UNITED STATES PATENT AND TRADEMARK OFFICE
`________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`________________
`
`GLOBALFOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN
`MODULE ONE LLC & CO. KG, GLOBALFOUNDRIES DRESDEN
`MODULE TWO LLC & CO. KG, and
`THE GILLETTE COMPANY,
`Petitioners,
`
`v.
`
`ZOND, LLC,
`Patent Owner
`________________
`
`IPR2014-011001
`Patent 7,604,716 B2
`
`________________
`
`PETITIONER’S DEMONSTRATIVE EXHIBIT FOR ORAL ARGUMENT
`
`
`1 Case IPR2014-00973 has been joined with the instant proceeding.
`
`

`
`UNITED STATES PATENT AND TRADEMARK OFFICE
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`U.S. Patent No. 7,604,716:
`Fujitsu Semiconductor Limited, and Fujitsu Semiconductor America, Inc., Advanced Micro Devices, Inc.,
`Renesas Electronics Corporation, Renesas Electronics America, Inc., GlobalFoundries U.S., Inc.,
`GlobalFoundries Dresden Module One LLC & Co. KG, GlobalFoundries Dresden Module Two LLC &
`Co. KG, Toshiba America Electronic Components, Inc., Toshiba America Inc., Toshiba America
`Information Systems, Inc., Toshiba Corporation, and the Gillette Company.
`
`v.
`Zond, LLC.
`
`IPR2014-807 and IPR2014-808
`
`GlobalFoundries U.S., Inc., GlobalFoundries Dresden Module One LLC & Co. KG, GlobalFoundries
`Dresden Module Two LLC & Co. KG, and the Gillette Company.
`v.
`Zond, LLC.
`
`IPR2014-1099 and IPR2014-1100
`
`June 12, 2015
`
`1
`
`

`
`Overview
`
`• Overview of the ’716 Patent
`• Grounds Instituted for Review
`• Overview of Wang
`• Disputes for Independent Claims
`‒ “Without developing an electrical breakdown condition”
`(claims 1, 14, 26, 33)
`
`‒ Wang + Kudryavtsev (claims 14, 26)
`
`‒ Cathode “adjacent” to anode (claim 26)
`• Disputes for Dependent Claims
`
`2
`
`

`
`The ’716 Patent
`
`The 71 6 Patent
`
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`202
`
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`
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`
`
`
`‘,4
`
`IPR2014-807, Ex. 1201
`
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`,
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`
`3
`
`

`
`The ’716 Patent – Fig. 2A
`
`Cathode (204)
`
`Anode (216)
`
`Gap (220)
`
`Pulsed power supply
`(202)
`
`’716 Patent, Fig. 2A
`
`4
`
`

`
`The ’716 Patent – Fig. 3
`
`’716 Patent, 11:9-12
`
`’716 Patent, 11:25-30
`
`’716 Patent, 11:66-12:1
`
`5
`
`’716 Patent, Fig. 3
`
`

`
`The ’716 Patent – Fig. 3
`
`’716 Patent, 6:19-25
`
`’716 Patent, 11:43-47
`
`6
`
`’716 Patent, Fig. 3
`
`

`
`“Electrical Breakdown” Occurs Through Arcing
`
`’716 Patent, 3:34-41
`
`7
`
`

`
`The ’716 Patent
`Representative Claims
`
`’716 Patent, Claim 1
`
`’716 Patent, Claim 14
`
`8
`
`

`
`Grounds Instituted For Review
`
`Claims
`
`Prior Art
`
`1-11 and 33
`
`Anticipated by Wang
`
`12 and 13
`
`Obvious over Wang + Lantsman
`
`IPR
`
`2014-1099
`
`2014-1100
`
`14-18, 21, 25-32
`
`Obvious over Wang + Kudryavtsev
`
`2014-807, 808
`
`19 and 20
`
`Obvious over Wang + Kudryavtsev + Lantsman
`
`2014-808
`
`22-24
`
`Obvious over Wang + Kudryavtsev + Mozgrin
`
`2014-808
`
`•
`•
`•
`•
`
`IPR2014-807 is joined with IPR2014-846, -974, and -1065
`IPR2014-808 is joined with IPR2014-849, -975, and -1067
`IPR2014-1099 is joined with IPR2014-972
`IPR2014-1100 is joined with IPR2014-973
`
`9
`
`

`
`Applied Prior Art: Wang
`’716 Patent
`
`Wang
`
`’716 Patent, Fig. 2A
`
`Cathode
`
`Anode
`
`Gap
`
`Pulsed power supply
`
`Wang, IPR2014-807, Ex. 1204, Fig. 1
`
`10
`
`

`
`Wang’s Electrical Pulse
`
`Wang, IPR2014-807, Ex. 1204, Fig. 6
`
`Wang, IPR2014-807, Ex. 1204, Fig. 7
`
`11
`
`

`
`Disputes for Independent Claims
`Independent Claims 1, 14, 26, 33
`
`• “Without developing an electrical breakdown condition”
`(claims 1, 14, 26, 33)
`• Wang + Kudryavtsev combination (claims 14, 26)
`• Cathode “adjacent” to anode (claim 26)
`
`12
`
`

`
`“Without developing an electrical breakdown condition”
`Independent Claims 1, 14, 26, 33
`• Wang discloses generating a strongly-ionized plasma
`from a weakly-ionized plasma using an electrical pulse
`
`(1 MW)
`
`(1 kW)
`
`Wang, IPR2014-807, Ex. 1204, 7:17-30
`
`Wang, IPR2014-807, Ex. 1204, Fig. 6
`
`13
`
`

`
`“Without developing an electrical breakdown condition”
`Independent Claims 1, 14, 26, 33
`• Wang discloses generating a strongly-ionized plasma
`“without developing an electrical breakdown condition”
`
`Wang, IPR2014-807, Ex. 1204, 7:47-51
`
`(1 MW)
`
`(1 kW)
`
`Wang, IPR2014-807, Ex. 1204, Fig. 6
`
`14
`
`

`
`“Without developing an electrical breakdown condition”
`Independent Claims 1, 14, 26, 33
`
`Petitioner’s Declarant
`Dr. Kortshagen
`
`Kortshagen Supp. Decl., IPR2014-00807, Ex. 1221 at ¶75
`
`Patent Owner’s Declarant
`Dr. Hartsough
`Q. But if impedance changes
`relatively little during the transition
`from a low- to a high-density
`plasma, then it’s indicative of no
`short circuit or arcing, right? …
`
`A. That’s indicative of no - certainly
`no unipolar arc. . . .
`
`2/19/2015 Hartsough Dep. at 89:8-24
`(IPR2014-00807, Ex. 1223)
`(interposing objections omitted)
`
`15
`
`

`
`Wang Discloses the Only Breakdown Prevention
`Technique Taught by the ’716 Patent
`’716 Patent
`
`Wang
`
`(1 MW)
`
`(1 kW)
`
`’716 Patent, 6:19-25 and Fig. 3
`
`Wang, IPR2014-807, Ex. 1204, 7:47-51 and Fig. 6
`
`16
`
`

`
`The ’716 Patent – Independent Claims
`
`17
`
`

`
`“Without developing an electrical breakdown condition”
`Independent Claims 1, 14, 26, 33
`
`• Zond attempts to distinguish “voltage pulses” from “power pulses”
`
`‒ Claims recite “electrical pulse” without specifying type
`
`‒ ’716 Patent specification discloses use of power and voltage pulses
`
`‒ Wang discloses power pulses (Fig. 6) and voltage pulses (Fig. 7)
`• Zond criticizes an embodiment (Fig. 4) not relied on by Petitioner
`
`‒ Fig. 4 embodiment uses pulses without PB (i.e. without maintaining weakly-
`ionized plasma), which requires plasma re-ignition with each pulse
`• Zond’s argument that Wang’s Fig. 6 embodiment does not meet
`this limitation contradicts admissions by its own declarant
`
`18
`
`

`
`Wang + Kudryavtsev
`Independent Claims 14 and 26
`• Wang discloses using electrical pulses to increase plasma density
`
`Wang, IPR2014-807, Ex. 1204, 7:25-30
`• Kudryavtsev studies effects of applying a sudden field to a
`weakly-ionized plasma to increase plasma density
`
`Kudryavtsev, IPR2014-807, Ex. 1205, p. 34
`
`19
`
`

`
`Wang + Kudryavtsev
`Independent Claims 14 and 26
`• Wang’s goal is to generate “very high plasma density”
`
`Wang, IPR2014-807, Ex. 1204, Abstract
`• Kudryavtsev provides model for fast-stage ionization through
`increasing number of atoms in excited states
`
`Kudryavtsev, IPR2014-807, Ex. 1205, Abstract
`
`20
`
`

`
`Wang + Kudryavtsev
`Independent Claims 14 and 26
`
`Kudryavtsev confirms that atom
`excitation leads to explosive
`increase in plasma density
`
`Kudryavtsev, IPR2014-807, Ex. 1205, p. 31
`
`’716 Patent, Claim 14 and 26
`
`21
`
`

`
`Wang + Kudryavtsev
`Independent Claims 14 and 26
`• Zond argues that Wang cannot be combined with Kudryavtsev
`because:
`‒ Physical differences in chamber geometry
`‒ Absence of magnetic field in Kudryavtsev
`‒ Differences in gas pressure
`• Kudryavtsev is not combined for chamber geometry, magnetic
`field, or gas pressure
`• Kudryavtsev provides analytical model applicable to devices
`other than its testing apparatus
`• Physical substitution is not required for obviousness combination
`• Skilled person would know how to adjust chamber geometry and
`process conditions
`
`22
`
`

`
`POSITA Would Know How To Adjust Process Parameters
`
`Petitioner’s Declarant
`Dr. Kortshagen
`
`Supp. Kortshagen Decl. at ¶ 54
`(IPR2014-00807, Ex. 1221)
`
`23
`
`

`
`POSITA Would Know How To Adjust Process Parameters
`
`Patent Owner’s Declarant
`Dr. Hartsough
`
`Q. Now, a person at that time would understand that plasma sputtering units
`could have different parameters that might affect the plasma, such as gap
`size, pressure, things like that; correct?
`
`A. So there’s a lot -- a lot of parameters that affect the sputtering process,
`yes.
`
`Q. And a person of ordinary skill would have had to understand the physics
`involved with this -- you know, the parameters involved in the sputtering
`process; correct? …
`
`A. I think a person of ordinary skill would have had to understand the kind
`of basics of principles of the -- the effects of the different elements in
`order to -- you know, to practice it. The physics, that depends on how,
`you know, deep you go. I -- I said -- they’re basic principles that one
`would use.
`
`2/12/15 Hartsough Dep. at 106:3-23
`(IPR2014-00807, Ex. 1225) (interposing objections omitted)
`
`24
`
`

`
`Wang Discloses Cathode “adjacent to” Anode
`Independent Claim 26
`
`Patent Owner’s Declarant
`(Dr. Hartsough)
`
`Q. So as you sit -- as you sit here
`today, you can't specifically recall
`any design that did not have the
`cathode adjacent to the anode?
`A. I just -- I can't.
`
`4/8/2015 Hartsough Dep. at 77:6-9
`(IPR2014-00807, Ex. 1222)
`
`25
`
`’716 Patent, Claim 26
`
`

`
`Wang Discloses Cathode “adjacent to” Anode
`Independent Claim 26
`
`Patent No.
`
`IPR
`
`Claim Language
`
`PO’s Position
`
`’716 Patent
`
`2014-00807
`
`“a cathode that is positioned adjacent to the
`anode” (claim 26)
`
`Disputed
`
`’142 Patent
`
`2014-00819
`(6/12/15)
`
`“a cathode that is positioned adjacent to the
`anode and …” (claim 21)
`
`Not disputed
`
`’759 Patent
`
`2014-01086
`(6/8/15)
`
`“a cathode assembly that is positioned
`adjacent to the anode” (claim 1)
`
`’421 Patent
`
`2014-00800
`(6/8/15)
`
`’155 Patent
`
`2014-00477
`(5/28/15)
`
`“a cathode assembly comprising a sputtering
`target that is positioned adjacent to an
`anode” (claim 1)
`
`“a cathode assembly that is positioned
`adjacent to the anode inside the chamber”
`(claim 1)
`
`Not disputed
`
`Not disputed
`
`Not disputed
`
`26
`
`

`
`Wang Discloses Cathode “adjacent to” Anode
`Independent Claim 26
`
`Petitioner’s Declarant
`Dr. Kortshagen
`
`Kortshagen Supp. Decl., IPR2014-00807, Ex. 1221 at ¶90-91
`
`27
`
`

`
`Floating
`Shield
`
`Wang Discloses Cathode “adjacent to” Anode
`Independent Claim 26
`Patent Owner’s Declarant
`Dr. Hartsough
`Q. These tools that you worked on while at Varian,
`did it have a cathode?
`A. Well, the sputter -- the sputtering source was
`a cathode with a target attached.
`Q. And did it also include an anode?
`A. As I mentioned, the anodes were typically
`grounded, so -- what I am trying to
`remember is was there -- the anode could
`have just been part of the shielding of the
`chamber …
`And I know that in earlier cathodes that had
`developed, that was a floating shield. …
`Q. And for these tools, would you consider the
`cathode to be adjacent to the anode?
`A. Well, it would have been adjacent to parts of
`surfaces that served as an anode. …
`
`Wang, IPR2014-807, Ex. 1204, Fig. 1
`
`4/8/2015 Hartsough Dep. at 89:8-24
`(IPR2014-00807, Ex. 1222) (interposing objections omitted)
`
`28
`
`

`
`Summary of Disputes for Dependent Claims
`
`• “Gap” between cathode and anode (claims 28, 29)
`
`• Selecting a “rise time” or “magnitude”/“amplitude” of electrical
`pulse (claims 16, 17, and 30)
`
`• “Quasi-static electric field” (claims 7, 21)
`
`• “Constant power” and “Constant voltage” (claims 4, 5)
`
`• Timing of pulse (claim 6)
`
`• Combinations with Lantsman (claims 12-13 and 19-20)
`
`• Combination with Mozgrin (claims 22-24)
`
`29
`
`

`
`“Gap” Between Cathode and Anode
`Dependent Claims 28, 29
`• Patent Owner admits that Wang teaches choosing a cathode-anode
`gap distance that overlaps with the ’716’s disclosed embodiment
`
`IPR2014-00807, Patent Owner Response (Paper 29) at 36-37
`• Patent Owner’s declarant admitted that all plasma chambers inherently
`have a cathode-anode gap
`Q. There was a gap between the anode and the cathode; correct?
`A. Well, the anode wasn’t in contact with the cathode. Otherwise, it
`would short out, so -- but the nature of that gap I don’t remember.
`
`4/8/2015 Hartsough Dep. at 102:9-15 (IPR2014-00807, Ex. 1222) (interposing objections omitted)
`
`30
`
`

`
`Selecting One Of A “rise time” Or “magnitude”
`Dependent claims 16, 17, and 30
`
`• Wang discloses selecting/choosing at least the magnitude/
`amplitude of the electrical pulse to increase plasma density
`
`(1 MW)
`
`(1 kW)
`
`Wang, IPR2014-807, Ex. 1204, 7:17-30
`
`Wang, IPR2014-807, Ex. 1204, 7:47-51 and Fig. 6
`
`31
`
`

`
`Selecting One Of A “rise time” Or “magnitude”
`Dependent claims 16, 17, and 30
`
`’716 Patent
`
`Wang
`
`(1 MW)
`
`(1 kW)
`
`’716 Patent, 6:19-25 and Fig. 3
`
`Wang, IPR2014-807, Ex. 1204, 7:47-51 and Fig. 6
`
`32
`
`

`
`“Quasi-static electric field”
`Dependent claims 7, 21
`• Wang teaches claimed “quasi static electric field”
`‒ “By quasi-static electric field we mean an electric field that has a
`characteristic time of electric field variation that is much greater than the
`collision time for electrons with neutral gas particles.” ’716 at 7:9-12
`50 µs >> 0.188 µs
`
`Wang, IPR2014-807, Ex. 1204, 5:45-48
`
`Petition, IPR2014-808, at 48
`
`33
`
`

`
`“Quasi-static electric field”
`Dependent claims 7, 21
`
`Ignition
`Phase
`
`Maintenance
`Phase
`
`Patent Owner’s Declarant
`Dr. Hartsough
`
`Q. If the region between T5 and T6 in
`Figure 5 is longer than the
`collision time for electrons, that
`would meet the ‘775 patent’s
`definition of a quasi-static electric
`field; right?
`A. If it were -- yeah, if it were
`constant.
`
`2/19/15 Hartsough Dep. at 137:25-138:8
`(IPR2014-808, Ex. 1332)
`(interposing objections omitted)
`
`34
`
`‘775 Patent, Fig. 5 (Identical to ’716 Fig. 4)
`(IPR2014-808, Ex. 1333) (Annotated)
`
`

`
`“Constant power” and “Constant voltage”
`Dependent claims 4, 5
`
`Wang discloses square waveforms for voltage and power pulses
`
`Wang, IPR2014-807, Ex. 1204, Fig. 6
`
`Wang, IPR2014-807, Ex. 1204, Fig. 7 (excerpted)
`
`35
`
`

`
`Timing of Pulse
`Dependent claim 6
`
`’716 Patent, Claim 6
`
`Petitioner’s Declarant
`Dr. Kortshagen
`
`Supp. Kortshagen Decl. at ¶ 102 (IPR2014-1099, Ex. 1025)
`
`36
`
`

`
`Timing of Pulse
`Dependent claim 6
`
`’716 Patent, Claim 6
`
`Wang
`
`200 µs
`
`150 µs
`
`50 µs
`
`>50 µs
`
`Wang, IPR2014-807, Ex. 1204, Fig. 6 and 5:43-49
`
`37
`
`

`
`Combinations with Lantsman
`Dependent claims 12-13 and 19-20
`• Wang and Lantsman both disclose magnetron plasma sputtering
`Wang
`Lantsman
`
`• Wang and Lantsman both use two power supplies
`Wang
`Lantsman
`
`Wang, IPR2014-807, Ex. 1204, 3:16-19, 7:57-63
`
`Lantsman, IPR2014-808, Ex. 1306, 1:6-8, 3:47-50
`
`38
`
`

`
`Combinations with Lantsman
`Dependent claims 12-13 and 19-20
`• Wang and Lantsman both discuss arc reduction
`Wang
`Lantsman
`
`• Wang and Lantsman both use argon feed gas
`
`Wang
`
`Lantsman
`
`Wang, IPR2014-807, Ex. 1204, 7:47-49, 4:5-7
`
`Lantsman, IPR2014-808, Ex. 1306, 1:51-55, 4:8-10
`
`39
`
`

`
`Combinations with Lantsman
`Dependent claims 12-13 and 19-20
`• Lantsman’s technique uses continuous feed gas throughout process
`
`Lantsman, IPR2014-808, Ex. 1306, 3:9-13
`• Lantsman’s technique applies to Wang
`
`Lantsman, IPR2014-808, Ex. 1306, 6:14-17
`
`40
`
`

`
`Combination with Mozgrin
`Dependent Claims 22-24
`
`• Wang and Mozgrin both disclose magnetron sputtering
`Wang
`Mozgrin
`
`• Wang and Mozgrin both use pulsed power supplies
`
`Wang
`
`Mozgrin
`
`Wang, IPR2014-807, Ex. 1204, Title, 5:18-20
`
`Mozgrin, IPR2014-808, Ex. 1303, 400, 401,
`
`41
`
`

`
`Combination with Mozgrin
`Dependent Claims 22-24
`
`• Wang and Mozgrin both generate strongly-ionized plasma from
`weakly-ionized plasma
`
`Wang
`
`Mozgrin
`
`Wang, IPR2014-807, Ex. 1204, 4:26-31
`
`Mozgrin, IPR2014-808, Ex. 1303, 403
`
`42
`
`

`
`Combination with Mozgrin
`Claims 22-24
`• Mozgrin discloses multiple benefits to using its “regime 2” plasma
`density (> 2x1013 cm-3)
`
`Mozgrin, IPR2014-808, Ex. 1303, p. 403
`
`43
`
`

`
`Combination with Mozgrin
`Claims 22-24
`• Mozgrin applies the Kudryavtsev model to a pulsed, magnetron
`sputtering system
`
`Mozgrin, IPR2014-808, Ex. 1303, 401 and 409
`
`44
`
`

`
`Combinations with Lantsman and Mozgrin
`
`• Zond argues that references cannot be combined because:
`‒ differences in chamber geometry
`‒ differences in process conditions (e.g., gas pressure, pulse rise time/width)
`‒ differences in power supply arrangement
`• Obvious combinations do not require actual physical substitution
`‒ “Common sense teaches, however, that familiar items may have obvious
`uses beyond their primary purposes, and in many cases a person of
`ordinary skill will be able to fit the teachings of multiple patents together
`like pieces of a puzzle. … A person of ordinary skill is also a person of
`ordinary creativity, not an automaton.”
`
`KSR v. Teleflex, 550 U.S. 398, 420-421 (2007).
`
`45
`
`

`
`Conclusion
`
`• All claims of the ’716 Patent are invalid in view of the following
`grounds
`
`Claims
`1-11 and 33
`
`12 and 13
`
`Prior Art
`
`Anticipated by Wang
`
`Obvious over Wang + Lantsman
`
`IPR
`
`2014-1099
`
`2014-1100
`
`14-18, 21, 25-32
`
`Obvious over Wang + Kudryavtsev
`
`2014-807, 808
`
`19 and 20
`
`22-24
`
`Obvious over Wang + Kudryavtsev + Lantsman
`
`2014-808
`
`Obvious over Wang + Kudryavtsev + Mozgrin
`
`2014-808
`
`46
`
`

`
`BACKUP SLIDES
`
`BACKUP SLIDES
`
`47
`
`

`
`No Dispute Regarding the Following Claim Terms
`Term
`Construction
`Orders
`“weakly-ionized plasma”
`“a plasma with a relatively low
`IPR2014-807, Paper 10 at 8
`IPR2014-808, Paper 9 at 8-9
`peak density of ions”
`IPR2014--1099, Paper 9 at 8
`IPR2014-1100, Paper 9 at 8)
`
`IPR2014-807, Paper 10 at 8
`IPR2014-808, Paper 9 at 8-9
`IPR2014--1099, Paper 9 at 8
`IPR2014-1100, Paper 9 at 8)
`
`IPR2014-00807, Paper 10 at 10
`IPR2014-808, Paper 9 at 10
`IPR2014-1099, Paper 9 at 10
`IPR2014-1100, Paper 9 at 10)
`
`IPR2014-01099, Paper 9 at 15-16
`
`“strongly-ionized plasma”
`
`“a plasma with a relatively high
`peak density of ions”
`
`“weakly-ionized plasma that
`substantially eliminates the
`probability of an electric
`breakdown condition”
`
`means for supplying an electrical
`pulse across the weakly-ionized
`plasma to transform the weakly-
`ionized plasma to a strongly-ionized
`plasma without developing an
`electrical breakdown condition in the
`chamber”
`
`“weakly-ionized plasma that
`substantially eliminates the
`probability of developing a
`breakdown condition when an
`electrical pulse is applied across the
`plasma to thereby generate a
`strongly-ionized plasma”
`Function: “supplying an electrical
`pulse across the weakly-ionized
`plasma to transform the weakly-
`ionized plasma to a strongly-ionized
`plasma without developing an
`electrical breakdown condition in the
`chamber”
`Structure: “a pulsed power supply
`electrically connected to a cathode,
`an anode, and/or an electrode”
`
`48
`
`

`
`Disputed Claim Term (Claim 33)
`• “Means for ionizing a feed gas in a chamber to form a weakly-
`ionized plasma that substantially eliminates the probability of
`developing an electrical breakdown condition in the chamber”
`Board’s Construction (IPR2014-1099, Paper 9 at 14):
`
`Function: “ionizing a feed gas in a chamber to form a weakly-ionized plasma
`that substantially eliminates the probability of developing an electrical
`breakdown condition in the chamber”
`
`Structure: “a power supply electrically connected to a cathode, an anode,
`and/or an electrode”
`• Dr. Hartsough’s structure: “a power supply electrically connected to a
`cathode, an anode, and/or an electrode, by a gap there between”
`‒ Not relied on by Paten Owner in its response in IPR2014-1099
`‒ Not necessary to include “gap” as part of structure
`‒ Not relevant because all prior art references disclose a gap between cathode
`and anode
`
`49
`
`

`
`Kudryavtsev Discloses “Without developing an
`electrical breakdown condition”
`
`Kudryavtsev, IPR2014-00807, Ex. 1205 at 34
`
`Kortshagen Supp. Decl., IPR2014-00807, Ex. 1221 at 25
`(Dr. Kortshagen’s explanation of Kudryavtsev Fig. 5)
`
`50
`
`

`
`
`Petitioner’s Demonstrative Exhibits for Oral Argument
`
`IPR2014-01100
` Patent No. 7,604,716
`
`
`
`
`
`
`Respectfully submitted,
`
`
`
`
`
`/s/ David M. Tennant
`David M. Tennant
`Lead Counsel for Petitioner
`GlobalFoundries
`Registration No. 48,362
`
`
`Dated: June 9, 2015
`
`
`
`1
`
`

`
`
`Petitioner’s Demonstrative Exhibits for Oral Argument
`
`IPR2014-01100
` Patent No. 7,604,716
`
`CERTIFICATE OF SERVICE
`
`
`
`The undersigned certifies, in accordance with 37 C.F.R. § 42.105, that
`
`service was made on the Patent Owner as detailed below.
`
`Date of service June 9, 2015
`
`Manner of service Electronic Mail
`
`Documents served Petitioner’s Demonstrative Exhibits for Oral Arguments
`
`Dr. Gregory Gonsalves
`2216 Beacon Lane
`Falls Church, Virginia 22043
`
`Bruce Barker
`Chao Hadidi Start & Barker LLP
`176 East Mail Street, Suite 6
`Westborough, MA 01581
`
`Tarek Fahmi
`333 W. San Carlos Street, Suite 200
`San Jose, CA 95110
`
`
`Persons served
`
`
`
`
`
`
`
`
`
`
`
`
`/s/ Xin-Yi Zhou
`Xin-Yi Zhou
`Counsel for Petitioner Advanced Micro
`Devices, Inc.
`Registration No. 63,366
`
`
`2