UNITED STATES PATENT AND TRADEMARK OFFICE
`____________________________________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`__________________________________________
`FUJITSU SEMICONDUCTOR LIMITED, FUJITSU SEMICONDUCTOR AMERICA, INC., ADVANCED MICRO
`DEVICES, INC., RENESAS ELECTRONICS CORPORATION, RENESAS ELECTRONICS AMERICA, INC., GLOBAL
`FOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN MODULE ONE LLC & CO. KG, GLOBALFOUNDRIES
`DRESDEN MODULE TWO LLC & CO. KG, TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC., TOSHIBA
`AMERICA INC., TOSHIBA AMERICA INFORMATION SYSTEMS, INC., TOSHIBA CORPORATION, and THE
`GILLETTE COMPANY,
`Petitioners
`v.
`ZOND, LLC
`PatentOwner
`_____________________
`U.S. PatentNo. 7,604,716
`Cases IPR2014-‐00807; IPR2014-‐00808; IPR2014-‐01099; IPR2014-‐01100
`_____________________
`
`Patent Owner’s Demonstrative Exhibits
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`1
`
`
`____________________________________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`__________________________________________
`FUJITSU SEMICONDUCTOR LIMITED, FUJITSU SEMICONDUCTOR AMERICA, INC., ADVANCED MICRO
`DEVICES, INC., RENESAS ELECTRONICS CORPORATION, RENESAS ELECTRONICS AMERICA, INC., GLOBAL
`FOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN MODULE ONE LLC & CO. KG, GLOBALFOUNDRIES
`DRESDEN MODULE TWO LLC & CO. KG, TOSHIBA AMERICA ELECTRONIC COMPONENTS, INC., TOSHIBA
`AMERICA INC., TOSHIBA AMERICA INFORMATION SYSTEMS, INC., TOSHIBA CORPORATION, and THE
`GILLETTE COMPANY,
`Petitioners
`v.
`ZOND, LLC
`PatentOwner
`_____________________
`U.S. PatentNo. 7,604,716
`Cases IPR2014-‐00807; IPR2014-‐00808; IPR2014-‐01099; IPR2014-‐01100
`_____________________
`
`Patent Owner’s Demonstrative Exhibits
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`1
`
`
`
`‘716 Patent
`
`Low Power Pulse to Create A Weakly Ionized Plasma
`
`A pre-‐ionizing voltage is applied between the cathode
`204 and the anode 216 across the feed gas 226 to form
`the weakly-‐ionized plasma 232. The weakly-‐ionized
`plasma 232 is generally formed in the region 222 and
`diffuses to the region 234 as the feed gas 226 continues
`to flow. In one embodiment (not shown) a magnetic field
`is generated in the region 222 and extends to the center
`of the cathode 204. This magnetic field tends to assist in
`diffusing electrons from the region 222 to the region 234.
`The electrons in the weakly-‐ionized plasma 232 are
`substantially trapped in the region 234 by the magnetic
`field. In one embodiment, the volume of weakly-‐ionized
`plasma in the region 222 is rapidly exchanged with a new
`volume of feed gas 226.
`
`‘716 Patent at 7:63 – 8:8
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`2
`
`
`
`‘716 Patent
`
`Weakly Ionized Plasma Suppress Arc
`WhenHigh Power Applied
`
`Forming the weakly-‐ionized or pre-‐ionized plasma 232
`substantially eliminates the probability of establishing a
`breakdown condition in the chamber when high-‐power
`pulses are applied between the cathode 204 and the
`anode 216. The probability of establishing a breakdown
`condition is substantially eliminated because the
`weakly-‐ionized plasma 232 has a low-‐level of ionization
`that provides electrical conductivity through the
`plasma. This conductivity substantially prevents the
`setup of a breakdown condition, even when high
`power is applied to the plasma.
`
`‘716 Patent at 6:16-‐25.
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`3
`
`
`
`‘716 Patent
`
`High Power Pulse to Create
`Strongly-‐Ionized Plasma
`
`Referring to FIG. 2C, once the weakly-‐ionized plasma 232
`is formed, the pulsed power supply 202 generates high-‐
`power pulses between the cathode 204 and the anode
`216 (FIG. 2C).
`
`The high-‐power pulses generate a strong electric field
`236 between the cathode 204 and the anode 216. . . .
`[and] generate a highly-‐ionized or a strongly-‐ionized
`plasma 238 from the weakly-‐ionized plasma 232 (FIG.
`2C). The strongly-‐ionized plasma 238 is also referred to
`as a high-‐density plasma.
`
`‘716 Patent at 6:52-‐57, 7:3-‐19.
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`4
`
`
`
`‘716 Patent
`
`Claim 1
`
`An apparatus for generating a strongly-‐ionized plasma, the apparatus comprising:
`
`a. an ionization source that generates a weakly-‐ionized plasma from a feed
`gas contained in a chamber, the weakly-‐ionized plasma substantially eliminating the
`probability of developing an electrical breakdown condition in the chamber; and
`
`b. a power supply that supplies power to the weakly-‐ionized plasma though
`an electrical pulse that is applied across the weakly-‐ionized plasma, the electrical pulse
`having at least one of a magnitude and a rise-‐time that is sufficient to transform the
`weakly-‐ionized plasma to a strongly-‐ionized plasma without developing an electrical
`breakdown condition in the chamber.
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`5
`
`
`
`Wang – US Pat. 6,413,382
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`6
`
`
`
`Wang’s Fig. 4
`
`The on-‐and-‐off pulsing represented in the waveforms
`of FIG. 4 can be further improved to benefit
`semiconductor processing. Plasma ignition,
`particularly in plasma sputter reactors, has a
`tendency to generate particles during the initial
`arcing, which may dislodge large particles from the
`target or chamber.
`
`Wang at 7:1-‐6
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`7
`
`
`
`Wang’s Fig. 6
`
`The initial plasma ignition needs be performed
`only once and at much lower power levels so
`that particulates produced by arcing are much
`reduced.
`
`Wang at 7:47-‐49 (emphasis added).
`
`“So Wang goes on to teach that arcing can be
`reduced by igniting the plasma only once and
`using the background power level, P sub B, to
`maintain the plasma between the high power
`pulses, P sub P.”
`
`Kortshagen Depo., Ex. 2007 at 42:19-‐23
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`8
`
`
`
`‘716 Patent
`
`Claim 6
`
`The apparatus of claim 1 wherein the power supply supplies power to the weakly
`ionized plasma at a time that is between about fifty microsecond and five second after
`the ionization source generates the weakly-‐ionized plasma.
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`9
`
`
`
`Wang
`
`“In the embodiment shown in Figure 6 there is only
`one plasma ignition”
`
`“once the plasma has been ignited it does not have
`to be reignited.”
`
`Kortshagen Depo., Ex. 2009 at 34:4-‐5, 6-‐8
`
`“I believe the ionization source to which claim 1 of
`the ‘716 patent refers is the same as the DC power
`supply 100 which is shown in Figure 7 of the Wang
`reference.”
`
`Kortshagen Depo., Ex. 2009 at 39:10-‐14
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`10
`
`
`
`Kudryavetsev
`
`Fujitsu et al. v. Zond
`IPRs 2014-‐00807, 2014-‐00808, 2014-‐01099, 2014-‐01100
`Zond Ex. 2010
`
`11
Accessing this document will incur an additional charge of $.
After purchase, you can access this document again without charge.
Accept $ Charge
Still Working On It
This document is taking longer than usual to download. This can happen if we need to contact the court directly to obtain the document and their servers are running slowly.
Give it another minute or two to complete, and then try the refresh button.
A few More Minutes ... Still Working
It can take up to 5 minutes for us to download a document if the court servers are running slowly.
Thank you for your continued patience.
This document could not be displayed.
We could not find this document within its docket. Please go back to the docket page and check the link. If that does not work, go back to the docket and refresh it to pull the newest information.
Your account does not support viewing this document.
You need a Paid Account to view this document. Click here to change your account type.
Your account does not support viewing this document.
Set your membership
status to view this document.
With a Docket Alarm membership, you'll
get a whole lot more, including:
- Up-to-date information for this case.
- Email alerts whenever there is an update.
- Full text search for other cases.
- Get email alerts whenever a new case matches your search.
One Moment Please
The filing “” is large (MB) and is being downloaded.
Please refresh this page in a few minutes to see if the filing has been downloaded. The filing will also be emailed to you when the download completes.
Your document is on its way!
If you do not receive the document in five minutes, contact support at support@docketalarm.com.
Sealed Document
We are unable to display this document, it may be under a court ordered seal.
If you have proper credentials to access the file, you may proceed directly to the court's system using your government issued username and password.
Access Government Site
