EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`References cited herein:
`
`o U.S. Patent No. 7,808,184 C“ 184 Patent”)
`
`Dischar e in a
`-Current Low-Pressure uasi-Station
`0 D.V. Mozgrin, et al, Hi
`Magnetic Field: Experimental Research, Plasma Physics Reports, Vol. 21, No. 5, 1995
`(“Mozgrin”)
`
`0 A. A. Kudryavtsev, et al, Ionization relaxation in a plasma produced by a pulsed inert-gas
`discharge, Sov. Phys. Tech. Phys. 28(1), January 1983 (“Kudryavtsev”)
`
`0 Leipold et al., High-electron density, atmospheric pressure air glow discharges, Power
`Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Conference Record of
`the Twenty-Fifth International, June 2002 (“Leipold”)
`
`0 Dennis M. Manos & Daniel L. Flamm, Plasma Etching: An Introduction, Academic Press
`1989 (“Manos”)
`
`0 Gudmundsson et al., Evolution of the electron energy distribution and plasma parameters
`in a pulsed magnetron discharge, Applied Physics Letters, 78(22) May 2001
`(“Gudmundsson”)
`
`- U.S. Pat. No. 6,413,382 (“Wang”)
`
`Claims 3 and 13
`
`Mozrin in View of Kud avtsev and Wan
`
`1. A method of
`generating a
`strongly-ionized
`plasma, the
`method
`comprising:
`
`The combination of Mozgrin with Kudryavtsev discloses a method of
`generating a strongly-ionized plasma.
`
`‘ 184 Patent at 7: 14-17 (“[S]trongly-ionized plasmas are generally plasmas
`having plasma densities that are greater than about 1012-1013 cm'3.”)
`
`Mozgrin at 401, right col, 112 (“For pre-ionization
`density in the 109 — 10“ cm'3 range.”)
`
`the initial plasma
`
`Mozgrin at 409, left col, 1] 4 (“The implementation of the high-current
`magnetron discharge (regime 2) in sputtering
`plasma density (exceeding
`2xl013 cm'3).”
`
`Mozgrin at 409, left col, 115 (“The high-current diffuse discharge (regime 3)
`
`is useful for producing large-Volume uniform dense plasmas I1,-E
`l.5xl015cm'3...” .
`
`The combination of Mozgrin with Kudryavtsev discloses supplying feed gas
`proximate to an anode and a cathode assembly.
`
`a) supplying feed
`gas proximate to
`an anode and a
`
`cathode assembly; Mozgrin at Fig. 1
`and
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozgrin in view of Kudryavtsev and Wang‘.1
`
`I
`
`,.
`
`,\\‘ yr
`
`.
`
`Fig. 1. Discharge dcvicc configurations: (a) planar magne-
`tron;
`(b)
`shaped-clcctrodc configuration.
`(1) Cathode;
`(2) anode; (3) magnetic system.
`
`Mozgrin at 401, left col, 1] 4 (“. . .the discharge gap which was filled up with
`either neutral or pre-ionized gas.”).
`
`Mozgrin at 400, right col, 1] 3 (“We investigated the discharge regimes in
`Various gas mixtures at 10'3 — 10 torr. . .”).
`
`Mozgrin at 402, 1] sparming left and right cols (“We studied the high-current
`discharge in wide ranges of discharge current. . .and operating
`pressure. . .using Various gases (Ar, N2, SF6, and H2) or their mixtures of
`Various composition. . .”).
`
`Mozgrin at 401, left col, 1] 1 (“The [plasma] discharge. . .was adjacent to the
`cathode.”)
`
`See also Moz; '
`
`.
`
`.
`
`The combination of Mozgrin with Kudryavtsev discloses generating a
`Voltage pulse between the anode and the cathode assembly.
`
`Mozgrin at Fig. 3:
`
`(b)
`
`b) generating a
`Voltage pulse
`between the
`
`anode and the
`
`cathode assembly,
`
`ActiVeUS 12224927 1 V. 1
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in view of Kud avtsev and Wan
`
`Mozgrin at 402, Fig. 3 caption (“Fig. 3. Oscillograms of (a) current and (b)
`voltage. . .”).
`
`Mozgrin at 401, left col, 1] 4 (“It was possible to form the high-current
`quasi-stationary regime by applying a square voltage pulse to the discharge
`which was filled u with either neutral or re-ionized
`.
`
`The combination of Mozgrin with Kudryavtsev discloses the voltage pulse
`having at least one of a controlled amplitude and a controlled rise time.
`
`Mozgrin at Fig. 3:
`
`(b)
`
`the voltage pulse
`having at least
`one of a
`
`controlled
`amplitude and a
`controlled rise
`time
`
`1
`
`2a 2b
`
`3
`
`Mozgrin at 401, right col, 1] 1 (“[t]he power supply was able to deliver
`square voltage and current pulses with [rise] times (leading edge) of 5 — 60
`HS --
`
`Mozgrin at 406, right col, 1] 2 (“Table 1 presents parameter ranges
`corresponding to regime 2.”).
`
`that increases an
`ionization rate so
`that a rapid
`increase in
`electron density
`and a formation of
`
`Mozrin at 406, Table 1.
`
`The combination of Mozgrin with Kudryavtsev discloses [at least one of a
`controlled amplitude and a controlled rise time] that increases an ionization
`rate so that a rapid increase in electron density and a formation of a
`strongly-ionized plasma occurs without forming an arc between the anode
`and the cathode assembly.
`
`a strongly-ionized Mozgrin at Fig. 3
`plasma occurs
`
`Mozgrin at 401, right col, 1]2 (“For pre-ionization
`density in the 109 — 10“ cm'3 range.”).
`
`the initial plasma
`
`Mozgrin at 409, left col, 1] 4 (“The implementation of the high-current
`magnetron discharge (regime 2) in sputtering
`plasma density (exceeding
`2x10” cm'3).”).
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in View of Kud avtsev and Wan
`
`Mozgrin at 409, left col, 1]5 (“The high-current diffuse discharge (regime 3)
`
`is useful for producing large-volume uniform dense plasmas I1,-E
`l.5xl015cm'3. . .”).
`
`Mozgrin at Fig. 3
`
`Mozgrin at 401, 1] sparming left and right columns (“The frequency
`parameters of the pulsed supply unit were chosen... Designing the [pulsed
`supply] unit, we took into account the dependencies which had been
`obtained in [Kudryavtsev] of ionization relaxation on pre-ionization
`parameters, pressure, and pulse voltage amplitude.”).
`
`Kudryavtsev at 32, right col, 1]1] 5-6 (“The discharge occurred inside a
`cylindrical tube... The gas was preionized by applying a dc current. . .A
`voltage pulse. . .was applied to the tube.”).
`
`Kudryavtsev at 31, right col, 1] 6 (“. .. an explosive increase in ne [electron
`density]. The subsequent increase in ne then reaches its maximum value,
`equal to the rate of excitation [equation omitted], which is several orders of
`magnitude greater than the ionization rate during the initial stage.”)
`
`Kudryavtsev at Abstract (“. .. electron density increases explosively in time
`due to accumulation of atoms in the lowest excited states.”)
`
`It would have been obvious to adjust the operating parameters, e.g., increase
`the pulse length and/or pressure, so as to trigger Kudryavtsev’s fast stage of
`ionization. One of ordinary skill would have been motivated to use
`Kudryavtsev’s fast stage of ionization in Mozgrin so as to increase plasma
`density and thereby increase the sputtering rate. Kudravtsev’s fast stage
`would also reduce the time required to reach a given plasma density in
`Mozgrin, thus reducing the time required for a sputtering process. Further,
`use of Kudryavtsev’s fast stage in Mozgrin would have been a combination
`of old elements in which each element performed as expected to yield
`predictable results. Finally, because Mozgrin’s pulse, or the pulse used in
`the combination of Mozgrin and Kudryavtsev, produced Kudryavtsev’s
`“explosive increase” in plasma density, the rise time and amplitude of the
`pulse result in increasing the ionization rate so that a rapid increase in
`electron density and formation of a strongly-ionized plasma occurs.
`
`It would have been obvious to one of ordinary skill to combine Mozgrin
`with Kudryavtsev at least because Mozgrin cites Kudryavtsev and because
`Mozgrin explicitly notes that it was designed in accordance with
`Kudryavtsev. Mozgrin at 401, 1] spanning left and right columns
`(“Designing the [pulsed supply] unit, we took into account the dependences
`which had been obtained in [Ku
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in view of Kud avtsev and Wan
`“Since the effects studied in this work are characteristic of ionization
`
`whenever a field is suddenly applied to a weakly ionized gas, they must be
`allowed for when studying emission mechanisms in pulsed gas lasers, gas
`breakdown, laser sparks, etc.” Kudryavtsev at 34, right col, 1] 4. Because
`Mozgrin applies voltage pulses that “suddenly generate an electric field,”
`one of ordinary skill reading Mozgrin would have been motivated to
`consider Kudryavtsev to better understand the effects of applying Mozgrin’s
`pulse and to confirm that Mozgrin’s system used Kudryavtsev’s fast stage
`of ionization. Further, use of Kudryavtsev’s fast stage in Mozgrin would
`have been a combination of old elements in which each element performed
`as expected.
`
`Background.‘
`Leipold at Abstract (“Application of a high voltage pulse causes a shift in
`the electron energy distribution function to higher energies. This causes a
`temporary increase of the ionization rate and consequently an increase of
`
`without forming
`an arc between
`the anode and the
`
`an arc between the anode and the cathode assembly.
`
`cathode assembly. Mozgrin at Fig. 7.
`
`Mozgrin at 400, left col, 1] 3 (“Some experiments on magnetron systems of
`various geometry showed that discharge regimes which do not transit to arcs
`can be obtained even at high currents.”).
`
`Mozgrin at 400, right col, 1] 1 (“A further increase in the discharge currents
`caused the discharges to transit to the arc regimes. . .”).
`
`Mozgrin at 404, left col, 1] 4 (“The parameters of the shaped-electrode
`discharge transit to regime 3, as well as the condition of its transit to arc
`regime 4, could be well determined for every given set of the discharge
`parameters.”).
`
`Mozgrin at 406, right col. 1] 3 (“Moreover, pre-ionization was not necessary;
`however, in this case, the probability of discharge transferring to the arc
`mode increased.”).
`
`Mozgrin at 403, left col, 1] 2 (“Then, we studied regimes 2 and 3 separately
`to determine the boundary parameters of their occurrence, such as current,
`voltage. . .”).
`
`Mozgrin at 400, right col, 1] 1 (“A further increase in the discharge currents
`caused the discharges to transit to the arc regimes. . .”).
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in view of Kud avtsev and Wan
`
`Mozgrin at 404, left col, 1] 4 (“If the current was raised above 1.8 kA or the
`pulse duration was increase to 2 — 10 ms, an instability development and
`discharge contraction was observed.”).
`
`Mozgrin at Figs. 4 and 7.
`
`Background.‘
`Manos at 231 “arcs. . .are a
`
`The combination of Mozgrin with Kudryavtsev discloses applying a
`magnetic field proximate to the cathode assembly.
`
`See evidence cited for claim 1.
`
`Mozgrin at Fig. 1:
`
`2. The method of
`claim 1 further
`comprising
`applying a
`magnetic field
`proximate to the
`cathode assembly.
`
`Fig. 1. Discharge devtcc configurations: ta) planar magne-
`tron;
`(b)
`shaped-electrode
`configuration.
`(I) Cathode;
`(2) anode; (3) ntagnctic system
`
`Mozgrin at 401, left col, 1] 1 (“The electrodes were immersed in a magnetic
`field of armular ermanent ma nets.” .
`
`The combination of Mozgrin, Kudryavtsev, and Wang discloses moving the
`magnetic field.
`
`See evidence cited for claim 2.
`
`Wang at Title (“Pulsed sputtering with a small rotating magnetron”).
`
`Wang at 4:45-46 (“The magnetron 40 is rotated about a central axis 52 by a
`motor shaft 54 and attached motor 56.”).
`
`One of ordinary skill would have been motivated to combine the teachings
`of Wang with Mozgrin and Kudryavtsev. First, as explained above with
`res ect to claim 1, Moz; '
`'
`'
`
`3. The method of
`claim 2 further
`comprising
`moving the
`magnetic field.
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in view of Kud avtsev and Wan
`
`when designing its systems. Also, both Mozgrin and Wang relate to pulsed
`plasma systems for sputtering. See Mozgrin at 409, left col, 1] 4 (“The
`implementation of the high-current magnetron discharge (regime 2) in
`sputtering or layer-deposition technologies provides an enhancement in the
`flux of deposited materials and plasma density. . .”); see also Wang at Title
`(“Pulsed sputtering with a small rotating magnetron”). Hence, Mozgrin and
`Wang relate to similar technology and one of ordinary skill would have
`been motivated to use Wang’s rotating magnetron in Mozgrin to further
`improve uniform target erosion.
`
`Moreover, a combination of Wang‘s rotating magnetic field with Mozgrin
`and Kudryavtsev would be a combination of known elements in which each
`element erforrned as exected.
`
`The combination of Mozgrin with Kudryavtsev discloses a method of
`generating a strongly-ionized plasma.
`
`See evidence cited in claim 1 preamble.
`
`The combination of Mozgrin with Kudryavtsev discloses supplying feed gas
`proximate to an anode and a cathode assembly.
`
`See evidence cited in claim 1(a).
`
`The combination of Mozgrin with Kudryavtsev discloses generating a
`voltage pulse between the anode and the cathode assembly, the voltage
`pulse having at least one of a controlled amplitude and a controlled rise time
`that shifts an electron energy distribution in the plasma to higher energies
`that increase an ionization rate so as to result in a rapid increase in electron
`density and a formation of a strongly-ionized plasma without forming an arc
`between the anode and the cathode assembly.
`
`See evidence cited in claim l(b).
`
`One of ordinary skill would have readily understood that the electron energy
`distribution shifts to higher energies in Mozgrin, because Mozgrin applies
`voltage pulses in a magnetron sputtering chamber.
`
`Background.‘
`Leipold at Abstract (“Application of a high voltage pulse causes a shift in
`the electron energy distribution function to higher energies. This causes a
`temporary increase of the ionization rate and consequently an increase of
`the electron density.”)
`
`Gudrnundsson at Title “[e]volution of the electron ener;
`
`distribution
`
`in
`
`1 1. A method of
`
`generating a
`strongly-ionized
`plasma, the
`method
`
`comrisin:
`
`a) supplying feed
`gas proximate to
`an anode and a
`
`cathode assembly;
`and
`
`b) generating a
`voltage pulse
`between the
`
`anode and the
`
`cathode assembly,
`the voltage pulse
`having at least
`one of a
`
`controlled
`
`amplitude and a
`controlled rise
`
`time that shifts an
`
`electron energy
`distribution in the
`
`plasma to higher
`energies that
`increase an
`
`ionization rate so
`
`as to result in a
`
`rapid increase in
`electron densi
`
`ActiVeUS l2224927lV.l
`
`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozrin in view of Kud avtsev and Wan
`
`and a formation of a pulsed magnetron discharge.”).
`a strongly-ionized
`plasma without
`forming an arc
`between the
`anode and the
`
`Gudmundsson at 3427, right col, 1] 2 (“For the measurements presented
`here, the average power was 300 W, pulse width 100 us, and repetition
`frequency 50 Hz. The peak voltage was roughly 800 V. . ..”)
`
`cathode assembly. Gudmundsson at 3428, left col, 1] 2 (“Figure 1 [of Gudmundsson] shows the
`evolution of the electron energy distribution fi1IlClIlOIl with time from
`initiating the pulse.”).
`
`Gudmundsson at 3429, right col, 1] 1 (“The average electron energy peaks at
`3.5 eV roughly 100 us after initiating the pulse. This peak in the average
`energy coincides with the presence of the high energy group of electrons
`apparent in the electron energy distribution.”)
`
`Gudmundsson at Figs. 1 and 2:
`001:
`
`
`
`.\:I)!‘HI‘<lll7PdEEDF
`
`
`
`.\'orma]izedEEDF
`
`2
`
`
`
`NorumlizeilEEDF
`
`FIG. 1. Normalized EEDF ineasmecl (a) during pulses 60. 80. and 100 ,us
`after initiating the pulse: (b) aroluid the electron density inaxinluni 105. 110.
`and 130 /is after initiating the pulse; and (c) 250. 350. and 450 /13 after
`initiating the pulse. Pulse length. 100 us: average power. 300 W : and pres-
`sure ] n1Ton'.
`
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`

`
`EXHIBIT G.02
`
`U.S. Patent No. 7,808,184
`
`Claims 3 and 13
`
`Mozgrin in view of Kud avtsev and Wan
`
`’-*_
`73
`E..
`'9bk
`
`0
`
`100
`
`200
`
`300
`
`400
`
`500
`
`t:,us]
`lb» avenge eltcuou umgv, And An
`In Ek-nmn demm-
`FIG J
`9
`floating potential l',_
`- plaana potculxal 1'“ and ' pommal dnffenence
`113,1
`1"!) ae :\ function of mm from amluhon ofllm pulse Tmgel (uncut
`pulse kngtlx. I00 us. average pawn. 300 W. and pl!S'.llll I InTon'
`
`Gudmundsson’s teaching that applying a voltage pulse that raises the
`density of a plasma also “shifts an electron energy distribution in the plasma
`to higher energies” is part of the background knowledge that one of ordinary
`skill would have in mind while readin;
`'
`.
`
`The combination of Mozgrin with Kudryavtsev discloses applying a
`magnetic field proximate to the cathode assembly.
`
`See evidence cited for claim 1 1.
`
`See evidence cited in claim 2.
`
`The combination of Mozgrin, Kudryavtsev, and Wang discloses moving the
`magnetic field.
`
`See evidence cited for claim 12.
`
`See evidence cited in claim 3.
`
`12. The method of
`
`claim 11 further
`
`comprising
`applying a
`magnetic field
`proximate to the
`cathode assembl
`
`.
`
`13. The method of
`
`claim 12 further
`
`comprising
`moving the
`magnetic field.
`
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