`
`____________________________________________
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`____________________________________________
`
`FUJITSU SEMICONDUCTOR LIMITED,
`FUJITSU SEMICONDUCTOR AMERICA, INC.,
`ADVANCED MICRO DEVICES, INC., RENESAS ELECTRONICS
`CORPORATION, RENESAS ELECTRONICS AMERICA INC.,
`GLOBALFOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN
`MODULE ONE LLC & CO. KG, GLOBALFOUNDRIES DRESDEN
`MODULE TWO LLC & CO. KG, TOSHIBA AMERICA ELECTRONIC
`COMPONENTS, INC., TOSHIBA AMERICA INC., TOSHIBA
`AMERICA INFORMATION SYSTEMS, INC.,
`TOSHIBA CORPORATION, and
`THE GILLETTE COMPANY,
`Petitioners,
`
`
`
`v.
`
`Zond, LLC.
`U.S. Patent No. 6,853,142
`IPR Case No. IPR2014-008211
`
`
`
`PETITIONER’S DEMONSTRATIVE EXHIBITS FOR ORAL ARGUMENT
`
`
`
`1 Case Nos. IPR2014-00863, IPR2014-01013, and IPR2014-01057 have been
`joined with this proceeding.
`
`
`
`UNITED STATES PATENT AND TRADEMARK OFFICE
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`The ’142 Patent:
`
`GlobalFoundries U.S. Inc., GlobalFoundries Dresden Module One LLC & Co. KG,
`GlobalFoundries Dresden Module Two LLC & Co. KG, The Gillette Company, Fujitsu
`Semiconductor Limited, Fujitsu Semiconductor America, Inc., Advanced Micro Devices, Inc., Renesas
`Electronics Corporation, Renesas Electronics America, Inc., Toshiba America Electronic Components,
`Inc., Toshiba America Inc., Toshiba America Information Systems, Inc., and Toshiba Corporation
`v.
`Zond LLC
`
`IPR2014-00818, IPR2014-00819, IPR2014-00821, and IPR2014-00827
`
`GlobalFoundries U.S. Inc., GlobalFoundries Dresden Module One LLC & Co. KG,
`GlobalFoundries Dresden Module Two LLC & Co. KG, and The Gillette Company
`v.
`Zond LLC
`
`IPR2014-01098
`
`June 12, 2015
`
`1
`
`
`
`Overview
`
`• Overview of the ’142 Patent
`
`• Grounds Instituted
`
`• Overview of Prior Art
`
`• Summary of Disputes and Responses Related to
`Independent Claims
`
`• Summary of Disputes and Responses Related to
`Dependent Claims
`
`2
`
`
`
`The ’142 Patent
`The ’142 Patent
`
`US 6,853,142 I32
`[10: Patent No.1
`112) United States Patent
`
`(45) Dale of Patent: Feb. 8.2005
`Chistyakov
`
`[15006553142112
`
`(75)
`
`(54] METHODS ANDAI’PARATUS FOR
`GENERATING IIIGHrDENSl'I'Y PLASMA
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`U.S. PATENT DOCUMENIE
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`FOREIGN PATENT DOCUMENTS
`[I 650 183 A]
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`122cm
`ESP
`OTHER PUBLICATIONS
`US 5.963.391. 111999. Drummand :1 u. (wimdnwn)
`Bnmh. :1 11.11:: 11-min” qum Symmetric 11: Aaymnm-
`ric Dbdflrgfl In when 1355 MHz Clplcily Cuuplnd
`Plasmas. .1. Ann. Phys. 1.11. 15. 1997. pp. 551560, val.
`33(2). Amnicnn 1mm: uI'Physins.
`(Lin mum on 11m 9333,)
`Pn'mnry Examinu—Wilsnn La
`(74) mm 43m, or Firm—Kim hunchenhlch‘,
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`(5?)
`ABSTRACI'
`Methodt and apparatus for genmling a away-mind
`plasma m dnscribad. An apparatus for generating a
`stmngly-Janina plum: mourning In 11:: prawn invention
`includes an anode and : fllhndl 111:11s pofl'u'nmd adj-42m
`1n in: mud: in [am I gap In“: bclwncn. An inninlinn
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`EmittinApuwcrsupplypmduuci In =1“:de in "2: gap
`between the nod: and 1h: cathode The :ledric field
`genuine mind mm in (he weakly-ionized plasma and
`gcnnnlfi sewndary nlccuuns fmm ll]: caihndn. The 591:-
`unduy clnctmns innit: the. :11:in .ms, mmhy mating
`lhe stronglyviomned plasma
`{3 (Julius. IJ Davin; Sheet:
`
`(11:1) Patent N11.:
`
`US 6,353,142 B2
`(45) Date of Patent:
`Feb. 8, 20-05
`
`
`(54) METHODS AND APPARATUS FOR
`GENERATING HIGH-DENSITY PLASMA
`
`
`2011
`J
`
`
`
`[\W/////////'//////Ai W
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`
`
` .
`
`US Patent 6,853,142
`US Patent 6,853,142
`
`
`3
`
`
`
`The ’142 Patent – Fig. 2A
`
`Cathode (204)
`
`Anode (216)
`
`Gap (220)
`
`Pulsed power
`supply (202)
`
`’142 Patent, Fig. 2A
`
`4
`
`
`
`’142 Independent Claims
`Claims 1 & 10
`
`Claim 1
`
`Claim 10
`
`’142 Patent, Claim 1
`
`’142 Patent, Claim 10
`
`5
`
`
`
`’142 Independent Claims
`Claims 21 & 31
`
`Claim 21
`
`Claim 31
`
`’142 Patent, Claim 21
`
`’142 Patent, Claim 31
`
`6
`
`
`
`’142 Independent Claims
`Claims 40 & 41
`
`Claim 40
`
`Claim 41
`
`’142 Patent, Claim 40
`
`’142 Patent, Claim 41
`
`7
`
`
`
`Grounds Instituted
`
`Ground
`
`Claims
`
`Prior Art
`
`818 Petition (IPR 2014-00866, IPR2014-01012, and IPR2014-01075 are joined with the 818)
`
`2
`
`3
`
`1, 3-7, 9, 10, 12, 15,
`19, 20, and 42
`
`Wang+ Lantsman
`
`8, 17, and 18
`
`Wang + Lantsman + Mozgrin
`
`819 Petition (IPR2014-00867, IPR2014-01014, and IPR2014-01046 are joined with the 819)
`
`3
`
`21, 24, 26-28, 31, 32,
`37, and 38
`
`Wang + Kudryavtsev
`
`821Petition (IPR2014-00863, IPR2014-01013, and IPR2014-01057 are joined with the 821)
`
`2
`
`4
`
`6
`
`13 and 14
`
`Wang+ Lantsman
`
`2 and 11
`
`Wang+ Lantsman + Kudryavtsev
`
`16
`
`Wang+ Lantsman + Mozgrin Thesis
`
`8
`
`
`
`Grounds Instituted
`
`Ground
`
`Claims
`
`Prior Art
`
`00827 Petition (IPR 2014-00865, IPR2014-01015, and IPR2014-01063 are joined with the 827)
`
`2
`
`22, 23, 25, 29, 30, 33-
`36, 39, and 43
`
`Wang + Kudryavtsev
`
`01098 Petition (IPR2014-01016 is joined with the 1098)
`
`4
`
`2
`
`40
`
`41
`
`Wang+ Lantsman
`
`Wang+ Kudryavtsev
`
`9
`
`
`
`’142 Patent and Wang Prior Art
`
`’142 Patent
`
`Wang
`
`’ 142 Patent, Fig. 2A
`
`Cathode
`
`Anode
`
`Gap
`
`Pulsed power supply
`
`Wang, Fig. 1 (Ex. 1005)
`
`10
`
`
`
`Asserted Prior Art: Kudryavtsev
`
`Kudryavtsev at 30 (Ex. 1204)
`
`11
`
`
`
`Asserted Prior Art: Lantsman
`
`Lantsman, Fig. 6 (Ex. 1004)
`
`Lantsman, Fig. 5 (Ex. 1004)
`
`12
`
`
`
`Disputes with Respect to Independent Claims
`
`• Independent claims 1, 10, 40, and 41
`
`‒ Whether Wang discloses a “magnitude and rise-time that is sufficient to
`increase the density of the weakly-ionized plasma”
`
`‒ Whether Wang in view of Lantsman discloses “diffusing the strongly-
`ionized plasma with additional feed gas to allow additional power to be
`absorbed by the strongly-ionized plasma”
`
`‒ Whether one of ordinary skill in the art would be motivated to combine
`Wang and Lantsman
`
`‒ Whether one of ordinary skill in the art would be motivated to combine
`Wang and Kudryavtsev (Claim 41 Only)
`
`• Independent claims 21and 31
`
`‒ Whether Wang discloses “a cathode that is positioned adjacent to the
`anode forming a gap there between” (Claim 21 Only)
`
`‒ Whether one of ordinary skill in the art would be motivated to combine
`Wang and Kudryavtsev
`
`13
`
`
`
`Wang Discloses Generating a Voltage Pulse with an
`Amplitude and Rise Time
`(Claims 1, 10, 40, and 41)
`
`Voltage Pulses
`
`Wang at 7:56-63 (Ex. 1005);
`see also Overzet Dec. at ¶ 91(Ex. 1022);
`Kortshagen Dec. at ¶ 125 - 130(Ex. 1002)
`
`Wang, Fig. 7
`
`14
`
`
`
`Wang Discloses Generating a Voltage Pulse with an
`Amplitude and Rise Time
`(Claims 1, 10, 40, and 41)
`
`Amplitude and Rise Time
`
`Wang at 5:24-27 (Ex. 1005);
`see also Overzet Dec. at ¶ 91(Ex. 1022);
`Kortshagen Dec. at ¶ 125 - 130(Ex. 1002)
`
`Wang, Fig. 7
`
`15
`
`
`
`Wang Discloses a Voltage Pulse with an Amplitude and
`a Rise Time that Creates Strongly-Ionized Plasma
`(Claims 1, 10, 40, and 41)
`
`Wang at 7:19-30 (Ex. 1005);
`see also Overzet Dec. at ¶ 91(Ex. 1022);
`Kortshagen Dec. at ¶ 125 - 130(Ex. 1002)
`
`16
`
`
`
`Wang Discloses Diffusing The Strongly-ionized Plasma
`(Claims 1, 10, 40, and 41)
`
`plasma region
`
`Feed gas enters here,
`and then fills the volume
`by diffusive motion
`
`Wang, Fig. 1(Ex.1005);
`Overzet Dec. at ¶¶ 75-76
`
`17
`
`
`
`Wang Discloses Diffusing The Strongly-ionized Plasma
`(Claims 1, 10, 40, and 41)
`
`•
`
`•
`
`In the system of Wang, the Argon feed gas will diffuse into the high
`density plasma, thereby allowing additional power from the pulsed
`power supply to be absorbed by the plasma.
`
`Overzet Dec. at ¶ 78 (Ex. 1022); Kortshagen Dec. at ¶ 134 (Ex. 1002)
`
`The processing region 22 of Wang is a restricted and well-defined
`container, and a volume of Argon gas will expand to fill this region.
`
`Overzet Dec. at ¶ 78 (Ex. 1022)
`
`• Not only will a gas like Argon expand to fill its container, it will also
`mix or “intermingle” with the gasses present in the container.
`
`Overzet Dec. at ¶ 78 (Ex. 1022)
`
`•
`
`Lantsman, which has a two stage plasma process similar to Wang,
`teaches a continuous feed of gas during the plasma process.
`
`Overzet Dec. at ¶ 80 (Ex. 1022)
`
`18
`
`
`
`Person Of Ordinary Skill In The Art Would Be Motivated To
`Apply Lantsman’s Teaching Of A Continuous Feed Gas To Wang
`(Claims 1, 10, 21, and 41)
`
`• Lantsman explicitly states its teachings are broadly applicable to
`other DC sputtering systems:
`
`Lantsman at 6:14-17 (Ex. 1004)
`
`• It is Lantsman’s teaching of continuously supplying feed gas that a
`person of ordinary skill in the art would be motivated to apply to
`Wang, not any physical components
`
`‒ Zond’s focus on the physical differences between Wang and Lantsman is misplaced
`
`19
`
`
`
`A Person of Skill Would Have Been Motivated to
`Combine Wang and Lantsman (Claims 1, 10, 21, and 41)
`
`Nevertheless, Zond is incorrect in stating that Wang and Lantsman
`disclose very different systems
`
`• Wang and Lantsman both disclose magnetron plasma sputtering
`
`Wang
`
`Lantsman
`
`Wang at 3:16-19, (Ex. 1005)
`
`Lantsman at 1:6-8, (Ex. 1004)
`
`• Wang and Lantsman both use two power supplies
`Wang
`
`Lantsman
`
`Wang at 7:57-63, (Ex. 1005)
`
`Lantsman at 3:47-50, (Ex. 1004)
`
`20
`
`
`
`A Person of Skill Would Have Been Motivated to
`Combine Wang and Lantsman (Claims 1, 10, 21, and 41)
`
`• Wang and Lantsman both discuss arc reduction
`
`Wang
`
`Lantsman
`
`Wang at 7:47-49 (Ex. 1005)
`
`Lantsman at 1:51-55 (Ex. 1004)
`
`• Wang and Lantsman both use argon feed gas
`
`Wang
`
`Lantsman
`
`Wang at 4:5-7 (Ex. 1005)
`
`Lantsman at 4:8-10 (Ex. 1004)
`
`21
`
`
`
`A Person of Skill Would Have Been Motivated to
`Combine Wang and Lantsman (Claims 1, 10, 21, and 41)
`
`• Lantsman’s technique uses continuous feed gas throughout process
`
`Lantsman at 3:9-13 (Ex. 1004)
`
`• Lantsman’s technique applies to Wang
`
`Lantsman at 6:14-17 (Ex. 1004)
`
`22
`
`
`
`Kudryavtsev Confirms Wang’s Applied Voltage Pulse
`Creates a Strongly-Ionized Plasma
`(Claims 21, 31, and 41)
`
`“I understand Kudryavtsev to be a study of
`the behavior of plasma, and modeling such
`behavior, which is general in its application”
`
`Overzet Dec. at ¶ 61 (Ex. 1022);
`’759 Kortshagen Deposition at 144:7-12
`
`Kudryavtsev at 30, 31;
`see also Overzet Dec. ¶ 61-65 (Ex. 1036);
`Kortshagen Dec. at ¶ 122-123 (Ex. 1202)
`
`23
`
`
`
`Kudryavtsev’s Teachings are Generally Applicable
`Whenever a Field is Suddenly Applied to a Weakly
`Ionized Plasma (Claims 21, 31, and 41)
`
`Kudyravtsev at p. 34, right col., ¶ 4
`
`Wang, Fig. 6, (Ex. 1005)
`
`24
`
`
`
`Combining Wang and Kudryavtsev
`(Claims 21, 31, and 41)
`• Zond argues that Wang cannot be combined with Kudryavtsev because:
`
`‒ Physical differences in chamber geometry
`
`‒ Absence of magnetic field in Kudryavtsev
`‒ Differences in gas pressure
`
`• Patent Owner’s arguments improperly focus on the physical
`apparatus used by Kudryavtsev to experimentally verify his model.
`
`‒ A person of ordinary skill in the art would be motivated to apply
`Kudryavtsev’s generally-applicable model to Wang’s pulsed plasma system.
`
`Overzet Dec. at ¶ 62 (Ex. 1022)
`
`25
`
`
`
`Kudryavtsev’s Teachings are Not Limited to Any
`Specific Experiment (Claims 21, 31, and 41)
`
`Q. And Kudryavtsev is essentially analogous to a flash tube;
`is that right?
`
`A. . . . Kudryavtsev really consists of two parts. First, the
`description of a model, which as Kudryavtsev states
`himself, should be applied whenever one faces a situation
`of a plasma being exposed to a pulse electric field. And
`then a part two which describes a particular experiment,
`one of many possible in which he chooses to verify this
`model with the understanding that he could have chosen
`a lot other implementations of this particular experiment.”
`
`’759 Kortshagen Deposition at 144:7-19 (interposing objections omitted)
`
`26
`
`
`
`Wang and Kudryavtsev (Claims 21, 31, and 41)
`
`• Wang discloses using electrical pulses to increase plasma density
`
`• Kudryavtsev studies effects of applying a sudden field to a
`weakly-ionized plasma to increase plasma density
`
`Wang at 7:25-30 (Ex. 1005)
`
`Kudryavtsev at p. 34 (Ex. 1204)
`
`27
`
`
`
`Wang and Kudryavtsev (Claims 21, 31, and 41)
`
`• Wang’s goal is to generate “very high plasma density”
`
`• Kudryavtsev provides model for fast-stage ionization via
`increasing number of atoms in excited states
`
`Wang at Abstract (Ex. 1005)
`
`Kudryavtsev at Abstract (Ex. 1204)
`
`28
`
`
`
`Wang Discloses a “Gap” Between Cathode and Anode
`(Claim 21)
`
`• The term gap refers to the space between the anode and
`cathode in which an electric field is generated.
`
`Overzet Dec. at ¶ 122 (Ex. 1022)
`
`• Broadest reasonable interpretation does not require the gap to
`be less than 10 cm as Patent Owner proposes
`
`• Patent Owner’s declarant admitted that all plasma chambers
`inherently have a cathode-anode gap
`
`Q: There was a gap between the anode and the cathode; correct?
`
`A: Well, the anode wasn’t in contact with the cathode. Otherwise,
`it would short out, so -- but the nature of that gap I don’t
`remember.
`
`’716 Hartsough Deposition at 102:9-15 (interposing objections omitted)
`
`29
`
`
`
`Wang Discloses a “Gap” Between Cathode and Anode
`(Claim 21)
`
`• Patent Owner admits that Wang teaches choosing a cathode-
`anode gap distance that is similar to the ’142 gap
`
`IPR2014-00819, Patent Owner Response (Paper 26) at 53
`
`• This purported gap distance in Wang differs from the distance
`put forth by Patent Owner regarding the ’716 Patent
`
`IPR2014-00807, Patent Owner Response (Paper 29) at 36-37
`
`30
`
`
`
`Disputes with Respect to Dependent Claims
`
`• Claims 3 and 12
`
`‒ Whether Wang and Lantsman disclose supplying additional feed
`gas to “exchange the weakly-ionized plasma while applying the
`electrical pulse across.”
`
`• Claims 4, 5, 22, 23, 33, and 34
`
`‒ Whether Wang discloses supplying a “constant power” and a
`“constant voltage”
`
`• Claim 6 and 29
`
`‒ Whether Wang discloses an ionization source comprising “an
`electrode coupled to a DC power supply.”
`
`31
`
`
`
`Disputes with Respect to Dependent Claims
`
`• Claims 13, 24, and 32
`
`‒ Whether Wang discloses a “quasi-static electric field”
`
`• Claims 14, 26, 28, and 36
`
`‒ Whether Wang discloses choosing the rise-time or pulse width of the
`electric field (claims 14, 26, and 36) or choosing the cathode/anode gap
`dimensions (claim 28) to “increase an ionization rate of the excited atoms
`in the weakly-ionized plasma”
`
`• Claims 15, 27, 37, and 38
`
`‒ Whether Wang discloses strongly-ionized plasma that is “substantially
`uniform proximate to the cathode” (claims 27 and 38) or selecting a pulse
`amplitude or width to cause the strongly-ionized plasma to be
`“substantially uniform” (claim 15) or “substantially uniform in an area
`adjacent to a surface of the cathode” (claim 37).
`
`32
`
`
`
`Wang And Lantsman Disclose Exchanging The Weakly-
`ionized Plasma With Feed Gas While Applying The
`Electrical Pulse (Claims 3 and 12)
`• Applying Lantsman’s teaching of continuously supplying feed gas
`during processing, Wang’s feed gas will exchange the weakly-
`ionized plasma while applying its high power pulse, PP .
`
`Kortshagen Dec. at ¶ 146 (Ex. 1002); Overzet Dec. at ¶ 87 (Ex. 1022)
`
`• Lantsman’s use of two DC power supplies does not affect application
`of its disclosed continuous feed gas to the system of Wang
`
`‒ Patent Owner incorrectly focuses on physical differences between
`the systems’ power supplies
`
`Overzet Dec. at ¶ 87 (Ex. 1022)
`
`33
`
`
`
`“Constant power” and “Constant voltage”
`(Claims 4, 5, 22, 23, 33, and 34)
`
`• Wang discloses square
`waveforms for voltage and
`power pulses
`
`Hartsough Dec. ¶ 57, (Ex. 2005)
`
`Wang, Fig. 6 (Ex. 1005)
`
`Wang, Fig. 4 (Ex. 1005)
`
`Wang, Fig. 7 (excerpted) (Ex. 1005)
`
`34
`
`
`
`“Quasi-static electric field” (Claims 13, 24, and 32)
`
`• Wang teaches claimed “quasi static electric field”
`
`50 µs >> 0.188 µs
`
`’142 Patent at 7:16-19
`
`Wang at 5:45-48 (Ex. 1022)
`
`Petition, IPR2014-00818, at 52
`
`35
`
`
`
`“Quasi-static electric field” (Claims 13, 24, and 32)
`
`Ignition
`Phase
`
`Maintenance
`Phase
`
`Patent Owner’s Declarant
`Dr. Hartsough
`
`Q: If the region between T5 and T6 in
`Figure 5 is longer than the collision
`time for electrons, that would meet
`the ‘775 patent’s definition of a
`quasi-static electric field; right?
`
`A: If it were -- yeah, if it were
`constant.
`
`’775 Hartsough Deposition at 137:25-138:8
`(interposing objections omitted)
`
`Overzet Dec. ¶ 110, (Ex. 1022)
`
`36
`
`’775 Patent, Fig. 5
`(Identical to ’142 Fig. 4)
`(Annotated)
`
`
`
`Kudryavtsev Teaches a Voltage Pulse Increases the
`Ionization Rate (Claims 14, 26, 28 and 32)
`
`Slow Stage
`
`Fast Stage
`
`Generation of Excited Atoms
`
`Multi-Step Ionization
`
`Direct Ionization
`
`Korstagen Dec. at ¶ 81 (Ex. 1202);
`see also Decision on Institution at p. 17 (Paper No. 11)
`
`’142 Patent
`
`Kudryavtsev
`
`’142 Patent at 8:19-25 (Ex. 2005)
`
`Kudyravtsev at p. 31, right col., ¶ 6;
`Overzet Dec. at ¶ 62 (Ex. 1022);
`’759 Kortshagen Deposition at 148:14-149:15
`
`37
`
`
`
`Kudryavtsev Teaches a Voltage Pulse Increases the
`Ionization Rate (Claims 14, 26, 28 and 32)
`
`Slow Stage
`
`Fast Stage
`
`Generation of Excited Atoms
`
`Multi-Step Ionization
`
`Direct Ionization
`
`Korstagen Dec. at ¶ 81 (Ex. 1202);
`see also Decision on Institution at p. 17 (Paper No. 11)
`
`’142 Patent
`
`Kudryavtsev
`
`’142 Patent at 8:25-35
`
`Kudyravtsev at p. 31, right col., ¶ 6 (Ex. 1204)
`
`38
`
`
`
`Kudryavtsev Teaches a Voltage Pulse Increases the
`Ionization Rate (Claims 14, 26, 28 and 32)
`
`Q. What causes the increase in electron density?
`
`A. So according to Kudryavtsev, which is a very insightful paper,
`in a pulse discharge electron density increases due to an
`increase in ionization, and this increase in ionization can be
`caused by an increase in stepwise ionization…. The increase
`in stepwise ionization, according to Kudryavtsev’s paper, is
`caused by an increase in the density of excited atoms.… The
`increase of the density of excited atoms is caused by an
`increase in the excitation rate of ground state atoms.
`
`Q. And what increases the excitation rate of ground state atoms?
`
`A. So the excitation rate of ground state atoms is mathematically
`defined as a rate coefficient, which depends on the electric
`field strength, so here the voltage pulse, and times the
`electron density times the density of ground state atoms.
`
`’759 Kortshagen Deposition at 148:14-149:15 (Interposing Questions Omitted)
`
`39
`
`
`
`Wang Discloses An Electrode Coupled To A
`DC Power Supply (Claims 6 and 29)
`
`• A cathode and anode are specific examples of electrodes.
`
`Q. And an anode is an electrode; right?
`
`Zond’s Expert
`Dr. Hartsough
`
`A. An anode is an electrode.
`
`Q. A cathode is an electrode; correct?
`
`A. Yes.
`
`’142 Hartsough Deposition at 35:23-36:4 (objections omitted)
`
`• Patent Owner incorrectly relies on one embodiment when
`concluding that the claimed electrode must be a filament
`separate from the cathode and anode
`
`Zond’s Expert
`Dr. Hartsough
`
`A. It -- in it's broadest possible interpretation, "electrode" would
`include the ionizing filament or other electrodes in the system.
`Q. You're referring now to the word "electrode" in Claim 6; correct?
`A. Yes
`Q. So it would include the anode and the cathode; correct?
`A. It could.
`
`’142 Hartsough Deposition at 35:23-36:4 (Ex. 1024) (objections omitted)
`
`40
`
`
`
`Wang Discloses a Substantially Uniform Plasma
`(Claims 15, 27, 37, and 38)
`
`Overzet, FIG. 2 (Ex. 1022)
`
`Wang, Fig. 1 (Ex. 1005)
`
`41
`
`
`
`Wang Discloses a Substantially Uniform Plasma
`(Claims 15, 27, 37, and 38)
`
`• Wang’s controlled voltage pulse increases plasma density
`
`• Spreading the plasma will result in a uniform plasma
`
`Wang at 7:25-30 (Ex. 1005)
`
`Overzet Decl. at ¶104 (Ex. 1022)
`
`42
`
`
`
`Conclusion
`
`• All disputed claims of the ’142 Patent are invalid.
`
`Ground
`
`Claims
`
`Prior Art
`
`818 Petition (IPR 2014-00866, IPR2014-01012, and IPR2014-01075 are joined with the 818)
`
`2
`
`3
`
`1, 3-7, 9, 10, 12, 15,
`19, 20, and 42
`
`Wang+ Lantsman
`
`8, 17, and 18
`
`Wang + Lantsman + Mozgrin
`
`819 Petition (IPR2014-00867, IPR2014-01014, and IPR2014-01046 are joined with the 819)
`
`3
`
`21, 24, 26-28, 31, 32,
`37, and 38
`
`Wang + Kudryavtsev
`
`821Petition (IPR2014-00863, IPR2014-01013, and IPR2014-01057 are joined with the 821)
`
`2
`
`4
`
`6
`
`13 and 14
`
`2 and 11
`
`Wang+ Lantsman
`
`Wang+ Lantsman + Kudryavtsev
`
`16
`
`Wang+ Lantsman + Mozgrin Thesis
`
`43
`
`
`
`Conclusion
`
`• All disputed claims of the ’142 Patent are invalid.
`
` Ground
`
`Prior Art
`
`Claims
`
`00827 Petition (IPR 2014-00865, IPR2014-01015, and IPR2014-01063 are joined with the 827)
`
`2
`
`22, 23, 25, 29, 30, 33-
`36, 39, and 43
`
`Wang + Kudryavtsev
`
`01098 Petition (IPR2014-01016 is joined with the 1098)
`
`4
`
`2
`
`40
`
`41
`
`Wang+ Lantsman
`
`Wang+ Kudryavtsev
`
`44
`
`
`
`RESERVED SLIDES
`RESERVED SLIDES
`
`45
`
`
`
`The ’142 Patent – Fig. 3
`
`’142 Patent, 11:16-19
`
`’142 Patent, 11:34-38
`
`’142 Patent, 12:19-11
`
`46
`
`’142 Patent, Fig. 3
`
`
`
`The ’142 Patent – Fig. 3
`
`’142 Patent, 6:25-30
`
`’142 Patent, 11:52-56
`
`47
`
`’142 Patent, Fig. 3
`
`
`
`Trial No. IPR2014-00821
`Petitioner’s Demonstrative Exhibits for Oral Argument
`
`
`
`
`Dated: June 9, 2015
`
`Respectfully Submitted,
`
`
`
`
`
`
`
`
`
`/s/ David M. Tennant
`David M. Tennant
`Lead Counsel for Petitioner
`GlobalFoundries
`Registration No. 48,362
`
`
`
`
`
`
`
`
`Trial No. IPR2014-00821
`Petitioner’s Demonstrative Exhibits for Oral Argument
`
`
`CERTIFICATE OF SERVICE
`
`
`
`
`Pursuant to 37 C.F.R. § 42.6(e), this is to certify that I caused to be served a
`
`true and correct copy of the foregoing “PETITIONER’S DEMONSTRATIVE
`
`EXHIBITS FOR ORAL ARGUMENT” as detailed below:
`
`
`
`
`
`Date of service June 9, 2015
`
`Manner of service Email: bbarker@chsblaw.com;
`gonsalves@gonsalveslawfirm.com; kurt@rauschenbach.com
`
`Documents served PETITIONER’S DEMONSTRATIVE EXHIBITS FOR
`ORAL ARGUMENT
`
`Persons Served Bruce Barker
`Chao Hadidi Stark & Barker LLP
`176 East Mail Street, Suite 6
`Westborough, MA 01581
`
`Dr. Gregory J. Gonsalves
`2216 Beacon Lane
`Falls Church, Virginia 22043
`
`
`
`/s/ Anna Goodall
`Anna Goodall
`White & Case LLP
`3000 El Camino Real
`Five Palo Alto Square, 9th Floor
`Palo Alto, CA 94306
`Tel: (650) 213-0367
`Email: agoodall@whitecase.com
`
`
`
`
`