(12) United States Patent
`Fu et al.
`
`(10) Patent N0.:
`(45) Date of Patent:
`
`US 6,306,265 B1
`Oct. 23, 2001
`
`US006306265B1
`
`(54) HIGH-DENSITY PLASMA FOR IONIZED
`METAL DEPOSITION CAPABLE OF
`EXCITING A PLASMA WAVE
`
`(75)
`
`Inventors: Jianming Fu, San Jose; Praburam
`Gopalraja, Sunnyvale; Fusen Chen,
`Saratoga; John Forster, San Francisco,
`all of CA (US)
`
`(73) Assignee: Applied Materials, Inc., Santa Clara,
`CA (US)
`
`( * ) Notice:
`
`Subject to any disclaimer, the term of this
`patent is extended or adjusted under 35
`U.S.C. 154(b) by 0 days.
`
`(21) Appl. No.: 09/546,798
`
`(22)
`
`Filed:
`
`Apr. 11, 2000
`
`2 241 710 *
`62‘89864
`63—282263
`11—074225
`
`............................. .. 204/298.19
`
`9/1991 (GB)
`4/1987 (JP) -
`11/1988 (JP) .
`3/1999 (JP).
`OTHER PUBLICATIONS
`
`B. Window et al. “Charged particle fluxes from planar
`magnetron sources”, J. Vac. Sci. Technol. A4(2), Mar./Apr.
`1986, pp. 196—202.*
`J. Musil, et al. “Unbalanced magnetrons and new sputtering
`systems with enhanced plasma ionization”, J. Vac. Sci.
`Technol. A 9(3), May/Jun. 1991, pp. 1171—1177.*
`W. Munz “The unbalanced magnetron: current status of
`development”, Surface and Coatings Technology, 48 (1991),
`pp. 81—94.*
`Matsuoka et al., “Dense plasma production and film depo-
`sition by new high—rate sputtering using an electric mirror,”
`Journal of Vacuum Science and Techn0l0gyA, vol. 7, No. 4,
`Jul./Aug. 1989, pp. 2652-2657.
`
`Related U.S. Application Data
`
`* cited by examiner
`
`Primary Examiner—Nam Nguyen
`Assistant Examiner—Gregg Cantelmo
`(74) Attorney, Agent, or Firm—Charles S. Guenzer, Esq
`
`(57)
`
`ABSTRACT
`
`low-pressure
`A magnetron especially advantageous for
`plasma sputtering or sustained self-sputtering having
`reduced area but full
`target coverage. The magnetron
`includes an outer pole face surrounding an inner pole face
`with a gap therebetween. The outer pole of the magnetron of
`the invention is smaller than that of a circular magnetron
`similarly extending from the center to the periphery of the
`target. A preferred triangular shape having a small apex
`angle of 20 to 30° may be formed from outer bar magnets of
`one magnetic polarity enclosing an inner magnet of the other
`magnetic polarity. The magnetron allows the generation of
`plasma waves in the neighborhood of 22 MHZ which
`interact with the 1 to 20 eV electrons of the plasma to
`thereby increase the plasma density.
`
`(63)
`
`Continuation—in—part of application No. 09/373,097, filed on
`Aug. 12, 1999, now Pat. No. 6,183,614, which is a continu-
`ation—in—part of application No. 09/249,468, filed on Feb. 12,
`1999.
`
`Int. Cl.7 ................................................... .. C23C 14/34
`(51)
`(52) U.S. Cl.
`.................................. .. 204/192.12; 204/298.2
`(58) Field of Search .......................... .. 204/298.19, 298.2,
`204/298.22, 192.12
`
`(56)
`
`References Cited
`U.S. PATENT DOCUMENTS
`
`............................ .. 204/298.2
`4/1984 Garrett
`4,444,643 *
`5,252,758
`10/1993 Demaray et al.
`.
`204/298.2
`6/1998 Kiyota . . . . . . . . . . . . . . .
`. . . .. 204/298.2
`5,770,025
`4/1999 Hong et al.
`204/298.2
`5,897,752 *
`5,966,607 * 10/1999 Chee etal. ......................... .. 438/305
`FOREIGN PATENT DOCUMENTS
`
`
`
`06—620583A
`0 691 419 A1 *
`
`10/1994 (EP).
`1/1996 (EP)
`
`.............................. .. 204/298.19
`
`22 Claims, 11 Drawing Sheets
`
`40
`
`
`
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