UNITED STATES PATENT AND TRADEMARK OFFICE
`BEFORE THE PATENT TRIAL AND APPEAL BOARD
`_____________________
`
`FUJITSU SEMICONDUCTOR AMERICA, INC., THE GILLETTE COMPANY, ADVANCED MICRO
`DEVICES, INC., RENESAS ELECTRONICS CORPORATION, RENESAS ELECTRONICS
`AMERICA, INC., GLOBALFOUNDRIES U.S., INC., GLOBALFOUNDRIES DRESDEN MODULE
`ONE LLC & CO. KG, GLOBALFOUNDRIES DRESDEN MODULE TWO LLC & CO. KG, TOSHIBA
`AMERICA ELECTRONIC COMPONENTS, INC., TOSHIBA AMERICA INC., TOSHIBA AMERICA
`INFORMATION SYSTEMS, INC., and TOSHIBA CORPORATION,
`
`Petitioners
`v.
` ZOND, LLC
`Patent Owner
`
`U.S. Patent Nos. 7,808,184 and 8,125,155
` _____________________
`
`Cases IPR2014-00477; IPR2014-0479; IPR2014-00799;IPR2014-00803
`
`
`
`Patent Owner’s Demonstrative Exhibits
`
`
`Page 1
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Dr.  Chistyakov’s  Disclosure  
`
`Control  Voltage  Amplitude  
`
`  
`“The  pulsed  power  supply  102  can  be  
`programmed  to  generate  voltage  pulses  having  
`various  shapes.”  (‘184  Patent,  col.  6,  lines  8  –  9).  
`  
`  
`“The  desired  pulse  shapes  requested  from  the  
`pulsed  power  supply  102  are  superimposed  in  
`do9ed  lines  304,  304',  and  304''  onto  each  of  
`the  respecIve  mulI-­‐stage  voltage  pulses  302,  
`302',  and  302’”  (‘184  Patent,  col.  11,  lines  56  –  
`60).  
`  
`“The  pulsed  power  supply  102  aKempts  to  
`maintain  a  constant  voltage.”  (‘184  Patent,  col.  
`7,  lines  62  –  63).    
`  
`“The  magnitude  of  the  voltage  280  in  the  
`second  transient  stage  278  is  chosen  to  
`generate  a  strong  enough  electric  field    …  “  (‘184  
`Patent,  col.  9,  lines  61  –  63).  
`  
`
`Page 2
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Dr.  Chistyakov’s  Disclosure  
`Selectable  Output  Energy  Capacity  
`“In  the  low  power  mode,  the  pulsed  power  supply  
`102  supplies  energy  to  the  iniIal  plasma  at  a  
`relaIvely  slow  rate.”  (‘184  patent,  col.  7,  lines  39  –  
`40).  
`“[T]he  pulsed  power  supply  102  does  not  supply  
`enough  energy  in  the  low-­‐power  mode  to  drive  the  
`transient  plasma  into  the  strongly-­‐ionized  
`state…”  (184  patent,  col.  12,  lines  33  –  39”  
`“Since  there  is  insufficient  energy  stored  in  the  
`pulsed  power  supply  102  in  the  low-­‐power  mode  
`to  create  condiIons  that  can  sustain  a  strongly-­‐
`ionized  plasma,  …”  (184  patent,  col.  12,  lines  20  –  
`23).  
`“[T]he  pulsed  power  supply  102  transiHons  from  
`the  low-­‐power  mode  to  the  high-­‐power  
`mode.”  (184  patent,  col.  14,  lines  62  –  63).  
`“[T]he  pulsed  power  supply  102  (in  the  high-­‐power  
`mode)  supplies  a  sufficient  amount  of  
`uninterrupted  power  to  drive  the  weakly-­‐ionized  
`plasma  from  the  transient  non-­‐steady  state  to  a  
`strongly-­‐ionized  state.”  (‘184  Patent  col.  14,  lines  1  
`–  5).  
`  
`
`Page 3
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Dr.  Chistyakov’s  Disclosure  
`
`Control  Rise  Time  
`  
`“The  pulsed  power  supply  102  can  be  
`programmed  to  generate  voltage  pulses  having  
`various  shapes.”  (‘184  Patent,  col.  6,  lines  11  –  
`12).  
`  
`  
`“The  peak  plasma  density  can  be  controlled  by  
`controlling  the  slope  of  the  rise  Hme  of  the  
`voltage  pulse  252.”(‘184  Patent,  col.  8,  lines  4  –  
`17).  
`  
`  
`“The  rise  Hme  of  the  voltage  280  in  the  second  
`transient  stage  278  is  chosen.”  (  ‘184  Patent,  
`col.  9,  lines  55  –  59).  
`  
`
`Page 4
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Dr.  Chistyakov’s  Disclosure  
`
`Fig.  5A                                                                                  Fig.  5B                                                                                                Fig.  5C  
`
`Page 5
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Claim  1  
`
`Claim  17  
`An apparatus for generating a strongly-ionized
`
`a) means for supplying feed gas proximate to an
`
`‘155  Patent:  Apparatus  Claims  
`A strongly-ionized plasma generator comprising:  
`plasma, the apparatus comprising:  
`a) a chamber for confining a feed gas;  
`anode and a cathode assembly;  
`b) an anode that is positioned inside the chamber;  
`    
`    
`the anode inside the chamber; and  
`cathode assembly,  
`and the cathode; and  
`rise time of the voltage pulse to  
`amplitude and a controlled rise time that  
`anode and the cathode assembly.  
`cathode assembly.  
`
`increases an ionization rate of sputtered material
`atoms so that a rapid increase in electron density
`and a formation of a strongly-ionized plasma occurs
`without forming an arc between the anode and the
`
`c) a cathode assembly that is positioned adjacent to
`d) a pulsed power supply having an output that is
`electrically connected between the anode and the
`
`the pulsed power supply generating at the output a
`voltage pulse having at least one of a controlled
`
`b) means for generating a voltage pulse that
`FORMS A PLASMA between the anode
`c) means for controlling an amplitude AND a
`
`increase an ionization rate of sputtered material
`atoms so that a rapid increase in electron density
`and a formation of a strongly-ionized plasma
`occurs without forming an arc between the
`
`Page 6
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Claim  1  
`A method of generating a strongly-ionized
`
`a) supplying feed gas proximate to an anode and
`
`Claim  11  
`A method of generating a strongly-ionized
`plasma, the method comprising: 
`a) supplying feed gas proximate to an anode and
`
`‘184  Patent:  Method  Claims  
`plasma, the method comprising:  
`  
`a cathode assembly; and  
`a cathode assembly; and  
`and the cathode assembly,  
`anode and the cathode assembly,  
`time  
`time  
`and the cathode assembly.  
`
`that increases an ionization rate so that a
`rapid increase in electron density and a
`formation of a strongly-ionized plasma occurs
`without forming an arc between the anode
`
`b) generating a voltage pulse between the anode
`
`b) generating a voltage pulse between the
`
`the voltage pulse having at least one of a
`controlled amplitude and a controlled rise
`
`the voltage pulse having at least one of a
`controlled amplitude and a controlled rise
`
`that shifts an electron energy distribution in
`the plasma to higher energies that increase an
`ionization rate so as to result in a rapid
`increase in electron density and a formation
`of a strongly-ionized plasma without
`forming an arc between the anode and the
`
`cathode assembly.  
`
`Page 7
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Controlled  Variable:  Eronini  
`
`Page 8
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Controlled  Variable:  Kuo  &  Sinha  
`
`Kuo  
`  
`  
`  
`  
`  
`  
`  
`  
`Sinha  
`
`Page 9
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`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Voltage  Control:  DeVito  
`
`Q:    What  does  it  mean  to  direct  the  amplitude  of  a  voltage  pulse?  
`A:  Well  in  this  context,  you  would  set  the  power  supply  to  a  specific  
`  
`magnitude  and  you  would  make  the  power  supply  go  to  that  magnitude.    
`  
`You  would  control  it  to  go  for  that  power  –  I’m  sorry    -­‐-­‐  that  voltage.  
`  
`***  
`  
`Q:    So  again,  the  quesIon  is,  what  does  it  mean  to  direct  the  amplitude  of  a  
`  
`voltage  pulse?  
`  
`A:    You  would  set  the  –  you  would  set  the  peak  magnitude  of  the  voltage  
`  
`pulse  on  our  power  supply  and  you  would  control  -­‐-­‐-­‐    -­‐it  would  go  to  that  
`  
`voltage.  
`  
`Ex.  2014,  DeVito  Deposi@on,  page  173,  line  14  –  page  174,  line  20.  
`
`Page 10
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Control:  Bravman  
`
`  
`A.  In  general,  one  understands  that  if  you  are  going  to  have  a  controlled  system,  it's  
`to  control  some  desired  output  variable.  (Zond  Ex.  2022,  Page  100,  line  24  –  page  101,  line  15,  lines  7  -­‐  
`16  )  
`  
`Q.  So  now  we  menIoned  earlier  the  programmable  controller  referred  to  in  the  
`'155  Patent.  Does  the  programmable  controller  bear  any  relaIon  to  the  specified  
`target  levels  shown  here  in  Figure  5C?  
`A.  It  would  be  typically  one  job  of  some  means  of  control  or  a  controller  to  
`maintain  the  desired  or  target  voltage  pulse  waveform.  That's  the  funcIon  of  
`whatever  the  controller  is  or  comprises,  that  would  be  one  of  its  tasks.  (  Zond  Ex.  2022,  
`Page  44,  lines  3  –  14).  
`  
`      
`
`Page 11
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Proposed  Claim  InterpretaIon  
`
`Claim Language at Issue
`
`Proposed Construction
`
`Generating a voltage pulse … having at
`least one of a controlled amplitude and a
`controlled rise time that increases an
`ionization rate so that a rapid increase in
`electron density and a formation of a
`strongly ionized plasma occurs without
`forming an arc …
`
`Generating a voltage pulse whose amplitude
`and/or rise time are controlled variables
`that are directed or restrained to a target
`voltage level and/or a rise time level
`to increase an ionization rate so that a rapid
`increase in electron density and a formation
`of a strongly ionized plasma occurs without
`forming an arc.
` 
`
`Page 12
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Proposed  InterpretaIon  for  Claim  17  
`
`Claim Language at Issue
`
`Proposed Construction
`
`Controlling and amplitude and rise
`time of the voltage pulse to increase
`an ionization rate of sputtered ion
`material atoms so that a rapid
`increase in electron density and a
`formation of a strongly ionized
`plasma occurs without forming an
`arc …”
`
`Directing or restraining the
`controlled variables of voltage
`amplitude AND voltage rise time
`to target levels to cause an increase
`an ionization rate of sputtered ion
`material atoms so that a rapid
`increase in electron density and a
`formation of a strongly ionized
`plasma occurs without forming an
`arc.
`
`Page 13
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Wang:  Power  Control  
`
`Page 14
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Wang:  Power  Control  
`
`“[I]it  is  advantageous  to  use  a  
`target  power  waveform  
`illustrated  in  figure  6  …  “  
`Wang,  col.  7,  lines  13  –  14  
`  
`  
`“[T]he  actual  waveforms  will  
`differ  from  the  idealized  
`illustrated  ones.”  (Wang,  col.  
`7,  lines  40  -­‐  41  
`
`Page 15
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Kudryavtsev  
`“Specially  Designed  Electrical  Circuit”  
`
`Measured  
`Current  
`  
`  
`Measured  
`Voltage  
`
`Kudryavtsev,  page  33,  leJ  col.  
`
`Page 16
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`DeVito:  
`Measured  Waveforms  Do  Not  Reveal    
`Power  Supply  Control  
`
`Mr.  DeVito:  
`
`  
`Q:  When  does  the  pulse  in  2B  end?  
`A:  We  don’t  know  that  from  this  diagram.    I  don’t  know  that  from  
`this  diagram.  
`  Ex.  2014,  DeVito  Deposi@on,  page  303,  lines  3  –  6.  
`
`  
`Q;  [W]hy  does  Kudryavtsev  bring  his  voltage  so  low,  way  below  the  
`pre-­‐ionizaIon  voltage?  
`A:  I  mean,  I  don’t  know  the  -­‐-­‐-­‐  it  could  be  a  physical  phenomenon  
`of  his  power  supply  interacIng  with  his  plasma.  I  don’t  know.  
`***  
`Q:  But  apart  from  that,  you  don’t  have  any  understanding  as  to  
`why  Kudryavtsev  would  drop  the  voltage?  
`A:  I  mean,  you  keep  saying  Kudryavtsev  dropping  the  voltage  as  if  
`he’s  doing  it  on  purpose.    I  think  that  is  wrong  –  a  wrong  
`interpretaIon.  I  mean  the  voltage  is  dropping  as  a  result  of  -­‐    he’s  
`not  telling  it  to  go  there.  
`  Ex.  2014,  DeVito  Deposi@on,  page  300,  lines  10  –  
`  page  310,  lines  7  –  15.  
`
`  16;  
`
`  
`
`Measured  
`Current  
`  
`  
`Measured  
`Voltage  
`
`Page 17
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`Bravman:  
`Measured  Waveforms  Do  Not  Reveal    
`Power  Supply  Control  
`Q.  And  I  think,  isn't  this  true,  generally,  that  when  you  measure  the  voltage  across  a  set  of  electrodes,  that  
`because  of  the  other  variables,  you  can't  deduce  from  the  waveforms  alone  the  status  or  condiIon  of  the  
`power  supply?  
`  A.  So  I  think  I  understand  that  quesIon.  It  is  a  very  -­‐-­‐  it  is  a  raIonale  but  very  broad  quesIon.  One  can  
`measure  the  voltage  across  terminals  precisely  as  a  funcIon  of  Ime  with  high  temporal  resoluIon.  And  that  
`will  tell  you,  and,  in  fact,  does  tell  you  what  the  power  supply  is  actually  capable  of  developing  as  a  funcIon  
`of  Ime  in  terms  of  voltage  across  a  load.  That  can  be  done  with  high  precision.    
`  Q.  Right.  But  from  that  waveform  alone,  you  can't  tell  what  the  power  supply's  target  voltage  amplitude  or  
`energy  capacity  is  just  from  the  measured  waveform  alone;  is  that  correct?    
`A. If  the  only  informaIon  one  had  available  was  that  measured  actual  voltage  and  nothing  else,  then  if  I  
`understand  your  quesIon  correctly,  right,  one  could  not  say  if,  for  instance,  the  power  supply  exhausted  its  
`total  energy  supply  or  whether  it  was  operaIng  at  1%  of  peak  load.  That  single  piece  of  data  I  don't  see  how  
`it  could  tell  you  that.  You  would  have  to  know  other  things.  (Ex.  2022,  Bravman,  page  145,  line  16  –  page  
`146,  line  23).  
`  
`Q.  So,  again,  since  it  is  a  measured  waveform,  when  the  voltage  drops  at  the  end  of  the  stage  that  you  have  
`highlighted  in  red  or  pink,  can  you  tell  from  looking  at  this  waveform  whether  that  drop  in  voltage  was  the  
`result  of  the  power  supply  controller  deciding  to  step  the  voltage  down  or  the  power  supply  controller  
`lacking  the  capacity  to  maintain  the  voltage  where  it  wanted  it  to  be?  
`A.  Again,  in  the  abstract  by  itself,  no,  you  cannot.  (Ex.  2022,Bravman,  page  191,  line  13  –  page  192,  line  2).  
`  
`
`Page 18
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`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`‘184  Patent:  MulI-­‐Stage  Pulse  
`pulse  comprise  a  mulI-­‐stage  voltage  pulse.    
`pulse  comprise  a  mulI-­‐stage  voltage  pulse    
`
`The  method  of  claim  1  wherein  the  voltage  
`
`The  method  of  claim  11  wherein  the  voltage  
`
`Claim  5  
`
`Claim  15  
`
`Page 19
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`‘184  Patent:  Long  Plasma  LifeIme  
`than  200  μsec.    
`than  200  μsec.    
`
`Claim  7  
`The  method  of  claim  1  wherein  a  lifeIme  
`of  the  strongly-­‐ionized  plasma  is  greater  
`
`Claim  17  
`The  method  of  claim  11  wherein  a  lifeIme  
`of  the  strongly-­‐ionized  plasma  is  greater  
`
`Page 20
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`‘155  Patent:  Long  Plasma  LifeIme  
`plasma  for  greater  than  200  μsec.    
`than  about  200  μsec.  
`  
`
`The  plasma  generator  of  claim  1  wherein  a  
`lifeIme  of  the  strongly-­‐ionized  plasma  is  greater  
`
`The  apparatus  of  claim  17  further  comprising  a  
`means  for  sustaining  the  strongly-­‐ionized  
`
`Claim  16  
`
`Claim  19  
`
`Page 21
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`

`

`‘155  Patent:  Supplemental  Energy  Store  
`
`Claim  9  
`The  plasma  generator  of  claim  1  further  
`comprising  an  energy  storage  device  that  is  
`electrically  coupled  to  the  cathode  assembly,  
`the  energy  storage  device  discharging  energy  
`into  the  plasma  to  enhance  the  rapid  
`increase  in  electron  density  and  the  
`
`formaIon  of  the  strongly-­‐ionized  plasma    
`
`Speci0ication  
`“In  some  embodiments,  the  plasma  
`spuKering  apparatus  includes  an  energy  
`storage  device  that  provides  a  source  of  
`energy  that  can  be  controllably  released  into  
`the  plasma.”    Ex.  1001,  ‘155  patent,  col.  3,  
`lines  43  –  45.  
`
`  
`
`Page 22
`
`Fujitsu et. al. v. Zond
`IPR Nos. 2014-00477; 2014-00479; 2014-00799; and 2014-00803
`Zond Exhibit 2023
`
`