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`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
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`Attorney Docket No. EGQ—005CP3C1
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`PATENT
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`APPLICANT:
`
`Smith
`
`CONFIRMATION NO.:
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`1022
`
`APPLICATION NO.:
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`13/964,938
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`GROUP NO.:
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`2881
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`FILING DATE:
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`August 12, 2013
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`EXAMINER :
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`McCormack, Jason L.
`
`TITLE:
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`High Brightness Laser—DriVen Light Source
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`Commissioner for Patents
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`P.O. Box 1450
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`Alexandria, VA 22313-1450
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`Madam:
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`AMENDMENT AND RESPONSE
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`This paper is submitted in response to the non—final Office Action mailed from the PTO
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`on February 27, 2015. Applicant submits herewith a fee for the terminal disclaimer. If any
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`additional fees are due upon submission of this paper, the Commissioner is hereby authorized to
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`charge them to Attorney’s Deposit Account No. 50-3081.
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`Applicant respectfully requests entry of this Preliminary Amendment, in which:
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`Amendments to the Claims begin on page 2, and
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`Applicant’s Remarks begin on page 7.
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`ASML 1218
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`ASML 1218
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`
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`Amendment and Response
`Attorney Docket No. EGQ-005CP3Cl
`Application No.2 13/964,938
`Page 2 of 8
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`Amendments to the Claims
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`Please amend the claims as follows, in compliance with 37 C.F.R. § l.l2l(c). This
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`listing of claims will replace all prior versions, and listings, of claims in the application:
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`Listing of the Claims:
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`1. (Previously presented) A method for illuminating features of a semiconductor wafer,
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`comprising:
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`ionizing a gas within a sealed pressurized plasma chamber having an operating
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`pressure of at least 10 atmospheres;
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`providing substantially continuous laser energy having a wavelength range of up
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`to about 2000 nm through a region of material of the sealed pressurized chamber that is
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`transparent to the substantially continuous laser energy to the ionized gas to sustain a
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`plasma within the sealed pressurized plasma chamber to produce plasma—generated
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`light having wavelengths greater than 50 nm; and
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`illuminating the wafer with plasma— generated light having wavelengths
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`greater than 5 0 nm that exits the sealed pressurized chamber.
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`2. (Original) The method of claim 1, further comprising using the plasma—generated light to
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`measure the features of the wafer.
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`3.
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`(Previously presented) The method of claim 1, wherein a magnitude of the brightness of
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`the light does not vary by more than 90% during operation.
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`4. (Previously presented) The method of claim 1, further comprising using an optical element
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`to deliver the plasma—generated light from the pressurized plasma chamber to a wafer
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`inspection system.
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`5. (Canceled)
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`
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`Amendment and Response
`Attorney Docket No. EGQ-005CP3C1
`Application No.2 13/964,938
`Page 3 of 8
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`6. (Canceled)
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`7. (Canceled)
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`8. (Previously presented) The method of claim 1, wherein the laser source comprises a
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`continuous wave (CW) laser.
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`9. (Original) The method of claim 1, wherein the plasma—generated light comprises ultraviolet
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`light.
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`10-12. (Canceled)
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`13. (Currently amended) A laser driven light source comprising:
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`a sealed pressurized plasma chamber having an ignition source for ionizing a gas
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`within the chamber and a sapphire window for maintaining a pressure therein;
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`a laser for providing at least substantially continuous energy through the sapphire
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`window to the ionized gas within the pressurized plasma chamber to sustain a
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`plasma and produce plasma—generated light having wavelengths greater than 50
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`nm, the pressure of the plasma chamber during operation is greater than 10
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`atmo spheres+;‘~;m:%
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`
`
` exit the pressurized Cha1flb€1"‘Ei‘i
`-.-
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`:.:‘~1‘::‘.\:1§11:‘‘1:::§:z:-‘E*:8‘t.-'1" .
`
`14. (Previously presented) The laser—driven light source of claim 13, wherein the pressurized
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`plasma chamber contains one or more of a noble gas, Xe, Ar, Ne, or Kr.
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`15. (Previously presented) The laser—driven light source of claim 13, wherein the ignition
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`source comprises or includes an electrode, an ultraviolet ignition source, a capacitive ignition
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`source, an inductive ignition source, an RF ignition source, a microwave ignition source, a flash
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`
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`Amendment and Response
`Attorney Docket No. EGQ-005CP3C1
`Application No.2 13/964,938
`Page 4 of 8
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`lamp, a pulsed laser, a pulsed lamp or the laser.
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`16. (Previously presented) The laser—driven light source of claim 15, wherein the laser source
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`comprises a continuous wave (CW) laser.
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`17. (Previously presented) The laser—driven light source of claim 13, wherein the laser
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`comprises at least one laser selected from the group consisting of an IR laser, a diode laser, a
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`fiber laser, an ytterbium laser, a C0; laser, a YAG laser, and a gas discharge laser.
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`18. (Previously presented) The laser—driven light source of claim 13, further comprising at least
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`one optical element to focus and modify a property of the energy of the laser, the property
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`selected from the group consisting of diameter, direction, divergence, convergence, orientation,
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`and wavelength.
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`19. (Previously presented) The laser—driven light source of claim 13, further comprising at least
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`one optical element to modify a property of the plasma— generated light emitted by the ionized gas
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`as the plasma— generated light is delivered to the tool.
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`20. (Previously presented) The laser—driven light source of claim 13, wherein the tool is
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`selected from the group consisting of a wafer inspection tool, a microscope, a metrology tool,
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`and a lithography tool.
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`21-25. (Canceled)
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`26. (Previously presented) A method for producing light comprising:
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`ionizing with an ignition source a gas within a pressurized plasma chamber, the pressure
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`of the plasma chamber during operation is greater than 10 atmospheres;
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`providing (i) laser energy having a wavelength range up to about 2000 nm and (ii) energy
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`from the ignition source to the ionized gas within the pressurized plasma chamber
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`to generate or sustain a plasma in the chamber to produce a plasma— generated light
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`having wavelengths greater than 50 nm; and directing the plasma—generated light
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`
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`Amendment and Response
`Attorney Docket No. EGQ-005CP3Cl
`Application No.2 13/964,938
`Page 5 of 8
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`out of the pressurized plasma chamber through a transparent region of the
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`pressurized plasma chamber.
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`27. (Previously presented) The method of claim 26 further comprising providing sufficient
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`energy from the ignition source to the plasma to maintain a desired temperature of the plasma
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`chamber or to maintain a desired pressure of gas or vapor within the plasma chamber.
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`28. (Previously presented) The method of claim 26 further comprising operating the ignition
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`source during operation of the laser.
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`29-30. (Canceled )
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`31. (Previously presented) The method of claim 1 wherein the pressure of the plasma chamber
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`during operation is greater than 10 atmospheres.
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`32. (Previously presented) A light source, comprising:
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`a sealed pressurized chamber comprising a window and a curved reflective surface, the
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`pressurized chamber having an operating pressure greater than atmospheric pressure;
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`an ignition source for ionizing a gas within the pressurized chamber;
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`at least one laser external to the pressurized chamber for providing electromagnetic
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`energy to produce a plasma that generates plasma—generated light having wavelengths greater
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`than 50 nm; and
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`a curved reflective surface receiving at least a portion of the plasma— generated light
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`emitted by the plasma and reflecting the plasma— generated light toward the window, wherein the
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`emitted light and laser energy pass through the window.
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`33. (Previously presented) The light source of claim 32, wherein the pressurized chamber has a
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`pressure of at least 10 atmospheres during operation.
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`34. (Previously presented) The light source of claim 32 wherein the ignition source is at least one
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`of an RF ignition source, or electrodes within the pressurized chamber, the electrodes located on
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`opposite sides of the plasma [8/8].
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`
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`Amendment and Response
`Attorney Docket No. EGQ-005CP3Cl
`Application No.2 13/964,938
`Page 6 of 8
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`35. (Previously presented) The method of claim 1, wherein the transparent material is formed of
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`at least one of sapphire or quartz.
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`36. (Currently amended) The method of claim 1, wherein the plasma-3%;
`t.gea§rg:%11eratetl light
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`exits the sealed pressurized chamber via a second transparent region.
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`37. (Currently amended) The laser driven light source of claim 13, wherein the
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`
`'\;::wL‘ix:§\‘>“\:V3l8.S(')I' has a wavelengtli ranoe of up to about 2000 nm.
`
`
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`38. (Currently amended) The laser driven light source of claim
`
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`
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`
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`
`lasn1a— enerated lir ht toward the sa __3hire window. wherein the emitted li' ht and laser ener
`
`pass through the window.
`
`39. (Currently amended) The laser driven light source of claim 13, wherein the
`
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`
`o _erati0n is Greater than 30 atmos heres.
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`
`
`Amendment and Response
`Attorney Docket No. EGQ-005CP3C1
`Application No.2 13/964,938
`Page 7 of 8
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`Status of the Claims
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`REMARKS
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`Applicant hereby cancels claim 6 and amends claims 13 and 36-39. Dependent claim 36
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`is amended to correct a typographical error. Support for the amended claims can be found in
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`paragraphs 0045-0047, 0070, 0143, 00154 of the publication of the application, U.S. Pub. No.
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`2014/01 1725 8. Applicant submits that no new matter is added to the application by these
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`amendments. After entry of these amendments, claims 1-4, 8, 9, 13-20, 26-28, and 31-39 will be
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`pending in the application and are presented for consideration.
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`Teleghonic Interview
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`The following is a record of the substance of a telephonic interview held with the
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`examiner on March 5, 20154, in accordance with the requirements of MPEP 713. The
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`undersigned thanks the examiner for his thoughtful and helpful comments and suggestions.
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`Present at the interview were Examiner McCormack, Don Smith, Joseph Capraro and Gerald
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`Worth. The discussion focused on amendments to the claims that could be made to overcome
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`the rejection would overcome the rejection under 35 U.S.C. § 112. In this paper, Applicant
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`hereby amends the claims accordingly.
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`Double Patenting
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`Applicant submits herewith an executed terminal disclaimer to overcome the double
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`patenting rejections.
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`Re 'ecti0ns under 35 U.S. C.
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`112
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`The Office Action rejects claims 13-20 and 37-39 under 35 U.S.C. § 112, referencing the
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`means for allowing limitation of claim 13. Applicant hereby amends claim 13 to remove this
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`rejection. Applicant also amends dependent claims 37-39. In view of these claim amendments,
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`Applicant submits that these rejections are overcome.
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`
`
`Amendment and Response
`Attorney Docket No. EGQ-005CP3C1
`Application No.2 13/964,938
`Page 8 of 8
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`0biected—t0 Claims
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`Applicant submits that these claims are now allowable, without amendment, in View of
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`the claim amendments and terminal disclaimer submitted herewith.
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`CONCLUSION
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`Applicant requests that the Examiner consider the application and claims in light of the
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`foregoing amendment, and respectfully submits that the pending claims are in condition for
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`allowance. The Examiner is invited to call the undersigned attorney at (617) 526-9800 to discuss
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`the application.
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`Date: March 5, 2015
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`Reg. No.: 36,471
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`Tel. No.: (617) 526-9800
`Fax No.: (617) 526-9899
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`Respectfully submitted,
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`/Joseph A. Capraro Jr. 36,471/
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`Joseph A. Capraro Jr.
`Proskauer Rose LLP
`
`Attorney for the Applicant
`One International Place
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`Boston, MA 02110
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`47800892V1