`
`US008309943B2
`
`(12) United States Patent
`Smith et al.
`
`(10) Patent No.:
`(45) Date of Patent:
`
`US 8,309,943 B2
`Nov. 13, 2012
`
`(54) LASER-DRIVEN LIGHT SOURCE
`
`(56)
`
`_
`
`References Cited
`U.S. PATENT DOCUMENTS
`
`(75)
`
`Inventors: Donald K. Smith, Boston, MA (US);
`William M. Holber, Winchester, MA
`(US); Jeffrey A. Casey, Winchester, MA
`(US)
`
`(73) Assignee: Energetiq Technology, Inc., Woburn,
`MA (US)
`
`( "“ ) Notice:
`
`Subject to any disclaimer, the term of this
`patent is extended or adjusted under 35
`USC. 154(b) by 41 days.
`
`(21) Appl.No.: 13/099,323
`
`(22)
`
`Filed:
`
`May 3, 2011
`
`(65)
`
`Prior Publication Data
`
`US 2011/0204265 A1
`
`Aug. 25, 2011
`
`Related U.S. Application Data
`
`(63) Continuation of application No. 12/166,918, filed on
`Jul. 2, 2008, now Pat. No. 7,989,786, which is a
`continuation—in-part of application No. 11/695,348,
`filed onApr. 2, 2007, now Pat. No. 7,786,455, which is
`a continuation~in~part of application No. 11/395,523,
`filed on Mar. 31, 2006, now Pat. No. 7,435,982.
`
`(51)
`
`Int. Cl.
`(2006.01)
`H01J 63/08
`(2006.01)
`H0511 1/24
`(2006.01)
`H05B 31/00
`(52) U.S. Cl.
`............ .. 250/493.1; 250/504 R; 250/503.1;
`250/365; 315/149; 315/111.21; 313/231.31
`(58) Field of Classification Search ............. .. 250/503.1,
`250/504 R, 365, 493.1; 315/149,111.21;
`313/231.31
`See application file for complete search history.
`
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`
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`
`250/504R
`250/503.1
`
`(Continued)
`
`JP
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`61-193358
`8/1986
`
`OTHER PUBLICATIONS
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`Beck, “Simple Pulse Generator for Pulsing Xenon Arcs with High
`Repetition Rate,” Rev. Sci. InsIrum., vol. 45, N0. 2, Feb. 1974, pp.
`318-319.
`
`(Continued)
`
`Primary Examiner —— Nikita Wells
`(74) Altorney, Agent, or Firm —— Proskauer Rose LLP
`
`(57)
`
`ABSTRACT
`
`An apparatus for producing light includes a chamber and an
`ignition source that ionizes a gas within the chamber. The
`apparatus also includes at least one laser that provides energy
`to the ionized gas within the chamber to produce a high
`brightness light. The laser can provide a substantially con-
`tinuous amount of energy to the ionized gas to generate a
`substantially continuous high brightness light.
`
`21 Claims, 17 Drawing Sheets
`
`ASIVIL 1301
`
` a
`
`'v'»‘i‘...'»'*C""4
`
`
`
`US 8,309,943 B2
`Page 2
`
`U.S. PATENT DOCUMENTS
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`2/2004 Otsubo
`2004/0264512 A1
`12/2004 Haitlove et a1.
`2005/0167618 A1
`8/2005 Hoshino et a1.
`2011/0181191 Al"‘
`7/2011 Smith etal.
`................. .. 315/149
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`OTHER PUBLICATIONS
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`Carlhofl" et a1., “Continuous Optical Discharges at Very High Pres-
`sure,” Physica 103C, 1981, pp. 439-447.
`Crcmers ct al., “Evaluation of the Continuous Optical Discharge for
`Spectrochemical Ana1ysis,’f Spectrochimica Acta, vol. 40B, No. 4,
`1985, pp. 665-679.
`Fiedorowicz et a1., “X-Ray Emission form Laser-Irradiated Gas Puff
`Targets,” Appl. Phys. Letl. 62 (22), May 31, 1993, pp. 2778-2780.
`Franzen, “CW Gas Breakdown in Argon Using 10.6- pm Laser
`Radiation,” Appl. Phys. Lett., vol. 21, No. 2, Jul. 15, 1972, pp. 62-64.
`Generalov et al., “Continuous Optical Discharge,” ZhETF Pis. Red.
`11, No. 9, May 5, 1970, pp. 302-304.
`Generalov et a1., “Experimental Investigation of a Continuous Opti-
`cal Discharge,” Soviet Physics JETP, vol. 34, No. 4, Apr. 1972, pp.
`763-769.
`Hecht, “Refraction”, Optics (Third Edition), 1998, Chapter 4, pp.
`100-101.
`Jeng et a1., “Theoretical Investigation ofLaser-Sustained Argon Plas-
`mas,” J. Appl. Phys. 60 (7), Oct. 1, 1986, pp. 2272-2279.
`
`Keefer, “Laser-Sustained Plasmas,” Laser-Induced Plasmas and
`Applications, published by Marcel Dekker, edited by Radziemski et
`a1., 1989, pp. 169-206.
`Keefer et a1., “Experimental Study of a Stationary Laser—Sustained
`Air Plasma,” Journal ofApp1ied Physics, vol. 46, No. 3, Mar. 1975,
`pp. 1080-1083.
`Kozlov et a1., “Radiative Losses by Argon Plasma and the Emissive
`Model of a Continuous Optical Discharge,”Sov. Phys. JETP, vol. 39,
`No.3, Sep. 1974, pp. 463-468.
`Kozlov et al., “Sustained Optical Discharges in Molecular Gases,”
`Soy. Phys. Tech. Phys. 4901), Nov. 1979, PP« 1283-1287.
`Moody, “Maintenance ofa Gas Breakdownin Argon Using 10 .6-11 cw
`Radiation,” Journal ofApp1ied Physics, vol. 46, No. 6, Jun. 1975, pp.
`2475-2482.
`Raizer, “Optical Discharges,” Sov. Phys. Usp. 23(1 1), Nov. 1980, pp.
`789-806.
`“Super-Quiet Xenon Lamp Super-Quiet Mercury-Xenon 1-16.
`Lamp,” Hamamtztsu Product Information, Nov. 2005, pp. 1-16.
`Wilbers et al., “The Continuum Emission of an Arc Plasma," J.
`Quant. Spectrosc. Radiat. Transfer, vo1.45,No. 1, 1991, pp. 1-10.
`Wilbers et al., “The VUV Emissivity of a High-Pressure Cascade
`Argon Arc from 125 to 200 nm,” J. Quarzt. .S)2ectr0sc. Radial. 7171213-
`fer, Vol.46, 1991, pp. 299-308.
`
`* cited by examiner
`
`
`
`U.S. Patent
`
`Nov. 13,2012
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`US 8,309,943 B2
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`US 8,309,943 B2
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`2
`
`1
`LASER—DRIVEN LIGHT SOURCE
`
`RELATED APPLICATIONS
`
`This application is a continuation ofU.S. Ser. No. 12/166,
`918, filed on Jul. 2, 2008, which is a continuation—in—part of
`U.S. Ser. No. l 1/695,348, filed onApr. 2, 2007, now U.S. Pat.
`No. 7,786,455, which is a continuation—in-part of U.S. Ser.
`No. 11/395,523, filed on Mar. 31, 2006, now US. Pat. No.
`7,435,982, the entire disclosures of which are hereby incor-
`porated by reference herein.
`
`5
`
`10
`
`FIELD OF THE INVENTION
`
`The invention relates to methods and apparatus for provid-
`ing a laser-driven light source.
`
`BACKGROUND OF THE INVENTION
`
`for ionizing a gas within the chamber. The light source also
`includes at least one laser for providing energy to the ionized
`gas within the chamber to produce a high brightness light.
`In some embodiments, the at least one laser is a plurality of
`lasers directed at a region from which the high brightness
`light originates. In some embodiments, the light source also
`includes at least one optical element for modifying a property
`of the laser energy provided to the ionized gas. The optical
`element can be, for example, a lens (e. g., an aplanatic lens, an
`achromatic lens, a single element lens, and a fresnel lens) or
`mirror (e.g., a coated mirror, a dielectric coated mirror, a
`narrow band mirror, and an ultraviolet transparent infrared
`reflecting mirror). In some embodiments, the optical element
`is one or more fiber optic elements for directing the laser
`energy to the gas.
`The chamber can include an ultraviolet transparent region.
`The chamber or a window in the chamber can include a
`material selected from the group consisting of quartz, Supra-
`sil® quartz (Heraeus Quartz America, LLC, Buford, Ga.),
`sapphire, MgF2, diamond, and CaF2. In some embodiments,
`the chamber is a sealed chamber. In some embodiments, the
`chamber is capable of being actively pumped. In some
`embodiments, the chamber includes a dielectric material
`(e.g., quartz). The chamber can be, for example, a glass bulb.
`In some embodiments, the chamber is an ultraviolet transpar-
`ent dielectric chamber.
`The gas can be one or more of a noble gas, Xe, Ar, Ne, Kr,
`He, D2, H2, 02, F2, a metal halide, a halogen, Hg, Cd, Zn, Sn,
`Ga, Fe, Li, Na, an excimer forming gas, air, a vapor, a metal
`oxide, an aerosol, a flowing media, or a recycled media. The
`gas can be produced by a pulsed laser beam that impacts a
`target (eg., a solid or liquid) in the chamber. The target can be
`a pool or film of metal. In some embodiments, the target is
`capable of moving. For example, the target may be a liquid
`that is directed to a region from which the high brightness
`light originates.
`In some embodiments, the at least one laser is multiple
`diode lasers coupled into a fiber optic element. In some
`embodiments, the at least one laser includes a pulse or con-
`tinuous wave laser. In some embodiments, the at least one
`laser is an IR laser, a diode laser, a fiber laser, an ytterbium
`laser, a C0, laser, a YAG laser, or a gas discharge laser. In
`some embodiments, the at least one laser emits at least one
`wavelength of electromagnetic energy that
`is
`strongly
`absorbed by the ionized medium.
`The ignition source can be or can include electrodes, an
`ultraviolet ignition source, a capacitive ignition source, an
`inductive ignition source, an RF ignition source, a microwave
`ignition source, a flash lamp, a pulsed laser, or a pulsed lamp.
`The ignition source can be a continuous wave (CW) or pulsed
`laser impinging on a solid or liquid target in the chamber. The
`ignition source can be external or internal to the chamber.
`The light source can include at least one optical element for
`modifying a property of electromagnetic radiation emitted by
`the ionized gas. The optical element can be, for example, one
`or more mirrors or lenses. In some embodiments, the optical
`element is configured to deliver the electromagnetic radiation
`emitted by the ionized gas to a tool (e.g., a wafer inspection
`tool, a microscope, a metrology tool, a lithography tool, or an
`endoscopic tool).
`‘
`The invention, in another aspect, relates to a method for
`producing light. The method involves ionizing with an igni-
`tion source a gas within a chamber. The method also involves
`providing laser energy to the ionized gas in the chamber to
`produce a high brightness light.
`In some embodiments, the method also involves directing
`the laser energy through at least one optical element for
`
`25
`
`30
`
`35
`
`40
`
`45
`
`High brightness light sources can be used in a variety of 20
`applications. For example, a high brightness light source can
`be used for inspection, testing or measuring properties asso-
`ciated with semiconductor wafers or materials used in the
`fabrication of wafers (e.g., reticles and photomasks). The
`electromagnetic energy produced by high brightness light
`sources can, alternatively, be used as a source of illumination
`in a lithography system used in the fabrication of wafers, a
`microscopy system, or a photoresist curing system. The
`parameters (e. g., wavelength, power level and brightness) of
`the light vary depending upon the application.
`The state of the art in, for example, wafer inspection sys—
`tems involves the use of xenon or mercury arc lamps to
`produce light. The are lamps include an anode and cathode
`that are used to excite xenon or mercury gas located in a
`chamber of the lamp. An electrical discharge is generated
`between the anode and cathode to provide power to the
`excited (e.g., ionized) gas to sustain the light emitted by the
`ionized gas during operation of the light source. During
`operation, the anode and cathode become very hot due to
`electrical discharge delivered to the ionized gas located
`between the anode and cathode. As a result, the anode and/or
`cathode are prone to wear and may emit particles that can
`contaminate the light source or result in failure of the light
`source. Also, these are lamps do not provide sufficient bright-
`ness for some applications, especially in the ultraviolet spec-
`trum. Further, the position of the arc can be unstable in these
`lamps.
`Accordingly, a need therefore exists for improved high
`brightness light sources. A need also exists for improved high
`brightness light sources that do not rely on an electrical dis-
`charge to maintain a plasma that generates a high brightness
`light.
`The properties of light produced by many light sources
`(e. g., are lamps, microwave lamps) are affected when the light
`passes through a wall of, for example, a chamber that includes
`the location from which the light is emitted.
`Accordingly, a need therefore exists for an improved light
`source whose emitted light is not significantly affected when
`the light passes through a wall of a chamber that includes the
`location from which the light is emitted.
`
`50
`
`55
`
`60
`
`SUMMARY OF THE INVENTION
`
`The present invention features a light source for generating
`a high brightness light.
`The invention, in one aspect, features a light source having
`a chamber. The light source also includes an ignition source
`
`65
`
`
`
`3
`
`US 8,309,943 B2
`
`4
`
`modifying a property of the laser energy provided to the
`ionized gas. In some embodiments, the method also involves
`actively pumping the chamber. The ionizable medium can be
`a moving target. In some embodiments, the method also
`involves directing the high brightness light through at least
`one optical element to modify a property ofthe light. In some
`embodiments, the method also involves delivering the high
`brightness light emitted by the ionized medium to a tool (e.g.,
`a wafer inspection tool, a microscope, a metrology tool, a
`lithography tool, or an endoscopic tool).
`In another aspect, the invention features a light source. The
`lights source includes a chamber and an ignition source for
`ionizing an ionizable medium within the chamber. The light
`source also includes at least one laser for providing substan-
`tially continuous energy to the ionized medium within the
`chamber to produce a high brightness light.
`In some embodiments, the at least one laser is a continuous
`wave laser or a high pulse rate laser. In some embodiments,
`the at least one laser is a high pulse rate laser that provides
`pulses ofenergy to tile ionized medium so the high brightness
`light is substantially continuous. In some embodiments, the
`magnitude of the high brightness light does not vary by more
`than about 90% during operation. In some embodiments, the
`at least one laser provides energy substantially continuously
`to minimize cooling of the ionized medium when energy is
`not provided to the ionized medium.
`In some embodiments, the light source ca11 include at least
`one optical element (e.g., a lens or mirror) for modifying a
`property of the laser energy provided to the ionized medium.
`The optical element can be, for example, an aplanatic lens, an
`achromatic lens, a single element lens, a fresnel lens, a coated
`mirror, a dielectric coated mirror, a narrow band mirror, or an
`ultraviolet transparent infrared reflecting mirror. In some
`embodiments, the optical element is one or more fiber optic
`elements for directing the laser energy to the ionizable
`medium.
`In some embodiments, the chamber includes an ultraviolet
`transparent region. In some embodiments, the chamber or a
`window in the chamber includes a quartz material, suprasil
`quartz material, sapphire material, MgF2 material, diamond
`material, or CaF2 material. In some embodiments, the cham-
`ber is a sealed chamber. The chamber can be capable ofbeing
`actively pumped.
`In some embodiments,
`the chamber
`includes a dielectric material (e.g., quartz). In some embodi-
`ments, the chamber is a glass bulb. In some embodiments, the
`chamber is an ultraviolet transparent dielectric chamber.
`The ionizable medium can be a solid, liquid or gas. The
`ionizable medium can include one or more ofa noble gas, Xe,
`Ar, Ne, Kr, He, D2, H2, 02, F2, a metal halide, a halogen, I-Ig,
`Cd, Zn, Sn, Ga, Fe, Li, Na, an excimer forming gas, air, a
`vapor, a metal oxide, an aerosol, a flowing media, a recycled
`media, or an evaporating target. In some embodiments, the
`ionizable medium is a target in the chamber and the ignition
`source is a pulsed laser that provides a pulsed laser beam that
`strikes the target. The target can be a pool or film of metal. In
`some embodiments, the target is capable of moving.
`In some embodiments, the at least one laser is multiple
`diode lasers coupled into a fiber optic element. The at least
`one laser can emit at least one wavelength of electromagnetic
`energy that is strongly absorbed by the ionized medium.
`The ignition source can be or can include electrodes, an
`ultraviolet ignition source, a capacitive ignition source, an
`inductive ignition source, an RF ignition source, a microwave
`ignition source, a flash lamp, a pulsed laser, or a pulsed lamp.
`The ignition source can be external or internal to the chamber.
`In some embodiments, the light source includes at least one
`optical element (e.g., a mirror or lens) for modifying a prop-
`
`erty of electromagnetic radiation emitted by the ionized
`medium. The optical element can be configured to deliver the
`electromagnetic radiation emitted by the ionized medium to a
`tool (e.g., a wafer inspection tool, a microscope, a metrology
`tool, a lithography tool, or an endoscopic tool).
`The invention, in another aspect relates to a method for
`producing light. The method involves ionizing with an igni-
`tion source an ionizable medium within a chamber. The
`method also involves providing substantially continuous
`laser energy to the ionized medium in the chamber to produce
`a high brightness light.
`In some embodiments, the method also involves directing
`the laser energy through at least one optical element for
`modifying a property of the laser energy provided to the
`ionizable medium. The method also can involve actively
`pumping the chamber. In some embodiments, the ionizable
`medium is a moving target. The ionizable medium can
`include a solid, liquid or gas. In some embodiments, the
`method also involves directing the high brightness light
`through at least one optical element to modify a property of
`the light. In some embodiments, the method also involves
`delivering the high brightness light emitted by the ionized
`medium to a tool.
`The invention, in another aspect, features alight source
`having a chamber. The light source includes a first ignition
`means for ionizing an ionizable medium within the chamber.
`The light source also includes a means for providing substan-
`tially continuous laser energy to the ionized medium within
`the chamber.
`The invention, in another aspect, features a light source
`having a chamber that includes a reflective surface. The light
`source also includes an ignition source for ionizing a gas
`within the chamber. The light source also includes a reflector
`that at least substantially reflects a first set of predefined
`wavelengths of electromagnetic energy directed toward the
`reflector and at least substantially allows a second set of
`predefined wavelengths of electromagnetic energy to pass
`through the reflector, The light source also includes at least
`one laser (e.g., a continuous—wave fiber laser) external to the
`chamber for providing electromagnetic energy to the ionized
`gas within the chamber to produce a plasma that generates a
`high brightness light. A continuous—wave laser emits radia-
`tion continuously or substantially continuously rather than in
`short bursts, as in a pulsed laser.
`In some embodiments, at least one laser directs a first set of
`wavelengths of electromagnetic energy through the reflector
`toward the reflective surface (e.g., inner surface) ofthe cham—
`ber and the reflective surface directs at least a portion of the
`first set of wavelengths of electromagnetic energy toward the
`plasma. In some embodiments, at least a portion of the high
`brightness light is directed toward the reflective surface ofthe
`chamber, is reflected toward the reflector, and is reflected by
`the reflector toward a tool. In some embodiments, at least one
`laser directs a first set of wavelengths of electromagnetic
`energy toward the reflector, the reflector reflects at least a
`portion of the first wavelengths of electromagnetic energy
`towards the reflective surface of the chamber, and the reflec-
`tive surface directs a portion ofthe first set of wavelengths of
`electromagnetic energy toward the plasma.
`In some embodiments, at least a portion of the high brigl1t~
`ness light is directed toward the reflective surface of the
`chamber, is reflected toward the reflector, and passes through
`the reflector toward an output of the light source. In some
`embodiments, the light source comprises a microscope, ultra,-
`violet microscope, wafer inspection system, reticle inspec-
`tion system or lithography system spaced relative to the out-
`put of the light source to receive the high brightness light. In
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`some embodiments, a portion of the high brightness light is
`directed toward the reflective surface of the chamber,
`is
`refiected toward the refiector, and electromagnetic energy
`comprising the second set of predefined wavelengths of elec-
`tromagnetic energy passes through the reflector.
`The chamber of the light source can include a window. In
`some embodiments, the chamber is a sealed chamber. In some
`embodiments, the reflective surface of the chamber com-
`prises a curved shape, parabolic shape, elliptical shape,
`spherical shape or aspherical shape. In some embodiments,
`the chamber has a reflective inner surface. In some embodi-
`ments, a coating or film is located on the outside of the
`chamber to produce the reflective surface. In some embodi-
`ments, a coating or film is located on the inside ofthe chamber
`to produce the reflective surface. In some embodiments, the
`reflective surface is a structure or optical element that is
`distinct from theinner surface of the chamber.
`The light source ca11 include an optical element disposed
`along a path the electromagnetic energy from the laser travels.
`I11 some embodiments, the optical element is adapted to pro-
`vide electromagnetic energy from the laser to the plasma over
`a large solid angle. In some embodiments, the reflective sur-
`face of the chamber is adapted to provide electromagnetic
`energy from the laser to the plasma over a large solid angle. In
`some embodiments, the reflective surface of the chamber is
`adapted to collect the high brightness light generated by the
`plasma over a large solid angle. In some embodiments, one or
`more of the reflective surface, reflector and the window
`include (e.g., are coated or include) a material to filter pre-
`defined wavelengths (e.g., infrared wavelengths of electro-
`magnetic energy) of electromagnetic energy.
`The invention, in anotheraspect, features a light sourcethat
`includes a chamber that has a refiective surface. The light
`source also includes an ignition source for ionizing a gas
`within the chamber. The light source also includes at least one
`laser external to the chamber for providing electromagnetic
`energy to the ionized gas within the chamber to produce a
`plasma that generates a high brightness light. The light source
`also includes a reflector positioned along a path that the
`electromagnetic energy travels from the at least one laser to
`the reflective surface of the chamber.
`In some embodiments, the reflector is adapted to at least
`substantially reflect a first set of predefined wavelengths of
`electromagnetic energy directed toward the reflector and at
`least substantially allow a second set of predefined wave-
`lengths of electromagnetic energy to pass through the reflec-
`tor.
`
`The invention, in another aspect, relates to a method for
`producing light. The method involves ionizing with an igni-
`tion source a gas within a chamber that has a reflective sur-
`face. The method also involves providing laser energy to the
`ionized gas in the chamber to produce a plasma that generates
`a high brightness light.
`In some embodiments, the method involves directing the
`laser energy comprising a first set of wavelengths of electro-
`magnetic energy through a reflector toward the reflective
`surface of the chamber, the reflective surface reflecting at
`least a portion of the first set of wavelengths of electromag-
`netic energy toward the plasma. In some embodiments, the
`method involves directing at least a portion ofthe high bright-
`ness light toward the reflective surface of the chamber which
`is refiected toward the reflector and is reflected by the refiec-
`tor toward a tool.
`In some embodiments, the method involves directing the
`laser energy comprising a first set of wavelengths of electro-
`magnetic energy toward the reflector, the reflector reflects at
`least a portion of the first wavelengths of electromagnetic
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`energy toward the reflective surface of the chamber, the
`reflective surface directs a portion of the first set of wave-
`lengths ofelectromagnetic energy toward the plasma. In some
`embodiments, the method involves directing a portion of the
`high brightness light toward the reflective surface of the
`chamber which is reflected toward the reflector and, electro-
`magnetic energy comprising the second set of predefined
`wavelengths of electromagnetic energy passes through the
`reflector.
`
`The method can involve directing the laser energy through
`an optical element that modifies a property ofthe laser energy
`to direct the laser energy toward the plasma over a large solid
`angle. In some embodiments, the method involves directing
`the laser energy through an optical element that modifies a
`property of the laser energy to direct the laser energy toward
`the plasma over a solid angle of approximately 0.012 stera-
`dians. In some embodiments, the method involves directing
`the laser energy through an optical element that modifies a
`property of the laser energy to direct the laser energy toward
`the plasma over a solid angle of approximately 0.048 stera— _
`dians. In some embodiments, the method involves directing
`the laser energy through an optical element that modifies a
`property of the laser energy to direct the laser energy toward
`the plasma over a solid angle of greater than about 27: (about
`6.28) steradians. In some embodiments, the refiective surface
`of the chamber is adapted to provide the laser energy to the
`plasma over a large solid angle. In some embodiments, the
`reflective surface ofthe chamber is adapted to collect the high
`brightness light generated by the plasma over a large solid
`angle.
`The invention, in another aspect, relates to a method for
`producing light. The method involves ionizing with an igni-
`tion source a gas within a chamber that has a refiective sur-
`face. The method also involves directing electromagnetic
`energy from a laser toward a reflector that at least substan-
`tially reflects a first set of wavelengths of electromagnetic
`energy toward the ionized gas in the chamber to produce a
`plasma that generates a high brightness light.
`In some embodiments, the electromagnetic energy from
`the laser first is reflected by the reflector toward the refiective
`surface of the chamber. In some embodiments, the electro-
`magnetic energy directed toward the refiective surface of the
`chamber is reflected toward the plasma. In some embodi-
`merits, a portion ofthe high brightness light is directed toward
`the refiective surface of the chamber, reflected toward the
`reflector and passes through the reflector.
`'
`In some embodiments, the electromagnetic energy from
`the laser first passes through the reflector and travels toward
`the reflective surface of the chamber. In some embodiments,
`the electromagnetic energy directed toward the refiective sur-
`face of the chamber is reflected toward the plasma. In some
`embodiments, a portion ofthe high brightness light is directed
`toward the reflective surface of the chamber, reflected toward
`the reflector and reflected by the reflector.
`The invention, in another aspect, features a light source that
`includes a chamber having a refiective surface. The light
`source also includes a means for ionizing a gas within the
`chamber. The light source also includes a means for at least
`substantially reflecting a first set ofpredefined wavelengths of
`electromagnetic energy directed toward the reflector and at
`least substantially allowing a second set of predefined wave-
`lengths of electromagnetic energy to pass through the reflec-
`tor. The light source also includes a means for providing
`electromagnetic energy to the ionized gas within the chamber
`to produce a plasma that generates a high brightness light.
`The invention, in another aspect, features a light source that
`includes a sealed chamber. The light source also includes an
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`ignition source for ionizing a gas within the chamber. The
`light source also includes at least one laser external to the
`sealed chamber for providing electromagnetic energy to the
`ionized gas within the chamber to produce a plasma that
`generates a high brightness light. The light source also
`includes a curved reflective surface disposed external to the
`sealed chamber to receive at leas a portion of the high bright-
`ness light emitted by the sealed chamber and reflect the high
`brightness light toward an output of the light source.
`In some embodiments, the light source includes an optical
`element disposed along a path the electromagnetic energy
`from the laser travels. In some embodiments, the sealed
`chamber includes a support element that locates the sealed
`chamber relative to the curved reflective surface. In some
`embodiments, the sealed chamber is a quartz bulb. In some
`embodiments, the light source includes a second curved
`reflective surface disposed internal or external to the sealed
`chamber to receive at least a portion of the laser electromag-
`netic energy and focus the electromagnetic energy on the
`plasma that generates the high brightness light.
`The invention, in another aspect, features a light source that
`includes a sealed chamber and an ignition source for ionizing
`a gas within the chamber. The light source also includes at
`least one laser external to the sealed chamber for providing
`electromagnetic energy. The light source also includes a
`curved refiective surface to receive and reflect at least a por-
`tion of the electromagnetic _energy toward the ionized gas
`within the chamber to produce a plasma that generates a high
`brightness light, the curved reflective surface also receives at
`least a portion of the high brightness light emitted by the
`plasma and reflects the high brightness light toward an output
`of the light source.
`the curved refiective surface
`In some embodiments,
`focuses the electromagnetic energy on a region in the cham-
`ber where the plasma is located. In some embodiments, the
`curved reflective surface is located within the chamber. In
`some embodiments, the curved reflective surface is located
`external to the chamber. In some embodiments, the high
`brightness light is ultraviolet light, includes ultraviolet light
`or is substantially ultraviolet light.
`The invention, in another aspect, features a light sourcethat
`-includes a chamber. The light source also includes an energy
`source for providing energy to a gas within the chamber to
`produce a plasma that generates a light emitted through the
`walls ofthe chamber