iiAR.3i.2o04 12:36PM
`J
`
`SONNENSCHEIN
`
`"
`
`iio.3527"“P.2
`
`L-,"c‘i;’ifi§ii"e°s"7"i".‘é3‘a‘3§ ‘7"2‘i i°§’é?.Z‘ifi225'&°.f.iL’5T’ié‘flu‘§?§n1i‘
`United States Patent and Trademark Office on
`Ni (I mi. 2.; a coal
`
`DaleofFacsimile
`
`Pagi E. fiuch, Ph.Q,
`Name of Applicant, assignee or
`Registered
`presentative
`
`_
`
`RECEIVED
`GENTEAL FAX CENTER
`MAR 3 1 2004
`‘
`
`S
`
`‘
`
`e
`
`-
`
`.
`
`_ 1-43.81?3
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`Our File No. 997999500011
`
`in re Application of:
`
`James E. Nulty. et al.
`
`3953' N°- 091540510
`
`Filing Date: March 31, 2000
`
`For Method for Eliminating Lateral
`Spacer Erosion on Enclosed
`Contact Topographies During RF
`Sputter Cleaning
`
`~.4gr\_a~_-».—sa\¢»a§«‘a\/
`
`Examiner Chris C. Chu
`
`Group An Unit No_ 2315
`
`CORRECTED AMENDMENT
`
`Mail stop - Al’-'
`Commissioner for Patents
`P.O. Box 1450
`Alexandria, VA 22313-1450
`
`Dear Sir:
`
`This Amendment is identical to the last amendment filed but It corrects the format
`
`of the presented claim set. Applicants thank Examiner Chu for pointing out this
`omission.
`
`PAGE 2!?‘ RCVD AT 3J31i2fl04 1:34:54 PM [Eastern Standard Time] ‘ SVRIUSPTO-EFXRF-1l25 ‘ DN|S:2T31?24 * C8102‘ DURATION (mm-ss):li1-36
`
`INTEL 1 1 19
`
`
`J
`
`SONNENSCHEIN
`
`"
`
`iio.3527"“P.2
`
`L-,"c‘i;’ifi§ii"e°s"7"i".‘é3‘a‘3§ ‘7"2‘i i°§’é?.Z‘ifi225'&°.f.iL’5T’ié‘flu‘§?§n1i‘
`United States Patent and Trademark Office on
`Ni (I mi. 2.; a coal
`
`DaleofFacsimile
`
`Pagi E. fiuch, Ph.Q,
`Name of Applicant, assignee or
`Registered
`presentative
`
`_
`
`RECEIVED
`GENTEAL FAX CENTER
`MAR 3 1 2004
`‘
`
`S
`
`‘
`
`e
`
`-
`
`.
`
`_ 1-43.81?3
`
`IN THE UNITED STATES PATENT AND TRADEMARK OFFICE
`
`Our File No. 997999500011
`
`in re Application of:
`
`James E. Nulty. et al.
`
`3953' N°- 091540510
`
`Filing Date: March 31, 2000
`
`For Method for Eliminating Lateral
`Spacer Erosion on Enclosed
`Contact Topographies During RF
`Sputter Cleaning
`
`~.4gr\_a~_-».—sa\¢»a§«‘a\/
`
`Examiner Chris C. Chu
`
`Group An Unit No_ 2315
`
`CORRECTED AMENDMENT
`
`Mail stop - Al’-'
`Commissioner for Patents
`P.O. Box 1450
`Alexandria, VA 22313-1450
`
`Dear Sir:
`
`This Amendment is identical to the last amendment filed but It corrects the format
`
`of the presented claim set. Applicants thank Examiner Chu for pointing out this
`omission.
`
`PAGE 2!?‘ RCVD AT 3J31i2fl04 1:34:54 PM [Eastern Standard Time] ‘ SVRIUSPTO-EFXRF-1l25 ‘ DN|S:2T31?24 * C8102‘ DURATION (mm-ss):li1-36
`
`INTEL 1 1 19
`
`
`
`MAR. 31. 2004 12:36PM
`
`SONNENSCHEIN
`
`N0. 3527—P.
`
`3
`
`IN THE SPECIFICATION
`
`Please add the following paragraph to the specification. page 15, after line 16:
`
`The phrase "substantialiy rectangular" means that a side of the spacer has an
`angle relative to the substrate surface of more than 85°.
`'
`
`PAGE 317 ‘ RCVD AT 3I31{2fl04 1:34:54 PM [Easlem standardTime1* SVR:USP'|'0-EFXRF-1f25 ' DN|S:2731724 ' CSID: ’ DURATION (nun-ss):fl1-36
`
`2
`
`
`
`l\ill'-iii. 3i. 2004 12:36PM
`
`SONNEllSCHElN
`
`N0. 3527
`
`P.
`
`4
`
`IN THE CLAIMS
`
`1-24.
`
`(Cancelled)
`
`25.
`
`(Previously presented) The semiconductor apparatus of claim 27 wherein
`
`said etch stop material comprises silicon nitride.
`
`26.
`
`(Previously presented) The semiconductor apparatus of claim 27 wherein
`
`said etch stop material comprises silicon dioxide.
`
`27.
`
`(Currently Amended) A structure. comprising:
`
`(a) a conductive layer disposed over a substrate;
`
`(b) a first insulating layer on the conductive layer;
`
`(c) a contact region in said first insulating layer;
`
`.
`
`(d) at least one insulating spacer in the contact region adjacent to the first
`
`insulating layer; and
`
`(e) an etch stop material over said first insulating layer and adjacent to the
`
`insulating spacer. the etch stop material being a different material from the insulating
`spacen
`
`wherein a side of the insulating spacer has an angle relative to the
`
`substrate surface of more than 85°
`
`region.
`
`28.
`
`(Cancelled).
`
`29.
`
`(Previously presented) The structure of Claim 27, wherein the insulating
`
`spacer has a surface portion in the contact region without overlying etch stop material.
`
`30.
`
`(Previously presented) The structure of Claim 29. wherein the insulating
`
`spacer surface portion without overlying etch stop material comprises an insulating
`
`spacer surface portion most distant from said substrate.
`
`31.
`
`(Cancelled).
`
`PAGE 417 ‘ RCVD AT 3l31l2fl04 1:34:54 PM [Easlem Standard Time] ’ SVR:U$PTO-EFXRF-1i25 ‘ DNlS:2731724 * CSIDI ‘ DURATION (mm-ss):01-36
`
`3
`
`
`
`MAR.3i.2004i2:37PM
`
`SONNENSCHHN
`
`N03527
`
`P-5
`
`J
`
`32.
`
`(Previously presented) The structure of Claim 27, further comprising a
`
`second insulating layer on the etch stop layer and overthe conductive layer.
`
`33.
`
`(Previously presented) The structure of Claim 32, further comprising a
`
`second conductive material in the contact region.
`
`34.
`
`(Currently amended) A structure. comprising:
`
`(a) a first electrically conductive material formed in and/or on a surface of
`
`a substrate;
`
`(b) a contact opening in a region adjacent to a second electrically
`conductive material formed on the substrate;
`
`(c) an electrically insulatlve spacer in the contact opening adjacent to the
`
`second electrically conductive material;
`
`T
`
`(cl) an etch stop material over the electrically lnsulative spacer and the first
`
`and second electrically conductive materials, the etch stop material being a different
`
`material from the insulative spacer;
`
`(e) a blanket layer over the etch stop material; and
`
`(f) an opening through a first part of the etch stop material to the first
`
`. electrically conductive material,
`
`wherein a side of the electrically lnsulatlve spacer has a-substantially-Feetangular
`
`
`'
`-e-=-. .-.::--:..-: --
`the substrate surface of more than 85'.
`
`.=*:- :
`
`::-'2:-: ..-
`
`ngnglgrglgflveto
`
`35.
`
`(Cancelled).
`
`36.
`
`(Previously presented) The structure of Claim 34, wherein the electrically
`
`insulative spacer has a surface portion without overlying etch stop material.
`
`37.
`
`(Previously presented) The structure of Claim 36, wherein the electrically
`
`insulatlve spacer surface portion without oveiiying etch stop material comprises a
`
`surface portion most distant from the substrate.
`
`PAGE Si?‘ RCVD AT 3lJ1l200-l 1:34:54 PM [Eastern Standard Time]* SVltUSPTO-EFXRF-1l25 ' DN|S:2?31?24 ‘ CSID: * DURATION (mm-ss):01-36
`
`4
`
`
`
`MAR. 31. 2004 12:37PM
`
`SONNENSCHEIN
`
`N0. 3527
`
`P.
`
`6
`
`38.
`
`(Previously presented) The structure of Claim 34. further comprising a
`
`second insulating layer on the etch stop layer and over the conductive layer.
`
`39.
`
`(Previously presented) The structure of Claim 38. further comprising a
`
`second conductive material in the Contact region.
`
`PAGE 6!? ‘ RCVDkT3l31l2l1041:34:54PM [Eastern Standard Time]*S\lR:USPTO£FXRF-1l25 ‘ DN|S:2731724’ CSIDI * DURATION (mm-ss):fl1-36
`
`5
`
`
`
`MAR.3i.200412:37PM
`
`SONNENSCHEIN
`
`iio.3527_P.
`
`7‘
`
`REMARKS
`
`The amendment to claims 27 and 34, and the specification, are supported by the
`
`specification, page 8, lines 19-23, and page 10. lines 8-11. No new matter has been
`added.
`
`Applicants would like to thank Examiner Chu for the courteous and helpful
`
`discussion held with applicants representative on February 19, 2004. During that
`
`discussion. it was indicated that the above amendments would clarify the claims.
`
`Applicants submit that the application is now in condition for allowance. Early
`
`notice of such action is earnestly solicited.
`
`Respectfully submitted,
`/ Ref ML .»_.s,g:’5
`.
`
`Paul E. Rauc:!—:-<P.
`
`Registration No. 38.591
`Attorney for Applicants
`SONNENSCHEIN NATH & ROSENTHAL
`P. 0. BOX 061080
`WACKER DRIVE STATION. SEARS TOWER
`CHICAGO, IL 60606
`(312) 876-8000
`
`.
`
`5
`
`PAGE‘?l7 ’ RCVD AT 3l31l2D04 1:34:54 PM [Eastern standard Time] * SVRIUSPTO-EFXRF-1125 ' DN|S:2731724 ‘ CSIDI ’ DURATION lrrrn-ss):01-36
Accessing this document will incur an additional charge of $.
After purchase, you can access this document again without charge.
Accept $ Charge
Still Working On It
This document is taking longer than usual to download. This can happen if we need to contact the court directly to obtain the document and their servers are running slowly.
Give it another minute or two to complete, and then try the refresh button.
A few More Minutes ... Still Working
It can take up to 5 minutes for us to download a document if the court servers are running slowly.
Thank you for your continued patience.
This document could not be displayed.
We could not find this document within its docket. Please go back to the docket page and check the link. If that does not work, go back to the docket and refresh it to pull the newest information.
Your account does not support viewing this document.
You need a Paid Account to view this document. Click here to change your account type.
Your account does not support viewing this document.
Set your membership
status to view this document.
With a Docket Alarm membership, you'll
get a whole lot more, including:
- Up-to-date information for this case.
- Email alerts whenever there is an update.
- Full text search for other cases.
- Get email alerts whenever a new case matches your search.
One Moment Please
The filing “” is large (MB) and is being downloaded.
Please refresh this page in a few minutes to see if the filing has been downloaded. The filing will also be emailed to you when the download completes.
Your document is on its way!
If you do not receive the document in five minutes, contact support at support@docketalarm.com.
Sealed Document
We are unable to display this document, it may be under a court ordered seal.
If you have proper credentials to access the file, you may proceed directly to the court's system using your government issued username and password.
Access Government Site
