`Petition for Inter Partes Review
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`
`DOCKET NO.: 0107131-00269 US5
`Filed on behalf of Intel Corporation
`By: Michael A. Diener, Reg. No. 37,122
`Yung-Hoon Ha, Reg. No. 56,368
`Wilmer Cutler Pickering Hale and Dorr LLP
`60 State Street, Boston, MA 02109
`Tel: (617) 526-6000
`Email: Michael.Diener@wilmerhale.com
` Yung-Hoon.Ha@wilmerhale.com
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________________________________________
`
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________________________________________
`
`
`INTEL CORPORATION
`Petitioner
`
`v.
`
`ZOND INC.
`Patent Owner
`
`Case No. IPR2014-00913
`
`
`PETITION FOR INTER PARTES REVIEW OF
`U.S. PATENT NO. 6,805,779
`CHALLENGING CLAIMS 7, 9, 20, 21, 38, AND 44
`UNDER 35 U.S.C. § 312 AND 37 C.F.R. § 42.104
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`TABLE OF CONTENTS
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`I.
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`Mandatory Notices ...................................................................................... - 1 -
`A.
`Real Party-in-Interest ....................................................................... - 1 -
`B.
`Related Matters ................................................................................. - 1 -
`C.
`Counsel ............................................................................................. - 1 -
`D.
`Service Information .......................................................................... - 1 -
`Certification of Grounds for Standing ........................................................ - 2 -
`II.
`III. Overview of Challenge and Relief Requested ............................................ - 2 -
`A.
`Prior Art Patents and Printed Publications ....................................... - 2 -
`B.
`Grounds for Challenge ..................................................................... - 3 -
`IV. Brief Description of Technology ................................................................ - 3 -
`A.
`Plasma............................................................................................... - 3 -
`B.
`Ions, excited atoms, and metastable atoms ...................................... - 3 -
`V. Overview of the ‘779 Patent ....................................................................... - 5 -
`A.
`Summary of Alleged Invention of the ‘779 Patent .......................... - 5 -
`B.
`Prosecution History .......................................................................... - 9 -
`VI. Overview of the Primary Prior Art References ........................................ - 10 -
`A.
`Summary of the Prior Art ............................................................... - 10 -
`B.
`Overview of Mozgrin ..................................................................... - 11 -
`C.
`Overview of Kudryavtsev .............................................................. - 12 -
`D. Overview of Iwamura ..................................................................... - 12 -
`E.
`Overview of Pinsley and Angelbeck .............................................. - 13 -
`VII. Claim Construction ................................................................................... - 14 -
`A.
`“multi-step ionization” ................................................................... - 15 -
`VIII. Specific Grounds for Petition ................................................................... - 15 -
`A. Ground I: Claims 9, 21 and 44 would have been obvious in view
`of Mozgrin, Kudryavtsev, Pinsley and Gruber .............................. - 16 -
`1.
`Independent claim 1 ............................................................. - 16 -
`2.
`Independent claim 18 ........................................................... - 29 -
`
`i
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`B.
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`C.
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`Dependent claims 9 and 21 .................................................. - 32 -
`3.
`Independent claim 44 ........................................................... - 34 -
`4.
`Ground II: Claims 7 and 20 would have been obvious in view of
`Mozgrin, Kudryavtsev, Pinsley, and Wells .................................... - 36 -
`Ground III: Claim 9, 21 and 44 would have been obvious over
`Iwamura, Angelbeck and Gruber ................................................... - 38 -
`1.
`Independent claim 1 ............................................................. - 38 -
`2.
`Independent claim 18 ........................................................... - 50 -
`3.
`Dependent claims 9 and 21 .................................................. - 52 -
`4.
`Independent claim 44 ........................................................... - 54 -
`D. Ground IV: Claims 7 and 20 would have been obvious in view
`of the combination of Iwamura, Angelbeck, and Wells ................ - 55 -
`Ground V: Claim 38 would have been obvious in view of
`Mozgrin, Kudryavtsev, Pinsley, and Iwamura ............................... - 57 -
`Ground VI: Claim 38 would have been obvious in view of the
`Iwamura and Angelbeck ................................................................. - 59 -
`IX. Conclusion ................................................................................................ - 60 -
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`E.
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`F.
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`ii
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`TABLE OF AUTHORITIES
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`FEDERAL STATUTES
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`Pages
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`35 U.S.C. § 312………………………………………………………....Cover Page
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`REGULATIONS
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`37 C.F.R. § 42.22……………………………………………………….…………2
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`37 C.F.R. § 42.100…………………………………………………………...14, 15
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`37 C.F.R. § 42.104…………………………………….……........Cover page, 2, 16
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`CASE LAW
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`In re ICON Health & Fitness, Inc., 496 F.3d 1374, 1379 (Fed. Cir. 2007)……...15
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`iii
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`I. MANDATORY NOTICES
`A. Real Party-in-Interest
`Intel Corporation (“Petitioner”) is the real party-in-interest.
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`B. Related Matters
`Zond has asserted U.S. Patent No. 6,805,779 (“‘779 Patent”) (Ex. 1401)
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`against parties in the District of Massachusetts, 1:13-cv-11570-RGS (Zond v.
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`Intel); 1:13-cv-11577-DPW (Zond v. AMD, Inc., et al); 1:13-cv-11581-DJC (Zond
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`v. Toshiba Am. Elec. Comp. Inc.); 1:13-cv-11591-RGS (Zond v. SK Hynix, Inc.);
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`1:13-cv-11625-NMG (Zond v. Renesas Elec. Corp.) ; 1:13-cv-11634-WGY (Zond
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`v. Fujitsu, et al.); and 1:13-cv-11567-DJC (Zond v. Gillette, Co.). Petitioner has
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`filed Petition Nos. IPR2014-00598, IPR2014-00686, IPR2014-00765, IPR2014-
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`00820 for claims 1-6, 8, 10-19, 22-37, 39-43, 45 and 46 of the ‘779 patent.
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`C. Counsel
`Lead Counsel: Michael A. Diener (Registration No. 37,122)
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`Backup Counsel: Yung-Hoon Ha (Registration No. 56,368)
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`Service Information
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`D.
`E-mail: Michael.Diener@wilmerhale.com
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`Yung-Hoon.Ha@wilmerhale.com
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`Post and hand delivery: Wilmer, Cutler, Pickering, Hale and Dorr, LLP
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`60 State Street, Boston, MA 02109
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`Telephone: 617-526-6000
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`Fax: 617-526-5000
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`II. CERTIFICATION OF GROUNDS FOR STANDING
`Petitioner certifies pursuant to Rule 42.104(a) that the patent for which
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`review is sought is available for inter partes review and that Petitioner is not
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`barred or estopped from requesting an inter partes review challenging the patent
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`claims on the grounds identified in this Petition.
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`III. OVERVIEW OF CHALLENGE AND RELIEF REQUESTED
`Pursuant to Rules 42.22(a)(1) and 42.104(b)(1)-(2), Petitioner challenges
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`Claims 7, 9, 20, 21, 38, and 44 of the ‘779 Patent.
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`Prior Art Patents and Printed Publications
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`A.
`The following references, and others listed in the Table of Exhibits, are
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`pertinent to the grounds of unpatentability explained below, and are each prior art
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`under (pre-AIA) 102(b):
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`1.
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`D.V. Mozgrin, et al, High-Current Low-Pressure Quasi-Stationary
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`Discharge in a Magnetic Field: Experimental Research, Plasma Physics Reports,
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`Vol. 21, No. 5, pp. 400-409, 1995 (“Mozgrin” (Ex. 1403)).
`
`2.
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`A. A. Kudryavtsev, et al, Ionization relaxation in a plasma produced by a
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`pulsed inert-gas discharge, Sov. Phys. Tech. Phys. 28(1), January 1983
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`(“Kudryavtsev” (Ex. 1404)).
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`3. U.S. Patent No. 3,761,836 (“Pinsley” (Ex. 1405)).
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`4.
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`5.
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`U.S. Patent No. 3,514,714 (“Angelbeck” (Ex. 1406)).
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`U.S. Patent No. 5,753,886 (“Iwamura” (Ex. 1407)).
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`- 2 -
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`6.
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`7.
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`EPO Patent Publication No. EP 0 146 509 (“Gruber” (Ex. 1413)).
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`PCT Patent Publication No. WO 83/01349 (“Wells” (Ex. 1414)).
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`Of these, only Mozgrin was of record during prosecution.
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`B. Grounds for Challenge
`Petitioner requests cancellation of claims 7, 9, 20, 21, 38, and 44 (hereinafter
`
`“challenged claims”) of the ‘779 Patent as unpatentable under 35 U.S.C. §103.
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`This Petition, supported by the declaration of Uwe Kortshagen, Ph.D.
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`(“Kortshagen Decl.” (Ex. 1402)) herewith, demonstrates that there is a reasonable
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`likelihood that Petitioner will prevail with respect to at least one challenged claim
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`and that each challenged claim is not patentable. See 35 U.S.C. § 314(a).
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`IV. BRIEF DESCRIPTION OF TECHNOLOGY
`A.
`Plasma
`A plasma is a collection of ions, free electrons, and neutral atoms. Dr.
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`Kortshagen Decl. provides some general background on plasma and their use in
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`sputtering at Kortshagen Decl. ¶ 21-22 (Ex. 1402). The “density” of a plasma
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`refers to the number of ions or electrons that are present in a unit volume. Id. (Ex.
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`1402).
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`Ions, excited atoms, and metastable atoms
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`B.
`Atoms have equal numbers of protons and electrons. Kortshagen Decl. ¶ 23
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`(Ex. 1402). Each electron has an associated energy state. Id. (Ex. 1402). If all of
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`an atom’s electrons are at their lowest possible energy state, the atom is said to be
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`- 3 -
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`in the “ground state.” Id. (Ex. 1402).
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`On the other hand, if one or more of an atom’s electrons is in a state that is
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`higher than its lowest possible state, then the atom is said to be an “excited atom.”
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`Id. at ¶ 24 (Ex. 1402). A metastable atom is a type of excited atom that is
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`relatively long-lived, because it cannot transition into the ground state through
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`dipole radiation, i.e., through the emission of electromagnetic radiation. Id. (Ex.
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`1402). See also ‘779 Patent at 7:22-25 (“The term ‘metastable atoms’ is defined
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`herein to mean excited atoms having energy levels from which dipole radiation is
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`theoretically forbidden. Metastable atoms have relatively long lifetimes compared
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`with other excited atoms.”) (Ex. 1401). “All noble gases have metastable states.”
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`‘779 Patent at 7:37 (Ex. 1401). When generating excited atoms, multiple levels of
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`excited states are formed. Of these, some of the lowest states are metastable, and
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`would typically be more common than the higher states. Id. (Ex. 1402), where Dr.
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`Kortshagen provides additional support with reference to Exs. 1411 and 1412.
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`Excited and metastable atoms are electrically neutral – they have equal
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`numbers of electrons and protons. Kortshagen Decl. ¶ 25 (Ex. 1402). A collision
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`with a low energy free electron (e-) can convert a ground state atom to an excited
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`or metastable atom. Id. (Ex. 1402). For example, the ‘779 Patent uses the
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`following equation to describe production of an excited argon atom, Ar*, from a
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`ground state argon atom, Ar. See ‘779 Patent at 8:7 (Ex. 1401).
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`- 4 -
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`Ar + e- Ar* + e-
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`An ion is an atom that has become disassociated from one or more of its
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`electrons. Kortshagen Decl. ¶ 26 (Ex. 1402). A collision between a free, high
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`energy electron and a ground state, excited, or metastable atom can create an ion.
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`Id. (Ex. 1402). For example, the ‘779 Patent uses the following equations to
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`describe production of an argon ion, Ar+, from a ground state argon atom, Ar, or an
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`excited argon atom, Ar*. See ‘779 Patent at 3:40 and 8:9 (Ex. 1401).
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`Ar + e- Ar+ + 2e-
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`Ar* + e- Ar+ + 2e-
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`The production of excited atoms, metastable atoms, and ions was well
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`understood long before the ‘779 Patent was filed. Kortshagen Decl. ¶ 27 (Ex.
`
`1402).
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`V. OVERVIEW OF THE ‘779 PATENT
`A.
`Summary of Alleged Invention of the ‘779 Patent
`The ‘779 Patent relates to generating a plasma using a multi-step ionization
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`process with an excited/metastable atom/molecule source that generates excited
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`atoms, or metastable atoms or molecules, and then provides the excited/metastable
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`atoms or molecules to a plasma chamber where the plasma is formed, thereby
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`generating a plasma with a “multi-step ionization” process. Kortshagen Decl. ¶ 28
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`(Ex. 1402). For convenience, this section will just use the term “excited atom
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`source.” In any event, there appears to be no substantial difference between
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`- 5 -
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`excited and metastable sources. Id. (Ex. 1402). The ‘779 Patent does not indicate
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`any particular difference in the operation of an excited atom source when it is a
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`metastable atom source. Id. (Ex. 1402). The specification repeatedly refers to “an
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`excited atom source such as a metastable atom source,” see, e.g., ‘779 Patent at
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`2:13-14, 17-18, 22-24 (Ex. 1401), and says that “[i]n some embodiments, the
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`metastable atom source 204 generates some excited atoms that are in excited states
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`other than a metastable state.” Id. at 5:63-65 (Ex. 1401)
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`Admitted prior art FIG. 1 of the ‘779 Patent shows a plasma chamber
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`consisting of a magnetron sputtering system, without an excited atom source.
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`Kortshagen Decl. ¶ 29 (Ex. 1402). It generates plasma through a process that the
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`patent refers to as a direct ionization process. ‘779 Patent at 3:36-47 (“The
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`ionization process in known plasma sputtering apparatus is generally referred to as
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`direct ionization…. The collision between the neutral argon atom and the ionizing
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`electron results in an argon ion (Ar+) and two electrons.”) (Ex. 1401).
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`As is generally known, this system has an anode, a cathode assembly 114 for
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`holding a target material to be sputtered, and a magnet 130 that generates a
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`magnetic field 132 proximate to the target to trap and concentrate electrons. Id. at
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`2:46-3:18 (Ex. 1401). See also Kortshagen Decl. ¶ 30 (Ex. 1402).
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`The alleged invention generally relates to coupling an excited or metastable
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`atom source to some plasma chamber. ‘779 Patent at 5:27-34 (“The metastable
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`atom source 204 can be coupled to any type of process chamber, such as the
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`chamber 104 of FIG. 1. In fact, a plasma generator according to the present
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`invention can be constructed by coupling a metastable atom source to a
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`commercially available plasma chamber. Thus, commercially available plasma
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`generators can be modified to generate a plasma using a multi-step ionization
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`process according to the present invention.”) (Ex. 1401). See also Kortshagen
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`Decl. ¶ 31 (Ex. 1402).
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`FIGS. 2 and 3 of the ‘779 Patent show such plasma generators “according to
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`the present invention” that are coupled with separate metastable atom sources
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`(annotated in color below). ‘779 Patent at 2:3-11; FIGS. 2 and 3 (Ex. 1401).
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`Specifically, FIG. 2 shows metastable atom source 204, and FIG. 3 shows
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`metastable atom source 304 (annotated in color above). Kortshagen Decl. ¶ 33
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`(Ex. 1402). The metastable atom sources 204 and 304 “generate[] a volume of
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`metastable atoms 218 from [a] volume of ground state atoms. See, e.g., ‘779
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`Patent at 4:56-58 (Ex. 1401). Metastable atoms 218 are transported from the
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`source where they are generated to the region between the cathode 114/306 and
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`substrate support 136/352, where plasma 202/302 is formed. Kortshagen Decl. ¶
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`33 (Ex. 1402).
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`Power supply 222 (annotated in color above) provides power to the
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`metastable atom source. See, e.g., ‘779 Patent at 4:60-62 (Ex. 1401). Another
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`(pulsed) power supply 201 (in FIG. 2) or power supply 316 (in FIG. 3) raises the
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`energy of the metastable atoms to generate a plasma 202. See, e.g., id. at 11:4-14
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`(“A power supply 316 is electrically coupled to the volume of metastable atoms
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`218. The power supply 316 can be any type of power supply, such as a pulsed
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`power supply, a RF power supply, an AC power supply, or a DC power supply. …
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`The power supply 316 generates an electric field 322 between the cathode 306 and
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`the anode 308 that raises the energy of the volume of metastable atoms 218 so that
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`at least a portion of the volume of metastable atoms 218 are ionized, thereby
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`generating the plasma 302.”) (Ex. 1401). See also Kortshagen Decl. ¶ 34 (Ex.
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`1402).
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`The metastable atom sources shown in FIGS. 2 and 3 can be mounted to the
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`inside wall of the chamber 230 (FIG. 3), or on the outside wall (FIG. 2). See, e.g.,
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`‘779 Patent at 4:31-34 and 9:51-62 (Ex. 1401). Kortshagen Decl. ¶ 35 (Ex. 1402).
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`Consistent with the claim language, FIGS. 2 and 3, and the specification, the
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`“excited atom source” and “metastable atom source” generate the excited atoms in
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`a source that is distinct from, and coupled to, the components that later raise the
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`energy of the excited or metastable atoms to generate a plasma with “multi-step
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`ionization,” a term the ‘779 Patent defines as an ionization process whereby ions
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`are ionized in at least two distinct steps.”1 ‘779 Patent at 6:60-63 (Ex. 1401).
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`Prosecution History
`
`B.
`The first substantive office action for the application that led to the ‘779
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`Patent rejected all independent claims as being anticipated based on prior art that
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`showed a first chamber for generating excited/metastable atoms, and a second
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`chamber for increasing the energy of the excited atoms, and for generating a
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`plasma using multi-step ionization. See 02/11/04 Office Action at 2-3 (Ex. 1408).
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`The applicant did not dispute the rejection, but amended the independent
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`claims at issue here to require that the distinct source further includes “a magnet
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`that generates a magnetic field for substantially trapping electrons proximate to the
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`ground state atoms.” See 05/06/04 Resp. at 2, 4, 6, 8 and 10 (Ex. 1409). The
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`claims were then allowed.
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`
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`Notwithstanding this difference, the ‘779 Patent does not indicate that an
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`excited atom source with magnets has any special significance over other ways for
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`generating excited/metastable atoms. Although the magnet embodiment was
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`claimed, the specification indicates that there were other ways to generate excited
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`1 All bold/italics emphasis is added.
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`- 9 -
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`atoms, and shows multiple embodiments – e.g., FIGS. 4, 5, 8, 9, and 11—without
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`the magnets that were required for the claims to be allowed. The “magnet” recited
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`in the claims refers particularly to the embodiments of FIGS. 6, 7, and10, and
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`specifically to magnets 504a, 504b, 506a and 506b in FIG. 6; magnets 566a-d and
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`570a-d in FIG. 7; and magnets 712 and 714 in FIG. 10. ‘779 Patent at FIGS. 6 and
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`7; 14:46-15:45; and 16:12-20 (Ex. 1401).
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`European Counterpart. The applicants had also identified these magnets,
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`located in the separate excited atom source of FIG. 6, as the claimed magnets in
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`counterpart claims in Europe, which read in part:
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`characterised [sic] in that the excited atom source (204) comprises a
`magnet (504, 506) that is arranged to generate a magnetic field (508)
`that traps electrons proximate to the ground state atoms.
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`24 July 2007 Response in EP 1614136 (Ex. 1410)
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`However, as explained in detail below, and contrary to the Examiner’s
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`reasons for allowance, the prior art addressed herein teaches using magnets in this
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`manner, along with the other limitations of the challenged claims. Kortshagen
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`Decl. ¶ 41 (Ex. 1402).
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`VI. OVERVIEW OF THE PRIMARY PRIOR ART REFERENCES
`A.
`Summary of the Prior Art
`As explained in detail below, limitation-by-limitation, there is nothing new
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`or non-obvious in the challenged claims of the ‘779 Patent. Id. at ¶ 42 (Ex. 1402).
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`B. Overview of Mozgrin
`Fig. 7 of Mozgrin shows the current-voltage characteristic (“CVC”) of a
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`plasma discharge generated by Mozgrin. As shown, Mozgrin divides this CVC
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`into four distinct regions. Id. at ¶ 43 (Ex. 1402).
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`Mozgrin calls region 1 “pre-ionization.” Mozgrin at 402, right col, ¶ 2 (Ex.
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`1403). See also Kortshagen Decl. ¶ 44 (Ex. 1402).
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`Mozgrin calls region 2 “high current magnetron discharge.” Mozgrin at 409,
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`left col, ¶ 4 (Ex. 1403). See also Kortshagen Decl. ¶ 45 (Ex. 1402). Application of
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`a high voltage to the pre-ionized plasma causes the transition from region 1 to 2.
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`Id. (Ex. 1402). Mozgrin teaches that region 2 is useful for sputtering. Mozgrin at
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`403, right col, ¶ 4 (“Regime 2 was characterized by an intense cathode
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`sputtering…”) (Ex. 1403). See also Kortshagen Decl. ¶ 45 (Ex. 1402).
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`Mozgrin calls region 3 “high current diffuse discharge.” Mozgrin at 409, left
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`col, ¶ 5, (Ex. 1403). Increasing the current applied to the “high-current magnetron
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`discharge” (region 2) causes the plasma to transition to region 3. Kortshagen
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`Decl. ¶ 46 (Ex. 1402). Mozgrin also teaches that region 3 is useful for etching, i.e.,
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`removing material from a surface. Mozgrin at 409, left col, ¶ 5 (“The high-current
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`diffuse discharge (regime 3) is useful … Hence, it can enhance the efficiency of
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`ionic etching…”) (Ex. 1403). See also Kortshagen Decl. ¶ 46 (Ex. 1402).
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`Mozgrin calls region 4 “arc discharge.” Mozgrin at 402, right col, ¶ 3(Ex.
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`1403). Further increasing the applied current causes the plasma to transition from
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`region 3 to the “arc discharge” region 4. Kortshagen Decl. ¶ 47 (Ex. 1402).
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`C. Overview of Kudryavtsev
`Kudryavtsev is a technical paper that studies the ionization of a plasma with
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`voltage pulses. See, e.g., Kudryavtsev at 30, left col. ¶ 1 (Ex. 1404). In particular,
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`Kudryavtsev describes how ionization of a plasma can occur via different
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`processes. The first process is direct ionization, in which ground state atoms are
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`converted directly to ions. See, e.g., id. at Fig. 6 caption (Ex. 1404). The second
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`process is multi-step ionization, which Kudryavtsev calls stepwise ionization. See,
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`e.g., id. (Ex. 1404). Kudryavtsev notes that under certain conditions multi-step
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`ionization can be the dominant ionization process. See, e.g., id. (Ex. 1404).
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`Mozgrin took into account the teachings of Kudryavtsev when designing his
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`experiments. Mozgrin at 401, ¶ spanning left and right cols. (“Designing the unit,
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`we took into account the dependences which had been obtained in
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`[Kudryavtsev]…”) (Ex. 1403). See also Kortshagen Decl. ¶ 48 (Ex. 1402).
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`D. Overview of Iwamura
`Iwamura discloses “a plasma treatment apparatus for treating a surface of an
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`object….” Iwamura at 2:51-52 (Ex. 1407). “A first plasma generation unit for
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`preactivating the gas to generate a plasma is positioned upstream along the flow
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`path of the gas in the gas supply; and a second plasma generation unit for
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`activating the gas to generate a plasma downstream along the flow path of the gas
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`in the gas supply is also provided. Thus, the first plasma generation unit
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`preactivates the gas and the second plasma generation unit activates the gas and
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`forms activated gas species. Then, the activated gas species formed by the second
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`plasma generation unit treat the object to be treated.” Iwamura at 2:56-65. (Ex.
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`1407); see also Kortshagen Decl. ¶ 49 (Ex. 1402).
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`
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`Iwamura discloses multiple ways for generating excited/metastable atoms,
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`and discloses the desirability of providing a first excitation step followed by a
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`further energy providing step, and also claims such a system. Iwamura at 2:1-50,
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`claim 1 (Ex. 1407); see also Kortshagen Decl. ¶ 50 (Ex. 1402).
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`E. Overview of Pinsley and Angelbeck
`Pinsley discloses a gas laser having a magnetic field that is oriented
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`transversely with respect to the flow of the gases. Pinsley at Abstract (“A flowing
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`gas laser having an electric discharge plasma with the electric field oriented
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`transversely with respect to the flow of gases therethrough is provided with a
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`magnetic field which is oriented transversely with respect to both the flow and the
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`electric field to overcome the forces of flowing gases thereon.”) (Ex. 1405); see
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`also Kortshagen Decl. ¶ 51 (Ex. 1402). The transverse magnetic field traps
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`electrons. Pinsley at 2:43-47 (“As is known, the interaction between the current
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`and the magnetic field will result in an upstream force as indicated by the force
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`vector 32. This force is exerted upon the electrons, and tends to maintain the
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`electrons in an area between the anode and cathode.”) (Ex. 1405); see also
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`Kortshagen Decl. ¶ 51 (Ex. 1402).
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`Pinsley does not specifically use the words “excited atoms,” but one of
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`ordinary skill would understand that increasing the energy and using a magnetic
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`field to maintain the electrons in place would allow excited atoms to be generated
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`and pass through. Id. at ¶ 52 (Ex. 1402). The Angelbeck patent (with a lead
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`inventor who is also a co-inventor on the Pinsley patent) makes clear that gas
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`lasers of the type disclosed by Pinsley generate excited atoms as part of their
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`operation. Angelbeck at 1:21-25 (“This invention relates to gas lasers, and
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`particularly to a method and apparatus for increasing and controlling the light
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`output of a gas laser by applying a transverse magnetic field to the laser.”); 2:18-20
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`(“A high gas pressure P is advantageous, however, for creating a high density of
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`excited atoms in the laser.”) (Ex. 1403); Kortshagen Decl. ¶ 52 (Ex. 1402).
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`VII. CLAIM CONSTRUCTION
`A claim in inter partes review is given the “broadest reasonable construction
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`in light of the specification.” 37 C.F.R. § 42.100(b). Any claim term that lacks a
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`definition in the specification is therefore also given a broad interpretation. In re
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`ICON Health & Fitness, Inc., 496 F.3d 1374, 1379 (Fed. Cir. 2007). Any claim
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`terms not included in the following discussion are to be given their broadest
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`reasonable interpretation in light of the specification as commonly understood by
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`those of ordinary skill in the art. 2
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`“multi-step ionization”
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`A.
`Each of the independent claims in the ‘779 Patent recites the term “multi-
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`step ionization.” The ‘779 Patent defines this term “to mean an ionization process
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`whereby ions are ionized in at least two distinct steps.” ‘779 Patent at 6:60-63 (Ex.
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`1401). This is consistent with the claim language, FIGS. 2 and 3, and the
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`specification, which generate the excited atoms in a source that is distinct from,
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`and coupled to, the components that later raise the energy of the excited or
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`metastable atoms to generate a plasma. Thus the proposed construction for “multi-
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`step ionization” is “an ionization process whereby ions are ionized in at least two
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`distinct steps.” This proposed construction is consistent with the position taken by
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`the Patent Owner in 1:13-cv-11634-WGY (Zond v. Fujitsu, et al.), where the
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`Patent Owner construed this term as “an ionization process having two or more
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`distinct steps.” (Ex. 1415).
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`VIII. SPECIFIC GROUNDS FOR PETITION
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`2 Petitioner adopts the “broadest reasonable construction” standard as required by
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`37 C.F.R. § 42.100(b). Petitioner reserves the right to pursue different
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`constructions in a district court, where a different standard is applicable.
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`Pursuant to Rule 42.104(b)(4)-(5), the below sections, and as confirmed in
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`the Kortshagen Declaration (Ex. 1402), demonstrate in detail how the prior art
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`discloses each and every limitation of Claims 7, 9, 20, 21, 38, and 44 of the ‘779
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`Patent, and how those claims are rendered obvious by the prior art.3
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`A. Ground I: Claims 9, 21 and 44 would have been obvious in view
`of Mozgrin, Kudryavtsev, Pinsley and Gruber
`1. Independent claim 1
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`The preamble: “[a] plasma generator that generates a plasma
`with a multi-step ionization process, the plasma generator
`comprising”
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`Mozgrin teaches a plasma generator that generates plasma using the power
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`supply shown in Fig 2. Kortshagen Decl. ¶ 57 (Ex. 1402). The power supply
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`includes a stationary discharge supply unit, to generate a pre-ionized plasma.
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`Mozgrin at 401, right col, ¶ 2 (“For pre-ionization… the initial plasma density in
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`the 109 – 1011 cm-3 range.”) Kortshagen Decl. ¶ 57 (Ex. 1402).
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`The power supply further includes a high-voltage supply unit, to deliver
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`voltage pulses to the pre-ionized plasma. See Mozgrin at 401, left col, ¶ 4
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`(“…applying a square voltage pulse to the discharge gap which was filled up with
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`3 Petitioner addresses the invalidity of independent claims 1, 18 and 30 in a
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`separate petition IPR2014-00598. Claims 1, 18 and 30 are addressed herein to
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`demonstrate the invalidity of claims that depend from claims 1, 18 and 30.
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`either neutral or pre-ionized gas.”) (Ex. 1403). See also Kortshagen Decl. ¶ 58
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`(Ex. 1402). Mozgrin explains that in “[d]esigning the [pulsed power supply] unit,
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`we took into account the dependences which had been obtained in [8] of ionization
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`relaxation on pre-ionization parameters, pressure, and pulse voltage amplitude.”
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`Mozgrin at 401, ¶ spanning left and right columns (Ex. 1403). The reference [8] is
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`Kudryavtsev.
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`Kudryavtsev discloses “multi-step ionization.” It would have been obvious
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`for one of ordinary skill to combine Mozgrin with Kudryavtsev. See also
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`Kortshagen Decl. ¶ 59 (Ex. 1402). In addition to the fact that Mozgrin itself cites
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`Kudryavtsev and Mozgrin explicitly notes that its power supply unit was designed
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`in accordance with Kudryavtsev, Kudryavtsev also states, “[s]ince the effects
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`studied in this work are characteristic of ionization whenever a field is suddenly
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`applied to a weakly ionized gas, they must be allowed for when studying emission
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`mechanisms in pulsed gas lasers, gas breakdown, laser sparks, etc.” Kudryavtsev
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`at 34, right col, ¶ 4 (Ex. 1404). Because Mozgrin applies voltage pulses that
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`“suddenly generate an electric field,” one of ordinary skill reading Mozgrin would
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`have been motivated to consider Kudryavtsev to further appreciate the effects of
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`applying Mozgrin’s pulses. Kortshagen Decl. ¶ 59 (Ex. 1402).
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`Kudryavtsev explains the contribution of multi-step ionization to the overall
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`ionization process. Id. at ¶ 60 (Ex. 1402). Referring to the annotated copy of
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`Kudryavtsev’s Fig. 1 copied below, ionization occurs with an initial “slow stage”
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`(Fig 1a) followed by a
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`“fast stage” (Fig. 1b).
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`Kudryavtsev at 31,
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`right col, ¶ 7 (Ex.
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`1404) (“The behavior of the increase in ne with time thus enables us to arbitrarily
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`divide the ionization process into two stages, which we will call the slow and fast
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`growth stages. Fig. 1 illustrates the relationships between the main electron
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`currents in terms of the atomic energy levels during the slow and fast stages.”).
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`See also Kortshagen Decl. ¶ 60 (Ex. 1402).
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`During the initial slow stage, direct ionization provides a significant
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`contribution to the generation of plasma ions (see arrow Γ1e colored in green
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`showing ionization (top line labeled “e”) from the ground state (bottom line
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`labeled “1”)). Id. at ¶ 61 (Ex. 1402). In addition, during the slow stage, excited
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`atoms are also created within the plasma chamber (see arrow Γ12 colored in blue
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`showing excitation into lowest excited state (middle line labeled “2”) from the
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`ground state (bottom line labeled “1”)). Id. (Ex. 1402). Once the population of
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`excited atoms becomes large enough, fast stage occurs, as shown in Fig. 1b. As
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`shown, multi-step (or “stepwise”) ionization, which occurs through the generation
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`of excited atoms (see arrow Γ12 colored in blue), becomes the dominant ionization
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`process as shown by the thick arrow labeled Γ2e ((colored in red) showing
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`ionization (top line labeled “e”) from the lowest excited state (middle line labeled
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`“2”)). See also Kudryavtsev at Fig. 6 (Ex. 1404); see also Kortshagen Decl. ¶ 61
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`(Ex. 1402). The thin arrows labeled Γ1e show that direct ionization produces ions
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`at a roughly constant rate in both the slow and fast stages. Id. (Ex. 1402). The
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`thick arrow labeled Γ2e in Fig. 1b shows that multi-step ionization can produce ions
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`at a much greater rate than direct ionization. Id. (Ex. 1402).
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`Kudryavtsev explains the rapid increase in ionization once multi-step
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`ionization becomes the dominant process as follows: “For nearly stationary n2
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`[excited atom density] values … there is an explosive increase in ne [plasma
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`density]. The subsequent