`U.S. Patent No. 6,805,779
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`__________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`__________________
`
`THE GILLETTE COMPANY
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`Petitioner
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`v.
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`ZOND, LLC
`Patent Owner
`__________________
`
`Case IPR2014-01019
`Patent 6,805,779
`__________________
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`
`
`ZOND LLC’S PATENT OWNER PRELIMINARY RESPONSE
`PURSUANT TO 37 C.F.R. § 42.107(a)
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`IPR2014-01019
`U.S. Patent No. 6,805,779
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`TABLE OF CONTENTS
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`I. INTRODUCTION .......................................................................................................................1
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`II. TECHNOLOGY BACKGROUND .........................................................................................11
`
`A.
`
`B.
`
`Overview Of Plasma Generation .................................................................................11
`
`The ’779 patent: Dr. Chistyakov invents a new plasma generator containing a
`feed gas source, an excited atom source with a magnet that traps electrons, a
`plasma chamber that confines excited atoms, and an energy source that ionizes
`the confined excited atoms in a multi-step ionization process. ...................................12
`
`C.
`
`The Petitioner Mischaracterized The File History. ......................................................17
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`III. SUMMARY OF THE PETITIONER’S PROPOSED GROUNDS FOR REVIEW ..............19
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`IV. THERE IS NO REASONABLE LIKELIHOOD OF PETITIONER PREVAILING
`AS TO A CHALLENGED CLAIM OF THE ’779 PATENT. ..............................................20
`
`A.
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`The Petition failed to demonstrate any motivation to combine. ..................................21
`
`1.
`
`Scope and content of prior art. ...............................................................................24
`
`a.
`
`b.
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`c.
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`d.
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`2.
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`3.
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`Mozgrin ............................................................................................................24
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`Kudryavtsev .....................................................................................................26
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`Iwamura ...........................................................................................................30
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`Pinsley and Angelbeck .....................................................................................31
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`The Petitioner Fails To Show That It Would Have Been Obvious To
`Combine Either Kudryavtsev’s Cylindrical Device Without A Magnet or
`Pinsley’s Gas Laser With The Magnetron System Of Mozgrin. ...........................32
`
`The Petitioner Failed To Show That It Would Have Been Obvious To
`Combine Angelbeck’s Gas Laser With The Plasma Treatment Apparatus
`Of Iwamura. ...........................................................................................................37
`
`B.
`
`The Petition failed to demonstrate how the alleged combinations teach every
`element of the challenged claims. ................................................................................39
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`1.
`
`The combination of Mozgrin, Kudryavtsev and Pinsley does not teach “an
`excited atom source that receives ground state atoms from the feed gas
`source” as recited in independent claim 1 and as similarly recited in
`independent claims 18 and 43. ...............................................................................39
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`
`
`ii
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`2.
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`3.
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`4.
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`5.
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`6.
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`7.
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`8.
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`9.
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`U.S. Patent No. 6,805,779
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`The combination of Mozgrin, Kudryavtsev and Pinsley does not teach “the
`excited atom source comprising a magnet that generates a magnetic field
`for substantially trapping electrons proximate to the ground state atoms”
`as recited in independent claim 1 and as similarly recited in independent
`claim 18. .................................................................................................................41
`
`The combination of Mozgrin, Kudryavtsev and Pinsley does not teach “a
`plasma chamber that is coupled to the excited atom source, the plasma
`chamber confining a volume of excited atoms generated by the excited
`atom source” as recited in independent claim 1 and as similarly recited in
`independent claims 18 and 43. ...............................................................................41
`
`The combination of Mozgrin, Kudryavtsev and Pinsley does not teach “an
`energy source that is coupled to the volume of excited atoms confined by
`the plasma chamber” as recited in independent claim 1 and as similarly
`recited in independent claims 18 and 43. ...............................................................42
`
`The combination of Mozgrin, Kudryavtsev and Pinsley does not teach that
`“a pressure differential exists between a pressure in the excited atom
`source and a pressure in the plasma chamber, the pressure differential
`increasing at least one of a rate at which the excited atoms are generated
`from the ground state atoms and a density of the excited atoms” as recited
`in independent claim 43 and as similarly recited in dependent claims 8 and
`23............................................................................................................................43
`
`The combination of Iwamura and Angelbeck does not teach a “plasma
`generator that generates a plasma with a multi-step ionization process,” as
`recited in independent claim 1 and as similarly recited in independent
`claims 18 and 43. ...................................................................................................43
`
`The combination of Iwamura and Angelbeck does not teach “the excited
`atom source comprising a magnet that generates a magnetic field for
`substantially trapping electrons proximate to the ground state atoms,” as
`recited in independent claim 1 and as similarly recited in claim 18. .....................45
`
`The combination of Iwamura and Angelbeck does not teach “the energy
`source raising an energy of excited atoms in the volume of excited atoms
`so that at least a portion of the excited atoms in the volume of excited
`atoms is ionized,” as recited in independent claim 1 and as similarly
`recited in independent claims 18 and 43. ...............................................................46
`
`The combination of Iwamura and Angelbeck does not teach that “a
`pressure differential exists between a pressure in the excited atom source
`and a pressure in the plasma chamber, the pressure differential increasing
`at least one of a rate at which the excited atoms are generated from the
`ground state atoms and a density of the excited atoms” as recited in
`
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`iii
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`U.S. Patent No. 6,805,779
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`independent claim 43 and as similarly recited in dependent claims 8 and
`23............................................................................................................................47
`
`10.
`
`The combination of Iwamura and Angelbeck does not teach “metastable
`atoms,” as recited in claims 4, 19, 22, 23. .............................................................48
`
`C.
`
`D.
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`E.
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`The Petition failed to set forth a proper obviousness analysis. ....................................49
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`Petitioner Failed To Demonstrate That Claim 43 Is Anticipated By Iwamura............51
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`The Petition Failed to Identify Any Compelling Rationale for Adopting
`Redundant Grounds of Rejection. ................................................................................53
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`V. CONCLUSION ........................................................................................................................57
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`iv
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`IPR2014-01019
`U.S. Patent No. 6,805,779
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`I. INTRODUCTION
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`
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`The Petitioner has represented in a motion for joinder that this petition
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`“is identical to the Intel IPR2014-00686 in all substantive respects, includes
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`identical exhibits, and relies upon the same expert declarant.” Accordingly,
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`based upon that representation, the Patent Owner opposes review on the same
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`basis presented in opposition to Intel’s request no. IPR2014-00686, which is
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`repeated below:
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`The Board should deny the present request for inter partes review of U.S.
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`Patent No. 6,805,779 (“the ’779 patent”) because there is not a reasonable
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`likelihood that the Petitioner will prevail at trial with respect to at least one
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`claim of the ’779 patent.1
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`Indeed, there are five different and independent groups of reasons why
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`the Petitioner cannot prevail. First, the reference that is primarily relied upon
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`by the Petitioner (i.e., Mozgrin) was already considered by the Examiner and
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`overcome during the prosecution of the application that led to the issuance of
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`the ’779 patent. Indeed, Mozgrin was considered by 6 different examiners and
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`1 35 U.S.C. § 314(a).
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`
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`1
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`U.S. Patent No. 6,805,779
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`overcome during the prosecution of 9 other patents that are related to the ’779
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`patent over nearly a 10 year period.2
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`Second, the Petitioner’s obviousness rejections are all predicated on the
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`false assumption that a skilled artisan could have achieved the combination of
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`(i) a feed gas source comprising ground state atoms; (ii) an excited atom source
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`that generates excited atoms from the ground state atoms and has a magnet
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`that traps electrons near the ground state atoms; (iii) a plasma chamber that
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`confines excited atoms; and (iv) an energy source that ionizes the confined
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`excited atoms in a multi-step ionization process, as required by independent
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`claims 1 and 18 of the ’779 patent by combining the teachings of either
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`Mozgrin with Kudryavtsev and Pinsley or Iwamura with Angelbeck.3
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`2 Examiners Douglas Owens, Tung X. Le, Rodney McDonald, Wilson Lee,
`
`Don Wong, and Tuyet T. Vo allowed U.S. Patents 7,147,759, 7,808,184,
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`7,811,421, 8,125,155, 6,853,142, 7,604,716, 6,896,775, 6,896,773, 6,805,779,
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`and 6,806,652 over Mozgrin over nearly a decade from the time that the
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`application for the ‘759 patent was filed on 9/30/2002 to the time that the ‘155
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`patent issued on 2/28/2012.
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`3 Petition at pp. 18-60.
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`
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`2
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`U.S. Patent No. 6,805,779
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`But these references disclose very different structures and processes.
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`Mozgrin teaches two different “[d]ischarge device configurations: (a) planar
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`magnetron and (b) shaped-electrode configuration.”4 Mozgrin further
`
`discloses a “square voltage pulse application to the gap.”5 Kudryavtsev teaches
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`a third type of discharge device configuration in which the “discharge occurred
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`inside a cylindrical tube of diameter 2R = 2.5 cm and the distance between the
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`electrodes was L = 52 cm.” Kudryavtsev’s system does not even have a
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`magnet. Pinsley discloses a fourth type of device: “[A] flowing gas laser
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`having an electric discharge plasma.”6
`
`And the Petitioner sets forth no evidence that the structure and process
`
`of Mozgrin would produce the particular plasma generator containing (i) a
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`feed gas source comprising ground state atoms; (ii) an excited atom source that
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`generates excited atoms from the ground state atoms and has a magnet that
`
`traps electrons near the ground state atoms; (iii) a plasma chamber that
`
`confines excited atoms; and (iv) an energy source that ionizes the confined
`
`excited atoms in a multi-step ionization process, as required by independent
`
`
`4 Mozgrin, Ex. 1003 at Fig. 1 caption.
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`5 Id. at p. 402, col. 2, ¶ 2.
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`6 Ex. 1005, Pinsley, Abstract.
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`3
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`U.S. Patent No. 6,805,779
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`claims 1 and 18 of the ’779 patent if Mozgrin were somehow modified by a
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`cylindrical structure that does not even have a magnet, like the structure
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`disclosed in Kudryavtsev or a structure that uses a laser to generate light like
`
`Pinsley.7 Indeed, a laser emits light with the release of energy when electrons
`
`in atoms move to a lower energy state. Because higher energy atoms in
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`Pinsley’s laser are used to make light, they would not be available for the
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`sputtering process of Mozgrin.
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`Similarly, the Petitioner failed to set forth any evidence that any higher
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`energy atoms in Angelbeck’s laser would be available for use in the plasma
`
`treatment apparatus of Iwamura, given that the higher energy atoms in
`
`Angelbeck’s laser are used to make light.8
`
`That is, the Petitioner did not show that a “skilled artisan would have
`
`been motivated to combine the teachings of the prior art references to achieve
`
`the claimed invention, and that the skilled artisan would have had a reasonable
`
`expectation of success in doing so.”9 The Board has consistently declined to
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`7 See e.g., Petition, pp. 18-40.
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`8 See e.g., id. at 52-60.
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`9 OSRAM Sylvania, Inc. v. Am Induction Techs., Inc., 701 F.3d 698, 706 (Fed. Cir.
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`2012).
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`4
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`U.S. Patent No. 6,805,779
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`institute proposed grounds of rejections in IPR proceedings when the Petition
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`fails to identify any objective evidence such as experimental data, tending to
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`establish that two different structures or processes can be combined.10 Here,
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`the Petitioner did not set forth any such objective evidence.11 For this
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`additional reason, there is not a reasonable likelihood that the Petitioner will
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`prevail at trial with respect to at least one claim of the ’779 patent.
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`Third, the prior art in each of the Petitioner’s proposed grounds of
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`rejections are missing one or more limitations required by the challenged
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`claims of the ‘779 patent. In particular, the combination of Mozgrin,
`
`Kudryavtsev and Pinsley does not teach or suggest (i) an excited atom source
`
`that receives ground state atoms from the feed gas source; (ii) the excited atom
`
`source comprising a magnet that generates a magnetic field for substantially
`
`trapping electrons proximate to the ground state atoms; (iii) a plasma chamber
`
`that is coupled to the excited atom source, the plasma chamber confining a
`
`volume of excited atoms generated by the excited atom source; (iv) an energy
`
`source that is coupled to the volume of excited atoms confined by the plasma
`
`
`10 Epistar, et al. v. Trustees Of Boston University, IPR2013-00298, Decision Not To
`
`Institute, Paper No. 18 (P.T.A.B. November 15, 2103).
`
`11 See e.g., Petition, pp. 14-60.
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`5
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`U.S. Patent No. 6,805,779
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`chamber; and that (v) a pressure differential exists between a pressure in the
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`excited atom source and a pressure in the plasma chamber, the pressure
`
`differential increasing at least one of a rate at which the excited atoms are
`
`generated from the ground state atoms and a density of the excited atoms.12
`
`Moreover, Iwamura, either alone or in combination with Angelbeck,
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`does not disclose or teach (i) a plasma generator that generates a plasma with a
`
`multi-step ionization process; (ii) the excited atom source comprising a magnet
`
`that generates a magnetic field for substantially trapping electrons proximate to
`
`the ground state atoms; (iii) the energy source raising an energy of excited
`
`atoms in the volume of excited atoms so that at least a portion of the excited
`
`atoms in the volume of excited atoms is ionized; that (iv) a pressure differential
`
`exists between a pressure in the excited atom source and a pressure in the
`
`plasma chamber, the pressure differential increasing at least one of a rate at
`
`which the excited atoms are generated from the ground state atoms and a
`
`density of the excited atoms, and (v) metastable atoms.13
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`12 Infra, §§ IV.B.1-5.
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`13 Infra, §§ IV.B.6-10.
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`6
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`U.S. Patent No. 6,805,779
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`Fourth, the Petitioner neglected to follow the legal framework for an
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`obviousness analysis set forth long ago by the Supreme Court. 14 That
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`framework requires consideration of the following factors: (1) the scope and
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`content of the prior art, (2) any differences between the claimed subject matter
`
`and the prior art, and (3) the level of skill in the art. The Board has previously
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`warned that failure to identify differences between the cited art and the claims
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`is a basis for denying a petition:
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`A petitioner who does not state the differences between
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`a challenged claim and the prior art, and relies instead on the
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`Patent Owner and the Board to determine those differences based
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`on the rest of the submission in the petition risks having the
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`corresponding ground of obviousness not included for trial for
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`failing to adequately state a claim for relief. 15
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`The Petitioner ignored the Board’s warning by failing to identify the
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`differences between the challenged claim and the prior art. That is, the
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`14 Graham v. John Deere Co., 383 U.S. 1, 17-18, 148 USPQ 459, 467 (1966); see
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`also KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 399 (2007) (“While the sequence
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`of these questions might be reordered in any particular case, the [Graham]
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`factors define the controlling inquiry.”)
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`15 Liberty Mutual v. Progressive Casualty, CBM-2012-00003, paper 7 at 2 – 3.
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`7
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`U.S. Patent No. 6,805,779
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`Petitioner failed to identify the claim limitations that it believed are missing
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`from the primary references (i.e., Mozgrin and Iwamura) and are instead
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`taught by the secondary references (i.e., Kudryavtsev, Pinsley, and
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`Angelbeck).16 Rather, Petitioner argued that the claim limitations are taught
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`by the combinations of references, leaving the Board to figure out whether the
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`primary or secondary reference teaches the claim limitation.17 Under this
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`circumstance, it would be “inappropriate for the Board to take the side of the
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`Petitioner to salvage an inadequately expressed ground …”18 On this
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`additional basis, inter partes review should be denied.
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`Fifth, the Petition contains many redundant grounds of rejection.
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`Indeed, the Petitioner proposed two or more grounds of rejections for every
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`challenged claim and did not set forth a compelling reason for why the Board
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`should institute this proceeding on multiple, redundant grounds.19
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`In brief, the Petitioner failed to demonstrate that there is a reasonable
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`likelihood that it will prevail with respect to at least one of the claims
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`16 See e.g., Petition, pp. 32, 33, 35, 36, 37, 38, 40, 41, 57, and 59.
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`17 Id.
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`18 Liberty Mutual v. Progressive Casualty, CBM-2012-00003, paper 8 at 14.
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`19 Petition, pp. 18-60.
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`8
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`challenged in the petition for the four groups of reasons summarized in the
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`U.S. Patent No. 6,805,779
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`table below:
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`Grounds
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`I
`
`Reasons For Not Instituting a Proceeding
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`The reference that is primarily relied upon by the
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`Petitioner (i.e., Mozgrin) was already considered by
`
`the Examiner and overcome during the prosecution
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`of the application that led to the issuance of the ’779
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`patent.
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`All
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`The Petitioner failed to show that a skilled artisan
`
`would have had a reasonable chance of success of
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`achieving the claimed plasma generator containing
`
`(i) a feed gas source comprising ground state atoms;
`
`(ii) an excited atom source that generates excited
`
`atoms from the ground state atoms and has a
`
`magnet that traps electrons near the ground state
`
`atoms; (iii) a plasma chamber that confines excited
`
`atoms; and (iv) an energy source that ionizes the
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`confined excited atoms in a multi-step ionization
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`process, as required by independent claims 1 and 18
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`of the ’779 patent by modifying Mozgrin’s planar
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`magnetron with closely spaced electrodes by a
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`cylindrical structure that does not even have a
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`magnet like the structure disclosed in Kudryavtsev
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`or a laser structure that makes no mention of
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`excited atoms like Pinsley.
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`9
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`All
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`The prior art, either alone or in combination, would
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`U.S. Patent No. 6,805,779
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`not have taught all the claim limitations of
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`independent claims 1, 18 and 43 to a skilled artisan
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`at the time of the invention.
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`All
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`The Petitioner failed to identify differences between
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`the primary references (i.e., Mozgrin and Iwamura)
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`and the claimed invention in the proposed
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`obviousness rejections.
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`Grounds I or II and III Ground I using Mozgrin as a primary reference is
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`redundant with Grounds II and III using Iwamura
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`as either the sole reference in a proposed
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`anticipation ground or as a primary reference in an
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`obviousness ground and Petitioner did not set forth
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`a compelling reason for why the Board should
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`institute this proceeding on multiple, redundant
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`grounds.
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`For these reasons as expressed more fully below, the Board should deny the
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`Petition.
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`II. TECHNOLOGY BACKGROUND
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`A. Overview Of Plasma Generation
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`“A plasma is a collection of charged particles that move in random
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`directions.”20 “For example, a plasma can be generated by applying a
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`potential of several kilovolts between two parallel conducting electrodes in an
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`inert gas atmosphere (e.g., argon) at a pressure that is between about 10-1 and
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`10-2 Torr.”21 Plasma is generated for use in sputtering systems, which deposit
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`films on substrates:
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`Ions, such as argon ions, are generated and are then drawn out of
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`the plasma and accelerated across a cathode dark space. The target
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`surface has a lower potential than the region in which the plasma
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`is formed. Therefore, the target surface attracts positive ions.
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`Positive ions move towards the target with a high velocity and
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`then impact the target and cause atoms to physically dislodge or
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`sputter from the target surface. The sputtered atoms then
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`propagate to a substrate or other work piece where they deposit a
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`film of sputtered target material.22
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`Magnets can be used in sputtering systems to increase the deposition rate:
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`20Exhibit 1101, ‘779 patent col. 1, ll. 7-9.
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`21 Id. at col. 1, ll. 14-16.
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`22 Id. col. 1, ll. 30-42.
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`11
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`Magnetron sputtering systems use magnetic fields that are shaped
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`to trap and concentrate secondary electrons proximate to the target
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`surface. The magnetic fields increase the density of electrons and,
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`therefore, increase the plasma density in a region that is proximate
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`to the target surface. The increased plasma density increases the
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`sputter deposition rate.23
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`These magnetron sputtering systems, however, have “undesirable non-
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`uniform erosion of target material.”24 To address these problems, researchers
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`increased the applied power and later pulsed the applied power.25 But
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`increasing the power increased “the probability of establishing an electrical
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`breakdown condition leading to an undesirable electrical discharge (an
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`electrical arc) in the chamber.”26 And “very large power pulses can still result
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`in undesirable electrical discharges and undesirable target heating regardless of
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`their duration.”27
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`B. The ’779 patent: Dr. Chistyakov invents a new plasma generator
`containing a feed gas source, an excited atom source with a magnet
`
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`23 Id. at col. 1, ll. 50-57.
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`24 Id. at col. 4, ll. 64-65.
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`25 Id. at col. 4, ll. 3-20.
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`26 Id. at col. 4, ll. 7-9.
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`27 Id. at col. 4, ll. 18-20.
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`12
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`that traps electrons, a plasma chamber that confines excited atoms,
`and an energy source that ionizes the confined excited atoms in a
`multi-step ionization process.
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`To overcome the problems of the prior art, Dr. Chistyakov invented a
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`plasma generator containing (i) a feed gas source comprising ground state
`
`atoms; (ii) an excited atom source that generates excited atoms from the
`
`ground state atoms and has a magnet that traps electrons near the ground state
`
`atoms; (iii) a plasma chamber that confines excited atoms; and (iv) an energy
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`source that ionizes the confined excited atoms in a multi-step ionization
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`process as recited in independent claims 1 and 18 and as illustrated in Fig. 2 of
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`the ’779 patent, reproduced below:
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`13
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`As illustrated by FIG. 2, Dr. Chistyakov’s plasma generation apparatus
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`includes “an excited atom source that generates excited atoms from ground
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`state atoms from a feed gas source 206.”28 In one embodiment, “the excited
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`28 Id. at col. 4, ll. 30-31.
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`14
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`atom source is a metastable atom source 204.”29 “The feed gas source 206
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`provides a volume of ground state atoms 208 to the metastable atom source
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`204.”30 “The plasma generator of the present invention can use any type of
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`metastable atom source 204. Skilled artisans will appreciate that there are
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`many methods of exciting ground state atoms 208 to a metastable state.”31
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`Dr. Chistyakov’s plasma generation apparatus then moves the excited or
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`metastable atoms toward a chamber:
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`The plasma chamber 230 confines the volume of metastable atoms
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`218. In one embodiment, the output of the metastable atom source
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`204 is positioned so as to direct the volume of metastable atoms
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`218 towards the cathode assembly 114. In one embodiment, the
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`geometry of the plasma chamber 230 and the cathode assembly
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`114 is chosen so that the metastable atoms reach the cathode
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`assembly 114 at a time that is much less than an average transition
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`time of the metastable atoms to ground state atoms.32
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`The plasma generator also includes a magnet to increase the plasma density
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`near the cathode:
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`29 Id. at col. 4, ll. 31-34.
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`30 Id. at col. 4, ll. 34-36.
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`31 Id. at col. 5, ll. 1-5.
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`32 Id. at col. 6, ll. 48-56.
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`15
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`U.S. Patent No. 6,805,779
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`In one embodiment, a magnet (not shown) is disposed proximate
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`to the cathode assembly 114. The magnet generates a magnetic
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`field that traps electrons in the plasma proximate to the cathode
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`assembly 114 and, therefore, increases the plasma density. In the
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`region proximate to the cathode assembly 114.33
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`“The plasma generator 200 of FIG. 2 uses a multi-step or stepwise
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`ionization process to generate the plasma 202.”34 A “multi-step ionization
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`process according to the present invention includes a first step where atoms are
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`excited from a ground state to an excited state and a second step where atoms
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`in the excited state are ionized.”35
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`Dr. Chistyakov’s “multi-step ionization process … substantially
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`increases the rate at which the plasma 202 is formed and therefore, generates a
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`relatively dense plasma.”36 “Once a plasma having the desired characteristics
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`is generated, the plasma 202 can be used in the processing of the workpiece
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`138. … In a plasma sputtering application, ions in the plasma can be used to
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`33 Id. at col. 6, ll. 34-39.
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`34 Id. at col. 6, ll. 60-61.
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`35 Id. at col. 7, ll. 4-7.
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`36 Id. at col. 8, ll. 65-67.
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`U.S. Patent No. 6,805,779
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`sputter material from the target 116. The sputtered material is deposited on the
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`workpiece 138 to form a thin film.”37
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`Thus, Dr. Chistyakov accomplished his breakthrough of improve plasma
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`generation by inventing a particular apparatus comprising (i) a feed gas source
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`comprising ground state atoms; (ii) an excited atom source that generates
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`excited atoms from the ground state atoms and has a magnet that traps
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`electrons near the ground state atoms; (iii) a plasma chamber that confines
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`excited atoms; and (iv) an energy source that ionizes the confined excited
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`atoms in a multi-step ionization process. In the claimed invention of the ‘779
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`patent, ground state atoms are transformed to excited atoms and the excited
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`atoms are moved to a plasma chamber where they are confined and ionized by
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`an energy source.
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`C. The Petitioner Mischaracterized The File History.
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`The Petitioner alleged that the claims of the ’779 patent were allowed
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`solely because the Applicant (i.e., now the Patent Owner) “amended the
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`independent claims at issue here to require that the distinct source further
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`37 Id. at col. 9, ll. 42-50.
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`U.S. Patent No. 6,805,779
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`includes ‘a magnet that generates a magnetic field for substantially trapping
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`electrons proximate to the ground state atoms.’”38
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`But this allegation is not true because the Applicant amended the
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`independent claims to specify that “an excited atom source receives ground
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`state atoms from the feed gas source.”39 More important, the Applicant
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`amended the claims at the suggestion of the Examiner to include the
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`limitations from a dependent claim, as applicants frequently do.40 That is, the
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`independent claims were allowed because of all the components recited within
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`them (i.e., the feed gas source, excited atom source, plasma chamber, energy
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`source) as well as the recitation of the transformation of ground state atoms to
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`excited atoms and the movement of the excited atoms among the various
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`components, and not because of one of the claim amendments made prior to
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`allowance of the patent.
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`38 Petition, p. 10 (citing Ex. 1109, 05/06/04 Resp. at 2, 4, 6, 8 and 10).
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`39 Exhibit 1109, 05/06/04 Resp. at 2.
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`40 Id. at 11.
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`III. SUMMARY OF THE PETITIONER’S PROPOSED GROUNDS FOR
`REVIEW
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`Confusingly, the Petition contains multiple, redundant grounds of
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`rejection based on the various combinations of references. In particular, for
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`every ground of rejection using the combination of Mozgrin, Kudryavtsev and
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`Pinsley, there is a corresponding redundant ground using either Iwamura by
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`itself in an anticipation ground or the combination of Iwamura and Angelbeck
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`in an obviousness ground.41 That is, each and every challenged claim in the
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`Petition is the subject of two different grounds of rejection.42 For the Board’s
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`convenience below is a summary of claim rejections proposed by the
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`Petitioner:
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`1. Claims 5, 6, 8, 19, 22, 23 and 43 : obvious in view of the
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`combination of Mozgrin, Kudryavtsev and Pinsley (Ground I);
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`2. Claim 43: anticipated by Iwamura (Ground II); and
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`3. Claims 5, 6, 8, 19, 22, and 23: obvious in view of the combination
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`of Iwamura and Angelbeck.
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`41 Petition, pp. 18-60.
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`42 Id.
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`IV. THERE IS NO REASONABLE LIKELIHOOD OF