`571-272-7822
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` Paper 41
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`Entered: January 5, 2016
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`
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________
`
`GLOBALFOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN
`MODULE ONE LLC & CO. KG, GLOBALFOUNDRIES DRESDEN
`MODULE TWO LLC & CO. KG, and THE GILLETTE COMPANY,
`
`Petitioners,
`
`v.
`
`ZOND, LLC,
`Patent Owner.
`____________
`
`Case IPR2014-010881
`Patent 6,806,652 B1
`____________
`
`
`Before KEVIN F. TURNER, JONI Y. CHANG, SUSAN L. C. MITCHELL,
`and JENNIFER MEYER CHAGNON, Administrative Patent Judges.
`
`MITCHELL, Administrative Patent Judge.
`
`FINAL WRITTEN DECISION
`Inter Partes Review
`35 U.S.C. § 318(a) and 37 C.F.R. § 42.73
`
`
`1 Case IPR2014-01000 has been joined with the instant inter partes review.
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`IPR2014-01088
`Patent 6,806,652 B1
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`I. INTRODUCTION
`
`We have jurisdiction under 35 U.S.C. § 6(c). This Final Written
`Decision is entered pursuant to 35 U.S.C. § 318(a) and 37 C.F.R. § 42.73.
`For the reasons set forth below, we determine that Petitioners have shown,
`by a preponderance of the evidence, that claims 1–17 of U.S. Patent
`No. 6,806,652 B1 (Ex. 1001, “the ’652 patent”) are unpatentable under
`35 U.S.C. § 103(a).
`
`A. Procedural History
`GlobalFoundries U.S., Inc., GlobalFoundries Dresden Module One
`
`LLC & Co. KG, and GlobalFoundries Dresden Module Two LLC & Co.,
`KG (collectively, “GlobalFoundries”) filed a Petition (Paper 2, “Pet.”)
`seeking inter partes review of claims 1–17 (“the challenged claims”) of
`the ’652 patent. GlobalFoundries included a Declaration of Dr. Uwe
`Kortshagen (Ex. 1002) to support its positions. Patent Owner Zond, LLC
`(“Zond”) filed a Preliminary Response (Paper 10, “Prelim. Resp.”).
`Pursuant to 35 U.S.C. § 314(a), on January 6, 2015, we instituted an inter
`partes review of the challenged claims to determine if the claims are
`unpatentable under 35 U.S.C. § 103 as obvious over various combinations of
`Mozgrin, Kudryavtsev, Fahey, Iwamura, Vratney, Lantsman, and Wang.
`Paper 16, 32 (“Dec.”).
`
`Subsequent to institution, we granted a revised Motion for Joinder
`filed by the Gillette Company listed in the Caption above, joining Case
`IPR2014-01000 with the instant trial (Paper 17). Zond filed a Patent Owner
`Response (Paper 28, “PO Resp.”), along with a Declaration of Larry D.
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`Hartsough, Ph.D. (Ex. 2002) to support its positions. GlobalFoundries filed
`a Reply (Paper 29, “Reply”) to the Patent Owner Response, along with a
`supplemental Declaration of Dr. Kortshagen (Ex. 1020). An oral hearing2
`was held on August 13, 2015. A transcript of the hearing is included in the
`record. Paper 40 (“Tr.”).
`
`B. Related Matters
`GlobalFoundries indicates that the ’652 patent was asserted in seven
`
`patent infringement actions in the District of Massachusetts, naming many of
`the Petitioners as defendants. Pet. 1; Ex. 1018. GlobalFoundries also
`identifies Petitions for inter partes review that are related to this proceeding.
`Pet. 1.
`
`C. The ’652 Patent
`The ’652 patent notes several problems with known magnetron
`sputtering systems, such as poor target utilization resulting from a relatively
`high concentration of positively charged ions in the region that results in a
`non-uniform plasma. Ex. 1001, 4:23–28. The ’652 patent states that while
`increasing the power applied to the plasma may increase the uniformity and
`density of the plasma, doing so may significantly increase the probability of
`establishing an electrical breakdown condition of arcing. Id. at 4:31–37.
`The invention set forth in the ’652 patent involves a plasma generation
`method that provides independent control of two or more co-existing
`plasmas in a system. Id. at 4:62–64.
`
`2 The oral arguments for the instant review and IPR2014-00861 and
`IPR2014-01089 were consolidated.
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`One embodiment of the ’652 patent is shown in Figure 2A set forth
`below.
`
`
`Figure 2A, reproduced above, shows a cross-sectional view of plasma
`generating apparatus 200 with segmented cathode 202. Id. at 5:43–45. Such
`segmented cathode has inner cathode section 202a and outer cathode section
`202b. Id. at 5:45–47. Outer cathode 202b is coupled to first output 204 of
`first power supply 206, which can operate in a constant power mode or a
`constant voltage mode. Id. at 5:56–67. Second output 208 of first power
`supply 206 is coupled to first anode 210 that has insulator 211 to isolate it
`from outer cathode section 202b. Id. at 6:5–7.
`Gap 212 is formed between first anode 210 and outer cathode section
`202b that is sufficient to allow current to flow through region 214 within
`gap 212. Id. at 6:34–38. Gap 212 can be a plasma generator where plasma
`is ignited in gap 212 from feed gas 234, such as argon, fed from gas
`line 230. Id. at 6:59–61, 8:1–3, 10–11. Such an ignition condition and
`plasma development in the gap can be optimized by crossed electric and
`magnetic fields in gap 212 that trap electrons and ions improving the
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`efficiency of the ionization process. Id. at 6:61–67. Gap 212 can be
`configured to generate excited atoms, which can increase the density of
`plasma, from ground state atoms. Id. at 6:44–46. “Since excited atoms
`generally require less energy to ionize than ground state gas atoms, a volume
`of excited atoms can generate higher density plasma than a similar volume
`of ground state feed gas atoms for the same input energy.” Id. at 6:46–50.
`Gap 212 facilitates high input power by having additional feed gas
`supplied to gap 212 that displaces some of the already developing plasma
`and absorbs any excess power applied to the plasma. Id. at 7:1–6. Such
`absorption prevents the plasma from contracting and terminating. Id. at 7:6–
`9. Feed gases 234, 236 are introduced into the chamber from more than one
`feed source, such as feed source 238, 240, through gas lines 230, 232 that
`may include in-line gas valves 242, 244 to control gas flow to the chamber.
`Id. at 8:1–5. Pulsing the feed gas can help generate excited atoms, including
`metastable atoms, by increasing the instantaneous pressure in gap 212, while
`the average pressure in the chamber is unchanged. Id. at 8:23–28.
`Second power supply 222 applies high power pulses between inner
`cathode section 202a and second anode 226 after an appropriate volume of
`initial plasma is present in region 252. Id. at 12:1–5. “The high-power
`pulses create an electric field 254 between the inner cathode section 202b
`and the second anode 226 that strongly-ionizes the initial plasma thereby
`creating a high-density plasma in the region 252.” Id. at 12:5–9. These high
`power pulses from second power supply 222, which add additional power to
`an already strongly-ionized plasma, super-ionizes the high-density plasma in
`region 252. Id. at 11:54–57. The ’652 patent defines “super-ionized” to
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`mean that “at least 75% of the neutral atoms in the plasma are converted to
`ions.” Id. at 5:8–10.
`Figure 2B, reproduced below, shows a more detailed cross-sectional
`view of the segmented cathode of Figure 2A.
`
`
`
`Figure 2B shows that electric fields 250, 254, which enhance the
`formation of ions in the plasma, can facilitate a multi-step ionization process
`of feed gases 234, 236, respectively, that substantially increases the rate at
`which the high-density plasma is formed. Id. at 12:50–56.
`Figure 12, set forth below with GlobalFoundries’s annotations,
`Pet. 10, shows another embodiment of the ’652 patent.
`
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`Excited atom source 732b generates an initial plasma and excited
`atoms, which include metastable atoms, from ground state atoms from feed
`gas 234. Ex. 1001, 25:35–38. Nozzle chamber 738 traps a large fraction of
`ions and electrons, while excited atoms and ground state atoms flow through
`aperture 737 of skimmer 736. Id. at 27:18–21. The ’652 patent further
`provides:
`After a sufficient volume of excited atoms including
`
`metastable atoms is present proximate to the inner cathode
`section 732a of the cathode assembly 732, the second power
`supply 222 generates an electric field (not shown) proximate to
`the volume of excited atoms between the inner cathode section
`732a and the second anode 706. The electric field
`super-ionizes the initial plasma by raising the energy of the
`initial plasma including the volume of excited atoms which
`causes collisions between neutral atoms, electrons, and excited
`atoms including metastable atoms in the initial plasma. The
`high-density collisions generate the high-density plasma
`proximate to the inner cathode section 732a. The high-density
`plasma includes ions, excited atoms and additional metastable
`atoms. The efficiency of this multi-step ionization process
`increases as the density of excited atoms and metastable atoms
`increases.
`
`Id. at 27:22–37.
`
`D. Illustrative Claim
`Of the challenged claims, claim 1 is the only independent claim.
`Challenged claims 2 through 17 depend, either directly or indirectly, from
`claim 1. Claim 1, reproduced below, is illustrative:
`1. A high-density plasma source comprising:
`a) a cathode assembly;
`b) an anode that is positioned adjacent to the cathode assembly;
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`c) an excited atom source that generates an initial plasma and
`excited atoms from a volume of feed gas, the initial plasma and
`excited atoms being proximate to the cathode assembly; and
`d) a power supply that generates an electric field between the
`cathode assembly and the anode, the electric field super-
`ionizing the initial plasma so as to generate a high-density
`plasma.
`Ex. 1001, 33:53–64.
`
`E. Prior Art Relied Upon
`GlobalFoundries relies upon the following prior art references:
`Wang et al.
`US 6,413,382 B1 July 2, 2002
`(Ex. 1004)
`
`Iwamura et al.
`US 5,753,886
`May 19, 1998
`(Ex. 1007)
`
`Lantsman
`
`US 6,190,512 B1 Feb. 20, 2001
`(Ex. 1013)
`
`Vratny
`
`US 3,461,054
`Aug. 12, 1969
`(Ex. 1008)
`
`D.V. Mozgrin, et al., High-Current Low-Pressure Quasi-Stationary
`
`Discharge in a Magnetic Field: Experimental Research, 21 PLASMA
`PHYSICS REPORTS 400–409 (1995) (Ex. 1003) (“Mozgrin”).
`
`
`A. A. Kudryavtsev and V. N. Skrebov, Ionization Relaxation in a
`Plasma Produced by a Pulsed Inert-Gas Discharge, 28(1) SOV. PHYS. TECH.
`PHYS. 30–35 (Jan. 1983) (Ex. 1006) (“Kudryavtsev”).
`
`
`
`D. W. Fahey, W. F. Parks, and L. D. Schearer, High Flux Beam
`Source of Thermal Rare-Gas Metastable Atoms, 13 J. PHYS. E: SCI.
`INSTRUM. 381–383 (1980) (Ex. 1005) (“Fahey”).
`
`
`F. Asserted Grounds of Unpatentability
`We instituted the instant trial based on the following grounds of
`unpatentability (Dec. 32).
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`
`Claims
`
`1–14, 16, and 17
`
`5
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`8–10
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`15
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`
`
`References
`Basis
`§ 103(a) Mozgrin, Kudryavtsev, Fahey, and
`Iwamura
`§ 103(a) Mozgrin, Kudryavtsev, Fahey,
`Vratny, and Iwamura
`§ 103(a) Mozgrin, Kudryavtsev, Fahey,
`Lantsman, and Iwamura
`§ 103(a) Mozgrin, Kudryavtsev, Fahey,
`Wang, and Iwamura
`
`II. ANALYSIS
`A. Claim Construction
`In an inter partes review, claim terms in an unexpired patent are given
`their broadest reasonable construction in light of the specification of the
`patent in which they appear. 37 C.F.R. § 42.100(b). Claim terms are given
`their ordinary and customary meaning as would be understood by one of
`ordinary skill in the art in the context of the entire disclosure. In re
`Translogic Tech., Inc., 504 F.3d 1249, 1257 (Fed. Cir. 2007). An inventor
`may rebut that presumption by providing a definition of the term in the
`specification with reasonable clarity, deliberateness, and precision. In re
`Paulsen, 30 F.3d 1475, 1480 (Fed. Cir. 1994). In the absence of such a
`definition, limitations are not to be read from the specification into the
`claims. In re Van Geuns, 988 F.2d 1181, 1184 (Fed. Cir. 1993).
`In the instant proceeding, GlobalFoundries proposed a construction of
`the term “super-ionizing the initial plasma.” Pet. 13–14. Although Zond
`offered its own construction of this term, in addition to a construction of an
`“excited atom source that generates an initial plasma and excited ions from a
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`volume of feed gas” and “a gas valve that injects feed gas proximate to the
`cathode assembly at a predetermined time” in its Preliminary Response,
`Prelim. Resp. 12–20, Zond did not address explicitly constructions of these
`terms in its Patent Owner Response. In its Patent Owner Response,
`however, Zond does apply our initial construction of the term “super-
`ionizing the initial plasma,” PO Resp. 2–4, and relies on its proposed
`construction for “generating an initial plasma and excited ions from a
`volume of feed gas” in its overview of the teachings of Kudryavtsev. PO
`Resp. 16–20. We address these two claim terms in turn.
`
`1. “excited atom source that generates an initial plasma
`and excited atoms from a volume of feed gas”
`
`All claims at issue require an “excited atom source that generates an
`initial plasma and excited atoms from a volume of feed gas.” Ex. 1001,
`33:53–34:44. As we previously stated, Zond does not propose an explicit
`construction for this claim limitation in its Patent Owner Response. In its
`Preliminary Response, however, Zond proposes that this claim limitation
`should be construed as “a source for generating both an initial plasma and
`significantly more than an incidental amount of excited atoms from the same
`volume of feed gas, wherein a feed gas is a gas that is a flowing gas.”
`Prelim. Resp. 15. Zond implicitly applies this proposed construction in its
`assertions concerning the teachings of Kudryavtsev.
`Zond asserts in its Preliminary Response that the recitation of a
`“volume of feed gas” requires that both ionization and excitation occur in the
`same volume of feed gas, and that “feed gas” implies a flow of gas. Prelim.
`Resp. 12–13. In its Patent Owner Response, Zond reiterates this
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`understanding of the meaning of “excited atom source that generates an
`initial plasma and excited atoms from a volume of feed gas,” by asserting as
`follows regarding Kudryavtsev.
`Furthermore, and perhaps most importantly, Kudryavtsev says
`that the “studied effects” are characteristic of a system in which
`a field applied to a pre-existing weak plasma, i.e. an initial
`plasma has already been created when the electric field is
`applied. In the claims at issue, excited atoms are formed from a
`volume of feed gas at the same time as an initial plasma is
`being formed from the same volume of feed gas. Kudryavtsev
`does not consider this situation. The analysis deals only with
`the reaction of an existing plasma when an electric field is
`suddenly applied.
`
`PO Resp. 20 (citations omitted); see also PO Resp. 18 (“Kudryavtsev deals
`with the reaction of an existing plasma when an electric field is suddenly
`applied, and the formation of ions and excited atoms as a result of that
`pulse.”).
`As we previously stated in our Decision on Institution, see Dec. 12,
`the recitation of “feed gas” in claim 1 does not imply necessarily the flow of
`gas. Certainly, the gas is provided, but claim 1 does not recite generating an
`initial plasma and excited atoms “from a gas being fed,” for example.
`Construing the claim limitation as Zond suggests would be equivalent to
`changing the scope of claim 1.
`Also, we previously noted that the Specification of the ’652 patent
`describes the use of in-line gas valves 242, 244 that can control the flow of
`gas to the chamber (Ex. 1001, 8:3–5), and also describes pulsing feed gases
`234, 236 to help generate excited atoms, including metastable atoms, in
`gap 212 (Ex. 1001, 8:3–5, 8:23–25). See Dec. 12–13. Therefore, we
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`concluded that such control of the feed gas supports the notion that “feed
`gas” does not necessitate a “gas that is a flowing gas.” Id. at 13.
`We also previously stated that the Specification of the ’652 patent
`further states that feed gases may be introduced from multiple locations into
`the chamber. Id. (citing Ex. 1001, 8:1–3). We also stated that having
`multiple sources for feed gases does not support a construction that “a
`volume of feed gas” requires that the initial plasma and excited ions are
`generated from the same volume of feed gas, assuming that a particular
`volume of feed gas may be identified in such a process. Id. In its Patent
`Owner Response, Zond does not address these issues that we expressed with
`regard to its proposed claim construction. Although we did not construe
`explicitly the claim limitation “excited atom source that generates an initial
`plasma and excited atoms from a volume of feed gas,” we discern no reason
`to modify our conclusions that the claim limitation does not imply
`necessarily the flow of gas, nor does it require that the initial plasma and
`excited ions are generated from the same volume of feed gas.
`
`2. “super-ionizing the initial plasma”
`All claims at issue require “super-ionizing the initial plasma.”
`Ex. 1001, 33:53–34:44. GlobalFoundries notes that the Specification of
`the ’652 patent explicitly defines “super-ionized” as “at least 75% of the
`neutral atoms in the plasma are converted to ions.” Pet. 13 (citing Ex. 1001,
`5:8–10). From this definition, GlobalFoundries concludes that the limitation
`at issue should be construed as “converting at least 75% of the neutral atoms
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`in the initial plasma generated from a volume of feed gas to ions.” Id. at 13–
`14 (emphasis added).
`Zond made arguments in its Preliminary Response that it did not
`reiterate in its Patent Owner Response. Zond, noting the same definition in
`the ’652 patent, asserts that the reference to “the plasma” in the definition
`means that “75% of the neutrals in the original feed gas have been converted
`to ions in the super-ionized plasma.” Prelim. Resp. 15–16. Therefore, Zond
`asserts that this claim limitation should be construed to mean ionizing the
`plasma “so that at least 75% of the neutrals in the original feed gas have
`been converted to ions.” Prelim. Resp. 16.
`We noted in our Decision on Institution that the claim limitation at
`issue requires “super-ionizing the initial plasma,” Ex. 1001, 33:63 (emphasis
`added), which Zond’s proposed construction did not reflect. Dec. 11. We
`also noted that Zond’s construction introduced a term “original feed gas”
`that does not appear to be used or defined in the Specification of the ’652
`patent; therefore, Zond’s construction would introduce an unnecessary
`ambiguity into the claims. Id. We found that GlobalFoundries’s proposed
`construction reflects the explicit definition of “super-ionized” provided in
`the ’652 patent Specification. Id. Therefore, we initially construed the
`claim limitation as “converting at least 75% of the neutral atoms in the initial
`plasma into ions.” Id. Neither party challenges our construction, see PO
`Resp. 27, Reply 3–11, and we discern no reason to modify our construction
`based on the complete record now before us. Therefore, we construe “super-
`ionizing the initial plasma” as “converting at least 75% of the neutral atoms
`in the initial plasma into ions.”
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`B. Principles of Law
`A patent claim is unpatentable under 35 U.S.C. § 103(a) if the
`differences between the claimed subject matter and the prior art are such that
`the subject matter, as a whole, would have been obvious at the time the
`invention was made to a person having ordinary skill in the art to which said
`subject matter pertains. KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 406
`(2007). The question of obviousness is resolved on the basis of underlying
`factual determinations including: (1) the scope and content of the prior art;
`(2) any differences between the claimed subject matter and the prior art;
`(3) the level of ordinary skill in the art; and (4) objective evidence of
`nonobviousness. Graham v. John Deere Co., 383 U.S. 1, 17–18 (1966).
`In that regard, an obviousness analysis “need not seek out precise
`teachings directed to the specific subject matter of the challenged claim, for
`a court can take account of the inferences and creative steps that a person of
`ordinary skill in the art would employ.” KSR, 550 U.S. at 418; see
`Translogic, 504 F.3d at 1259. A prima facie case of obviousness is
`established when the prior art itself would appear to have suggested the
`claimed subject matter to a person of ordinary skill in the art. In re Rinehart,
`531 F.2d 1048, 1051 (CCPA 1976). Notwithstanding that Dr. Hartsough
`provides a definition of “a person of ordinary skill in the art” in the context
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`of the ’652 patent,3 we are mindful that the level of ordinary skill in the art
`also is reflected by the prior art of record. See Okajima v. Bourdeau,
`261 F.3d 1350, 1355 (Fed. Cir. 2001); In re GPAC Inc., 57 F.3d 1573, 1579
`(Fed. Cir. 1995); In re Oelrich, 579 F.2d 86, 91 (CCPA 1978).
`We analyze the asserted grounds of unpatentability in accordance with
`the above-stated principles.
`
`C. Obviousness over, in Whole or in Part, the Combination of Mozgrin,
`Kudryavtsev, Fahey, Iwamura, Lantsman, and Wang
`
`GlobalFoundries asserts the following: (1) Claims 1–14, 16, and 17
`
`are unpatentable under 35 U.S.C. § 103(a) as obvious over the combination
`of Mozgrin, Kudryavtsev, Fahey, and Iwamura, Pet. 54–58; (2) Claim 5 is
`unpatentable under 35 U.S.C. § 103(a) as obvious over the combination of
`Mozgrin, Kudryavtsev, Fahey, Vratny, and Iwamura; (3) Claims 8–10 are
`unpatentable as obvious over the combination of Mozgrin, Kudryavtsev,
`Fahey, Lantsman, and Iwamura, Pet. 58–59; and (4) Claim 15 is
`unpatentable under 35 U.S.C. § 103(a) as obvious over the combination of
`Mozgrin, Kudryavtsev, Fahey, Wang, and Iwamura, Pet. 59–60.
`As support, GlobalFoundries provides detailed explanations as to how
`each claim limitation is met by the references and rationales for combining
`the references, as well as an initial declaration and a supplemental
`declaration of Dr. Kortshagen to support GlobalFoundries’s Petition and
`
`3 “[A] person of ordinary skill in the art at the time of filing of the ’652
`patent [is] someone who holds at least a bachelor of science degree in
`physics, material science, or electrical/computer engineering with at least
`two years of work experience or equivalent in the field of development of
`plasma-based processing equipment.” Ex. 2002 ¶ 17.
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`Reply, respectively. Pet. 54–60; Ex. 1002; Reply 16-20; Ex. 1020. Zond
`responds that these combinations do not disclose every claim element.
`PO Resp. 25–35.
`We have reviewed the entire record before us, including the parties’
`explanations and supporting evidence presented during this trial. We begin
`our discussion with a brief summary of Mozgrin, Kudryavtsev, Fahey, and
`Iwamura.
`
`Mozgrin
`Mozgrin discloses experimental research conducted on high-current,
`low-pressure, quasi-stationary discharge in a magnetic field. Ex. 1003, 400,
`Title. In Mozgrin, pulse or quasi-stationary regimes are discussed in light of
`the need for greater discharge power and plasma density. Id. Mozgrin
`discloses a planar magnetron plasma system having cathode 1, anode 2
`adjacent and parallel to cathode 1, and magnetic system 3, as shown in
`Figure 1(a). Id. at 400–01. Mozgrin also discloses a power supply unit that
`includes a pulsed discharge supply unit and a system for pre-ionization. Id.
`at 401–02, Fig. 2. For pre-ionization, an initial plasma density is generated
`when the square voltage pulse is applied to the gas. Id.
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`Figure 3(b) of Mozgrin is reproduced below.
`
`
`Figure 3(b) of Mozgrin illustrates an oscillogram of voltage of the
`quasi-stationary discharge. Id. at 402. In Figure 3(b), Part 1 represents the
`voltage of the stationary discharge (pre-ionization stage); Part 2 displays the
`square voltage pulse application to the gap (Part 2a), where the plasma
`density grows and reaches its quasi-stationary value (Part 2b); and Part 3
`displays the voltage as the discharge current grows and both the voltage and
`discharge current attain their quasi-stationary value. Id. More specifically,
`the power supply generates a square voltage with rise times of 5–60 µs and
`durations of as much as 1.5 ms. Id. at 401.
`Mozgrin further discloses the current-voltage characteristic of the
`quasi-stationary plasma discharge that has four different stable forms or
`regimes: (1) pre-ionization stage, id. at 401–02; (2) high-current magnetron
`discharge regime, in which the plasma density exceeds 2 x 1013 cm-3,
`appropriate for sputtering, id. at 402–04, 409; (3) high-current diffuse
`discharge regime, in which the plasma density produces large-volume
`uniform dense plasmas η1 ≈ 1.5 x 1015 cm-3, appropriate for etching, id.; and
`(4) arc discharge regime, id. at 402–04. Id. at 402–09, Figs. 3–7.
`
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`Kudryavtsev
`Kudryavtsev discloses a multi-step ionization plasma process,
`comprising the steps of exciting the ground state atoms to generate excited
`atoms, and then ionizing the excited atoms. Ex. 1006, Abs., Figs. 1, 6.
`Figure 1 of Kudryavtsev illustrates the atomic energy levels during the
`slow and fast stages of ionization. Figure 1 of Kudryavtsev is reproduced
`below (with annotations added by GlobalFoundries, Pet. 17).
`
`
`
`As shown in Figure 1 of Kudryavtsev, ionization occurs with a “slow
`stage” (Fig. 1a) followed by a “fast stage” (Fig. 1b). During the initial slow
`stage, direct ionization provides a significant contribution to the generation
`of plasma ions (arrow Γ1e showing ionization (top line labeled “e”) from the
`ground state (bottom line labeled “1”)). Dr. Kortshagen explains that
`Kudryavtsev shows the rapid increase in ionization once multi-step
`ionization becomes the dominant process. Ex. 1002 ¶ 46; Pet. 18–19.
`Indeed, Kudryavtsev discloses:
`For nearly stationary n2 [excited atom density] values . . . there
`is an explosive increase in ne [plasma density]. The subsequent
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`increase in ne then reaches its maximum value, equal to the rate
`of excitation . . . which is several orders of magnitude greater
`than the ionization rate during the initial stage.
`
`Ex. 1006, 31, right col., ¶ 6 (emphasis added). Kudryavtsev also recognizes
`that “in a pulsed inert-gas discharge plasma at moderate pressures . . . [i]t is
`shown that the electron density increases explosively in time due to
`accumulation of atoms in the lowest excited states.” Id. at 30, Abs., Fig. 6.
`
`Fahey
`
`Fahey discloses a high-flux beam source that produces a beam of
`helium, neon, and argon metastable atoms. Ex. 1005, Abs. Figure 1,
`reproduced below, shows a beam source schematic showing Pyrex tube (A),
`boron nitride nozzle (B), skimmer (C), and needle or needle array (D). Id.
`at 381, right col.
`
`
`Figure 1 above shows a source that produces a low-voltage discharge
`
`between sharp needle D, which is a cathode maintained at a negative
`potential, and cone-shaped skimmer electrode C, which is kept at ground
`potential. Id. at 381, right col., ¶ 4; 382, left col., ¶ 2. Skimmer piece C is
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`attached with an aluminum gasket to a vacuum wall to allow differential
`pumping of the source. Id. at 382, left col., ¶ 1. For all diagnostic
`measurements, a set of parallel sweep plates, maintained at an adequate
`voltage, is mounted after the skimmer to keep the beam free of charged
`species. Id. at 382, left col., ¶ 5. The source can provide very stable thermal
`energy beams of helium, neon, and argon metastable atoms. Id. at 381, right
`col., ¶ 3.
`
`Iwamura
`
`Iwamura discloses a plasma treatment apparatus for generating a
`stable plasma with a multi-step ionization process, to treat a semiconductor
`wafer. Ex. 1007, Abs., 6:67–7:8. Figure 1 of Iwamura, reproduced below
`(with our annotations added), illustrates a plasma treatment apparatus.
`
`Pre-excitation unit
`
`First plasma generation unit
`
`Second plasma generation unit
`
`
`As shown in Figure 1 of Iwamura, plasma chamber 10 is coupled to
`the gas supply pipe (shown as items 20a and 20b). Gas supply 20 supplies a
`gas capable of plasma discharge (e.g., helium or argon, a noble gas) through
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`a pre-excitation unit that includes ultraviolet lamp 24, and a first plasma
`generation unit that includes electrodes 26. Id. at 6:67–7:17, 49. Ultraviolet
`lamp 24 causes photoionization, raising the excitation level of the gas and
`generating excited and metastable atoms from ground state atoms. Id. at
`7:55–60. Thereafter, a plasma is generated from the gas in plasma region A,
`between electrodes 26 (the first plasma generation unit), and a plasma also is
`generated in plasma region B, between electrodes 30 (the second plasma
`generation unit). Id. at 7:61–65, 8:4–9, 8:32–46. According to Iwamura,
`because the excitation level of the gas is raised first, a stable plasma can be
`generated inside the plasma chamber. Id. at 8:32–37. Consequently, the
`uniformity of the plasma density, as well as the yield of the treatment of the
`semiconductor wafer, can be improved. Id. at 8:41–46.
`
`Analysis
`
`Zond does not take issue with GlobalFoundries’s assertions that the
`cited references teach “a high density plasma source comprising a cathode
`assembly, and an anode that is positioned adjacent to the cathode assembly.”
`See PO Resp. 25–30. After reviewing the record, we are persuaded that
`GlobalFoundries has shown that the references teach these limitations that
`are found in all challenged claims. See Pet. 20–34, 54–58; Ex. 1002 ¶¶ 52–
`81, 141–146.
`
`Zond does assert that GlobalFoundries has failed to show any cited
`reference teaches “super-ionizing the initial plasma so as to generate a high-
`density plasma,” see PO Resp. 25–30, and, at least implicitly, asserts that no
`reference teaches “an excited atom source that generates an initial plasma
`and excited atoms from a volume of feed gas,” PO Resp. 20–23.
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`“an excited atom source that generates an initial plasma and
`excited atoms from a volume of feed gas”
`
`Zond notes deficiencies in the references for what each teaches alone
`
`(see PO Resp. 16–23), and argues that the combination does not teach or
`suggest “an excited atom source that generates an initial plasma and excited
`atoms from a volume of feed gas,” see PO Resp. 22–23 (regarding Fahey),
`20 (regarding Kudryavtsev). References must be read, however, not in
`isolation, but for what each fairly teaches in combination with the prior art
`as a whole. In re Merck & Co., 800 F.2d 1091, 1097 (Fed. Cir. 1986). Zond
`does not address what the combination of references asserted by
`GlobalFoundries teaches, but only addresses the references individually.
`
`GlobalFoundries asserts that both Fahey and Iwamura teach
`“generating an initial plasma and excited atoms from a volume of feed gas.”
`See Pet. 22–24, 54–58. GlobalFoundries asserts the following concerning
`Fahey.
`
`While many of the charged species are skimmed by
`Fahey’s skimmer, some of the charged species will pass
`through the skimmer, as is said to occur in the ’652 Patent. See,
`e.g., ’652 Patent, 27:18–21 (“A large fraction of the ions and
`electrons are trapped in the nozzle chamber 738 while the
`excited atoms and ground state atoms flow through the aperture
`737 of the skimmer 736.”) (Ex. 1001). Kortshagen Decl. ¶ 58
`(Ex. 1002). Therefore, like the ’652 Patent, Fahey generates
`both an initial plasma and excited atoms from a volume of feed
`gas. Id.
`
`Pet. 23–24.
`
`Zond’s argument with respect to the teachings of Fahey focuses on a
`lack of teaching of generation of an initial plasma and excited atoms from a
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`volume of feed gas by pointing out that Fahey “describes a dev