UNITED STATES PATENT AND TRADEMARK OFFICE
`
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`
`’421 Patent:
`
`Fujitsu Semiconductor Limited, Fujitsu Semiconductor America, Inc., Advanced Micro Devices, Inc., Renesas
`Electronics Corporation, Renesas Electronics America, Inc., Globalfoundries U.S., Inc., Globalfoundries
`Dresden Module One LLC & Co. KG, Globalfoundries Dresden Module Two LLC & Co. KG, Toshiba
`America Electronic Components, Inc., Toshiba America Inc., Toshiba America Information Systems, Inc.,
`Toshiba Corporation, and the Gillette Company,
`
`v. Zond, LLC.
`
`IPR2014-8001, IPR2014-8022 , and IPR2014-8053
`
`1 Cases IPR2014-844, IPR2014-991, and IPR2014-1037 are joined with the 800
`2 Cases IPR2014-848, IPR2014-992, and IPR2014-1071 are joined with the 802
`3 Cases IPR2014-851, IPR2014-990, and IPR2014-1069 are joined with the 805
`
`June 8, 2015
`
`1
`
`

`

`Overview
`
`• Overview of ’421 Patent
`
`• Grounds Instituted
`
`• Overview of Prior Art
`
`• Summary of Disputes with Respect to Independent Claims
`
`‒ Claim Construction
`
`‒ Response to Patent Owner’s Arguments
`
`• Summary of Disputes and Responses Related to Dependent Claims
`
`2
`
`

`

`The ’421 Patent
`
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`{10} Patent N40,:
`
`(45} Date of Patent:
`
`US 7,311,421 BZ
`*Oct. 12, 2010
`
`(54) HIGH DEPflSITIflN RATE SPUTTERING
`
`
`
`US Patent 7,811,421
`
`US Patent 7,811,421
`
`3
`
`

`

`The ’421 Patent
`
`Anode (238)
`
`Cathode Assembly (216)
`
`Pulsed Power Supply (234)
`
`Magnets (256)
`
`Plasma (246)
`
`Feed Gas Source (208)
`
`Substrate (211)
`
`Bias Power Supply (214)
`
`’421 Patent, Fig. 4
`
`4
`
`

`

`Representative Claim
`
`’421 Patent, Claim 1
`
`‘421 Patent, Claim 1
`
`5
`
`

`

`Grounds Instituted
`
`Ground
`
`800 Petition
`
`1
`
`2
`
`802 Petition
`1
`2
`805 Petition
`1
`
`2
`3
`
`Claims
`
`Prior Art
`
`1, 2, 8, 10–13, 16, 17, 22–
`25, 28–30, 33, 34, 39, 42,
`43, 46–48
`15, 27, 38
`
`Wang
`
`Wang + Mozgrin
`
`9, 21, and 35
`14, 26, and 37
`
`Wang + Kudryavtsev
`Wang + Mozgrin Thesis
`
`3–5, 18–20, 36, 40, and
`41
`6, 31, 44, and 45
`7 and 32
`
`Wang + Kawamata
`
`Wang + Lantsman
`Wang + Lantsman + Kawamata
`
`6
`
`

`

`Asserted Prior Art: Wang
`
`Anode (24)
`
`Cathode Assembly (14)
`
`Pulsed Power Supply (80)
`
`High-Density Plasma (42)
`
`Feed Gas Source (32)
`
`Magnet Assembly
`
`Substrate (20)
`
`Bias Power Supply (44)
`
`Wang, Fig. 1, Ex. 1004; All citations are to IPR2014‐800 unless otherwise noted.
`
`7
`
`

`

`’421 Patent and Wang Prior Art
`
`Anode
`
`Cathode Assembly
`
`Pulsed Power Supply
`
`Magnets
`
`Plasma
`
`Feed Gas Source
`
`Substrate
`
`’421 Patent, Fig. 4
`
`Bias Power Supply
`
`Wang, Fig. 1, Ex. 1004
`
`8
`
`

`

`Disputes with Respect to Independent Claims
`(Claims 1, 17, 34, and 46-48)
`• All independent claims:
`
`‒ Whether Wang discloses a voltage pulse for creating a weakly-ionized
`plasma and then a strongly-ionized plasma from the weakly-ionized
`plasma.
`‒ Whether Wang discloses “without an occurrence of arcing.”
`‒ Whether Wang discloses an amplitude, a duration and a rise time of the
`voltage pulse being chosen to increase a density of ions in the strongly-
`ionized plasma.
`
`9
`
`

`

`Claim Construction
`
`Claim terms construed by the Board:
`•
`•
`
`“weakly-ionized plasma”
`
`“strongly-ionized plasma”
`
`Claim construction disputes raised by Patent Owner's Response:
`•
`
`“creates a weakly-ionized plasma and then a strongly-ionized plasma from
`the weakly-ionized plasma”
`
`•
`
`“pulse”
`
`10
`
`

`

`Construction for "Creates a Weakly Ionized Plasma. . ."
`
`Claim Language
`a voltage pulse  . . . 
`that creates a weakly‐
`ionized plasma and 
`then a strongly‐
`ionized plasma 
`without an 
`occurrence of arcing
`
`Patent Owner's Construction Petitioner's Construction
`a voltage pulse that ignites a 
`a voltage pulse  . . . that 
`gas from a state in which 
`forms or generates a 
`there is no plasma to a state 
`weakly‐ionized plasma 
`in which a plasma exists, 
`and then a strongly‐
`wherein the plasma is 
`ionized plasma without 
`an occurrence of arcing
`initially a weakly‐ionized 
`plasma and then a strongly‐
`ionized plasma that is formed 
`from the weakly ionized 
`plasma without an 
`occurrence of arcing
`
`• Patent Owner attempts to add "ignites a gas" as a limitation to the claim
`
`11
`
`

`

`Patent Owner’s New Construction for "Creates a
`Weakly Ionized Plasma. . ." Is Incorrect
`• Adding an "ignites a gas" limitation ignores an
`embodiment of the '421 Patent (Overzet Decl. ¶ 31):
`
`'421 Patent at 16:42‐44
`
`'421 Patent at 16:48‐51
`
`• Each pulse “creates a weakly-ionized plasma” by providing a
`background power that allows the system to reset to a state
`with a weakly-ionized plasma. See Overzet Decl. ¶ 31.
`
`12
`
`

`

`Construction for "Pulse"
`
`Claim Language
`Pulse
`
`Patent Owner's Construction Petitioner's Construction
`[None offered]
`a property (e.g., voltage, 
`current, or power) that is 
`applied over a period of 
`time
`
`• Patent Owner has argued that Wang does not disclose a "pulse" without
`ever defining the term.
`• Petitioner defined the term "pulse" consistent with the way it is used in
`the '421 Patent. Overzet Decl. ¶¶ 33-36 and 53.
`
`13
`
`

`

`Construction for "Pulse"
`
`• Patent Owner and its expert refused to provide any
`definition of the term "pulse":
`
`Q.  Can you tell me what “pulse” means to you in relation to the ’421 patent?
`A.  I don't think I can give you a definition of it.  As I said, as it’s used here, I 
`understand what it means.
`Q.  Okay.  What's your understanding of what it means?
`A.  In the context of these patents, it’s pretty clear what it means.
`***
`Q.  If it’s clear, Dr. Hartsough, I would like you to tell me what it means.
`A.  I am not going to ‐‐ I am not going to try to come up with a definitive 
`definition of the word as it’s used.  To a person of ordinary skill in the art, it’s 
`clear what it means.
`
`Ex. 1028, Hartsough Dep. Tr. at 8:17‐10:2 (Objections omitted)
`
`14
`
`

`

`Construction for "Pulse"
`
`• Patent Owner refuses to define "pulse" because the '421 Patent
`implements the same approach already disclosed by Wang:
`
`Wang, Fig. 6
`
`'421 Patent, Fig. 6 (Excerpt)
`
`• Both the '421 Patent and Wang disclose (repeating) pulses
`with uniform low-power and high-power regions.
`
`15
`
`

`

`Disputes with Respect to Independent Claims
`
`‒ Whether Wang discloses a voltage pulse for creating a
`weakly-ionized plasma and then a strongly-ionized
`plasma from the weakly-ionized plasma.
`‒ Whether Wang discloses “without an occurrence of arcing.”
`‒ Whether Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a density
`of ions in the strongly-ionized plasma.
`
`16
`
`

`

`Wang discloses a voltage pulse for creating a weakly-
`ionized plasma and then a strongly-ionized plasma
`from the weakly-ionized plasma.
`
`Wang at 7:56‐63; Petition at 34‐35
`
`Wang at Fig. 7
`
`17
`
`

`

`Wang discloses a voltage pulse for creating a weakly-
`ionized plasma and then a strongly-ionized plasma
`from the weakly-ionized plasma.
`
`Wang at 7:17‐31; Petition at 35‐36
`
`Wang at Fig. 6
`
`18
`
`

`

`Disputes with Respect to Independent Claims
`
`‒ Whether Wang discloses a voltage pulse for creating a
`weakly-ionized plasma and then a strongly-ionized plasma
`from the weakly-ionized plasma.
`‒ Whether Wang discloses “without an occurrence of
`arcing.”
`‒ Whether Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a density
`of ions in the strongly-ionized plasma.
`
`19
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`The only description of "without an occurrence of arcing" in the
`'421 Patent's specification:
`
`'421 Patent at 15:65‐18:5
`
`• Addresses the possibility of arcing during the transition to a strongly-ionized
`plasma.
`• Uses the phrase "substantially eliminates the possibility"
`
`20
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`Wang at 7:3‐6
`
`Wang at 7:13‐17
`
`Wang at 7:47‐49
`• Dr. Overzet explained that Wang teaches the same solution to arcing as the
`’421 Patent: forming a weakly-ionized plasma at a low power before forming
`a strongly-ionized plasma at a high power. Overzet Decl., ¶ 50.
`
`21
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`Wang at 8:2‐5
`
`Wang at 7:49‐51
`
`Wang at Fig. 6
`
`22
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`Wang at 7:49‐51
`
`Q. But if impedance changes relatively little during the
`transition from a low-to a high-density plasma, then it’s
`indicative of no short circuit or arcing, right? …
`A. That’s indicative of no - certainly no unipolar arc. . . .
`Ex. 1031, 2/19/2015 Hartsough Dep. ('775 Patent) at 89:8‐24
`(interposing objections omitted)
`
`23
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`Overzet Dec. at ¶ 45 (Ex. 1036);
`
`Wang at Fig. 6
`
`24
`
`

`

`Disputes with Respect to Independent Claims
`
`‒ Whether Wang discloses a voltage pulse for creating a
`weakly-ionized plasma and then a strongly-ionized plasma
`from the weakly-ionized plasma.
`‒ Whether Wang discloses “without an occurrence of arcing.”
`‒ Whether Wang discloses an amplitude, a duration and a
`rise time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`25
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`• Patent Owner does not dispute that Wang discloses an amplitude, a
`duration, and a rise time.
`• Patent Owner's sole dispute is whether they are chosen to increase the
`density of the ions in the strongly ionized plasma. (Response at 38-40.)
`• Patent Owner's argument is irrelevant:
`‒ “An intended use or purpose usually will not limit the scope of the claim because
`such statements usually do no more than define a context in which the invention
`operates.” Boehringer Ingelheim Vetmedica, Inc. v. Schering-Plough Corp., 320 F.3d
`1339, 1345 (Fed. Cir. 2003).
`
`‒ Where Wang discloses a sputtering system and method having the limitations of
`the '421 Patent's claims, patentability does not turn on the subjective state of mind,
`i.e., whether characteristics are chosen for one purpose or another.
`
`26
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`• Wang uses voltage pulses to control the system:
`
`Wang at Fig. 7
`
`Wang at 7:56‐63
`
`27
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`Wang at 7:17‐22; Overzet Decl., ¶ 60 
`
`Wang at Fig. 6
`
`• The voltage amplitude is relative to the voltage during the
`background power. Overzet Decl. ¶ 60.
`
`28
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`Wang at 7:19‐27
`
`Wang at Fig. 6
`
`• Wang teaches having a specific pulse width (i.e., duration), which
`would include a rise time, to produce its peak power pulse.
`Overzet Decl. ¶ 60.
`
`29
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`Rise Time
`
`Wang, Fig. 7
`
`Wang at 7:65‐8:1;
`
`Hartsough pg. 
`181, Exhibit 
`1029 
`
`30
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`• Wang's goal is to produce a high fraction of ionized sputter
`particles, i.e., to increase a density of ions in the strongly
`ionized plasma:
`
`• Dr. Overzet agrees that Wang selected pulse characteristics
`and reactors with the goal of producing a high fraction of
`ionized sputtered particles. Overzet Decl. ¶¶ 59-60.
`
`Wang at 1:6‐8
`
`31
`
`

`

`Wang discloses an amplitude, a duration and a rise
`time of the voltage pulse being chosen to increase a
`density of ions in the strongly-ionized plasma.
`
`Wang at 7:19‐30; 
`see also Overzet Dec. at ¶66 (Ex. 1036);
`Kortshagen Dec. at ¶139 (Ex. 1002) 
`
`32
`
`

`

`Dependent Claims
`• Patent Owner offers no additional argument for claims 2-5, 8-10,
`13, 15-16, 18-22, 25, 27-28, 30, 33, 35-36, and 38-43.
`
`Ground
`
`800 Petition
`
`1
`
`2
`
`802 Petition
`1
`805 Petition
`1
`
`Claims
`
`Prior Art
`
`2, 8, 10, 13, 16, 22, 25,
`28, 30, 33, 39, 42, 43
`15, 27, 38
`
`Wang
`
`Wang + Mozgrin
`
`9, 21, and 35
`
`Wang + Kudryavtsev
`
`3–5, 18–20, 36, 40, and
`41
`
`Wang + Kawamata
`
`33
`
`

`

`Disputes with Respect to Dependent Claims
`
`• Claims 11 and 23:
`‒ Whether Wang discloses a power supply that generates “a constant
`voltage.”
`• Claims 12 and 24:
`‒ Whether Wang discloses choosing the rise time of a voltage pulse “to
`increase the ionization rate.”
`• Claim 29:
`‒ Whether Wang discloses “a distance from the sputtering target to the
`substrate support in the range of approximately 1 cm to 100 cm.”
`• Claims 14, 26, and 37:
`‒ Whether a “rise time of a voltage pulse approximately between 0.01
`and 1000V/µsec” would have been obvious.
`
`34
`
`

`

`Disputes with Respect to Dependent Claims
`
`• Claims 6, 31, and 45:
`‒ Whether Wang discloses “a gas flow controller that controls a flow of the
`feed gas so that the feed gas diffuses the strongly-ionized plasma.”
`• Claim 44:
`‒ Whether Wang discloses “diffusing the weakly-ionized plasma with a
`volume of the feed gas while ionizing the volume of the feed gas to
`create additional weakly-ionized plasma.”
`• Claims 7 and 32:
`‒ Whether Wang discloses “the gas flow controller controls the flow of the
`feed gas to allow additional power to be absorbed by the strongly
`ionized plasma, thereby generating additional thermal energy in the
`sputtering target.”
`
`35
`
`

`

`Wang discloses a power supply that generates “a
`constant voltage.” (Claims 11 and 23)
`
`Wang at 7:49‐51
`
`Q. And over that full period of time, the
`voltage does not direct back up closer to
`the 600; right? …
`
`A. … if the impedance of that thing were
`steady, you know, then the voltage
`would approach a constant value.
`Ex. 1029, 2/11/2015 Hartsough Dep. ('184 Patent) at 151:20 – 152:6 
`(interposing objections omitted)
`
`36
`
`

`

`Wang discloses a power supply that generates “a
`constant voltage.” (Claims 11 and 23)
`
`See Overzet Dec. ¶¶ 61‐63
`
`37
`
`

`

`Wang discloses choosing the rise time of a voltage pulse
`“to increase the ionization rate.” (Claims 12 and 24)
`
`Q. And, conversely, a high-pass filter
`would allow high-frequency
`signals to pass; correct?
`
`A. Yes.
`
`Q. So that could enable fast rise times;
`right?
`
`A. Yes.
`
`Ex. 1029, 2/19/2015 Hartsough Dep. ('184 Patent) at 181:9‐17 
`(interposing objections omitted)
`
`Wang at 7:65‐8:1
`
`Wang , Fig. 7
`
`38
`
`

`

`Wang discloses “a distance from the sputtering target
`to the substrate support in the range of approximately
`1 cm to 100 cm.” (Claim 29)
`
`• Patent Owner does not dispute that Chiang discloses a distance in the
`claimed range (i.e., 28 cm).
`• Patent Owner does not dispute that Wang cites the Chiang reference.
`• Patent Owner's sole argument is that "material that is incorporated by
`reference will only be considered in an anticipation analysis if the host
`document (here Wang) contains language clearly identifying the subject
`matter that is incorporated and where it is to be found.” (Response at
`38-49.)
`
`39
`
`

`

`Wang discloses “a distance from the sputtering target
`to the substrate support in the range of approximately
`1 cm to 100 cm.” (Claim 29)
`
`Wang at 1:42‐51
`
`Wang at 3:57‐61
`
`40
`
`

`

`A “rise time of a voltage pulse approximately between
`0.01 and 1000V/µsec” would have been obvious.
`(Claims 14, 26, and 37)
`
`• Patent Owner does not argue that there is anything significant about
`this range.
`• Patent Owner does not dispute that the Mozgrin Thesis discloses this
`limitation or that a person of skill in the art would have been motivated
`to combine Wang and the Mozgrin Thesis.
`• Patent Owner's only argument is that the Mozgrin Thesis does not
`qualify as a “printed publication” for the purposes of prior art status.
`
`41
`
`

`

`A “rise time of a voltage pulse approximately between
`0.01 and 1000V/µsec” would have been obvious.
`(Claims 14, 26, and 37)
`
`• Claims 14, 26, and 37 are unpatentable regardless of the prior art
`status of the Mozgrin Thesis.
`
`•
`
`"[W]here the general conditions of a claim are disclosed in the prior
`art, it is not inventive to discover the optimum or workable ranges by
`routine experimentation.” In re Aller, 220 F. 454, 456 (CCPA 1955).
`• Claims 14, 26, and 37 describe an extremely wide range consistent
`with the voltage rate of rise in many sputtering systems using pulsed DC
`power. See Overzet Decl., ¶ 72.
`
`42
`
`

`

`Wang discloses “a gas flow controller that controls a
`flow of the feed gas so that the feed gas diffuses the
`strongly-ionized plasma.” (Claims 6, 31, and 45)
`
`plasma region
`
`feed gas enters here,
`and then fills the volume
`by diffusive motion
`
`See Overzet Dec. ¶¶ 75‐76
`
`43
`
`

`

`Wang discloses “a gas flow controller that controls a
`flow of the feed gas so that the feed gas diffuses the
`strongly-ionized plasma.” (Claims 6, 31, and 45)
`
`•
`
`The processing region 22 of Wang is a restricted and well-defined container,
`and a volume of Argon gas will expand to fill this region. Overzet Dec. ¶ 77.
`• Not only will a gas like Argon expand to fill its container, it will also mix or
`“intermingle” with the gasses present in the container. Overzet Dec. ¶ 77.
`
`•
`
`•
`
`In the system of Wang, the Argon feed gas will diffuse into the high density
`plasma, thereby allowing additional power from the pulsed power supply to
`be absorbed by the plasma. Overzet Dec. ¶ 77.
`
`Lantsman, which has a two stage plasma process similar to Wang, teaches a
`continuous feed of gas during the plasma process. Overzet Dec. ¶ 79.
`
`44
`
`

`

`Wang discloses “diffusing the weakly-ionized plasma
`with a volume of the feed gas while ionizing the
`volume of the feed gas to create additional weakly-
`ionized plasma.” (Claim 44)
`
`• Concerns "weakly-ionized plasma" rather than "strongly-ionized
`plasma" but concerns the same issue.
`
`45
`
`

`

`Wang discloses “the gas flow controller controls the
`flow of the feed gas to allow additional power to be
`absorbed by the strongly ionized plasma, thereby
`generating additional thermal energy in the sputtering
`target.” (Claims 7 and 32)
`
`• Controlling the flow of the feed gas will necessarily cause additional power to
`be absorbed by the strongly-ionized plasma. Overzet Dec. ¶ 82.
`• Moreover, when the strongly-ionized plasma absorbs additional power, it will
`necessarily generate additional thermal energy in the sputtering target.
`Overzet Dec. ¶ 83.
`
`•
`
`The increased power to the strongly-ionized plasma results in increased ion
`bombardment of the target which necessarily increases the power/energy to
`the target. Overzet Dec. ¶ 83.
`
`46
`
`

`

`Conclusion
`
`All claims of the ’421 patent are invalid.
`
`Ground
`
`800 Petition
`
`1
`
`2
`
`802 Petition
`1
`2
`805 Petition
`1
`
`2
`3
`
`Claims
`
`Prior Art
`
`1, 2, 8, 10–13, 16, 17, 22–
`25, 28–30, 33, 34, 39, 42,
`43, 46–48
`15, 27, 38
`
`Wang
`
`Wang + Mozgrin
`
`9, 21, and 35
`14, 26, and 37
`
`Wang + Kudryavtsev
`Wang + Mozgrin Thesis
`
`3–5, 18–20, 36, 40, and
`41
`6, 31, 44, and 45
`7 and 32
`
`Wang + Kawamata
`
`Wang + Lantsman
`Wang + Lantsman + Kawamata
`
`47
`
`

`

`Reserved Slides
`
`Reserved Slides
`
`48
`
`

`

`Patent Owner Conflates Figure 4 and Figure 6 of Wang
`
`Wang at Figs. 4 and 6 (annotated); Overzet Decl., ¶ 41
`
`49
`
`

`

`Patent Owner Conflates Figure 4 and Figure 6 of Wang
`
`Internal 
`impedance
`
`Power or 
`Voltage 
`
`Arcing 
`
`Wang Figure 4
`Impedance changes dramatically: 
`“[C]hamber impedance 
`dramatically changes.”  Wang at 
`5:29‐30, 52‐53.
`“Where chamber impedance is 
`changing, the power pulse width is 
`preferably specified rather than 
`the current or voltage pulse 
`widths.” Wang at 5:52‐54.
`Tendency to arc during 
`ignition/generation of strongly 
`ionized plasma: See Wang at 7:1‐
`12.
`
`Wang Figure 6
`Impedance changes little: 
`“[C]hamber impedance 
`changes relatively little ….”  
`Wang at 7:49‐51.
`Where chamber impedance 
`changes relatively little, there 
`is no preference to specify 
`power pulse over current or 
`voltage pulse.  (V = I * R).
`Arcing is avoided during 
`ignition and during 
`generation of strongly 
`ionized plasma. See Wang at 
`7:26‐28, 47‐48.
`
`Overzet Decl., ¶¶ 42‐44
`
`50
`
`

`

`Wang discloses "without an occurrence of arcing"
`
`Kortshagen Supp. Decl., IPR2014‐00807, Ex. 1221 at ¶75
`
`51
`
`

`

`Petitioner's Demonstrative Exhibits
`IPR2014-00805 (U.S. 7,811,421)
`
`CERTIFICATE OF SERVICE
`
`Pursuant to 37 C.F.R. § 42.6(e), this is to certify that I caused to be served a
`
`true and correct copy of the foregoing “PETITIONER'S
`
`DEMONSTRATIVE EXHIBITS” as detailed below:
`
`Date of service June 3, 2015
`
`Manner of service Email: gonsalves@gonsalveslawfirm.com;
`bbarker@chsblaw.com; and
`patents@ascendalaw.com
`
`Documents served PETITIONER'S DEMONSTRATIVE EXHIBITS
`
`Persons Served Dr. Gregory J. Gonsalves
`2216 Beacon Lane
`Falls Church, Virginia 22043
`
`Bruce Barker
`Chao Hadidi Stark & Barker LLP
`176 East Mail Street, Suite 6
`Westborough, MA 01581
`
`/Susan J. Stewart/
`Susan Stewart
`Baker Botts LLP
`910 Louisiana Street
`Houston, Texas 77002
`Tel: (713) 229-1580
`Email: susan.stewart@bakerbotts.com
`
`2
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`