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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition | Maurice Francombe, John Vossen | ISBN 9780125330183
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition
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`Francombe & Vossen
`13 Aug 1994
`Academic Press
`9730125330183
`328
`229X 152
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`Overview
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`Authors
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`Table of Contents
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition
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`M.A. Lieberman and R.A. Gottscho, Design of High— Density Plasma Sources for Materials Processing. O.A. Popov,
`Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition ofThin
`Films. S.L. Rohde, Unbalanced Magnetron Sputtering. C. Steinbruchel, The Formation ofParticles in Thin-Film Processing
`Plasmas. References. Author Index. Subject Index.
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`Plasma Sources for Thin Film Deposition and Etching, 1st Edition | Maurice Francombe, John Vossen | ISBN 9780125330183
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