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IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`Attorney Docket No. EGQ—005CP3C1
`
`PATENT
`
`APPLICANT:
`
`Smith
`
`CONFIRMATION NO.:
`
`1022
`
`APPLICATION NO.:
`
`13/964,938
`
`GROUP NO.:
`
`2881
`
`FILING DATE:
`
`August 12, 2013
`
`EXAMINER :
`
`McCormack, Jason L.
`
`TITLE:
`
`High Brightness Laser—DriVen Light Source
`
`Commissioner for Patents
`
`P.O. Box 1450
`
`Alexandria, VA 22313-1450
`
`AMENDMENT AND RESPONSE TO FINAL OFFICE ACTION
`
`Madam:
`
`This paper is submitted in response to the final Office Action mailed from the Patent
`
`Office on July 17, 2014. Applicant submits herewith a Request for Prioritized Examination, a
`
`Request for Continued Examination (RCE), a Petition for Extension of Time, and related fees.
`
`In the event any additional fees are due, the Commissioner is hereby authorized to charge them to
`
`Attomey’s Deposit Account No. 50-3081.
`
`Applicant respectfully requests entry of this Amendment and Response, in which:
`
`Amendments to the Claims begin on page 2, and
`
`Applicant’s Remarks begin on page 7.
`
`ASML 1009
`ASML 1211
`ASML 1211
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3Cl
`Page 2 of 10
`
`Amendments to the Claims
`
`Please amend the claims as follows, in compliance with 37 C.F.R. § l.l2l(c). This
`
`listing of claims will replace all prior versions, and listings, of claims in the application:
`
`Listing of the Claims:
`
`1. (Currently amended) A method for illuminating features of a semiconductor wafer,
`
`comprising:
`
`ionizing a gas within a sealed pressurized plasma chamber having an operating
`
`
`
`resseure of at least 10 atmos heres;
`
`providing substantiallv continuous laser energy having a wavelengtli ranoe of up
`
`to about 2000 nm throuoh a reoion of material of the sealed _31‘essu1*ized chamber that is
`
`trans arent to the substantiall continuous laser energv to the ionized gas to sustain a
`
`plasma within the sealed pressurized plasma chamber to produce plasma—generated
`
`light having wavelengths greater than 50 nm; and
`
`illuminating the wafer with »‘&s‘<=.\<~%\\plasma— generated light__l;ayi;1g__yg_ay§l§;;1g_§l;1§
`
`reater than 50 rim that exits the sealed ressurized chamber.
`
`2. (Original) The method of claim 1, further comprising using the plasma—generated light to
`
`measure the features of the wafer.
`
`
`
`4. (Previously presented) The method of claim 1, further comprising using an optical element
`
`to deliver the plasma—generated light from the pressurized plasma chamber to a wafer
`
`inspection system.
`
`5. (Canceled)
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 3 of 10
`
`6. (Currently amended) The method of claim_1--5%, wherein the at least one laser emits
`
`electromagnetic energy at a wavelength of 823.2 nm, 881.9 nm, 980 nm, 992.3 nm, or 1473.3
`
`1’1lTl.
`
`7. (Canceled)
`
`8. (Currently amended) The method of claim~i}5;l, wherein the laser source comprises a
`
`continuous wave (CW) laser.
`
`9. (Original) The method of claim 1, wherein the plasma—generated light comprises ultraviolet
`
`light.
`
`10-12. (Canceled)
`
`13. (Currently amended) A
`
`
`
`
`ilaser driven litrht source comprising:
`
`
`
`21 .§_eal;c2si_.pr6SSuriZ6d Plasma Chambér haVing an .i..g.!.1_i.‘§.i__é?_E_1___§91$Q2.flit._i_€2[1i2;i.E1g..§§i3
`
`gas within the chamber and a sa )hii'e window for maintainino a ressure
`therein;
`
`a laser for providing at least substantially continuous energy through the sapphire
`
`_y§._/'_i_n_g_i_Q__\3_»_'__to the ionized gas within the pressurized plasma chamber to sustain a
`
`plasma and produce plasma—generated light having wavelengths greater than 50
`
`nm. the ressure of the lasma chamber durin 0 ieration is reater than 10
`
`atmosggheres; and
`
`a means for allowino the lasma--generated li ht to exit the ressurized lasma chamber
`
` .
`
`.».
`.— -,-W.
`. :\\~.\-Au :\
`:
`.
`3:
`.
`.,
`1
`K
`_
`,
`‘.5 n.
`,
`¥‘;“.:~‘3.‘}.“.‘z\‘.?i‘\‘>‘. “.‘-1‘;“;1“§f::>¥v:t§t‘%‘““z‘S$‘.Ha ‘
`
`\‘3i‘,‘“i§“_§‘,‘x.. \.
`
`
`
`
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 4 of 10
`
`
`
`16. (Currently amended) The
`
`3%--lElS€1‘---Cl1'1V€H
`
`light source of claim 15, wherein the laser
`
`source comprises a continuous wave (CW) laser.
`
`17. (Currently amended) The s‘}y=s}i;\<%m“elaser—d1‘iven light source of claim 13, wherein the laser
`
`comprises at least one laser selected from the group consisting of an IR laser, a diode laser, a
`
`fiber laser, an ytterbium laser, a C02 laser, a YAG laser, and a gas discharge laser.
`
`18. (Currently amended) The
`
`least one optical element to focus and modify a property of the energy of the laser, the property
`
`selected from the group consisting of diameter, direction, divergence, convergence, orientation,
`
`and wavelength.
`
`19. (Currently amended) The
`
`
`
`’ ‘ mar-—iEase1‘—driV‘en light source of claim 13, further comprising at
`
`least one optical element to modify a property of the plasma— generated light emitted by the
`
`ionized gas as the plasma— generated light is delivered to the tool.
`
`20. (Currently amended) The
`
`
`
`“'3m---laser~driVen liglit source of claim 13, wherein the tool is
`
`selected from the group consisting of a wafer inspection tool, a microscope, a metrology
`
`tool, and a lithography tool.
`
`21-25. (Canceled)
`
`26. (Currently amended) A method for producing light comprising:
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3Cl
`Page 5 of 10
`
`ionizing with an ignition source a gas within a pressurized plasma chamber, the pressure
`
`
`
`of the lasma chambe1'duri‘n/ 0 eration is treater than 10 atmos ")l‘1é31‘€S;
`
`
`
`
`
`providing (iilaser energy havint. a wavelen th range u 3 to about 2.0()() nm and ii ‘) ernerfi V
`
`12119.13.__t11§__ig.ni_tiQt1__§g22tg:_.t0 the ionizéd gas Within the P.;£t_?_l§‘_§_t!£i;§£1_.IZl_%§_EI!.%_.Chambflf
`
`t0 g6n6rat6 Or Sustain ‘<1 plasma in th6 Chamb6f__!9..L2£9£l_!£§§__i:‘:_.Rlflé!l1fl:££§l!.§£%_E§§i_li§§;h£
`
`having wavelengths greater than 50 nm; and
`
`
` enerated light out of the iessurized lasma chamber throu' h a
`
`
`
`directin the _ lasma—
`
`
`
`27. (Currently amended) The method of claim 26 further comprising providing sufficient energy
`
`from the ignition source to the plasma to maintain a desired temperature of the plasma chamber
`
`or to maintain a desired ressure of as or va or within the lasma chamber.
`
`
`
`
`28. (Previously presented) The method of claim 26 further comprising operating the ignition
`
`source during operation of the laser.
`
`29-30. (Canceled )
`
`31. (New) The method of claim 1 wherein the pressure of the plasma chamber during operation is
`
`greater than 10 atmospheres.
`
`32. (New) A light source, comprising:
`
`a sealed pressurized chamber comprising a window and a curved reflective surface, the
`
`pressurized chamber having an operating pressure greater than atmospheric pressure;
`
`an ignition source for ionizing a gas within the pressurized chamber;
`
`at least one laser external to the pressurized chamber for providing electromagnetic
`
`energy to produce a plasma that generates plasma—generated light having wavelengths greater
`
`than 50 nm, ; and
`
`a curved reflective surface receiving at least a portion of the plasma— generated light
`
`emitted by the plasma and reflecting the plasma— generated light toward the window, wherein the
`
`emitted light and laser energy pass through the window.
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 6 of 10
`
`33. (New) The light source of claim 32, wherein the pressurized chamber has a pressure of at
`
`least 10 atmospheres during operation.
`
`34. (New) The light source of claim 32 wherein the ignition source is at least one of an RF
`
`ignition source, or electrodes within the pressurized chamber, the electrodes located on opposite
`
`sides of the plasma [8/8].
`
`35. (New) The method of claim 1, wherein the transparent material is formed of at least one of
`
`sapphire or quartz.
`
`36. (New) The method of claim 1, wherein the plasma—generaged light exits the sealed
`
`pressurized chamber via a second transparent region.
`
`37. (New) The laser driven light source of claim 13, wherein the means for allowing is the
`
`sapphire window.
`
`38. (New) The laser driven light source of claim 13, wherein the means for allowing is a second
`
`window.
`
`39. (New) The laser driven light source of claim 13, wherein the means for allowing comprises
`
`an optical element.
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 7 of 10
`
`REMARKS
`
`Claims 1-30 were pending in the application. Applicant notes that the Amendment After
`
`Final submitted on October 22, 2014 was not entered. The claim markings presented in the
`
`present amendments to the claims are thus based on the claims that were submitted on June 17,
`
`2014. Claims 1, 3, 6, 8, 13-20, 26 and 27 are hereby amended. Claims 5, 7, 10-12, 21-25, 29
`
`and 30 are canceled. New claims 31-39 are hereby added, of which only claim 32 is
`
`independent. After entry of these amendments, claims 1-4, 6, 8, 9, 13-20, 26-28 and 31-39 will
`
`be pending in the application and are presented for consideration. Of these, claims 1, 13, 26 and
`
`32 are independent.
`
`Support for the new and amended claims can be found at least in paragraphs 0011, 0014,
`
`0019, 0045-0047, 0069, 0143, 0164, 0154 and the figures of the published application. In View
`
`of the following remarks, Applicant respectfully requests reconsideration and withdrawal of all
`
`grounds of rejection and passage of the case to allowance.
`
`Teleghonic Interview
`
`The following is a record of the substance of a telephonic interview held with the
`
`examiner on October 2, 2014, in accordance with the requirements of MPEP 713. The
`
`undersigned thanks the examiner for his thoughtful and helpful comments and suggestions.
`
`Present at the interview were Examiner McCormack, Don Smith, Joseph Capraro and Gerald
`
`Worth. During discussions with the Examiner, agreement was reached that the proposed claim
`
`amendments would overcome the prior art of record. In this paper, Applicant hereby amends the
`
`independent claims accordingly.
`
`Re'ections under 35 U.S.C.
`
`102 b
`
`The Office Action rejects claims 1, 7, 9, 10, 12, 13, 14, 15, 20, 26 and 28 as anticipated
`
`by U.S. Patent Publication No. 2004/0016894 (“Wester”). Of these, claims 1, 13 and 26 are
`
`independent. (Claim 10 is canceled by this paper.)
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 8 of 10
`
`Applicant hereby amends each of these independent claims to recite that the pressure of
`
`the plasma chamber during operation is greater than 10 atmospheres. As discussed during the
`
`telephonic interview, Wester does not teach or suggest this claim element. Applicant thus
`
`submits that for at least this reason these claims, and the claims that depend therefrom, define
`
`patentable subject matter.
`
`Applicant also amends independent claims 1,13 and 26 to recite that the plasma generated
`
`light has wavelengths greater than 50 nm. As discussed during the interview, EUV light sources
`
`do not emit light having wavelengths greater than 50 nm.
`
`Re'ections under 35 U.S.C.
`
`103 a
`
`The Office Action rejects dependent claims 2, 4 and 19 as obvious over Wester in view of
`
`U.S. Patent Publication No. 2005/0243390 (“Tejnil”). However, Tejnil describes an EUV light
`
`source that does not cure the defects of Wester discussed above. Since each of these claims
`
`depends from an allowable independent claim, Applicant submits that these claims also define
`
`patentable subject matter at least for this reason.
`
`The Office Action rejects claims 3, 5, 11, 17 and 18 as obvious over Wester in view of
`
`U.S. Patent Publication No. 2004/0183038 (“Hiramoto”). Claims 5 and 11 are canceled by this
`
`paper. Hiramoto describes an EUV light source that does not cure the defects of Wester
`
`discussed above. Since each of these claims depends from an allowable independent claim,
`
`Applicant submits that claims 3, 17 and 18 also define patentable subject matter at least for this
`
`reason.
`
`The Office Action rejects claim 6 as obvious over Wester in view of U.S. Patent
`
`Publication No. 2005/0205 81 1(“Partl0”). Partlo describes an EUV light source that does not
`
`cure the defects of Wester discussed above. Since this claim depends from an allowable
`
`independent claim, Applicant submits that claim 6 also defines patentable subject matter at least
`
`for this reason.
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 9 of 10
`
`The Office Action rejects claims 8 and 16 as obvious over Wester in View of U.S. Patent
`
`Publication No. 2004/0238762 (“Mizoguchi”). Mizoguchi describes an EUV light sources that
`
`does not cure the defects of Wester discussed above. Since these claims depend from allowable
`
`independent claims, Applicant submits that these claims also define patentable subject matter at
`
`least for this reason.
`
`The Office Action rejects claims 21, 22, 23, 25 and 30 as obvious over Wester in view of
`
`U.S. Patent No. 3,826,996 (“J aegle”). These claims are all canceled by this paper without
`
`prejudice.
`
`The Office Action rejects claim 24 as obvious over Wester in view of J aegle and further
`
`in view of U.S. Patent Publication No. 2006/0219957 (“Ershov”). This claim is canceled by this
`
`paper without prejudice.
`
`The Office Action rejects claim 27 as obvious over Wester in view of U.S. Patent No.
`
`4,789,788 (“Cox”). Cox also does not cure the defects of Wester. For example, Cox is silent
`
`concerning the operating pressure of his optically pumped radiation source and does not generate
`
`a plasma. Since this claim depends from an allowable independent claim, Applicant submits that
`
`this claim also defines patentable subject matter at least for this reason.
`
`The Office Action rejects claim 29 as obvious over Wester in view of U.S. Patent
`
`Publication No. 2004/0129896 (“Schmidt”). This claim is canceled by this paper without
`
`prejudice.
`
`The new claims
`
`Applicant hereby adds new claims 31-39. Of these, only new claim 32 is independent.
`
`Applicant submits that claims 31 and 35-39 are allowable at least because each depends from
`
`allowable independent claim 1 or 13.
`
`New independent claim 32 recites a light source having a pressurized chamber with an
`
`operating pressure greater than atmospheric pressure that produces a plasma— generated light
`
`

`
`Amendment and Response to Office Action
`Application No.2 13/964,938
`Attorney Docket EGQ-005CP3C1
`Page 10 of 10
`
`having wavelengths greater than 50 nm. The sealed pressurized chamber of the light source also
`
`includes a window through which both the laser energy and the emitted plasma— generated light
`
`pass. Applicant submits that none of the references of record teach or suggest these features, and
`
`thus that claim 32, and claims 33 and 34 that depend therefrom, also define patentable subject
`
`matter.
`
`CONCLUSION
`
`Applicant requests that the Examiner reconsider the application and claims in light of the
`
`foregoing amendment and response, and respectfully submits that the pending claims are in
`
`condition for allowance. The Examiner is invited to call the undersigned attorney at (617) 526-
`
`9626 to discuss the application.
`
`Date: January 6, 2015
`
`Reg. No.: 45,238
`
`Tel. No.: (617) 526-9626
`Fax No.: (617) 526-9899
`
`Respectfully submitted,
`
`(
`
`Gerald E. Worth, P.E.
`Proskauer Rose LLP
`
`Attorney for the Applicant
`One International Place
`
`Boston, MA 02110
`
`46671846V2

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