References cited herein:
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`
` U.S. Patent No. 7,604,716 (“‘716 Patent”)
`
` D.V. Mozgrin, et al, High-Current Low-Pressure Quasi-Stationary Discharge in a
`Magnetic Field: Experimental Research, Plasma Physics Reports, Vol. 21, No. 5, 1995
`(“Mozgrin”)
`
` A. A. Kudryavtsev, et al, Ionization relaxation in a plasma produced by a pulsed inert-gas
`discharge, Sov. Phys. Tech. Phys. 28(1), January 1983 (“Kudryavtsev”)
`
` Milton Ohring, The Material Science of Thin Films, Academic Press, 1992 (“Ohring”)
`
`
`
`Claims 14-18 and 22-32
`
`Mozgrin in view of Kudryavtsev
`
`14. A method for
`generating a strongly-
`ionized plasma, the
`method comprising:
`
`a. ionizing a feed gas in a
`chamber to form a
`weakly-ionized plasma
`that substantially
`eliminates the probability
`of developing an
`electrical breakdown
`condition in the chamber;
`
`The combination of Mozgrin with Kudryavtsev discloses a method
`for generating a strongly-ionized plasma.
`
`‘716 Patent at claim 24 (“wherein the peak plasma density of the
`strongly-ionized plasma is greater than about 1012 cm˗3”)
`
`Mozgrin at Fig 1
`
`Mozgrin at 400, right col, ¶ 4 (“To study the high-current forms of
`the discharge, we used two types of devices: a planar magnetron
`and a ystem with specifically shaped hollow electrodes.”)
`
`Mozgrin at 401, right col, ¶2 (“For pre-ionization … the initial
`plasma density in the 109 – 1011 cm-3 range.”)
`
`Mozgrin at 409, left col, ¶ 4 (“The implementation of the high-
`current magnetron discharge (regime 2) in sputtering … plasma
`density (exceeding 2x1013 cm-3).”)
`
`Mozgrin at 409, left col, ¶5 (“The high-current diffuse discharge
`(regime 3) is useful for producing large-volume uniform dense
`plasmas ni  1.5x1015cm-3…”).
`The combination of Mozgrin with Kudryavtsev discloses ionizing a
`feed gas in a chamber to form a weakly-ionized plasma that
`substantially eliminates the probability of developing an electrical
`breakdown condition in the chamber.
`
`‘716 Patent at 5:14-15 (“The weakly-ionized plasma 232 is also
`referred to as a pre-ionized plasma.”)
`
`‘716 Patent at claim 23 (“wherein the peak plasma density of the
`
`ActiveUS 122367749v.1
`
`- 1 -
`
`INTEL 1215
`
`

`
`Claims 14-18 and 22-32
`
`and
`
`b. supplying an electrical
`pulse across the weakly-
`ionized plasma that
`excites atoms in the
`weakly-ionized plasma,
`thereby generating a
`strongly-ionized plasma
`without developing an
`electrical breakdown
`condition in the chamber.
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`weakly-ionized plasma is less than about 1012 cm˗3”)
`
`Mozgrin at Figs. 1, 2, 3, 6, 7
`
`Mozgrin at 401, left col, ¶ 1 (“The [plasma] discharge had an
`annular shape and was adjacent to the cathode.”)
`
`Mozgrin at 401, left col, ¶ 4 (“[A]pplying a square voltage pulse to
`the discharge gap which was filled up with either neutral or pre-
`ionized gas.”)
`
`Mozgrin at 402, right col, ¶2 (“Figure 3 shows typical voltage and
`current oscillograms.… Part I in the voltage oscillogram represents
`the voltage of the stationary discharge (pre-ionization stage).”)
`
`Mozgrin at 401, right col, ¶2 (“[f]or pre-ionization, we used a
`stationary magnetron discharge; … provided the initial plasma
`density in the 109 – 1011 cm˗3 range.”)
`
`Mozgrin at 400, right col, ¶ 3 (“We investigated the discharge
`regimes in various gas mixtures at 10-3 – 10 torr…”)
`
`Mozgrin at 402, ¶ spanning left and right cols (“We studied the
`high-current discharge in wide ranges of discharge current…and
`operating pressure…using various gases (Ar, N2, SF6, and H2) or
`their mixtures of various composition…”)
`
`The combination of Mozgrin with Kudryavtsev discloses supplying
`an electrical pulse across the weakly-ionized plasma that excites
`atoms in the weakly-ionized plasma, thereby generating a strongly-
`ionized plasma without developing an electrical breakdown
`condition in the chamber.
`
`‘716 Patent at claim 23 (“wherein the peak plasma density of the
`weakly-ionized plasma is less than about 1012 cm˗3”)
`
`‘716 Patent at claim 24 (“wherein the peak plasma density of the
`strongly-ionized plasma is greater than about 1012 cm˗3”)
`Mozgrin at Fig. 1
`
`ActiveUS 122367749v.1
`
`- 2 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`
`
`
`
`
`
`
`
`Mozgrin at Fig. 2
`
`Mozgrin at Fig. 3
`
`ActiveUS 122367749v.1
`
`- 3 -
`
`
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Mozgrin at 402, right col, ¶ 2 (“Part 1 in the voltage oscillogram
`represents the voltage of the stationary discharge (pre-ionization
`stage).”)
`
`Mozgrin at 401, right col, ¶2 (“For pre-ionization … the initial
`plasma density in the 109 – 1011 cm-3 range.”)
`Mozgrin at 401, right col, ¶ 1 (“Thus, the supply unit was made
`providing square voltage and current pulses with [rise] times
`(leading edge) of 5 – 60 µs…”).
`
`Mozgrin 403, right col, ¶4 (“Regime 2 was characterized by intense
`cathode sputtering…”) (emphasis added).
`
`Mozgrin at 409, left col, ¶ 4 (“The implementation of the high-
`current magnetron discharge (regime 2) in sputtering … plasma
`density (exceeding 2x1013 cm-3).”).
`
`Mozgrin at 409, left col, ¶5 (“The high-current diffuse discharge
`(regime 3) is useful for producing large-volume uniform dense
`plasmas ni  1.5x1015cm-3…”)
`
`Mozgrin at 400, left col, ¶ 3 (“Some experiments on magnetron
`systems of various geometry showed that discharge regimes which
`do not transit to arcs can be obtained even at high currents.”)
`Mozgrin at 400, right col, ¶ 1 (“A further increase in the discharge
`currents caused the discharges to transit to the arc regimes…”).
`Mozgrin at 404, left col, ¶ 3 (“The parameters of the shaped-
`electrode discharge…transit to arc regime 4, could be well
`determined… The point of the planar-magnetron discharge transit
`to the arc regime was determined by discharge voltage and structure
`changes...”).
`Mozgrin at 404, left col, ¶ 4 (“If the current was raised above 1.8
`kA or the pulse duration was increase to 2 – 10 ms, an instability
`development and discharge contraction was observed.”).
`Mozgrin at Fig. 4
`
`ActiveUS 122367749v.1
`
`- 4 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Mozgrin at Fig. 7
`
`
`
`
`Mozgrin at 401, ¶ spanning left and right columns (“Designing the
`[pulsed supply] unit, we took into account the dependences which
`had been obtained in [Kudryavtsev] of ionization relaxation on pre-
`ionization parameters, pressure, and pulse voltage amplitude.”)
`Kudryavtsev at 34, right col, ¶ 4 (“Since the effects studied in this
`work are characteristic of ionization whenever a field is suddenly
`applied to a weakly ionized gas, they must be allowed for when
`studying emission mechanisms in pulsed gas lasers, gas breakdown,
`laser sparks, etc.”)
`Kudryavtsev at Fig. 1
`
`ActiveUS 122367749v.1
`
`- 5 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Kudryavtsev at Fig. 6
`
`
`
`
`
`Kudryavtsev at 31, right col, ¶ 7 (“The behavior of the increase in
`ne with time thus enables us to arbitrarily divide the ionization
`process into two stages, which we will call the slow and fast growth
`stages. Fig. 1 illustrates the relationships between the main electron
`currents in terms of the atomic energy levels during the slow and
`fast stages.”).
`Kudryavtsev at 31, right col, ¶ 6 (“For nearly stationary n2 [excited
`atom density] values … there is an explosive increase in ne [plasma
`density]. The subsequent increase in ne then reaches its maximum
`value, equal to the rate of excitation [equation omitted], which is
`several orders of magnitude greater than the ionization rate during
`the initial stage.”)
`Kudryavtsev at Abstract (“[I]n a pulsed inert-gas discharge plasma
`at moderate pressures… [i]t is shown that the electron density
`increases explosively in time due to accumulation of atoms in the
`lowest excited states.”)
`One of ordinary skill would have been motivated to use
`
`ActiveUS 122367749v.1
`
`- 6 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`15. The method of claim
`14 wherein the ionizing
`the feed gas comprises
`exposing the feed gas to
`one of a static electric
`field, an pulsed electric
`field, UV radiation, X-
`ray radiation, electron
`beam radiation, and an
`ion beam.
`
`16. The method of claim
`14 wherein at least one of
`a rise time and magnitude
`of the electrical pulse
`supplied across the
`weakly-ionized plasma is
`selected to increase a
`density of the weakly-
`ionized plasma.
`
`Kudryavtsev’s fast stage of ionization in Mozgrin so as to increase
`plasma density and thereby increase the sputtering rate. Further,
`use of Kudryavtsev’s fast stage in Mozgrin would have been a
`combination of old elements that in which each element performed
`as expected to yield predictable results of increasing plasma density
`and multi-step ionization.
`
`The combination of Mozgrin with Kudryavtsev discloses the
`ionizing the feed gas comprises exposing the feed gas to one of a
`static electric field, an pulsed electric field, UV radiation, X-ray
`radiation, electron beam radiation, and an ion beam.
`
`See evidence cited in claim 14
`
`Mozgrin at 401, left col, ¶ 5 (“…The pre-ionization system
`provided direct current up to 0.3A and voltage up to 3 kV.”).
`
`Mozgrin at 401, left col, ¶ 4 (“…the discharge gap was filled up
`with either neutral or pre-ionized gas.”).
`
`Mozgrin at Figs. 1-3.
`
`The combination of Mozgrin with Kudryavtsev discloses at least
`one of a rise time and magnitude of the electrical pulse supplied
`across the weakly-ionized plasma is selected to increase a density
`of the weakly-ionized plasma.
`
`See evidence cited in claim 14
`
`Mozgrin at Fig. 3.
`
`Mozgrin at 402, right col, ¶ 2 (“Part 1 in the voltage oscillogram
`represents the voltage of the stationary discharge (pre-ionization
`stage).”).
`
`Mozgrin at 401, right col, ¶ 2 (“For pre-ionization, we used a
`stationary magnetron discharge. We found that only the regimes
`with magnetic field strength not lower than 400 G provided the
`initial plasma density in the 109 – 1011 cm-3 range.) (emphasis
`added).
`
`Mozgrin at 401, right col, ¶ 1 (“Thus, the supply unit was made
`providing square voltage and current pulses with [rise] times
`(leading edge) of 5 – 60 µs…”)
`
`Mozgrin at 409, left col, ¶ 4 (“The implementation of the high-
`
`ActiveUS 122367749v.1
`
`- 7 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`current magnetron discharge (regime 2) in sputtering … plasma
`density (exceeding 2x1013 cm-3).” (emphasis added)).
`
`Mozgrin at 401, ¶ spanning left and right cols (“[d]esigning the
`[pulsed supply] unit, we took into account the dependences which
`had been obtained in [Kudryavtsev] of ionization relaxation on pre-
`ionization parameters, pressure, and pulse voltage amplitude.”)
`
`Kudryavtsev at 31, right col, ¶ 6 (“For nearly stationary n2 [excited
`atom density] values … there is an explosive increase in ne [plasma
`density]. The subsequent increase in ne then reaches its maximum
`value, equal to the rate of excitation [equation omitted], which is
`several orders of magnitude greater than the ionization rate during
`the initial stage.”)
`
`Kudryavtsev at Abstract (“in a pulsed inert-gas discharge plasma at
`moderate pressures… [i]t is shown that the electron density
`increases explosively in time due to accumulation of atoms in the
`lowest excited states.”)
`
`Kudryavtsev at 34, right col, ¶ 4 (“[s]ince the effects studied in this
`work are characteristic of ionization whenever a field is suddenly
`applied to a weakly ionized gas, they must be allowed for when
`studying emission mechanisms in pulsed gas lasers, gas breakdown,
`laser sparks, etc.”)
`
`It would have been obvious to one of ordinary skill to combine
`Mozgrin with Kudryavtsev. Mozgrin itself cites Kudryavtsev.
`Moreover, Mozgrin explicitly notes that it was designed in
`accordance with Kudryavtsev. Mozgrin at 401, ¶ spanning left and
`right columns (“Designing the [pulsed supply] unit, we took into
`account the dependences which had been obtained in
`[Kudryavtsev].”). Further, Kudryavtsev states, “[s]ince the effects
`studied in this work are characteristic of ionization whenever a field
`is suddenly applied to a weakly ionized gas, they must be allowed
`for when studying emission mechanisms in pulsed gas lasers, gas
`breakdown, laser sparks, etc.” Kudryavtsev at 34, right col, ¶ 4.
`Because Mozgrin applies voltage pulses that “suddenly generate an
`electric field,” one of ordinary skill reading Mozgrin would have
`been motivated to consider Kudryavtsev to further appreciate the
`effects of applying Mozgrin’s pulse.
`
`If one of ordinary skill, applying Mozgrin’s power levels did not
`experience Kudryavtsev’s “explosive increase” in plasma density, it
`would have been obvious to adjust the operating parameters, e.g.,
`
`ActiveUS 122367749v.1
`
`- 8 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`17. The method of claim
`14 wherein at least one of
`a rise time and magnitude
`of the electrical pulse
`supplied across the
`weakly-ionized plasma is
`selected to excite atoms
`in the weakly-ionized
`plasma to generate
`secondary electrons that
`increase an ionization
`rate of the weakly-
`ionized plasma.
`
`increase the pulse length and/or pressure, so as to trigger
`Kudryavtsev’s fast stage of ionization. One of ordinary skill would
`have been motivated to use Kudryavtsev’s fast stage of ionization
`in Mozgrin so as to increase plasma density and thereby increase
`the sputtering rate. Further, use of Kudryavtsev’s fast stage in
`Mozgrin would have been a combination of old elements that
`yielded predictable results of increasing plasma density.
`
`The combination of Mozgrin with Kudryavtsev discloses at least
`one of a rise time and magnitude of the electrical pulse supplied
`across the weakly-ionized plasma is selected to excite atoms in the
`weakly-ionized plasma to generate secondary electrons that
`increase an ionization rate of the weakly-ionized plasma.
`
`See evidence cited in claim 14.
`
`‘716 Patent at 1:39-41 (“Magnetron sputtering systems use
`magnetic fields that are shaped to trap and to concentrate secondary
`electrons, which are produced by ion bombardment of the target
`surface.”)
`
`‘716 Patent at 1:35-39 (“The plasma is replenished by electron-ion
`pairs formed by the collision of neutral molecules with secondary
`electrons generated at the target surface.”)
`
`Mozgrin at Figs. 1, 2, and 3.
`
`Mozgrin at 402, right col, ¶ 2 (“Part 1 in the voltage oscillogram
`represents the voltage of the stationary discharge (pre-ionization
`stage).”)
`
`Mozgrin at 401, right col, ¶ 1 (“Thus, the supply unit was made
`providing square voltage and current pulses with [rise] times
`(leading edge) of 5 – 60 µs…”)
`
`Mozgrin 403, right col, ¶4 (“Regime 2 was characterized by intense
`cathode sputtering due to both high energy and density of ion
`flow.”)
`
`Mozgrin at 401, ¶ spanning left and right cols (“[d]esigning the
`[pulsed supply] unit, we took into account the dependences which
`had been obtained in [Kudryavtsev] of ionization relaxation on pre-
`ionization parameters, pressure, and pulse voltage amplitude.”)
`
`ActiveUS 122367749v.1
`
`- 9 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Kudryavtsev at Figs. 1, 6
`
`Kudryavtsev at 34, right col, ¶ 4 (“[s]ince the effects studied in this
`work are characteristic of ionization whenever a field is suddenly
`applied to a weakly ionized gas, they must be allowed for when
`studying emission mechanisms in pulsed gas lasers, gas breakdown,
`laser sparks, etc.”)
`
`Kudryavtsev at 31, right col, ¶ 6 (“For nearly stationary n2 [excited
`atom density] values … there is an explosive increase in ne [plasma
`density]. The subsequent increase in ne then reaches its maximum
`value, equal to the rate of excitation [equation omitted], which is
`several orders of magnitude greater than the ionization rate during
`the initial stage.”)
`
`Kudryavtsev at 31, right col, ¶ 7 (“The behavior of the increase in
`ne with time thus enables us to arbitrarily divide the ionization
`process into two stages, which we will call the slow and fast growth
`stages. Fig. 1 illustrates the relationships between the main electron
`currents in terms of the atomic energy levels during the slow and
`fast stages.”)
`
`Kudryavtsev at Abstract (“in a pulsed inert-gas discharge plasma at
`moderate pressures… [i]t is shown that the electron density
`increases explosively in time due to accumulation of atoms in the
`lowest excited states.”)
`
`Kudryavtsev at Equation 1
`
`Kudryavtsev at 30, right col, last ¶ (“n2, and ne are the atomic
`densities in the … first excited states and the electron density,
`respectively … 2e [is] the rate coefficient[]….”)
`
`It would have been obvious to one of ordinary skill to combine
`Mozgrin with Kudryavtsev. Mozgrin itself cites Kudryavtsev.
`Moreover, Mozgrin explicitly notes that it was designed in
`accordance with Kudryavtsev. Mozgrin at 401, ¶ spanning left and
`right columns (“Designing the [pulsed supply] unit, we took into
`account the dependences which had been obtained in
`[Kudryavtsev].”). Further, Kudryavtsev states, “[s]ince the effects
`studied in this work are characteristic of ionization whenever a field
`is suddenly applied to a weakly ionized gas, they must be allowed
`for when studying emission mechanisms in pulsed gas lasers, gas
`breakdown, laser sparks, etc.” Kudryavtsev at 34, right col, ¶ 4.
`Because Mozgrin applies voltage pulses that “suddenly generate an
`
`ActiveUS 122367749v.1
`
`- 10 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`electric field,” one of ordinary skill reading Mozgrin would have
`been motivated to consider Kudryavtsev to further appreciate the
`effects of applying Mozgrin’s pulse.
`
`If one of ordinary skill, applying Mozgrin’s power levels did not
`experience Kudryavtsev’s “explosive increase” in plasma density, it
`would have been obvious to adjust the operating parameters, e.g.,
`increase the pulse length and/or pressure, so as to trigger
`Kudryavtsev’s fast stage of ionization. One of ordinary skill would
`have been motivated to use Kudryavtsev’s fast stage of ionization
`in Mozgrin so as to increase plasma density and thereby increase
`the sputtering rate. Further, use of Kudryavtsev’s fast stage in
`Mozgrin would have been a combination of old elements that
`yielded predictable results of increasing plasma density.
`
`Background:
`
`Ohring at 104 (“Microscopically, positive gas ions in the discharge
`strike the cathode plate and eject neutral target atoms…. In
`addition, other particles (secondary electrons, desorbed gases, and
`negative ions) … are emitted from the target.”)
`
`The combination of Mozgrin with Kudryavtsev discloses at least
`one of a rise time and magnitude of the electrical pulse supplied
`across the weakly-ionized plasma is selected to improve uniformity
`of the strongly-ionized plasma.
`
`See evidence cited in claim 14.
`
`Mozgrin, at 403, left col, last ¶ (“…being transferred to the high-
`current regime, the discharge expands over a considerably larger
`area of the cathode surface than it occupied in the stationary pre-
`ionization regime.”).
`
`Mozgrin at 404, left col, ¶ 4 (“…the discharge plasma and current
`area were seen to expand and cover the whole cathode surface (Fig.
`6).”)
`One of ordinary skill would understand that expanding the plasma
`increases its uniformity. One of ordinary skill in the art would
`understand that the plasma discharge covering a larger area of the
`cathode surface during sputtering would impact the surface of the
`sputtering target in a substantially uniform manner and lead to a
`substantially more uniform erosion of the sputtering target.
`
`18. The method of claim
`14 wherein at least one of
`a rise time and magnitude
`of the electrical pulse
`supplied across the
`weakly-ionized plasma is
`selected to improve
`uniformity of the
`strongly-ionized plasma.
`
`22. The method of claim The combination of Mozgrin with Kudryavtsev discloses the
`
`ActiveUS 122367749v.1
`
`- 11 -
`
`

`
`Claims 14-18 and 22-32
`
`14 wherein the electrical
`pulse comprises a rise
`time that is between
`about 0.1 microsecond
`and 10 seconds.
`
`23. The method of claim
`14 wherein a peak
`plasma density of the
`weakly-ionized plasma is
`less than about 1012 cm-3.
`
`24. The method of claim
`14 wherein the peak
`plasma density of the
`strongly-ionized plasma
`is greater than about 1012
`cm-3.
`
`25. The method of claim
`14 further comprising
`generating a magnetic
`field proximate to the
`weakly-ionized plasma,
`the magnetic field
`trapping electrons in the
`weakly-ionized plasma.
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`electrical pulse comprises a rise time that is between about 0.1
`microsecond and 10 seconds.
`
`See evidence cited in claim 14.
`
`Mozgrin at 401, right col, ¶ 1 (“…the supply unit was made
`providing square voltage and current pulses with [rise] times
`(leading edge) of 5 – 60 µs...”).
`
`The combination of Mozgrin with Kudryavtsev discloses a peak
`plasma density of the weakly-ionized plasma is less than about 1012
`cm-3.
`
`See evidence cited in claim 14.
`
`Mozgrin at 401, right col. ¶ 2 (“For pre-ionization, … the initial
`plasma density [is] in the 109 – 1011 cm-3 range….”).
`
`The combination of Mozgrin with Kudryavtsev discloses the peak
`plasma density of the strongly-ionized plasma is greater than about
`1012 cm-3.
`
`See evidence cited in claim 14.
`
`Mozgrin at 409, left col, ¶ 4 (“The implementation of the high-
`current magnetron discharge (regime 2) in sputtering … plasma
`density (exceeding 2x1013 cm-3).” (emphasis added)).
`
`Mozgrin at 409, left col, last ¶ (“the high current quasi-stationary
`discharge with plasma density ne highet than 1.5 x 1015 cm-3.”).
`
`The combination of Mozgrin with Kudryavtsev discloses generating
`a magnetic field proximate to the weakly-ionized plasma, the
`magnetic field trapping electrons in the weakly-ionized plasma.
`
`See evidence cited in claim 14
`
`‘716 Patent at 1:39-42 [in the Background of the Invention]
`(“Magnetron sputtering systems use magnetic fields that are shaped
`to trap and concentrate secondary electrons….”).
`
`‘716 Patent at 3:13-15 [describing the prior art Fig. 1] (“This has
`led to the use of a DC magnetic field near the cathode 114 to
`confine the secondary electrons.”)
`
`
`ActiveUS 122367749v.1
`
`- 12 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Mozgrin at Fig. 1.
`
`Mozgrin at 401, left col, ¶ 1 (“The electrodes were immersed in a
`magnetic field of annular permanent magnets.”).
`
`Mozgrin at 401, left col, ¶ 1 (“The [plasma] discharge had an
`annular shape and was adjacent to the cathode.”)
`
`Mozgrin at 401, right col, ¶2 (“We found out that only the regimes
`with magnetic field strength not lower than 400 G provided the
`initial plasma density in the 109-1011 cm-3 range.”).
`
`Mozgrin at 407, left col, ¶ 3 (“The action of the magnetic field
`serves only to limit the electron thermal conductivity and to provide
`collisions sufficient for efficient energy transfer from electrons to
`heavy particles.”)
`The combination of Mozgrin with Kudryavtsev discloses an
`apparatus for generating a strongly-ionized plasma.
`
`See evidence cited in claim 14 preamble.
`
`26. An apparatus for
`generating a strongly-
`ionized plasma, the
`apparatus comprising:
`
`a. an anode;
`
`The combination of Mozgrin with Kudryavtsev discloses an anode.
`
`b. a cathode that is
`positioned adjacent to the
`anode;
`
`‘716 Patent at 2:19-20 (“FIG. 1 illustrates a cross-sectional view of
`a known plasma generating apparatus 100…”)
`
`’716 Patent at 2:41-42 (“An anode 130 is positioned in the vacuum
`chamber 104 proximate to the cathode 114.”)
`
`Mozgrin at Fig. 1
`
`Mozgrin at 401, Fig. 1 caption (“Fig. 1… (1) Cathode; (2) anode;
`…”)
`
`The combination of Mozgrin with Kudryavtsev discloses a cathode
`that is positioned adjacent to the anode.
`
`‘716 Patent at 2:19-20 (“FIG. 1 illustrates a cross-sectional view of
`a known plasma generating apparatus 100…”)
`
`’716 Patent at 2:41-42 (“An anode 130 is positioned in the vacuum
`chamber 104 proximate to the cathode 114.”)
`
`Mozgrin at Fig. 1
`
`
`ActiveUS 122367749v.1
`
`- 13 -
`
`

`
`Claims 14-18 and 22-32
`
`c. an ionization source
`that generates a weakly-
`ionized plasma proximate
`to the cathode, the
`weakly-ionized plasma
`substantially eliminating
`the probability of
`developing an electrical
`breakdown condition
`between the anode and
`the cathode; and
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`Mozgrin at 401, Fig. 1 caption (“Fig. 1… (1) Cathode; (2) anode;
`…”)
`
`The combination of Mozgrin with Kudryavtsev discloses an
`ionization source that generates a weakly-ionized plasma proximate
`to the cathode, the weakly-ionized plasma substantially eliminating
`the probability of developing an electrical breakdown condition
`between the anode and the cathode.
`
`‘716 Patent at 5:14-15 (“The weakly-ionized plasma 232 is also
`referred to as a pre-ionized plasma.”)
`
`‘716 Patent at claim 23 (“wherein the peak plasma density of the
`weakly-ionized plasma is less than about 1012 cm˗3”)
`
`Mozgrin at Figs. 1, 2, 3, 6, 7
`
`Mozgrin at 401, left col, ¶ 1 (“The [plasma] discharge had an
`annular shape and was adjacent to the cathode.”)
`
`Mozgrin at 401, left col, ¶ 4 (“[A]pplying a square voltage pulse to
`the discharge gap which was filled up with either neutral or pre-
`ionized gas.”)
`
`Mozgrin at 402, right col, ¶2 (“Figure 3 shows typical voltage and
`current oscillograms.… Part I in the voltage oscillogram represents
`the voltage of the stationary discharge (pre-ionization stage).”)
`
`Mozgrin at 401, right col, ¶2 (“[f]or pre-ionization, we used a
`stationary magnetron discharge; … provided the initial plasma
`density in the 109 – 1011 cm˗3 range.”)
`
`Mozgrin at 400, right col, ¶ 3 (“We investigated the discharge
`regimes in various gas mixtures at 10-3 – 10 torr…”)
`
`Mozgrin at 402, ¶ spanning left and right cols (“We studied the
`high-current discharge in wide ranges of discharge current…and
`operating pressure…using various gases (Ar, N2, SF6, and H2) or
`their mixtures of various composition…”)
`
`ActiveUS 122367749v.1
`
`- 14 -
`
`

`
`Claims 14-18 and 22-32
`
`d. a power supply that is
`electrically coupled to
`the anode and to the
`cathode, the power
`supply generating an
`electric field that excites
`atoms in the weakly-
`ionized plasma, thereby
`forming a strongly-
`ionized plasma without
`developing an electrical
`breakdown condition in
`the chamber.
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`The combination of Mozgrin with Kudryavtsev discloses a power
`supply that is electrically coupled to the anode and to the cathode,
`the power supply generating an electric field that excites atoms in
`the weakly-ionized plasma, thereby forming a strongly-ionized
`plasma without developing an electrical breakdown condition in the
`chamber.
`
`‘716 Patent at claim 23 (“wherein the peak plasma density of the
`weakly-ionized plasma is less than about 1012 cm˗3”)
`
`‘716 Patent at claim 24 (“wherein the peak plasma density of the
`strongly-ionized plasma is greater than about 1012 cm˗3”)
`Mozgrin at Fig. 1
`
`
`
`
`
`
`
`
`
`Mozgrin at Fig. 2
`
`Mozgrin at Fig. 3
`
`ActiveUS 122367749v.1
`
`- 15 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`
`Mozgrin at 402, right col, ¶ 2 (“Part 1 in the voltage oscillogram
`represents the voltage of the stationary discharge (pre-ionization
`stage).”)
`
`Mozgrin at 401, right col, ¶2 (“For pre-ionization … the initial
`plasma density in the 109 – 1011 cm-3 range.”)
`Mozgrin at 401, right col, ¶ 1 (“Thus, the supply unit was made
`providing square voltage and current pulses with [rise] times
`(leading edge) of 5 – 60 µs…”).
`
`Mozgrin 403, right col, ¶4 (“Regime 2 was characterized by intense
`cathode sputtering…”) (emphasis added).
`
`Mozgrin at 409, left col, ¶ 4 (“The implementation of the high-
`current magnetron discharge (regime 2) in sputtering … plasma
`density (exceeding 2x1013 cm-3).”).
`
`Mozgrin at 409, left col, ¶5 (“The high-current diffuse discharge
`(regime 3) is useful for producing large-volume uniform dense
`plasmas ni  1.5x1015cm-3…”)
`
`Mozgrin at 400, left col, ¶ 3 (“Some experiments on magnetron
`systems of various geometry showed that discharge regimes which
`do not transit to arcs can be obtained even at high currents.”)
`Mozgrin at 400, right col, ¶ 1 (“A further increase in the discharge
`
`ActiveUS 122367749v.1
`
`- 16 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`currents caused the discharges to transit to the arc regimes…”).
`Mozgrin at 404, left col, ¶ 3 (“The parameters of the shaped-
`electrode discharge…transit to arc regime 4, could be well
`determined… The point of the planar-magnetron discharge transit
`to the arc regime was determined by discharge voltage and structure
`changes...”).
`Mozgrin at 404, left col, ¶ 4 (“If the current was raised above 1.8
`kA or the pulse duration was increase to 2 – 10 ms, an instability
`development and discharge contraction was observed.”).
`Mozgrin at Fig. 4
`
`Mozgrin at Fig. 7
`
`
`
`
`Mozgrin at 401, ¶ spanning left and right columns (“Designing the
`[pulsed supply] unit, we took into account the dependences which
`had been obtained in [Kudryavtsev] of ionization relaxation on pre-
`
`ActiveUS 122367749v.1
`
`- 17 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`ionization parameters, pressure, and pulse voltage amplitude.”)
`Kudryavtsev at 34, right col, ¶ 4 (“Since the effects studied in this
`work are characteristic of ionization whenever a field is suddenly
`applied to a weakly ionized gas, they must be allowed for when
`studying emission mechanisms in pulsed gas lasers, gas breakdown,
`laser sparks, etc.”)
`Kudryavtsev at Fig. 1
`
`Kudryavtsev at Fig. 6
`
`
`
`
`
`Kudryavtsev at 31, right col, ¶ 7 (“The behavior of the increase in
`ne with time thus enables us to arbitrarily divide the ionization
`process into two stages, which we will call the slow and fast growth
`stages. Fig. 1 illustrates the relationships between the main electron
`currents in terms of the atomic energy levels during the slow and
`fast stages.”).
`Kudryavtsev at 31, right col, ¶ 6 (“For nearly stationary n2 [excited
`atom density] values … there is an explosive increase in ne [plasma
`density]. The subsequent increase in ne then reaches its maximum
`
`ActiveUS 122367749v.1
`
`- 18 -
`
`

`
`Claims 14-18 and 22-32
`
`EXHIBIT B.02
`U.S. Patent No. 7,604,716
`
`Mozgrin in view of Kudryavtsev
`
`value, equal to the rate of excitation [equation omitted], which is
`several orders of magnitude greater than the ionization rate during
`the initial stage.”)
`Kudryavtsev at Abstract (“[I]n a pulsed inert-gas discharge plasma
`at moderate pressures… [i]t is shown that the electron density
`increases explosively in time due to accumulation of atoms in the
`lowest excited states.”)
`One of ordinary skill would have been motivated to use
`Kudryavtsev’s fast stage of ionization in Mozgrin so as to increase
`plasma density and thereby increase the sputtering rate. Further,
`use of Kudryavtsev’s fast stage in Mozgrin would have been a
`combination of old elements that in which each element performed
`as expected to yield predictable results of increasing plasma density
`and multi-step ionization.
`
`The combination of Mozgrin with Kudryavtsev discloses the
`ionization source is chosen from the group comprising an electrode
`coupled to a DC power supply, an electrode coupled to an AC
`power supply, a UV source, an X-ray source, an electron beam
`source, an ion beam source, an inductively coupled plasma source,
`a capacitively coupled plasma source, and a microwave plasma
`source.
`
`See evidence cited in claim 26.
`
`See evidence cited in claim 15.
`
`The combination of Mozgrin with Kudryavtsev discloses the anode
`and the cathode form a gap there between.
`
`See eviden