operating pressure greater than 10 atmospheres, Applicant submits that
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`amended independent 1, 8 and 15, and that claims that depend therefrom, all define patentable
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`subject matter.
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`Moreover, Applicant amends independent claims 1, 8 and 15 to recite a substantially
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`continuous laser providing the beam of laser energy within a wavelength range of up to about
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`2000 nm. Applicant submits that these limitations further distinguish these claims, and the
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`claims that depend therefrom, from the cited references.
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`Double patenting
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`Claims 1, 8 and 15 are rejected on the ground of nonstatutory double patenting as
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`unpatentable over claim 1 of U.S. Patent No. 8,525,138 in view of Hertz. Claims 1, 8 and 15 are
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`provisionally rejected on the ground of nonstatutory double patenting as unpatentable over
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`claims 1, 13 or 26 of U.S.S.N. 13/964938 (now USPN 9,048,000) in view of Hertz. Claims 1, 8
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`and 15 are provisionally rejected on the ground of nonstatutory double patenting as unpatentable
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`over claims 21 of U.S.S.N. 13/964938 (now USPN 9,048,000). Claims 2, 3, 4, 9, 10, 11, 16, 17
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`and 18 are provisionally rejected on the ground of nonstatutory double patenting as unpatentable
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`over claim 22 of U.S.S.N. 13/964938 (now USPN 9,048,000) in view of Ahmad. Claims 6, 13
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`and 20 are provisionally rejected on the ground of nonstatutory double patenting as unpatentable
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`over claim 8 or 16 of U.S.S.N. 13/964938 (now USPN 9,048,000) in view of Hertz. Claims 1, 8
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`and 15 are provisionally rejected on the ground of nonstatutory double patenting as unpatentable
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`over claims 1, 58, 67 or 68 of U.S.S.N. 13/024027 (now USPN 8,525,138) in view of Hertz.
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`Claims 1, 8 and 15 are rejected on the ground of nonstatutory double patenting as unpatentable
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`over claims 2, 14 or 38 of U.S. Patent No. 7,989,786 in view of Hertz. Claims 1, 8 and 15 are
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`rejected on the ground of nonstatutory double patenting as unpatentable over claims 1, 17, 19,
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ—005CP3C2
`Page 9 of 10
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`28, 34 or 39 of U.S. Patent No. 7,786,455 in View of Hertz. Claims 1, 8 and 15 are rejected on
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`the ground of nonstatutory double patenting as unpatentable oVer claims 1, 30, 37, 67 or 78 of
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`U.S. Patent No. 7,435,982 in View of Hertz. Claims 1, 8 and 15 are provisionally rejected on the
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`ground of nonstatutory double patenting as unpatentable oVer claims 1, 13 15 or 20 of U.S.S.N.
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`14/510959 (now USPN 8,969,841) in View of Hertz. Claims 2, 3, 4, 9, 10, 11, 16, 17 and 18 are
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`proVisionally rejected on the ground of nonstatutory double patenting as unpatentable oVer
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`claims 7 or 30 of U.S.S.N. 14/510959 (now USPN 8,969,841) in View of Ahmad.
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`Applicant submits herewith a terminal disclaimer and fee to oVercome these rejections.
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`The new claims
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`Applicant submits herewith new dependent claims 22-25. Support for the new claims can
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`be found, e.g., in para. 0070 and 0178 of the application. Applicant submits these new claims
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`are also allowable at least because they depend from allowable independent claims.
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`US Patent Serial No. 14/448,258
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`Attorney Docket No. EGQ-005CP3C2
`Page 10 of 10
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`CONCLUSION
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`Applicant requests that the Examiner reconsider the application and claims in light of the
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`foregoing amendments and remarks, and respectfully submit that the pending claims are in
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`condition for allowance.
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`The Examiner is invited to call the undersigned attorney at (617) 526-9626 to discuss the
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`application.
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`Date: June 15, 2014
`Reg. No.: 45,238
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`Tel. No.: (617) 526-9626
`Fax No.: (617) 526-9899
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`Respectfully submitted,
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`
`
`,
`9
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`*3"
`Gerald Worth, P.E.
`Proskauer Rose LLP
`
`Attorney for the Applicant
`One International Place
`Boston, MA 02110
`
`49974533V1