`571-272-7822
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` Paper 9
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`Entered: November 17, 2014
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`UNITED STATES PATENT AND TRADEMARK OFFICE
`____________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`____________
`
`
`
`
`TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
`and TSMC NORTH AMERICA CORPORATION,
`Petitioners,
`
`v.
`
`ZOND, LLC,
`Patent Owner.
`____________
`
`Case IPR2014-00828
`Patent 6,805,779 B2
`____________
`
`
`
`
`
`Before KEVIN F. TURNER, DEBRA K. STEPHENS, JONI Y. CHANG,
`SUSAN L. C. MITCHELL, and JENNIFER M. MEYER,
`Administrative Patent Judges.
`
`
`CHANG, Administrative Patent Judge.
`
`
`
`DECISION
`Institution of Inter Partes Review
`37 C.F.R. § 42.108
`
`
`
`
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`IPR2014-00828
`Patent 6,805,779 B2
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`I. INTRODUCTION
`
`Taiwan Semiconductor Manufacturing Company, Ltd. and TSMC
`
`North America Corporation (collectively, “TSMC”) filed a Petition
`
`requesting inter partes review of claims 30–37, 39, and 40 of U.S. Patent
`
`No. 6,805,779 B2 (“the ’779 patent”).1 Paper 2 (“Pet.”). Zond, LLC
`
`(“Zond”) filed a Preliminary Response. Paper 8 (“Prelim. Resp.”). We have
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`jurisdiction under 35 U.S.C. § 314.
`
`The standard for instituting an inter partes review is set forth in
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`35 U.S.C. § 314(a), which provides:
`
`THRESHOLD.—The Director may not authorize an inter
`partes review to be instituted unless the Director determines
`that the information presented in the petition filed under section
`311 and any response filed under section 313 shows that there
`is a reasonable likelihood that the petitioner would prevail with
`respect to at least 1 of the claims challenged in the petition.
`
`Upon consideration of TSMC’s Petition and Zond’s Preliminary
`
`Response, we conclude that the information presented in the Petition
`
`demonstrates that there is a reasonable likelihood that TSMC would prevail
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`in challenging claims 30–37, 39, and 40 as unpatentable under 35 U.S.C.
`
`§ 103(a). Pursuant to 35 U.S.C. § 314, we hereby authorize an inter partes
`
`review to be instituted as to claims 30–37, 39, and 40 of the ’779 patent.
`
`
`
`1 In its statement of relief and conclusion, TSMC indicates that it also is
`challenging claim 38. See, e.g., Pet. 2, 60. TSMC, however, fails to present
`any specific ground of unpatentability or analysis as to claim 38. Pet. 20–
`59. As such, we presume that TSMC does not intend to challenge claim 38
`in the instant proceeding. We note that claim 38 is being challenged in
`Taiwan Semiconductor Mfg. v. Zond, Case IPR2014-00917 (Paper 2).
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`2
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`IPR2014-00828
`Patent 6,805,779 B2
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`A. Related Matters
`
`
`
`TSMC indicates that the ’779 patent was asserted in several related
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`district court proceedings, including Zond, LLC v. Fujitsu Corp., No. 1:13-
`
`cv-11634-WGY (D. Mass.). Pet. 1. TSMC also identifies other Petitions for
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`inter partes review that are related to the instant proceeding. Id.
`
`
`
`B. The ’779 patent
`
`The ’779 patent relates to a method and a system for generating a
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`plasma with a multi-step ionization process. Ex. 1201, Abs. For instance,
`
`Figure 2 of the ’779 patent, reproduced below, illustrates a cross-sectional
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`view of a plasma generating apparatus:
`
`In the embodiment shown in Figure 2, feed gas source 206 supplies
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`ground state atoms 208 (e.g., ground state argon atoms) to metastable atom
`
`source 204 that generates excited or metastable atoms 218 from ground state
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`atoms 208. Id. at 4:26–42. Plasma 202 is generated from the excited or
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`metastable atoms 218 in process chamber 230. Id. at 5:25–34.
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`Electrons and ions are formed in metastable atom source 204 along
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`with excited or metastable atoms 218. Id. at 8:20–23. In another
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`embodiment, the ions and electrons are separated from excited or metastable
`
`atoms 218 and trapped in electron/ion absorber before excited or metastable
`
`atoms 218 are injected into plasma chamber 230. Id. at 8:23–26, 18:62–67,
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`Fig. 10. Figure 12B of the ’779 patent illustrates an electron/ion absorber
`
`and is reproduced below:
`
`As shown in Figure 12B, electron/ion absorber 750’ includes magnets
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`776 and 778 that generate magnetic field 780, trapping electrons 772 and
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`ions 774 in chamber 760’. Id. at 20:9–13. Excited or metastable atoms 768
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`and ground state atoms 770 then flow through output 754’. Id. at 20:19–21.
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`
`
`
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`C. Illustrative Claims
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`Of the challenged claims, claims 30 and 40 are the only independent
`
`claims. Claims 31–37 and 39 depend directly from claim 30.
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`Claims 30 and 40 are illustrative:
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`30. A method for generating a plasma with a multi-step
`ionization process, the method comprising:
`
`generating a magnetic field proximate to a volume of
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`IPR2014-00828
`Patent 6,805,779 B2
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`ground state atoms to substantially trap electrons proximate to
`the volume of ground state atoms;
`
`generating a volume of metastable atoms from the
`volume of ground state atoms; and
`
`raising an energy of the metastable atoms so that at least
`a portion of the volume of metastable atoms is ionized, thereby
`generating a plasma with a multi-step ionization process.
`
`Ex. 1201, 23:24–34 (emphases added).
`
`40. A method for generating a plasma with a multi-step
`ionization process, the method comprising:
`
`generating a magnetic field proximate to a volume of
`ground state molecules to substantially trap electrons
`proximate to the volume of ground state molecules;
`
`generating a volume of metastable molecules from the
`volume of ground state molecules; and
`
`raising an energy of the metastable molecules so that at
`least a portion of the volume of metastable molecules is
`thereby generating a plasma with a multistep
`ionized,
`ionization process.
`
`Id. at 23:66–24:9 (emphases added).
`
`
`
`D. Prior Art Relied Upon
`
`TSMC relies upon the following prior art references:
`
`
`Pinsley
`Angelbeck
`Iwamura
`
`
`Wells
`Lovelock
`
`
`US 3,761,836
`US 3,514,714
`US 5,753,886
`
`Sept. 25, 1973
`May 26, 1970
`May 19, 1998
`
`(Ex. 1205)
`(Ex. 1206)
`(Ex. 1207)
`
`PCT WO 83/01349
`EP 0 242 028 A2
`
`
`Apr. 14, 1983
`Oct. 21, 1987
`
`(Ex. 1214)
`(Ex. 1215)
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`D.V. Mozgrin, et al., High-Current Low-Pressure Quasi-Stationary
`Discharge in a Magnetic Field: Experimental Research, 21 PLASMA
`PHYSICS REPORTS, NO. 5, 400–409 (1995) (Ex. 1203, “Mozgrin”).
`
`
`A. A. Kudryavtsev and V.N. Skrebov, Ionization Relaxation in a
`Plasma Produced by a Pulsed Inert-Gas Discharge, 28(1) SOV. PHYS.
`TECH. PHYS. 30–35 (1983) (Ex. 1204, “Kudryavtsev”).
`
`
`E. Asserted Grounds of Unpatentability
`
`TSMC asserts the following grounds of unpatentability:
`
`Claims
`
`Basis
`
`References
`
`30–33, 35, 37, and 40
`
`§ 103(a) Mozgrin, Kudryavtsev, and Pinsley
`
`34 and 39
`
`§ 103(a)
`
`36
`
`§ 103(a)
`
`Mozgrin, Kudryavtsev, Pinsley, and
`Wells
`
`Mozgrin, Kudryavtsev, Pinsley, and
`Lovelock
`
`30–33, 35, 37, and 40
`
`§ 103(a)
`
`Iwamura, Angelbeck, and Pinsley2
`
`34 and 39
`
`§ 103(a)
`
`36
`
`
`
`§ 103(a)
`
`
`
`Iwamura, Angelbeck, Pinsley, and
`Wells
`
`Iwamura, Angelbeck, Pinsley, and
`Lovelock
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`2 Pinsley is omitted inadvertently from each statement of the asserted
`grounds of unpatentability based on Iwamura, although included in the
`corresponding analysis. See Pet. 41, 47, 56, 58. Therefore, we treat each of
`the statements as mere harmless error and presume that TSMC intended to
`assert that the challenged claims are unpatentable under § 103(a) based, in
`whole, or in part, on the combination of Iwamura, Angelbeck, and Pinsley.
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`II. ANALYSIS
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`A. Claim Construction
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`In an inter partes review, claim terms in an unexpired patent are given
`
`their broadest reasonable construction in light of the specification of the
`
`patent in which they appear. 37 C.F.R. § 42.100(b). Claim terms are given
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`their ordinary and customary meaning as would be understood by one of
`
`ordinary skill in the art in the context of the entire disclosure. In re
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`Translogic Tech., Inc., 504 F.3d 1249, 1257 (Fed. Cir. 2007). An inventor
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`may rebut that presumption by providing a definition of the term in the
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`specification with reasonable clarity, deliberateness, and precision. In re
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`Paulsen, 30 F.3d 1475, 1480 (Fed. Cir. 1994). In the absence of such a
`
`definition, limitations are not to be read from the specification into the
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`claims. In re Van Geuns, 988 F.2d 1181, 1184 (Fed. Cir. 1993).
`
`We construe the claim terms below in accordance with the above-
`
`stated principles.
`
`
`
`1. “metastable atoms”
`
`Claim 30 recites “generating a volume of metastable atoms from the
`
`volume of ground state atoms.” TSMC submits that the claim term
`
`“metastable atoms” is defined in the Specification of the ’779 patent as
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`“excited atoms having energy levels from which dipole radiation is
`
`theoretically forbidden.” Pet. 5 (emphasis added) (citing Ex. 1201, 7:22–
`
`25). In that regard, Dr. Uwe Kortshagen further explains that “[i]f all of an
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`atom’s electrons are at their lowest possible energy state, the atom is said to
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`be in the ‘ground state,’” and that “if one or more of an atom’s electrons is
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`in a state that is higher than its lowest possible state, then the atom is said to
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`be an ‘excited atom.’” Ex. 1202 ¶¶ 24–25 (emphases added).
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`Dr. Kortshagen testifies that a “metastable atom is a type of excited atom
`
`that is relatively long-lived, because it cannot transition into the ground state
`
`through dipole radiation, i.e., through the emission of electromagnetic
`
`radiation.” Id. ¶ 25 (citing Ex. 1201, 7:22–25). According to
`
`Dr. Kortshagen, generating excited argon atoms means also generating
`
`metastable atoms because, when generating excited argon atoms, multiple
`
`levels of excited states are formed, and some of the lowest states are
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`metastable. Id. ¶ 26 (citing Exs. 1211–1212).3 The Specification also
`
`provides that all noble gases, including argon, have metastable states.
`
`Ex. 1201, 7:37–39.
`
`Given the evidence before us, we construe the claim term “metastable
`
`atoms,” consistent with the Specification, as “excited atoms having energy
`
`levels from which dipole radiation is theoretically forbidden,” and observe
`
`that exciting noble gas atoms would generate metastable atoms.
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`
`
`
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`3 J. Vlček, A Collisional-Radiative Model Applicable to Argon Discharges
`Over a Wide Range of Conditions. I: Formulation and Basic Data, 22 J.
`PHYS. D: APPL. PHYS. 623–631 (1989) (Ex. 1211).
`
`J. Vlček, A Collisional-Radiative Model Applicable to Argon Discharges
`Over a Wide Range of Conditions. II: Application to Low-Pressure, Hollow-
`Cathode Arc and Low-Pressure Glow Discharges, 22 J. PHYS. D: APPL.
`PHYS. 632–643 (1989) (Ex. 1212).
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`2. “multi-step ionization process”
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`
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`Claim 30 recites “raising an energy of the metastable atoms so that at
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`least a portion of the volume of metastable atoms is ionized, thereby
`
`generating a plasma with a multi-step ionization process.”
`
`TSMC asserts that the claim term “multi-step ionization process” is
`
`defined in the Specification of the ’779 patent as “an ionization process
`
`whereby ions are ionized in at least two distinct steps.” Pet. 19–20 (citing
`
`Ex. 1201, 6:60–63, Figs. 2, 3) (emphasis added by TSMC). Indeed, the
`
`Specification expressly provides:
`
`The term “multi-step ionization process” is defined herein to
`mean an ionization process whereby ions are ionized in at least
`two distinct steps. However, the term “multi-step ionization
`process” as defined herein may or may not include exciting
`ground state atoms to a metastable state. For example, one
`multi-step ionization process according to the present invention
`includes a first step where atoms are excited from a ground
`state to a metastable state and a second step where atoms in the
`metastable state are ionized. Another multi-step ionization
`process according to the present invention includes a first step
`where atoms are excited from a ground state to an excited state
`and a second step where atoms in the excited state are ionized.
`The
`term “multi-step
`ionization process” also
`includes
`ionization processes with three or more steps.
`
`Ex. 1201, 6:60–7:9 (emphases added).
`
`We observe that the Specification sets forth a definition for the claim
`
`term “multi-step ionization” with reasonable clarity, deliberateness, and
`
`precision. See Paulsen, 30 F.3d at 1480. Further, that definition is
`
`consistent with the ordinary and customary meaning of the term, as would be
`
`understood by one with ordinary skill in the art. As such, in the context of
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`the Specification, we construe the claim term “multi-step ionization” as “an
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`ionization process having at least two distinct steps.”
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`
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`B. Principles of Law
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`A patent claim is unpatentable under 35 U.S.C. § 103(a) if the
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`differences between the claimed subject matter and the prior art are such that
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`the subject matter, as a whole, would have been obvious at the time the
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`invention was made to a person having ordinary skill in the art to which said
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`subject matter pertains. KSR Int’l Co. v. Teleflex Inc., 550 U.S. 398, 406
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`(2007). The question of obviousness is resolved on the basis of underlying
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`factual determinations including: (1) the scope and content of the prior art;
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`(2) any differences between the claimed subject matter and the prior art;
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`(3) the level of ordinary skill in the art; and (4) objective evidence of
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`nonobviousness. Graham v. John Deere Co., 383 U.S. 1, 17–18 (1966).
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`The level of ordinary skill in the art is reflected by the prior art of record.
`
`See Okajima v. Bourdeau, 261 F.3d 1350, 1355 (Fed. Cir. 2001);
`
`In re GPAC Inc., 57 F.3d 1573, 1579 (Fed. Cir. 1995); In re Oelrich,
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`579 F.2d 86, 91 (CCPA 1978).
`
`We analyze the asserted grounds of unpatentability in accordance with
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`the above-stated principles.
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`
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`C. Claims 30–37, 39, and 40—Obviousness over Iwamura in
`Combination of Other Cited References
`
`TSMC asserts that claims 30–33, 35, 37, and 40 are unpatentable
`
`under 35 U.S.C. § 103(a) as obvious over the combination of Iwamura,
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`Angelbeck, and Pinsley. Pet. 41–57. TSMC also asserts that dependent
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`claims 34 and 39 are unpatentable over the combination of Iwamura,
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`Angelbeck, Pinsley, and Wells (id. at 57–58), and claim 36 is unpatentable
`
`over the combination of Iwamura, Angelbeck, Pinsley, and Lovelock (id.
`
`at 58–60). In support of those asserted grounds of unpatentability, TSMC
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`provides detailed explanations as to how each claim limitation is met by the
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`combination of the references and rationales for combining the references.
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`Id. at 41–60. TSMC also proffers the Declaration of Dr. Kortshagen
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`(Ex. 1202) to support its contentions. Id.
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`In its Preliminary Response, Zond responds that the combinations of
`
`cited prior art references do not disclose every claim limitation. Prelim.
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`Resp. 39–52. Zond also argues that TSMC has not articulated a sufficient
`
`rationale to combine the references. Id. at 35–37.
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`We have reviewed the parties’ contentions and supporting evidence.
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`Given the evidence on this record, we determine that TSMC has
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`demonstrated a reasonable likelihood of prevailing on its assertion that
`
`claims 30–37, 39, and 40 are unpatentable over Iwamura in combination
`
`with the other cited references. Our discussion focuses on the deficiencies
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`alleged by Zond as to the claims.
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`Iwamura
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`
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`Iwamura discloses a plasma treatment apparatus for generating a
`
`stable plasma with a multi-step ionization process, to treat a semiconductor
`
`wafer. Ex. 1207, Abs., 6:67–7:8. Figure 1 of Iwamura, reproduced below
`
`(with our annotations added), illustrates a plasma treatment apparatus.
`
`Pre-excitation unit
`
`First plasma generation unit
`
`Second plasma generation unit
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`
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`
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`As shown in Figure 1 of Iwamura, plasma treatment chamber 10 is
`
`coupled to a gas supply pipe (shown as items 20a and 20b). Gas supply 20
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`supplies a gas capable of plasma discharge (e.g., argon) through a pre-
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`excitation unit that includes ultraviolet lamp 24, and a first plasma
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`generation unit that includes electrodes 26. Ex. 1207, 6:67–7:17, 49.
`
`Ultraviolet lamp 24 causes photoionization, raising the excitation level of the
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`gas—in other words, generating excited atoms from ground state atoms. Id.
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`at 7:55–60. At this pre-excitation stage, no plasma is generated from the
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`gas. Id. at 7:59–60. Thereafter, a plasma is generated from the gas, with a
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`raised excitation level, in plasma region A, between electrodes 26 (the first
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`plasma generation unit), and a plasma also is generated in plasma region B,
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`between electrodes 30 (the second plasma generation unit). Id. at 7:61–65,
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`8:4–9, 8:32–46. According to Iwamura, because the excitation level of the
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`gas is raised first, a stable plasma can be generated. Id. at 8:32–37.
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`Consequently, the uniformity of the plasma density as well as the yield of
`
`the treatment of semiconductor wafer can be improved. Id. at 8:41–46.
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`
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`Generating metastable atoms
`
`Claim 30 recites “generating a volume of metastable atoms from the
`
`volume of ground state atoms.” Claim 40 recites a similar limitation. In its
`
`Petition, TSMC takes the position that Iwamura’s disclosure regarding pre-
`
`excitation unit and first plasma generation unit (including electrodes 26)
`
`teaches or suggests generating metastable atoms from ground state argon
`
`atoms. Pet. 49–50 (citing Ex. 1202 ¶¶ 123–127). At this stage of the
`
`proceeding, Zond does not challenge that assertion. See Prelim. Resp. 39–
`
`52.
`
`Given the evidence before us, we agree with TSMC. As discussed
`
`previously, we adopted the definition set forth in the Specification of the
`
`’779 patent as the broadest reasonable interpretation for the claim term
`
`“metastable atoms”—namely, “excited atoms having energy levels from
`
`which dipole radiation is theoretically forbidden.” Ex. 1201, 7:22–24
`
`(emphasis added). The Specification also provides that all noble gases,
`
`including argon, have metastable states. Ex. 1201, 7:37.
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`As noted by TSMC, Iwamura’s gas supply 20 introduces a gas, such
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`as helium or argon, into the pre-excitation unit and the first plasma
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`generation unit. Pet. 49–50 (citing Ex. 1207, 7:48–50). Iwamura discloses
`
`that the pre-excitation unit raises the excitation level of the ground state
`
`atoms to generate excited atoms, using either an ultraviolet lamp or a
`
`magnetron, which radiates microwaves along the direction of the gas flow.
`
`Ex. 1207, 7:55–60, 9:38–53. Iwamura also discloses that the first plasma
`
`unit pre-activates the gas by exciting the gas to a high excitation level. Id. at
`
`2:31–41, 2:56–58.
`
`Dr. Kortshagen explains a “metastable atom is a type of excited atom
`
`that is relatively long-lived, because it cannot transition into the ground state
`
`through dipole radiation, i.e., through the emission of electromagnetic
`
`radiation.” Ex. 1202 ¶ 25 (emphasis added) (citing Ex. 1201, 7:22–25).
`
`Indeed, the Specification notes that “[m]etastable atoms have relatively long
`
`lifetimes compared with other excited atoms,” and “in practice, there is a
`
`finite probability that the metastable atoms relax to the ground state and emit
`
`dipole radiation.” Ex. 1201, 7:24–32.
`
`According to Dr. Kortshagen, generating excited argon atoms means
`
`also generating metastable atoms because, when generating excited argon
`
`atoms, multiple levels of excited states are formed, and some of the lowest
`
`states of excited argon atoms are metastable. Ex. 1202 ¶ 26 (citing
`
`Exs. 1211–1212). Dr. Kortshagen testifies that it has been shown that the
`
`four lowest excited states of excited argon atoms have at least 100 times
`
`higher density than the next higher excited states. Id. On this record, we are
`
`persuaded that one of ordinary skill in the art at the time of the invention
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`would have recognized that exciting ground state argon atoms would
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`generate excited argon atoms, including metastable atoms—excited argon
`
`atoms having two of the four lowest excited levels (levels with n=2 and n=4)
`
`from which dipole radiation is theoretically forbidden.
`
`On this record, we determine that TSMC has established adequately
`
`that Iwamura teaches or suggests “generating a volume of metastable atoms
`
`from the volume of ground state atoms.”
`
`
`
`Ionizing metastable atoms and generating a plasma with a multi-step
`ionization process
`
`Claim 30 recites “raising an energy of the metastable atoms so that at
`
`least a portion of the volume of metastable atoms is ionized, thereby
`
`generating a plasma with a multi-step ionization process.” Claim 40 recites
`
`a similar limitation.
`
`In its Petition, TSMC maintains that Iwamura’s second plasma
`
`generation unit that includes electrodes coupled to a high-frequency power
`
`supply provides energy to the metastable atoms and generates a plasma
`
`within the chamber. Pet. 50–51 (citing Ex. 1207, 7:44–46, 8:4–7, 9:8–12,
`
`9:24–29). According to TSMC, the power supply and electrodes raise the
`
`energy of excited atoms and ionizes them. Id. (citing Ex. 1202 ¶ 129).
`
`Zond counters that the combination of Iwamura and Angelbeck does
`
`not describe the “ionization” and “multi-step ionization process” claim
`
`features. Prelim. Resp. 39–42. Specifically, Zond alleges that those claim
`
`features require more than pre-exciting the gas and activating the gas, and
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`“Iwamura makes no mention of ionization.” Id. at 40, 42.
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`However, obviousness is not an ipsissimis verbis test. Rather, a prima
`
`facie case of obviousness is established when the prior art, itself, would
`
`appear to have suggested the claimed subject matter to a person of ordinary
`
`skill in the art. In re Rinehart, 531 F.2d 1048, 1051 (CCPA 1976). In that
`
`regard, an obviousness analysis “need not seek out precise teachings directed
`
`to the specific subject matter of the challenged claim, for a court can take
`
`account of the inferences and creative steps that a person of ordinary skill in
`
`the art would employ.” KSR, 550 U.S. at 418. “A person of ordinary skill is
`
`also a person of ordinary creativity, not an automaton.” Id. at 421.
`
`The Specification of the ’779 patent indicates that “plasma is a
`
`collection of charged particles that move in random directions.” Ex. 1201,
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`1:7–9 (emphases added). As discussed above, the Specification of the ’779
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`patent defines the claim term “multi-step ionization process” as “an
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`ionization process whereby ions are ionized in at least two distinct steps.”
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`Id. at 6:60–7:9 (emphases added). The Specification also provides that a
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`multi-step ionization process includes: (1) a first step where atoms are
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`excited from a ground state to an excited state; and (2) a second step where
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`atoms in the excited state are ionized, generating ions from the excited
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`atoms. Id. The term “ionization” ordinarily is understood as a “process by
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`which an atom or molecule receives enough energy (by collision with
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`electrons, photons, etc.) to split it into one or more free electrons and a
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`positive ion” (emphasis added).4
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`4 See THE AUTHORITATIVE DICTIONARY OF IEEE STANDARDS TERMS 589
`(7th ed.) (2000) (Ex. 3001) (defining “ionization” as “(B) The process by
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`As TSMC indicates in its Petition, Iwamura, in fact, discloses a
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`plasma treatment apparatus that generates a plasma with a multi-step
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`ionization process. Pet. 41–49 (citing Ex. 1202 ¶¶ 110–121). For the first
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`step, Iwamura’s pre-excitation unit raises the excitation level of the argon
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`gas—i.e., generating metastable atoms from ground state argon atoms—
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`using microwaves or ultraviolet radiation that causes photoionization.
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`Ex. 1207, 7:55–60, 9:46–48, Figs. 1, 2. For the second step, Iwamura’s
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`plasma treatment apparatus includes a pair of electrodes coupled to a high-
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`frequency power supply that generates a plasma, which includes a collection
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`of ions and free electrons. Id. at 7:61–63, 8:32–46, Figs. 1, 2. Therefore,
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`we are persuaded that one of ordinary skill in the art would have recognized
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`that the electrodes and power supply generate the ions and free electrons by
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`ionizing the metastable atoms.
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`Given the evidence on this record, we determine that TSMC has
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`demonstrated sufficiently that the combination of Iwamura, Angelbeck,
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`Pinsley teaches or suggests the “ionization” and “multi-step ionization
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`process” claim features—“raising an energy of the metastable atoms so that
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`at least a portion of the volume of metastable atoms is ionized, thereby
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`generating a plasma with a multi-step ionization process.”
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`
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`which an atom or molecule receives enough energy (by collision with
`electrons, photons, etc.) to split it into one or more free electrons and a
`positive ion. Ionization is a special case of charging.”).
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`Generating a magnetic field for trapping electrons
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`Claim 30 recites “generating a magnetic field proximate to a volume
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`of ground state atoms to substantially trap electrons proximate to the volume
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`of ground state atoms.” Claim 40 recites a similar limitation.
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`In its Petition, TSMC relies upon the combination of Angelbeck’s
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`transverse magnetic field with Iwamura’s disclosure, regarding the
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`pre-excitation unit and first plasma generation unit, to disclose or suggest the
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`“magnetic field” claim limitations. Pet. 47–49. TSMC maintains that it was
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`well known in the art at the time of the invention to use a magnet for
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`generating a magnetic field in a plasma apparatus for trapping electrons, as
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`evidenced by Angelbeck and Pinsley. Id. at 47–48 (citing Ex. 1206, 1:36–
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`41, 2:18–20, 2:50–51, 2:66–67, Fig. 1; Ex. 1205, 2:43–60). Dr. Kortshagen
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`testifies that it would have been obvious to one of ordinary skill in the art to
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`combine Angelbeck’s transverse magnetic field with Iwamura’s
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`pre-excitation unit and first plasma generation unit—which are located
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`proximate to the ground state atoms source, gas supply 20—for trapping
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`electrons, to increase the efficiency of excitation. Ex. 1202 ¶ 120.
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`In its Preliminary Response, Zond counters that the combination of
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`the cited prior art references does not teach or suggest the “magnetic field”
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`claim limitations. Prelim. Resp. 40–41. In particular, Zond argues that
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`Iwamura does not have a magnet, and Angelbeck does not trap electrons
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`near the ground state atoms. Id.
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`Zond’s arguments, however, do not address what is taught or
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`suggested by the combination of cited prior art references. Nonobviousness
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`cannot be established by attacking references individually where, as here,
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`the ground of unpatentability is based upon the teachings of a combination
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`of references. In re Keller, 642 F.2d 413, 426 (CCPA 1981). Rather, the
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`test for obviousness is whether the combination of references, taken as a
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`whole, would have suggested the patentees’ invention to a person having
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`ordinary skill in the art. In re Merck & Co., Inc., 800 F.2d 1091, 1097
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`(Fed. Cir. 1986). As discussed above, TSMC relies upon the combination of
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`Iwamura, Angelbeck, and Pinsley to disclose or suggest the “magnetic field”
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`claim limitations. Pet. 47–49. As such, we are not persuaded by Zond’s
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`arguments.
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`In addition, Zond does not dispute that it was well known in the art at
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`the time of the invention to use a magnet in a plasma apparatus for trapping
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`electrons. Indeed, the admitted prior art, Figure 1 of the ’779 patent,
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`describes magnet 130 that generates magnetic field 132 to trap electrons.
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`Ex. 1201, 3:13–15. As TSMC points out, Pinsley and Angelbeck confirm
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`that one of ordinary skill in the art would have recognized that applying a
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`transverse magnetic field in a plasma apparatus would trap electrons.
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`Pet. 47–49 (citing Ex. 1205, 2:43–60; Ex. 1206, 1:36–41, 2:18–20, 2:50–51,
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`2:66–67, Fig. 1).
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`Notably, Pinsley discloses a plasma generating apparatus having a
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`magnetic field for trapping electrons. Ex. 1205, 1:51–54, 2:43–47.
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`Pinsley’s sole Figure, reproduced below, illustrates a plasma generating
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`apparatus with magnets.
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`As shown in Pinsley’s sole Figure, conduit 10 includes anode 18 and
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`cathode 19, for establishing an electric discharge plasma, as well as magnets
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`24 and 26, for generating a magnetic field. Id. at 2:27–42. According to
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`Pinsley, “the interaction between the current and the magnetic field will
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`result in an upstream force as indicated by the force vector 32.” Id. at 2:43–
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`45. “This force is exerted upon the electrons, and tends to maintain the
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`electrons in an area between the anode and cathode,” trapping the electrons.
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`Id. at 2:45–47 (emphasis added).
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`More importantly, Angelbeck discloses applying a transverse
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`magnetic field in a plasma generating apparatus for creating a high density
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`of excited atoms. Ex. 1206, 1:36–41, 2:18–20, 2:29–33. Figure 1 of
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`Angelbeck, reproduced below, illustrates a plasma generating apparatus with
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`a magnet.
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`20
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`As shown in Figure 1 of Angelbeck, the current-excited discharge
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`passed through the gas within tube 10 creates a plasma in which the atoms
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`are ionized and electrons are freed. Id. at 2:55–57. Transverse magnetic
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`field B is applied by a magnet with pole pieces 24 and 26 for trapping
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`electrons to the tube walls. Id. at 2:45–54, 2:57–59. According to
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`Angelbeck, such a transverse magnetic field creates a high density of excited
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`atoms and increases the efficiency of excitation. Id. at 1:36–41 (“It has been
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`found that a transverse magnetic field applied to a DC discharge gas laser
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`increases the electron temperature and hence the efficiency of excitation
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`. . . .”), 2:18–20 (“A high gas pressure P is advantageous . . . for creating a
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`high density of excited atoms in the laser.”), 2:29–33 (“This invention . . .
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`produces the same temperature at a higher pressure by applying a transverse
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`magnetic field.”).
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`On the present record, we agree with Dr. Kortshagen’s testimony
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`(Ex. 1202 ¶ 120) that it would have been obvious to one of ordinary skill in
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`the art to combine Angelbeck’s transverse magnetic field with Iwamura’s
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`pre-excitation unit and first plasma generation unit—which are located
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`proximate to the ground state atoms source, gas supply 20—for trapping
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`21
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`electrons, to increase the efficiency of excitation, as Dr. Kortshagen’s
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`testimony is consistent with the prior art references cited by TSMC. Given
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`the evidence before us, we conclude that TSMC has demonstrated
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`sufficiently that the combination of Iwamura, Angelbeck, and Pinsley would
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`have rendered the “magnetic field” limitations obvious.
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`
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`Reasons to combine the prior art references
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`
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`Zond further contends that one of ordinary skill in the art would have
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`been dissuaded from using the gas laser of Angelbeck or Pinsley to achieve
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`the claimed plasma generation apparatus of the ’779 patent. Prelim. Resp.
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`29–30, 35–36. In particular, Zond alleges that the excited atoms in
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`Angelbeck’s laser must return to their ground state to release energy so that
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`the laser will operate according to its intended purpose—namely, to emit
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`light. Id. at 35–36, 41. Zond further argues TSMC fails “to provide
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`experimental data or other objective evidence indicating that the structure
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`and process of Iwamura would produce the particular plasma generator of
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`the ’779 patent.” Id. at 36.
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`Given the evidence on this record, we are not persuaded by Zond’s
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`arguments. “It is well-established that a determination of obviousness based
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`on teachings from multiple references does not require an actual, physical
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`subs