`
`U.S. Patent No. 7,808,184
`
`References cited herein:
`
`. U.S. Patent No. 7,808,184 (‘“ 184 Patent”)
`
`Dischar e in a
`-Current Low-Pressure uasi-Station
`0 D.V. Mozgrin, et a], Hi
`Magnetic Field: Experimental Research, Plasma Physics Reports, Vol. 21, No. 5, 1995
`(“Mozgrin”)
`
`o D.V. Mozgrin, High-Current Low-Pressure Quasi-Stationary Discharge in a Magnetic
`Field: Experimental Research, Thesis at Moscow Engineering Physics Institute, 1994
`(“Mozgrin Thesis”)
`
`0 A. A. Kudryavtsev, et al, Ionization relaxation in a plasma produced by a pulsed inert-gas
`discharge, Sov. Phys. Tech. Phys. 28(1), January 1983 (“Kudryavtsev”)
`
`o Leipold et al., High-electron densifl, atmospheric pressure air glow discharges, Power
`Modulator Symposium, 2002 and 2002 High-Voltage Workshop. Conference Record of
`the Twenty-Fifth International, June 2002 (“Leipold”)
`
`0 Dennis M. Manos & Daniel L. Flamm, Plasma Etching: An Introduction, Academic Press
`1989 (“Manos”)
`
`o Thornton, J.A., Magnetron sputtering: basic physics and application to cylindrical
`magnetrons, J. Vac. Sci. Technol. 15(2) 1978 (“Thornton”)
`
`o Gudmundsson et al., Evolution of the electron energy distribution and plasma parameters
`in a pulsed magnetron discharge, Applied Physics Letters, 78(22) May 2001
`(“Gudmundsson”)
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`1. A method of The combination of Mozgrin with Mozgrin Thesis discloses a method of
`generating a
`generating a strongly-ionized plasma.
`strongly-
`ionized
`plasma, the
`method
`
`‘ 184 Patent at 7: 14-17 (“[S]trongly-ionized plasmas are generally plasmas
`having plasma densities that are greater than about 1012-1013 cm'3.”
`
`comprising:
`
`Mozgrin at 401, right col, 112 (“For pre-ionization
`in the 109 — 1011 cm'3 range”)
`
`the initial plasma density
`
`2x1013 cm'3).”).
`
`Mozgrin at 409, left col, 1] 4 (“The implementation of the high-current
`magnetron discharge (regime 2) in sputtering
`plasma density (exceeding
`
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`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in view of the Mozgrin Thesis
`
`Mozgrin at 409, left col, 1]5 (“The high-current diffiise discharge (regime 3) is
`useful for producing large-volume uniform dense plasmas 11,-; 1.5x1015cm'
`
`The combination of Mozgrin with Mozgrin Thesis discloses supplying feed gas
`proximate to an anode and a cathode assembly.
`
`a) supplying
`feed gas
`proximate to
`an anode and a Mozgrin at Fig. l
`cathode
`
`assembly; and
`
`
`
`
`
`‘&l/I§§‘
`'r//////////////
`
`Fig. 1. Discharge dcvicc configurations: (a) planar magne-
`tron;
`(b)
`shaped-electrode configuration,
`(I) Cathode;
`(2) anode; (3) magnetic system.
`
`Mozgrin at 401, left col, 1] 4 (“. . .the discharge gap which was filled up with
`either neutral or pre-ionized gas.”).
`
`Mozgrin at 400, right col, 1] 3 (“We investigated the discharge regimes in
`various gas mixtures at 10'3 — 10 torr. . .”).
`
`Mozgrin at 402, 1] spanning left and right cols (“We studied the high-current
`discharge in wide ranges of discharge current. . .and operating pressure. . .using
`various gases (Ar, N2, SF6, and H2) or their mixtures of various
`composition. . .”).
`
`Mozgrin at 401, left col, 1] l (“The [plasma] discharge. . .was adjacent to the
`cathode”).
`
`See also Mozrin at Fi. l.
`
`b) generating a The combination of Mozgrin with the Mozgrin Thesis discloses generating a
`voltage pulse
`voltage pulse between the anode and the cathode assembly.
`between the
`
`anode and the Mozgrin at Fig. 3:
`cathode
`
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`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in view of the Mozgrin Thesis
`
`assembly,
`
`1
`
`211 2b
`
`3
`
`Mozgrin at 402, Fig. 3 caption (“Fig. 3. Oscillograms of (a) current and (b)
`voltage. . .”).
`
`Mozgrin at 401, left col, 1] 4 (“It was possible to form the high-current quasi-
`stationary regime by applying a square voltage pulse to the discharge gap
`which was filled u n with either neutral or re-ionized
`
`The combination of Mozgrin with the Mozgrin Thesis discloses the voltage
`pulse having at least one of a controlled amplitude and a controlled rise time.
`
`Mozgrin at Fig. 3:
`
`(b)
`
`the voltage
`pulse having at
`least one of a
`
`controlled
`amplitude and
`a controlled
`.
`.
`r1se t1me
`
`- A
`
`Mozgrin at 401, right col, 1] l (“[t]he power supply was able to deliver square
`voltage and current pulses with [rise] times (leading edge) of 5 — 60 us ....”).
`
`Mozgrin at 406, right col, 1] 2 (“Table 1 presents parameter ranges
`corresponding to regime 2.”).
`
`that increases
`an ionization
`rate so that a
`
`The combination of Mozgrin with the Mozgrin Thesis discloses [at least one of
`a controlled amplitude and a controlled rise time] that increases an ionization
`rate so that a raid increase in electron densi
`and a formation of a stron l
`
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`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`rapid increase
`in electron
`density and a
`formation of a
`strongly-
`ionized plasma
`occurs
`
`ionized plasma occurs without forming an arc between the anode and the
`cathode assembly.
`
`‘ 184 Patent at 14:18-20 (“The duration of the transient stage 340 is about 40
`usec, but can have a duration that is in the range of about 10 usec to 5,000
`usec.”).
`
`‘ 184 Patent at 14:23-40 (“The transient stage 340 of the voltage pulse 302’ has
`a rise time that shifts the electron energy distribution in the weakly-ionized
`plasma to higher energies thereby causing a rapid increase in the ionization rate
`by driving the weakly-ionized plasma into a transient non-steady state... A
`high-power stage 350
`is sufficient to more rapidly create a strongly-ionized
`plasma. . .”).
`
`Mozgrin at 401, right col, 112 (“For pre-ionization ... the initial plasma density
`in the 109 — 1011 cm'3 range.”).
`
`Mozgrin at 409, left col, 1] 4 (“The implementation of the high-current
`magnetron discharge (regime 2) in sputtering
`plasma density (exceeding
`2x1013 cm‘3).”).
`
`Mozgrin at 409, left col, 115 (“The high-current diffiise discharge (regime 3) is
`useful for producing large-volume uniform dense plasmas 11,-; 1.5x1015cm'
`3. . .”).
`
`Mozgrin at 401, 1] spanning left and right columns (“The frequency parameters
`of the pulsed supply unit were chosen... Designing the [pulsed supply] unit,
`we took into account the dependencies which had been obtained in
`[Kudryavtsev] of ionization relaxation on pre-ionization parameters, pressure,
`and pulse voltage amplitude”).
`
`disclosed in Mozgrin. Thus, a person of ordinary skill would have combined
`
`Mozgrin at 402, Fig. 3 and Fig. caption.
`
`Mozgrin Thesis at 63, Fig. 3.2 and Fig. caption.
`
`It would have been obvious for one of ordinary skill to combine Mozgrin with
`the Mozgrin Thesis. Both Mozgrin and the Mozgrin Thesis are written by the
`same author, address similar subject matter, and describe the same research.
`The Mozgrin Thesis merely provides additional detail for the material already
`
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`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`forming an arc
`between the
`
`anode and the
`
`cathode
`
`assembly.
`
`an arc between the anode and the cathode assembly.
`
`Mozgrin at Fig. 7.
`
`Mozgrin at 400, left col, 1] 3 (“Some experiments on magnetron systems of
`various geometry showed that discharge regimes which do not transit to arcs
`can be obtained even at high currents.”)
`
`Mozgrin at 400, right col, 1] l (“A flirther increase in the discharge currents
`caused the discharges to transit to the arc regimes. . .”).
`
`Mozgrin at Fig. l:
`
`Mozgrin at 404, left col, 1] 4 (“The parameters of the shaped-electrode
`discharge transit to regime 3, as well as the condition of its transit to arc regime
`4, could be well determined for every given set of the discharge parameters”).
`
`Mozgrin at 406, right col. 1] 3 (“Moreover, pre-ionization was not necessary;
`however, in this case, the probability of discharge transferring to the arc mode
`increased.”).
`
`Mozgrin at 403, left col, 1] 2 (“Then, we studied regimes 2 and 3 separately to
`determine the boundary parameters of their occurrence, such as current,
`voltage. . .”).
`
`Mozgrin at 400, right col, 1] l (“A flirther increase in the discharge currents
`caused the discharges to transit to the arc regimes. . .”).
`
`Mozgrin at 404, left col, 1] 4 (“If the current was raised above 1.8 kA or the
`pulse duration was increase to 2 — 10 ms, an instability development and
`discharge contraction was observed.”).
`
`Mozgrin at Figs. 4 and 7.
`
`Background:
`Manos at 231 “arcs. . .are a
`
`The combination of Mozgrin with Mozgrin Thesis discloses applying a
`magnetic field proximate to the cathode assembly.
`
`See evidence cited for claim 1.
`
`2. The method
`
`of claim 1
`
`further
`
`comprising
`applying a
`magnetic field
`proximate to
`the cathode
`
`assembly.
`
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`
`
`EXHIBIT G.03
`
`US. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in view of the Mozgrin Thesis
`
`<7,%§§
`
`
`
`Fig. 1. Discharge dcvxcc configurations: (in) planar magne-
`tron;
`(b)
`shaped-electrode
`configuration.
`(I) Cathode;
`(2) anode; (3) magnetic system
`
`
`
`Mozgrin at 401, left col, 1] l (“The electrodes were immersed in a magnetic
`field of annular errnanent ma nets.” .
`
`The combination of Mozgrin with Mozgrin Thesis discloses generating an
`electron Hall current from an electric field generated by the voltage pulse and
`from the magnetic field, the electron Hall current raising the temperature of the
`electrons in the weakly-ionized plasma to a temperature that enhances the
`increase in electron density and the formation of the strongly-ionized plasma.
`
`4. The method
`of claim 1
`further
`comprising
`generating an
`electron Hall
`
`current from an See evidence cited for claim 1.
`
`electric field
`
`generated by
`the voltage
`pulse and from
`the magnetic
`field, the
`electron Hall
`
`current raising
`the
`tern n erature of
`
`‘ 184 Patent at 3:21-23 (“The magnetic field 132 can also induce an electron
`Hall current 135 that is formed by the crossed electric and magnetic fields.”) .
`
`‘ 184 Patent at 7:14-17 (“Weakly-ionized plasmas are generally plasmas having
`plasma densities that are less than about 1012 — 1013 cm” ....”)
`
`‘ 184 Patent at 10:2-5 (“. . .increasing electron temperature caused by EXB Hall
`currents”)
`
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`the electrons in
`
`the weakly-
`ionized plasma
`to a
`
`temperature
`that enhances
`
`the increase in
`
`electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`‘ 184 Patent at 11:5-10 (“An electron ExB Hall current 135 is generated when
`the voltage pulse 252 applied between the target 118 and the anode 124
`generates primary electrons and secondary electrons that move in a
`substantially circular motion proximate to the target 118 according to crossed
`electric and magnetic fields.”).
`
`‘ 184 Patent at 20:5-7 (“The magnetic field 526 increases the density of
`electrons and therefore, increases the plasma density in the region 527.”).
`
`Mozgrin at Abstract “[t]wo noncontracted discharge regimes in crossed E
`[electric] and H [magnetic] fields were studied.”
`
`plasma.
`
`Mozgrin at Fig. l.
`
`See evidence cited for claim 1.
`
`Mozgrin at 401, right col, 112 (“For pre-ionization,
`the 109 — 1011 cm'3 range.”)
`
`initial plasma density in
`
`Background:
`Thornton at 173, left col, 111. (“When an electric field Ei is applied
`perpendicular to a magnetic field of sufficient strength to affect the electrons
`but not the ions ... an electron Hall current ... will flow in the E x B
`
`direction.” .
`
`The combination of Mozgrin with Mozgrin Thesis discloses the voltage pulse
`comprise[s] a multi-stage voltage pulse.
`
`See evidence cited for claim 1.
`
`‘ 184 Patent at Fig. 4 (252).
`
`‘ 184 Patent at 7:22-23 (“The multi-stage voltage pulse 252 is a single voltage
`pulse having multiple stages as illustrated by the dotted line 253.”).
`
`‘ 184 Patent at 7: 19-21 (“One skilled in the art will appreciate that there are
`numerous variations of the exact shape of the multi-stage pulse according to
`the present invention.”).
`
`between the anode and the cathode assembly that sustains the strongly-ionized
`plasma.
`
`5. The method
`
`of claim 1
`
`wherein the
`
`voltage pulse
`comprise a
`multi-stage
`voltage pulse.
`
`6. The method
`
`of claim 1
`
`further
`
`comprising
`applying a
`
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`between the
`
`anode and the
`
`cathode
`
`assembly that
`sustains the
`
`strongly-
`ionized
`
`. lasma.
`
`7. The method
`
`of claim 1
`
`wherein a
`
`Mozgrin at Fig. 3.
`
`The combination of Mozgrin with Mozgrin Thesis discloses a lifetime of the
`strongly-ionized plasma is greater than 200 usec.
`
`lifetime of the
`
`See evidence cited for claim 1.
`
`
`
`strongly-
`ionized plasma
`is greater than
`200 sec.
`
`8. The method
`
`of claim 1
`
`further
`
`comprising
`discharging
`energy fiom an
`energy storage
`device into the
`
`plasma to
`enhance the
`
`rapid increase
`in electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`. lasma.
`
`9. The method
`
`of claim 1
`
`wherein an
`
`amplitude of
`the voltage
`pulse is
`sufficient to
`
`generate
`ionizational
`
`Mozgrin at Fig. 3.
`
`| 4 “the current ulse duration was 25 ms. . ..” .
`Mozrin at 403, ri ht col,
`The combination of Mozgrin with Mozgrin Thesis discloses discharging
`energy fiom an energy storage device into the plasma to enhance the rapid
`increase in electron density and the formation of the strongly-ionized plasma.
`
`See evidence cited for claim 1.
`
`Mozgrin at 401, left col, 1] 4 (“It was possible to form the high-current quasi-
`stationary regime by applying a square voltage pulse to the discharge gap
`which was filled up with either neutral or pre-ionized gas.”).
`
`Mozgrin at 402, Fig. 2
`
`The combination of Mozgrin with Mozgrin Thesis discloses an amplitude of
`the voltage pulse is sufficient to generate ionizational instabilities that enhance
`the ionization rate so as to cause a rapid increase in electron density and the
`formation of the strongly-ionized plasma.
`
`See evidence cited for claim 1.
`
`Mozgrin at Fig. 3(b).
`
`instabilities
`
`One of ordin
`
`skill would ex n ect that induced motion of the fiee electrons, in
`
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`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`that enhance
`
`the ionization
`rate so as to
`
`cause a rapid
`increase in
`
`electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`plasma.
`
`combination with the action of Mozgrin’s magnetic field, will create, at least
`temporarily, local instabilities within the plasma.
`
`If ionizational instabilities enhance the ionization rate in the ‘ 184 Patent, it will
`occur in Mozgrin as well, because both systems apply pulses under similar
`conditions. Moreover, because instabilities in plasmas were well known by
`those of ordinary skill long before the ‘ 184 Patent was filed, it would have
`been obvious to use such instabilities in Mozgrin.
`
`Background:
`Thornton at 173, right col, 112 (“Such drifts are inherently unstable, since any
`departure from charge neutrality in the form of charge bunching and separation
`(over distances of the order of the Debye length) create electric fields which
`cause second-order E x B drifts that can exacerbate the perturbation. These
`instabilities are often referred to as gradient-drift and neutral-drag
`instabilities.”).
`
`Thornton at 173, right col, 114 (“Plasma oscillations and instabilities are
`believed to la an imortant role in the o eration of ma netrons. . .” .
`
`The combination of Mozgrin with Mozgrin Thesis discloses at least some of
`the ionizational instabilities comprise diocotron instabilities.
`
`10. The
`
`method of
`
`claim 1
`
`wherein at
`
`See evidence cited for claim 1.
`
`
`
`least some of
`
`the ionizational
`
`instabilities
`
`comprise
`diocotron
`
`instabilities.
`
`‘ 184 Patent at 9:20-26 (“A high-power stage 283 includes voltage oscillations
`284 that have peak-to-peak amplitudes that are on the order of about 50V.
`These "saw toot
`" voltage oscillations 284 may be caused by the electron
`density forming a soliton (sic) waveform or having another non-linear
`mechanism, such as diocotron instability discussed above, that increases the
`electron density as indicated by the increasing discharge current 286.”)
`
`‘ 184 Patent at 14:41-44 (“Voltage oscillations 354 in the high-power stage 350
`are sustained for about 100 usec. The voltage oscillations can are (sic) caused
`by the ionizational instabilities in the plasma as described herein, such as
`diocotron oscillations.”)
`
`The claim merely adds a reference to the well-known principle of “diocotron
`instability” to the otherwise obvious independent claim. Therefore, this claim
`is obvious for the same reasons as claim 9.
`
`Background:
`Thornton at 173, right col, 112 (“Drifts driven by the two density gradients
`associated with a maximum in the radial electron density distribution can
`
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`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`.”
`— interact to cause the diocotron instabili
`11. A method
`The combination of Mozgrin with the Mozgrin Thesis discloses a method of
`of generating a
`generating a strongly-ionized plasma.
`strongly-
`ionized
`plasma, the
`method
`
`See evidence cited in claim 1 preamble.
`
`comn,risin:
`
`a) supplying
`feed gas
`proximate to
`an anode and a
`cathode
`
`assembl
`
`; and
`
`The combination of Mozgrin with the Mozgrin Thesis discloses supplying feed
`gas proximate to an anode and a cathode assembly.
`
`See evidence cited in claim 1(a).
`
`
`
`b) generating a The combination of Mozgrin with the Mozgrin Thesis discloses generating a
`voltage pulse
`voltage pulse between the anode and the cathode assembly, the voltage pulse
`between the
`having at least one of a controlled amplitude and a controlled rise time that
`anode and the
`shifts an electron energy distribution in the plasma to higher energies that
`cathode
`increase an ionization rate so as to result in a rapid increase in electron density
`assembly, the
`and a formation of a strongly-ionized plasma without forming an arc between
`voltage pulse
`the anode and the cathode assembly.
`having at least
`one of a
`controlled
`
`See evidence cited in claim l(b).
`
`amplitude and
`a controlled
`rise time that
`shifts an
`
`One of ordinary skill would have readily understood that the electron energy
`distribution shifts to higher energies in Mozgrin, because Mozgrin applies
`voltage pulses in a magnetron sputtering chamber.
`
`electron energy Background:
`distribution in
`Leipold at Abstract (“Application of a high voltage pulse causes a shift in the
`the plasma to
`electron energy distribution function to higher energies. This causes a
`higher energies
`temporary increase of the ionization rate and consequently an increase of the
`that increase an electron density.”)
`ionization rate
`
`so as to result
`in a rapid
`increase in
`
`Gudmundsson at Title (“[e]volution of the electron energy distribution
`pulsed magnetron discharge”).
`
`in a
`
`Gudmundsson at 3427, right col, 1] 2 (“For the measurements presented here,
`the average power was 300 W, pulse width 100 us, and repetition fiequency 50
`Hz. The peak voltage was roughly 800 V. . ..”)
`
`electron
`density and a
`formation of a
`strongly-
`ionized plasma Gudmundsson at 3428, left col, 1] 2 (“Figure l [of Gudmundsson] shows the
`without
`evolution of the electron ener; distribution firnction with time from initiatin
`
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`
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`forming an arc
`between the
`
`anode and the
`
`cathode
`
`EXHIBIT G.03
`
`US. Patent No. 7,808,184
`
`Mozgrin in view of the Mozgrin Thesis
`
`the pulse”).
`
`Gudmundsson at 3429, right col, 1] 1 (“The average electron energy peaks at
`3.5 eV roughly 100 us after initiating the pulse. This peak in the average
`energy coincides with the presence of the high energy group of electrons
`apparent in the electron energy distribution”)
`
`Gudmundsson at Figs. 1 and 2:
`
`[1:
`om
`
`assembly.
`
`004
`
`003
`.0oN
`
`o ‘3
`
`(MB
`
`
`
`Nul‘limlizmlEEDF
`
`m E
`
`g g
`
`7.
`
`2
`
`5
`
`E [eVI
`
`2
`
`5
`
`6
`
`7
`
`E [e\’I
`
`FIG. 1. Normalized EEDF measured (a) during pulses 60. 80. and 100 ,us
`
`after initiating the pulse: (1)) around the electron density maximum 105. 110.
`and 130 us after initiating the pulse; and (c) 250. 350. and 450 us after
`initiating the pulse. Pulse length. 100 us; average power. 300 W; and pres-
`sure 2 mTori‘.
`
`ActiveUS 122249250V.1
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`11
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`TSMC-1120 / Page 11 of 15
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`TSMC-1120 / Page 11 of 15
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`Mozgrin in view of the Mozgrin Thesis
`12, and 14-
`20
`
`100
`
`200
`
`300
`
`400
`
`500
`
`100
`
`200
`
`300
`
`400
`
`500
`
`’2
`
`7?'HCc,._,
`
`O
`2.
`
`45
`
`0
`
`100
`
`200
`
`300
`
`400
`
`500
`
`th5]
`tbl average eleclxm: energy. and ICI
`la! Electron density.
`FIG I
`+ floating potential Tl.
`- plasma potential FF]. and ‘ potential difference
`”'5;
`l'n) as a fmcuon of mu: 50m inmalion of the pulse. Target cuuem
`pulse lenglh. 100 gs. average power. 300 W. and pressure. 2 m’l'on.
`
`
`
`Gudmundsson’s teaching that applying a voltage pulse that raises the density of
`a plasma also “shifts an electron energy distribution in the plasma to higher
`energies” is part of the background knowledge that one of ordinary skill would
`have in mind while readin
`_ '
`.
`
`The combination of Mozgrin with the Mozgrin Thesis discloses applying a
`magnetic field proximate to the cathode assembly.
`
`See evidence cited for claim 11.
`
`See evidence cited in claim 2.
`
`12. The
`method of
`claim 11
`
`further
`
`comprising
`applying a
`magnetic field
`proximate to
`the cathode
`
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`TSMC-1120 / Page 12 of 15
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`TSMC-1120 / Page 12 of 15
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in view of the Mozgrin Thesis
`
`14. The
`method of
`claim 12
`further
`comprising
`generating an
`electron Hall
`
`The combination of Mozgrin with the Mozgrin Thesis discloses comprising
`generating an electron Hall current fiom an electric field generated by the
`voltage pulse and fiom the magnetic field, the electron Hall current raising the
`temperature of the electrons in the weakly-ionized plasma to a temperature that
`enhances the increase in electron density and the formation of the strongly-
`ionized plasma.
`
`current fiom an See evidence cited for claim 11.
`
`electric field
`
`generated by
`the voltage
`pulse and fiom
`the magnetic
`field, the
`electron Hall
`
`current raising
`the
`
`temperature of
`the electrons in
`
`the weakly-
`ionized plasma
`to a
`
`temperature
`that enhances
`
`the increase in
`
`electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`lasma.
`
`15. The
`method of
`claim 11
`
`
`
`See evidence cited in claim 4.
`
`The combination of Mozgrin with the Mozgrin Thesis discloses the voltage
`pulse comprise[s] a multi-stage voltage pulse.
`
`wherein the
`
`See evidence cited for claim 11.
`
`voltage pulse
`comprise a
`multi-stage
`
`See evidence cited in claim 5.
`
`method of
`claim 11
`
`The combination of Mozgrin with the Mozgrin Thesis discloses applying a
`voltage between the anode and the cathode assembly that sustains the strongly-
`ionized lasma.
`
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`TSMC-1120 / Page 13 of 15
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`Mozgrin in View of the Mozgrin Thesis
`
`further
`
`comprising
`applying a
`voltage
`between the
`
`anode and the
`
`cathode
`
`assembly that
`sustains the
`
`strongly-
`ionized
`
`lasma.
`
`17. The
`method of
`claim 11
`
`wherein a
`
`lifetime of the
`
`strongly-
`ionized plasma
`is greater than
`200 sec.
`
`18. The
`method of
`claim 11
`further
`
`See evidence cited for claim 11.
`
`See evidence cited in claim 6.
`
`The combination of Mozgrin with the Mozgrin Thesis discloses a lifetime of
`the strongly-ionized plasma is greater than 200 usec.
`
`See evidence cited in claim 7.
`
`The combination of Mozgrin with the Mozgrin Thesis discloses discharging
`energy from an energy storage device into the plasma to enhance the rapid
`increase in electron density and the formation of the strongly-ionized plasma.
`
`
`
`See evidence cited for claim 11.
`
`comprising
`discharging
`energy fiom an See evidence cited in claim 8.
`energy storage
`device into the
`
`plasma to
`enhance the
`
`rapid increase
`in electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`lasma.
`
`19. The
`method of
`claim 11
`wherein an
`
`The combination of Mozgrin with the Mozgrin Thesis discloses an amplitude
`of the voltage pulse is sufficient to generate ionizational instabilities that
`enhance the ionization rate resulting in a rapid increase in electron density and
`the formation of the stron l -ionized lasma.
`
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`TSMC-1120 / Page 14 of 15
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`
`
`EXHIBIT G.03
`
`U.S. Patent No. 7,808,184
`
`Mozgrin in View of the Mozgrin Thesis
`
`See evidence cited for claim 11.
`
`See evidence cited in claim 9.
`
`The combination of Mozgrin with the Mozgrin Thesis discloses the
`ionizational instabilities comprise at least some diocotron instabilities.
`
`Claims 1-2, 4-
`
`12, and 14-
`20
`
`amplitude of
`the voltage
`pulse is
`sufficient to
`
`generate
`ionizational
`
`instabilities
`
`that enhance
`
`the ionization
`
`rate resulting
`in a rapid
`increase in
`
`electron
`
`density and the
`formation of
`
`the strongly-
`ionized
`
`. lasma.
`
`20. The
`method of
`claim 11
`
`
`
`wherein the
`
`See evidence cited for claim 11.
`
`ionizational
`
`instabilities
`
`See evidence cited for claim 10.
`
`comprise at
`least some
`
`diocotron
`
`instabilities.
`
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